MY195012A - Method of polishing magnetic disk substrate, and polishing composition for magnetic disk substrate - Google Patents

Method of polishing magnetic disk substrate, and polishing composition for magnetic disk substrate

Info

Publication number
MY195012A
MY195012A MYPI2019004368A MYPI2019004368A MY195012A MY 195012 A MY195012 A MY 195012A MY PI2019004368 A MYPI2019004368 A MY PI2019004368A MY PI2019004368 A MYPI2019004368 A MY PI2019004368A MY 195012 A MY195012 A MY 195012A
Authority
MY
Malaysia
Prior art keywords
polishing
magnetic disk
disk substrate
stage
composition
Prior art date
Application number
MYPI2019004368A
Inventor
Ando Junichiro
Original Assignee
Yamaguchi Seiken Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaguchi Seiken Kogyo Co Ltd filed Critical Yamaguchi Seiken Kogyo Co Ltd
Publication of MY195012A publication Critical patent/MY195012A/en

Links

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

Provided are a method of polishing a magnetic disk substrate capable of reducing waviness and roll-off of a substrate surface after a rough polishing step in a multi-stage polishing method while maintaining productivity, and a polishing composition used in the method. The method of polishing a magnetic disk substrate of the present invention is a polishing method in a rough polishing step in a method of polishing a magnetic disk substrate including a rough polishing step and a finish polishing step in a multi-stage polishing method, including (1) a former-stage polishing step using a polishing composition A containing alumina particles, an organic sulfuric acid ester salt compound, and water, (2) a rinsing step after the former-stage polishing step, and (3) a latter-stage polishing step using a polishing composition B containing colloidal silica and water after the rinsing step, wherein a specific water-soluble polymer compound is contained in the polishing composition A and/or polishing composition B. [No suitable figure]
MYPI2019004368A 2018-08-03 2019-07-31 Method of polishing magnetic disk substrate, and polishing composition for magnetic disk substrate MY195012A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018146518A JP7128685B2 (en) 2018-08-03 2018-08-03 Method for polishing magnetic disk substrate, and abrasive composition for magnetic disk substrate

Publications (1)

Publication Number Publication Date
MY195012A true MY195012A (en) 2022-12-30

Family

ID=69589906

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2019004368A MY195012A (en) 2018-08-03 2019-07-31 Method of polishing magnetic disk substrate, and polishing composition for magnetic disk substrate

Country Status (3)

Country Link
JP (1) JP7128685B2 (en)
MY (1) MY195012A (en)
TW (1) TWI811415B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7440326B2 (en) * 2020-04-01 2024-02-28 山口精研工業株式会社 Abrasive composition
JP7492366B2 (en) 2020-04-17 2024-05-29 山口精研工業株式会社 Abrasive composition for magnetic disk substrates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6336945B1 (en) * 1996-11-14 2002-01-08 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
JP5979871B2 (en) * 2011-03-09 2016-08-31 花王株式会社 Manufacturing method of magnetic disk substrate
JP2014032718A (en) * 2012-08-01 2014-02-20 Kao Corp Method for manufacturing magnetic disk substrate
US11332640B2 (en) * 2016-02-29 2022-05-17 Fujimi Incorporated Polishing composition and polishing method using same

Also Published As

Publication number Publication date
TW202007738A (en) 2020-02-16
JP7128685B2 (en) 2022-08-31
JP2020021528A (en) 2020-02-06
TWI811415B (en) 2023-08-11

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