MY186105A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY186105A
MY186105A MYPI2015703422A MYPI2015703422A MY186105A MY 186105 A MY186105 A MY 186105A MY PI2015703422 A MYPI2015703422 A MY PI2015703422A MY PI2015703422 A MYPI2015703422 A MY PI2015703422A MY 186105 A MY186105 A MY 186105A
Authority
MY
Malaysia
Prior art keywords
abrasives
polishing composition
less
silica
polished
Prior art date
Application number
MYPI2015703422A
Inventor
Matsunami Yasushi
OOTSU Taira
Makino Yusuke
Yokomichi Noritaka
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=55864051&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MY186105(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY186105A publication Critical patent/MY186105A/en

Links

Abstract

To provide a polishing composition capable of achieving a high polishing rate and a surface accuracy of a surface to be polished sufficient in practice, by using silica abrasives. The polishing composition disclosed here includes abrasives, an acid, and water. The abrasives include silica abrasives A that are other than colloidal silica and have a specific surface area of 2 m2/g or more and 60 m2/g or less and an average particle diameter of 50 nm or more and 15,000 nm or less.
MYPI2015703422A 2014-09-30 2015-09-28 Polishing composition MY186105A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014201431A JP6559410B2 (en) 2014-09-30 2014-09-30 Polishing composition

Publications (1)

Publication Number Publication Date
MY186105A true MY186105A (en) 2021-06-22

Family

ID=55864051

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015703422A MY186105A (en) 2014-09-30 2015-09-28 Polishing composition

Country Status (2)

Country Link
JP (1) JP6559410B2 (en)
MY (1) MY186105A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11781039B2 (en) * 2016-12-26 2023-10-10 Fujimi Incorporated Polishing composition and polishing method
CN110546221B (en) * 2017-02-24 2022-02-22 伊鲁米那股份有限公司 Calcium carbonate slurry
EP3780069A4 (en) * 2018-03-28 2022-04-06 Fujimi Incorporated Gallium compound semiconductor substrate polishing composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2656400B2 (en) * 1991-06-27 1997-09-24 日本シリカ工業株式会社 Surface precision abrasive for hard and brittle materials
JP3719688B2 (en) * 1995-08-01 2005-11-24 東ソー・シリカ株式会社 Method for producing fine powder precipitated silicic acid having abrasiveness
JP3810588B2 (en) * 1998-06-22 2006-08-16 株式会社フジミインコーポレーテッド Polishing composition
US6447693B1 (en) * 1998-10-21 2002-09-10 W. R. Grace & Co.-Conn. Slurries of abrasive inorganic oxide particles and method for polishing copper containing surfaces
US6656241B1 (en) * 2001-06-14 2003-12-02 Ppg Industries Ohio, Inc. Silica-based slurry
US20060140877A1 (en) * 2004-12-23 2006-06-29 Mcgill Patrick D Methods of producing improved cleaning abrasives for dentifrices
JP2010034387A (en) * 2008-07-30 2010-02-12 Sumco Corp Method of manufacturing semiconductor wafer
JP2012116734A (en) * 2010-12-03 2012-06-21 Jgc Catalysts & Chemicals Ltd Crystalline silica sol and method for producing the same
JP2012155785A (en) * 2011-01-25 2012-08-16 Showa Denko Kk Method for manufacturing substrate for magnetic recording medium
DE112013005268T5 (en) * 2012-11-02 2015-09-24 Fujimi Incorporated polishing composition
JP6259182B2 (en) * 2012-12-12 2018-01-10 株式会社フジミインコーポレーテッド Polishing liquid for primary polishing of magnetic disk substrate with nickel phosphorus plating
JP6092623B2 (en) * 2012-12-28 2017-03-08 花王株式会社 Manufacturing method of magnetic disk substrate

Also Published As

Publication number Publication date
JP6559410B2 (en) 2019-08-14
JP2016069552A (en) 2016-05-09

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