MY119774A - Composition for polishing magnetic disk substrate. - Google Patents

Composition for polishing magnetic disk substrate.

Info

Publication number
MY119774A
MY119774A MYPI20011813A MY119774A MY 119774 A MY119774 A MY 119774A MY PI20011813 A MYPI20011813 A MY PI20011813A MY 119774 A MY119774 A MY 119774A
Authority
MY
Malaysia
Prior art keywords
magnetic disk
composition
disk substrate
polishing
aqueous medium
Prior art date
Application number
Inventor
Norihiko Miyata
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of MY119774A publication Critical patent/MY119774A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

AN OBJECT OF THE PRESENT INVENTION IS TO PROVIDE A COMPOSITION FOR POLISHING A MAGNETIC DISK SUBSTRATE THAT IS USED AS A STORAGE DEVICE FOR A COMPUTER OR THE LIKE, AND IS CAPABLE OF PRODUCING A MAGNETIC DISK SUBSTRATE POLISHED WITH HIGH PRECISION SUITABLE FOR USE IN COMBINATION WITH A MAGNETIC HEAD THAT FLOATS AT A LOW LEVEL. ANOTHER OBJECT OF THE PRESENT INVENTION IS TO PROVIDE A METHOD OF PRODUCING THE COMPOSITION FOR POLISHING THE MAGNETIC DISK SUBSTRATE. A POLISHING COMPOSITION INCLUDES ALKALI METAL IONS, ABRASIVE GRAINS, A CARBOXYLIC ACID, AN OXIDIZING AGENT, AND AN ANTI-GELLING AGENT CONTAINED IN AN AQUEOUS MEDIUM. IN A METHOD OF THE PRESENT INVENTION FOR PREPARING A POLISHING COMPOSITION, A PH VALUE OF AN AQUEOUS MEDIUM, IN WHICH ABRASIVE GRAINS, A CARBOXYLIC ACID, AN OXIDIZING AGENT, AND AN ANTI-GELLING AGENT ARE CONTAINED, IS ADJUSTED TO A RANGE OF ABOUT 1 TO ABOUT 5 BY THE ADDITION OF ALKALI METAL HYDROXIDE TO THE AQUEOUS MEDIUM.
MYPI20011813 2000-04-17 2001-04-17 Composition for polishing magnetic disk substrate. MY119774A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000115592 2000-04-17

Publications (1)

Publication Number Publication Date
MY119774A true MY119774A (en) 2005-07-29

Family

ID=18627202

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20011813 MY119774A (en) 2000-04-17 2001-04-17 Composition for polishing magnetic disk substrate.

Country Status (5)

Country Link
CN (1) CN1249193C (en)
AU (1) AU4876801A (en)
MY (1) MY119774A (en)
TW (1) TW528645B (en)
WO (1) WO2001079377A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4231632B2 (en) * 2001-04-27 2009-03-04 花王株式会社 Polishing liquid composition
JP4095798B2 (en) * 2001-12-20 2008-06-04 株式会社フジミインコーポレーテッド Polishing composition
JP3875156B2 (en) * 2002-08-07 2007-01-31 花王株式会社 Roll-off reducing agent
JP4202201B2 (en) * 2003-07-03 2008-12-24 株式会社フジミインコーポレーテッド Polishing composition
JP5090925B2 (en) * 2005-11-22 2012-12-05 日立化成工業株式会社 Polishing liquid for polishing aluminum film and polishing method of aluminum film using the same
JP5049249B2 (en) * 2008-10-31 2012-10-17 花王株式会社 Polishing liquid composition
SG188775A1 (en) * 2011-09-30 2013-04-30 Hoya Corp Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic data recording/reproducing device
US9202483B1 (en) * 2015-01-02 2015-12-01 HGST Netherlands B.V. Iron-oxidized hard disk drive enclosure cover
KR101943704B1 (en) * 2016-06-27 2019-01-29 삼성에스디아이 주식회사 Cmp slurry composition for metal film and polishing method
US9982351B1 (en) * 2017-01-31 2018-05-29 GM Global Technology Operations LLC Chemical mechanical polishing for improved contrast resolution

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5051134A (en) * 1990-01-26 1991-09-24 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe M.B.H. Process for the wet-chemical treatment of semiconductor surfaces
US5800577A (en) * 1996-08-06 1998-09-01 Showa Denko K.K. Polishing composition for chemical mechanical polishing
US5965036A (en) * 1995-08-01 1999-10-12 Mec Co., Ltd. Microetching composition for copper or copper alloy
US5980775A (en) * 1996-11-26 1999-11-09 Cabot Corporation Composition and slurry useful for metal CMP
US5997620A (en) * 1997-01-21 1999-12-07 Fujimi Incorporated Polishing composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3825827B2 (en) * 1996-01-30 2006-09-27 昭和電工株式会社 Polishing composition, magnetic disk substrate polishing method, and manufacturing method
JPH10121035A (en) * 1996-08-30 1998-05-12 Showa Denko Kk Composition for polishing magnetic disk substrate
JPH11167711A (en) * 1997-12-03 1999-06-22 Showa Alum Corp Production of magnetic disk substrate
JPH1180708A (en) * 1997-09-09 1999-03-26 Fujimi Inkooporeetetsudo:Kk Composition for polishing
JP4076630B2 (en) * 1998-08-07 2008-04-16 花王株式会社 Polishing liquid composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5051134A (en) * 1990-01-26 1991-09-24 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe M.B.H. Process for the wet-chemical treatment of semiconductor surfaces
US5965036A (en) * 1995-08-01 1999-10-12 Mec Co., Ltd. Microetching composition for copper or copper alloy
US5800577A (en) * 1996-08-06 1998-09-01 Showa Denko K.K. Polishing composition for chemical mechanical polishing
US5980775A (en) * 1996-11-26 1999-11-09 Cabot Corporation Composition and slurry useful for metal CMP
US5997620A (en) * 1997-01-21 1999-12-07 Fujimi Incorporated Polishing composition

Also Published As

Publication number Publication date
CN1249193C (en) 2006-04-05
WO2001079377A1 (en) 2001-10-25
TW528645B (en) 2003-04-21
AU4876801A (en) 2001-10-30
CN1366548A (en) 2002-08-28

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