MY179075A - Polishing composition and method for producing magnetic disk substrate - Google Patents
Polishing composition and method for producing magnetic disk substrateInfo
- Publication number
- MY179075A MY179075A MYPI2016702539A MYPI2016702539A MY179075A MY 179075 A MY179075 A MY 179075A MY PI2016702539 A MYPI2016702539 A MY PI2016702539A MY PI2016702539 A MYPI2016702539 A MY PI2016702539A MY 179075 A MY179075 A MY 179075A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic disk
- disk substrate
- polishing composition
- polishing
- producing magnetic
- Prior art date
Links
Abstract
This invention provides a polishing composition capable of suitably providing high polishing rates with the use of silica abrasives as well as a method for producing a magnetic disk substrate and a method for polishing a magnetic disk substrate, involving the use of the polishing composition. The polishing composition provided by this invention comprises a silica abrasive; the silica abrasive has an average primary particle diameter of 15 nm or larger and yields an average dissolved silicate ion quantity of 13.5 ppm/g or less in water at pH 9.5. The magnetic disk substrate production method provided by this invention comprises a step (1) of polishing a magnetic disk substrate using the polishing composition.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015141292 | 2015-07-15 | ||
JP2016121571A JP6730859B2 (en) | 2015-07-15 | 2016-06-20 | Polishing composition and method for manufacturing magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY179075A true MY179075A (en) | 2020-10-27 |
Family
ID=57945438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2016702539A MY179075A (en) | 2015-07-15 | 2016-07-13 | Polishing composition and method for producing magnetic disk substrate |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6730859B2 (en) |
MY (1) | MY179075A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019004161A1 (en) * | 2017-06-26 | 2019-01-03 | 花王株式会社 | Silica slurry for polishing-liquid composition |
JP7096714B2 (en) * | 2017-06-26 | 2022-07-06 | 花王株式会社 | Silica slurry for polishing liquid composition |
JPWO2020196542A1 (en) * | 2019-03-27 | 2020-10-01 | ||
JP7292923B2 (en) * | 2019-03-29 | 2023-06-19 | 株式会社フジミインコーポレーテッド | Method for manufacturing magnetic disk substrate, polishing composition and polishing method |
TW202128943A (en) * | 2019-12-20 | 2021-08-01 | 日商Jsr 股份有限公司 | Composition for chemical mechanical polishing, chemical mechanical polishing method, and method for manufacturing particles for chemical mechanical polishing |
WO2021200148A1 (en) * | 2020-03-30 | 2021-10-07 | 株式会社フジミインコーポレーテッド | Polishing composition |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6280490B1 (en) * | 1999-09-27 | 2001-08-28 | Fujimi America Inc. | Polishing composition and method for producing a memory hard disk |
JP2004186350A (en) * | 2002-12-03 | 2004-07-02 | Sanyo Chem Ind Ltd | Polishing composition for cmp process |
JP2005138197A (en) * | 2003-11-04 | 2005-06-02 | Fujimi Inc | Polishing composition and polishing method |
US20080020680A1 (en) * | 2006-07-24 | 2008-01-24 | Cabot Microelectronics Corporation | Rate-enhanced CMP compositions for dielectric films |
JP6259182B2 (en) * | 2012-12-12 | 2018-01-10 | 株式会社フジミインコーポレーテッド | Polishing liquid for primary polishing of magnetic disk substrate with nickel phosphorus plating |
JP2014117754A (en) * | 2012-12-13 | 2014-06-30 | Osaka Univ | Polishing abrasive grain and polishing method |
-
2016
- 2016-06-20 JP JP2016121571A patent/JP6730859B2/en active Active
- 2016-07-13 MY MYPI2016702539A patent/MY179075A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2017025295A (en) | 2017-02-02 |
JP6730859B2 (en) | 2020-07-29 |
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