JP7484710B2 - ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス - Google Patents

ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス Download PDF

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Publication number
JP7484710B2
JP7484710B2 JP2020517600A JP2020517600A JP7484710B2 JP 7484710 B2 JP7484710 B2 JP 7484710B2 JP 2020517600 A JP2020517600 A JP 2020517600A JP 2020517600 A JP2020517600 A JP 2020517600A JP 7484710 B2 JP7484710 B2 JP 7484710B2
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JP
Japan
Prior art keywords
resin composition
photosensitive resin
group
composition according
polysiloxane
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JP2020517600A
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English (en)
Japanese (ja)
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JPWO2020196601A5 (https=
JPWO2020196601A1 (https=
Inventor
世志美 今西
利保 日比野
充史 諏訪
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Toray Industries Inc
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Toray Industries Inc
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020517600A 2019-03-26 2020-03-25 ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス Active JP7484710B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019058133 2019-03-26
JP2019058133 2019-03-26
PCT/JP2020/013260 WO2020196601A1 (ja) 2019-03-26 2020-03-25 ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス

Publications (3)

Publication Number Publication Date
JPWO2020196601A1 JPWO2020196601A1 (https=) 2020-10-01
JPWO2020196601A5 JPWO2020196601A5 (https=) 2023-03-28
JP7484710B2 true JP7484710B2 (ja) 2024-05-16

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JP2020517600A Active JP7484710B2 (ja) 2019-03-26 2020-03-25 ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス

Country Status (3)

Country Link
JP (1) JP7484710B2 (https=)
TW (1) TWI827824B (https=)
WO (1) WO2020196601A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026018782A1 (ja) * 2024-07-18 2026-01-22 Jsr株式会社 保護膜形成用組成物及び半導体基板の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025192509A1 (ja) * 2024-03-13 2025-09-18 東レ株式会社 ポリシロキサン、感光性樹脂組成物、硬化物、半導体装置および有機ｅｌ表示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010185991A (ja) 2009-02-12 2010-08-26 Jsr Corp 感放射線性組成物、マイクロレンズおよびその形成方法
JP2011090164A (ja) 2009-10-22 2011-05-06 Jsr Corp ポジ型感放射線性組成物、層間絶縁膜及びその形成方法
WO2011142391A1 (ja) 2010-05-13 2011-11-17 日産化学工業株式会社 感光性樹脂組成物およびディスプレイ装置
WO2017188047A1 (ja) 2016-04-25 2017-11-02 東レ株式会社 樹脂組成物、その硬化膜およびその製造方法ならびに固体撮像素子

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5917150B2 (ja) * 2009-11-27 2016-05-11 Jsr株式会社 ポジ型感放射線性組成物、硬化膜及びその形成方法
WO2013099785A1 (ja) * 2011-12-26 2013-07-04 東レ株式会社 感光性樹脂組成物および半導体素子の製造方法
JP2017173741A (ja) * 2016-03-25 2017-09-28 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 感光性シロキサン組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010185991A (ja) 2009-02-12 2010-08-26 Jsr Corp 感放射線性組成物、マイクロレンズおよびその形成方法
JP2011090164A (ja) 2009-10-22 2011-05-06 Jsr Corp ポジ型感放射線性組成物、層間絶縁膜及びその形成方法
WO2011142391A1 (ja) 2010-05-13 2011-11-17 日産化学工業株式会社 感光性樹脂組成物およびディスプレイ装置
WO2017188047A1 (ja) 2016-04-25 2017-11-02 東レ株式会社 樹脂組成物、その硬化膜およびその製造方法ならびに固体撮像素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026018782A1 (ja) * 2024-07-18 2026-01-22 Jsr株式会社 保護膜形成用組成物及び半導体基板の製造方法

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Publication number Publication date
TW202040275A (zh) 2020-11-01
TWI827824B (zh) 2024-01-01
JPWO2020196601A1 (https=) 2020-10-01
WO2020196601A1 (ja) 2020-10-01

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