TWI827824B - 正型感光性樹脂組成物、硬化膜的製造方法、硬化膜、光學元件以及電子材料 - Google Patents

正型感光性樹脂組成物、硬化膜的製造方法、硬化膜、光學元件以及電子材料 Download PDF

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Publication number
TWI827824B
TWI827824B TW109110209A TW109110209A TWI827824B TW I827824 B TWI827824 B TW I827824B TW 109110209 A TW109110209 A TW 109110209A TW 109110209 A TW109110209 A TW 109110209A TW I827824 B TWI827824 B TW I827824B
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
resin composition
positive photosensitive
group
polysiloxane
Prior art date
Application number
TW109110209A
Other languages
English (en)
Chinese (zh)
Other versions
TW202040275A (zh
Inventor
今西世志美
日比野利保
諏訪充史
Original Assignee
日商東麗股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東麗股份有限公司 filed Critical 日商東麗股份有限公司
Publication of TW202040275A publication Critical patent/TW202040275A/zh
Application granted granted Critical
Publication of TWI827824B publication Critical patent/TWI827824B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW109110209A 2019-03-26 2020-03-26 正型感光性樹脂組成物、硬化膜的製造方法、硬化膜、光學元件以及電子材料 TWI827824B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019058133 2019-03-26
JP2019-058133 2019-03-26

Publications (2)

Publication Number Publication Date
TW202040275A TW202040275A (zh) 2020-11-01
TWI827824B true TWI827824B (zh) 2024-01-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW109110209A TWI827824B (zh) 2019-03-26 2020-03-26 正型感光性樹脂組成物、硬化膜的製造方法、硬化膜、光學元件以及電子材料

Country Status (3)

Country Link
JP (1) JP7484710B2 (https=)
TW (1) TWI827824B (https=)
WO (1) WO2020196601A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025192509A1 (ja) * 2024-03-13 2025-09-18 東レ株式会社 ポリシロキサン、感光性樹脂組成物、硬化物、半導体装置および有機ｅｌ表示装置
WO2026018782A1 (ja) * 2024-07-18 2026-01-22 Jsr株式会社 保護膜形成用組成物及び半導体基板の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201133137A (en) * 2009-11-27 2011-10-01 Jsr Corp Positive-type radiation-sensitive composition, cured film and method for forming same
TW201329639A (zh) * 2011-12-26 2013-07-16 東麗股份有限公司 感光性樹脂組成物及半導體元件的製造方法
TW201802594A (zh) * 2016-03-25 2018-01-16 Ａｚ電子材料盧森堡有限公司 感光性矽氧烷組成物
TW201807490A (zh) * 2016-04-25 2018-03-01 Toray Industries 樹脂組成物、硬化膜與其製造方法、以及固體攝像元件

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5310051B2 (ja) * 2009-02-12 2013-10-09 Ｊｓｒ株式会社 感放射線性組成物、マイクロレンズおよびその形成方法
JP5397152B2 (ja) * 2009-10-22 2014-01-22 Ｊｓｒ株式会社 ポジ型感放射線性組成物、層間絶縁膜及びその形成方法
JP5818022B2 (ja) * 2010-05-13 2015-11-18 日産化学工業株式会社 感光性樹脂組成物およびディスプレイ装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201133137A (en) * 2009-11-27 2011-10-01 Jsr Corp Positive-type radiation-sensitive composition, cured film and method for forming same
TW201329639A (zh) * 2011-12-26 2013-07-16 東麗股份有限公司 感光性樹脂組成物及半導體元件的製造方法
TW201802594A (zh) * 2016-03-25 2018-01-16 Ａｚ電子材料盧森堡有限公司 感光性矽氧烷組成物
TW201807490A (zh) * 2016-04-25 2018-03-01 Toray Industries 樹脂組成物、硬化膜與其製造方法、以及固體攝像元件

Also Published As

Publication number Publication date
TW202040275A (zh) 2020-11-01
JPWO2020196601A1 (https=) 2020-10-01
WO2020196601A1 (ja) 2020-10-01
JP7484710B2 (ja) 2024-05-16

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