MY186418A - Polishing composition and method for producing magnetic disk substrate - Google Patents

Polishing composition and method for producing magnetic disk substrate

Info

Publication number
MY186418A
MY186418A MYPI2018701208A MYPI2018701208A MY186418A MY 186418 A MY186418 A MY 186418A MY PI2018701208 A MYPI2018701208 A MY PI2018701208A MY PI2018701208 A MYPI2018701208 A MY PI2018701208A MY 186418 A MY186418 A MY 186418A
Authority
MY
Malaysia
Prior art keywords
polishing composition
diameter
magnetic disk
disk substrate
abrasive
Prior art date
Application number
MYPI2018701208A
Inventor
Otsu Taira
Yokomichi Noritaka
Matsunami Yasushi
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY186418A publication Critical patent/MY186418A/en

Links

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Silicon Compounds (AREA)

Abstract

Provided is a polishing composition that allows achieving both a high polishing rate and waviness reduction. A polishing composition that is used for polishing a magnetic disk substrate and contains an abrasive is provided by the present invention. A difference between a pore diameter PV90 corresponding to a cumulative 90% diameter and a pore diameter PV10 corresponding to a cumulative 10% diameter, from a small diameter side, in a volume-based pore size distribution of the abrasive, lies in the range of 50 ? to 760 ?, and a specific surface area-based particle diameter of the abrasive according to a BET method lies in the range of 35 nm to 100 nm.
MYPI2018701208A 2017-03-31 2018-03-26 Polishing composition and method for producing magnetic disk substrate MY186418A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017070460A JP6815257B2 (en) 2017-03-31 2017-03-31 Method for manufacturing polishing composition and magnetic disk substrate

Publications (1)

Publication Number Publication Date
MY186418A true MY186418A (en) 2021-07-22

Family

ID=64108577

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018701208A MY186418A (en) 2017-03-31 2018-03-26 Polishing composition and method for producing magnetic disk substrate

Country Status (2)

Country Link
JP (1) JP6815257B2 (en)
MY (1) MY186418A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102497825B1 (en) * 2020-09-29 2023-02-08 에스케이엔펄스 주식회사 Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same
KR102421888B1 (en) * 2020-09-29 2022-07-15 에스케이씨솔믹스 주식회사 Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same
KR102502516B1 (en) * 2021-03-12 2023-02-23 에스케이엔펄스 주식회사 Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4160348B2 (en) * 2001-09-25 2008-10-01 三菱化学株式会社 Silica and method for producing silica
JP5736681B2 (en) * 2010-07-15 2015-06-17 旭硝子株式会社 Polishing liquid and method for producing glass substrate for magnetic disk

Also Published As

Publication number Publication date
JP6815257B2 (en) 2021-01-20
JP2018174010A (en) 2018-11-08

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