TWI811415B - 磁碟基板之研磨方法及磁碟基板用研磨劑組成物 - Google Patents

磁碟基板之研磨方法及磁碟基板用研磨劑組成物 Download PDF

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Publication number
TWI811415B
TWI811415B TW108127248A TW108127248A TWI811415B TW I811415 B TWI811415 B TW I811415B TW 108127248 A TW108127248 A TW 108127248A TW 108127248 A TW108127248 A TW 108127248A TW I811415 B TWI811415 B TW I811415B
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Taiwan
Prior art keywords
monomer
water
disk substrate
grinding
polishing
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TW108127248A
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English (en)
Chinese (zh)
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TW202007738A (zh
Inventor
安藤順一郎
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日商山口精研工業股份有限公司
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Publication of TWI811415B publication Critical patent/TWI811415B/zh

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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
TW108127248A 2018-08-03 2019-07-31 磁碟基板之研磨方法及磁碟基板用研磨劑組成物 TWI811415B (zh)

Applications Claiming Priority (2)

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JP2018146518A JP7128685B2 (ja) 2018-08-03 2018-08-03 磁気ディスク基板の研磨方法、および磁気ディスク基板用研磨剤組成物
JP2018-146518 2018-08-03

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TW202007738A TW202007738A (zh) 2020-02-16
TWI811415B true TWI811415B (zh) 2023-08-11

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TW108127248A TWI811415B (zh) 2018-08-03 2019-07-31 磁碟基板之研磨方法及磁碟基板用研磨劑組成物

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JP (1) JP7128685B2 (enExample)
MY (1) MY195012A (enExample)
TW (1) TWI811415B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440326B2 (ja) * 2020-04-01 2024-02-28 山口精研工業株式会社 研磨剤組成物
JP7492366B2 (ja) * 2020-04-17 2024-05-29 山口精研工業株式会社 磁気ディスク基板用研磨剤組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
JP2014032718A (ja) * 2012-08-01 2014-02-20 Kao Corp 磁気ディスク基板の製造方法
TW201734160A (zh) * 2016-02-29 2017-10-01 Fujimi Inc 研磨用組成物及使用其之研磨方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5979871B2 (ja) 2011-03-09 2016-08-31 花王株式会社 磁気ディスク基板の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
JP2014032718A (ja) * 2012-08-01 2014-02-20 Kao Corp 磁気ディスク基板の製造方法
TW201734160A (zh) * 2016-02-29 2017-10-01 Fujimi Inc 研磨用組成物及使用其之研磨方法

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MY195012A (en) 2022-12-30
JP2020021528A (ja) 2020-02-06
TW202007738A (zh) 2020-02-16
JP7128685B2 (ja) 2022-08-31

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