MY186418A - Polishing composition and method for producing magnetic disk substrate - Google Patents
Polishing composition and method for producing magnetic disk substrateInfo
- Publication number
- MY186418A MY186418A MYPI2018701208A MYPI2018701208A MY186418A MY 186418 A MY186418 A MY 186418A MY PI2018701208 A MYPI2018701208 A MY PI2018701208A MY PI2018701208 A MYPI2018701208 A MY PI2018701208A MY 186418 A MY186418 A MY 186418A
- Authority
- MY
- Malaysia
- Prior art keywords
- polishing composition
- diameter
- magnetic disk
- disk substrate
- abrasive
- Prior art date
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Silicon Compounds (AREA)
Abstract
Provided is a polishing composition that allows achieving both a high polishing rate and waviness reduction. A polishing composition that is used for polishing a magnetic disk substrate and contains an abrasive is provided by the present invention. A difference between a pore diameter PV90 corresponding to a cumulative 90% diameter and a pore diameter PV10 corresponding to a cumulative 10% diameter, from a small diameter side, in a volume-based pore size distribution of the abrasive, lies in the range of 50 ? to 760 ?, and a specific surface area-based particle diameter of the abrasive according to a BET method lies in the range of 35 nm to 100 nm.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017070460A JP6815257B2 (en) | 2017-03-31 | 2017-03-31 | Method for manufacturing polishing composition and magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY186418A true MY186418A (en) | 2021-07-22 |
Family
ID=64108577
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2018701208A MY186418A (en) | 2017-03-31 | 2018-03-26 | Polishing composition and method for producing magnetic disk substrate |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6815257B2 (en) |
MY (1) | MY186418A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102497825B1 (en) * | 2020-09-29 | 2023-02-08 | 에스케이엔펄스 주식회사 | Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same |
KR102421888B1 (en) * | 2020-09-29 | 2022-07-15 | 에스케이씨솔믹스 주식회사 | Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same |
KR102502516B1 (en) * | 2021-03-12 | 2023-02-23 | 에스케이엔펄스 주식회사 | Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4160348B2 (en) * | 2001-09-25 | 2008-10-01 | 三菱化学株式会社 | Silica and method for producing silica |
JP5736681B2 (en) * | 2010-07-15 | 2015-06-17 | 旭硝子株式会社 | Polishing liquid and method for producing glass substrate for magnetic disk |
-
2017
- 2017-03-31 JP JP2017070460A patent/JP6815257B2/en active Active
-
2018
- 2018-03-26 MY MYPI2018701208A patent/MY186418A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP6815257B2 (en) | 2021-01-20 |
JP2018174010A (en) | 2018-11-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MX2015017782A (en) | Abrasive article including shaped abrasive particles. | |
MY171840A (en) | Composition for polishing purposes,polishing method using same,and method for producing substrate | |
MY177370A (en) | Polishing composition and method for polishing magnetic disk substrate | |
MY179075A (en) | Polishing composition and method for producing magnetic disk substrate | |
MY186418A (en) | Polishing composition and method for producing magnetic disk substrate | |
MX2015017794A (en) | Abrasive article including shaped abrasive particles. | |
SG10201808500PA (en) | Composite particles, method of refining and use thereof | |
SG10201908731PA (en) | Methods for fabricating a chemical-mechanical polishing composition | |
MY166770A (en) | Manufacturing method of magnetic disk substrate | |
MY150812A (en) | Polishing liquid composition for magnetic disk substrate | |
TW201612284A (en) | Polishing composition | |
MY166876A (en) | Method for manufacturing magnetic disc substrate | |
TW201614036A (en) | Polishing slurry composition | |
MY187526A (en) | Chemical-mechanical processing slurry and methods for processing a nickel substrate surface | |
MY164985A (en) | Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk | |
MY172434A (en) | Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same | |
MY181618A (en) | Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same | |
MY161744A (en) | Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks | |
MY167211A (en) | Polishing composition, and polishing method and substrate production method using same | |
MY169090A (en) | Polishing composition for magnetic disk substrate | |
MY192435A (en) | Polishing composition, method for producing substrate, and method for polishing same | |
MY175819A (en) | Polishing composition, method for producing magnetic disk substrate,and magnetic disk substrate | |
MY187480A (en) | Polishing liquid composition for magnetic disk substrate | |
MY184933A (en) | Polishing composition and method for polishing magnetic disk substrate | |
MY192422A (en) | Polishing composition, method for polishing substrate, method for producing substrate, and magnetic disk substrate |