JPWO2020196601A1 - - Google Patents
Info
- Publication number
- JPWO2020196601A1 JPWO2020196601A1 JP2020517600A JP2020517600A JPWO2020196601A1 JP WO2020196601 A1 JPWO2020196601 A1 JP WO2020196601A1 JP 2020517600 A JP2020517600 A JP 2020517600A JP 2020517600 A JP2020517600 A JP 2020517600A JP WO2020196601 A1 JPWO2020196601 A1 JP WO2020196601A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Silicon Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019058133 | 2019-03-26 | ||
| JP2019058133 | 2019-03-26 | ||
| PCT/JP2020/013260 WO2020196601A1 (ja) | 2019-03-26 | 2020-03-25 | ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020196601A1 true JPWO2020196601A1 (https=) | 2020-10-01 |
| JPWO2020196601A5 JPWO2020196601A5 (https=) | 2023-03-28 |
| JP7484710B2 JP7484710B2 (ja) | 2024-05-16 |
Family
ID=72609928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020517600A Active JP7484710B2 (ja) | 2019-03-26 | 2020-03-25 | ポジ型感光性樹脂組成物、その硬化膜およびそれを具備する光学デバイス |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7484710B2 (https=) |
| TW (1) | TWI827824B (https=) |
| WO (1) | WO2020196601A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025192509A1 (ja) * | 2024-03-13 | 2025-09-18 | 東レ株式会社 | ポリシロキサン、感光性樹脂組成物、硬化物、半導体装置および有機ｅｌ表示装置 |
| WO2026018782A1 (ja) * | 2024-07-18 | 2026-01-22 | Jsr株式会社 | 保護膜形成用組成物及び半導体基板の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010185991A (ja) * | 2009-02-12 | 2010-08-26 | Jsr Corp | 感放射線性組成物、マイクロレンズおよびその形成方法 |
| JP2011090164A (ja) * | 2009-10-22 | 2011-05-06 | Jsr Corp | ポジ型感放射線性組成物、層間絶縁膜及びその形成方法 |
| WO2011142391A1 (ja) * | 2010-05-13 | 2011-11-17 | 日産化学工業株式会社 | 感光性樹脂組成物およびディスプレイ装置 |
| WO2017188047A1 (ja) * | 2016-04-25 | 2017-11-02 | 東レ株式会社 | 樹脂組成物、その硬化膜およびその製造方法ならびに固体撮像素子 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5917150B2 (ja) * | 2009-11-27 | 2016-05-11 | Jsr株式会社 | ポジ型感放射線性組成物、硬化膜及びその形成方法 |
| WO2013099785A1 (ja) * | 2011-12-26 | 2013-07-04 | 東レ株式会社 | 感光性樹脂組成物および半導体素子の製造方法 |
| JP2017173741A (ja) * | 2016-03-25 | 2017-09-28 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | 感光性シロキサン組成物 |
-
2020
- 2020-03-25 WO PCT/JP2020/013260 patent/WO2020196601A1/ja not_active Ceased
- 2020-03-25 JP JP2020517600A patent/JP7484710B2/ja active Active
- 2020-03-26 TW TW109110209A patent/TWI827824B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010185991A (ja) * | 2009-02-12 | 2010-08-26 | Jsr Corp | 感放射線性組成物、マイクロレンズおよびその形成方法 |
| JP2011090164A (ja) * | 2009-10-22 | 2011-05-06 | Jsr Corp | ポジ型感放射線性組成物、層間絶縁膜及びその形成方法 |
| WO2011142391A1 (ja) * | 2010-05-13 | 2011-11-17 | 日産化学工業株式会社 | 感光性樹脂組成物およびディスプレイ装置 |
| WO2017188047A1 (ja) * | 2016-04-25 | 2017-11-02 | 東レ株式会社 | 樹脂組成物、その硬化膜およびその製造方法ならびに固体撮像素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202040275A (zh) | 2020-11-01 |
| TWI827824B (zh) | 2024-01-01 |
| WO2020196601A1 (ja) | 2020-10-01 |
| JP7484710B2 (ja) | 2024-05-16 |
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