TWI838606B - 資訊處理裝置、檢測方法、程式、基板處理系統及物品之製造方法 - Google Patents
資訊處理裝置、檢測方法、程式、基板處理系統及物品之製造方法 Download PDFInfo
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- TWI838606B TWI838606B TW110103938A TW110103938A TWI838606B TW I838606 B TWI838606 B TW I838606B TW 110103938 A TW110103938 A TW 110103938A TW 110103938 A TW110103938 A TW 110103938A TW I838606 B TWI838606 B TW I838606B
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- G05B23/02—Electric testing or monitoring
- G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
- G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
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- Engineering & Computer Science (AREA)
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020-071692 | 2020-04-13 | ||
JP2020071692A JP7423396B2 (ja) | 2020-04-13 | 2020-04-13 | 情報処理装置、検出方法、プログラム、基板処理システム、及び物品の製造方法 |
Publications (2)
Publication Number | Publication Date |
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TW202208996A TW202208996A (zh) | 2022-03-01 |
TWI838606B true TWI838606B (zh) | 2024-04-11 |
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TW110103938A TWI838606B (zh) | 2020-04-13 | 2021-02-03 | 資訊處理裝置、檢測方法、程式、基板處理系統及物品之製造方法 |
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JP (1) | JP7423396B2 (ja) |
KR (1) | KR20210127089A (ja) |
CN (1) | CN113539885A (ja) |
TW (1) | TWI838606B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2023102218A (ja) * | 2022-01-11 | 2023-07-24 | 株式会社Screenホールディングス | 基板処理装置管理システム、基板処理装置管理方法および基板処理装置管理プログラム |
JP2023103123A (ja) * | 2022-01-13 | 2023-07-26 | 株式会社Screenホールディングス | 適正判定装置および適正判定方法 |
JP2023105744A (ja) * | 2022-01-19 | 2023-07-31 | 株式会社Screenホールディングス | 支援装置、支援方法および支援プログラム |
WO2023162856A1 (ja) * | 2022-02-22 | 2023-08-31 | 株式会社Screenホールディングス | 基板処理装置管理システム、支援装置、基板処理装置、チャンバ間性能比較方法およびチャンバ間性能比較プログラム |
JP2023127946A (ja) * | 2022-03-02 | 2023-09-14 | 株式会社Screenホールディングス | 制御支援装置および制御支援方法 |
JP2023132914A (ja) * | 2022-03-11 | 2023-09-22 | 株式会社Screenホールディングス | 基板処理装置管理システム、管理装置、基板処理装置、基板処理装置管理方法および基板処理装置管理プログラム |
CN115798167B (zh) * | 2023-01-05 | 2023-04-21 | 石家庄市惠源淀粉有限公司 | 用于淀粉葡萄糖生产工艺的设备异常报警方法及装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015145500A1 (ja) * | 2014-03-27 | 2015-10-01 | 日本電気株式会社 | システム分析装置、分析モデル生成方法、システム分析方法およびシステム分析プログラム |
JP2019101495A (ja) * | 2017-11-28 | 2019-06-24 | 横河電機株式会社 | 診断装置、診断方法、プログラム、および記録媒体 |
TW202002121A (zh) * | 2018-06-14 | 2020-01-01 | 日商佳能股份有限公司 | 資訊處理設備、判斷方法、程式、微影系統及製造物的方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000243678A (ja) * | 1998-12-24 | 2000-09-08 | Toshiba Corp | モニタリング装置とその方法 |
US7065422B1 (en) * | 2002-06-28 | 2006-06-20 | Advanced Micro Devices, Inc. | Method and apparatus for system state classification |
JP2005136004A (ja) * | 2003-10-28 | 2005-05-26 | Nikon Corp | 露光装置、およびデバイス製造方法 |
JP2007219692A (ja) * | 2006-02-15 | 2007-08-30 | Omron Corp | プロセス異常分析装置およびプロセス異常分析システム並びにプログラム |
JP6853617B2 (ja) * | 2015-07-14 | 2021-03-31 | 中国電力株式会社 | 故障予兆監視方法 |
JP6615963B1 (ja) * | 2018-08-31 | 2019-12-04 | 株式会社日立パワーソリューションズ | 異常予兆診断装置及び異常予兆診断方法 |
JP7181033B2 (ja) * | 2018-09-20 | 2022-11-30 | 株式会社Screenホールディングス | データ処理方法、データ処理装置、および、データ処理プログラム |
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2020
- 2020-04-13 JP JP2020071692A patent/JP7423396B2/ja active Active
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2021
- 2021-02-03 TW TW110103938A patent/TWI838606B/zh active
- 2021-03-26 KR KR1020210039465A patent/KR20210127089A/ko active Search and Examination
- 2021-04-09 CN CN202110382069.5A patent/CN113539885A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2015145500A1 (ja) * | 2014-03-27 | 2015-10-01 | 日本電気株式会社 | システム分析装置、分析モデル生成方法、システム分析方法およびシステム分析プログラム |
JP2019101495A (ja) * | 2017-11-28 | 2019-06-24 | 横河電機株式会社 | 診断装置、診断方法、プログラム、および記録媒体 |
TW202002121A (zh) * | 2018-06-14 | 2020-01-01 | 日商佳能股份有限公司 | 資訊處理設備、判斷方法、程式、微影系統及製造物的方法 |
Also Published As
Publication number | Publication date |
---|---|
CN113539885A (zh) | 2021-10-22 |
KR20210127089A (ko) | 2021-10-21 |
JP2021168364A (ja) | 2021-10-21 |
JP7423396B2 (ja) | 2024-01-29 |
TW202208996A (zh) | 2022-03-01 |
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