TWI799388B - 保護膜用支撐框及保護膜及其製造方法 - Google Patents

保護膜用支撐框及保護膜及其製造方法 Download PDF

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Publication number
TWI799388B
TWI799388B TW106130932A TW106130932A TWI799388B TW I799388 B TWI799388 B TW I799388B TW 106130932 A TW106130932 A TW 106130932A TW 106130932 A TW106130932 A TW 106130932A TW I799388 B TWI799388 B TW I799388B
Authority
TW
Taiwan
Prior art keywords
pellicle
manufacturing
support frame
pellicle support
frame
Prior art date
Application number
TW106130932A
Other languages
English (en)
Other versions
TW201839183A (zh
Inventor
石戶伸幸
Original Assignee
日商日本輕金屬股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本輕金屬股份有限公司 filed Critical 日商日本輕金屬股份有限公司
Publication of TW201839183A publication Critical patent/TW201839183A/zh
Application granted granted Critical
Publication of TWI799388B publication Critical patent/TWI799388B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Laminated Bodies (AREA)
TW106130932A 2016-09-20 2017-09-11 保護膜用支撐框及保護膜及其製造方法 TWI799388B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016182625A JP6812714B2 (ja) 2016-09-20 2016-09-20 ペリクル用支持枠及びペリクル並びにその製造方法
JP2016-182625 2016-09-20

Publications (2)

Publication Number Publication Date
TW201839183A TW201839183A (zh) 2018-11-01
TWI799388B true TWI799388B (zh) 2023-04-21

Family

ID=61689493

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106130932A TWI799388B (zh) 2016-09-20 2017-09-11 保護膜用支撐框及保護膜及其製造方法

Country Status (7)

Country Link
US (1) US11092887B2 (zh)
EP (1) EP3518039A4 (zh)
JP (1) JP6812714B2 (zh)
KR (1) KR102381789B1 (zh)
CN (1) CN109791351A (zh)
TW (1) TWI799388B (zh)
WO (1) WO2018055995A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7139133B2 (ja) * 2018-04-03 2022-09-20 信越化学工業株式会社 ペリクルフレーム、ペリクル、及びペリクルフレームの製造方法
JP7330245B2 (ja) * 2018-04-03 2023-08-21 信越化学工業株式会社 ペリクルフレーム、ペリクル、ペリクル付フォトマスク、露光方法、及び半導体デバイスの製造方法
JP7082546B2 (ja) * 2018-08-01 2022-06-08 旭化成株式会社 ペリクル及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104102089A (zh) * 2013-04-15 2014-10-15 信越化学工业株式会社 防尘薄膜组件框架以及采用该框架的防尘薄膜组件

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5210341A (en) * 1991-12-20 1993-05-11 Union Carbide Chemicals & Plastics Technology Corporation Processes for the preparation of octafluoro-[2,2]paracyclophane
JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル
JP3027073B2 (ja) * 1993-07-28 2000-03-27 信越化学工業株式会社 ペリクル
JP3493090B2 (ja) * 1995-12-15 2004-02-03 信越化学工業株式会社 ペリクル
JP2001147519A (ja) * 1999-11-19 2001-05-29 Asahi Glass Co Ltd ペリクルおよびペリクル板の製造方法
KR100696152B1 (ko) * 1999-09-13 2007-03-20 아사히 가라스 가부시키가이샤 펠리클
TWI270504B (en) * 2004-12-15 2007-01-11 Gudeng Prec Ind Co Ltd Photo-mask protection film frame
US20070148390A1 (en) * 2005-12-27 2007-06-28 Specialty Coating Systems, Inc. Fluorinated coatings
JP2007333910A (ja) * 2006-06-14 2007-12-27 Shin Etsu Chem Co Ltd ペリクル
JP2010211021A (ja) * 2009-03-11 2010-09-24 Shin-Etsu Chemical Co Ltd ペリクル
JP5262917B2 (ja) * 2009-03-30 2013-08-14 日本軽金属株式会社 ペリクル用支持枠の製造方法及びペリクル用支持枠並びにペリクル
JP2010256609A (ja) * 2009-04-24 2010-11-11 Shin-Etsu Chemical Co Ltd ペリクル
JP5657407B2 (ja) * 2011-01-31 2015-01-21 旭化成イーマテリアルズ株式会社 ペリクル枠体、ペリクル及びペリクル枠体の製造方法
WO2015059783A1 (ja) * 2013-10-23 2015-04-30 日本軽金属株式会社 ペリクル枠及びその製造方法
KR101427404B1 (ko) * 2013-11-01 2014-08-07 주식회사 에프에스티 폴리오르가노실세스퀴옥산 코팅 층을 구비한 펠리클 프레임 및 그 제조방법
JP6313161B2 (ja) * 2014-08-27 2018-04-18 信越化学工業株式会社 ペリクルフレーム及びペリクル
US10670959B2 (en) * 2017-05-10 2020-06-02 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104102089A (zh) * 2013-04-15 2014-10-15 信越化学工业株式会社 防尘薄膜组件框架以及采用该框架的防尘薄膜组件

Also Published As

Publication number Publication date
KR102381789B1 (ko) 2022-03-31
TW201839183A (zh) 2018-11-01
US11092887B2 (en) 2021-08-17
US20210096457A1 (en) 2021-04-01
EP3518039A4 (en) 2019-10-09
JP2018049044A (ja) 2018-03-29
KR20190047074A (ko) 2019-05-07
EP3518039A1 (en) 2019-07-31
JP6812714B2 (ja) 2021-01-13
WO2018055995A1 (ja) 2018-03-29
CN109791351A (zh) 2019-05-21

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