TWI785180B - 組合物、硬化物、濾光器及硬化物之製造方法 - Google Patents

組合物、硬化物、濾光器及硬化物之製造方法 Download PDF

Info

Publication number
TWI785180B
TWI785180B TW108100485A TW108100485A TWI785180B TW I785180 B TWI785180 B TW I785180B TW 108100485 A TW108100485 A TW 108100485A TW 108100485 A TW108100485 A TW 108100485A TW I785180 B TWI785180 B TW I785180B
Authority
TW
Taiwan
Prior art keywords
group
mentioned
carbon atoms
mass
parts
Prior art date
Application number
TW108100485A
Other languages
English (en)
Chinese (zh)
Other versions
TW201934654A (zh
Inventor
前田洋介
齋藤智美
Original Assignee
日商艾迪科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商艾迪科股份有限公司 filed Critical 日商艾迪科股份有限公司
Publication of TW201934654A publication Critical patent/TW201934654A/zh
Application granted granted Critical
Publication of TWI785180B publication Critical patent/TWI785180B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C08G65/18—Oxetanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • C08K5/18—Amines; Quaternary ammonium compounds with aromatically bound amino groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/375—Thiols containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02—Polyalkylene oxides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW108100485A 2018-01-09 2019-01-07 組合物、硬化物、濾光器及硬化物之製造方法 TWI785180B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2018001527 2018-01-09
JP2018-001527 2018-01-09
JP2018-094582 2018-05-16
JP2018094582 2018-05-16
JP2018141724 2018-07-27
JP2018-141724 2018-07-27

Publications (2)

Publication Number Publication Date
TW201934654A TW201934654A (zh) 2019-09-01
TWI785180B true TWI785180B (zh) 2022-12-01

Family

ID=67219059

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108100485A TWI785180B (zh) 2018-01-09 2019-01-07 組合物、硬化物、濾光器及硬化物之製造方法

Country Status (5)

Country Link
JP (1) JP7339161B2 (ja)
KR (1) KR102684570B1 (ja)
CN (1) CN111315828B (ja)
TW (1) TWI785180B (ja)
WO (1) WO2019138953A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210016324A (ko) * 2018-06-04 2021-02-15 가부시키가이샤 아데카 조성물, 경화물, 광학 필터 및 경화물의 제조 방법
WO2021039244A1 (ja) * 2019-08-26 2021-03-04 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、レジスト膜、電子デバイスの製造方法
JPWO2021044801A1 (ja) * 2019-09-04 2021-03-11
KR20220059442A (ko) * 2019-09-04 2022-05-10 가부시키가이샤 아데카 조성물, 경화물, 광학 필터 및 경화물의 제조 방법
JP2021066773A (ja) * 2019-10-18 2021-04-30 株式会社Adeka 組成物、硬化物及び硬化物の製造方法
JP7535595B2 (ja) * 2020-11-30 2024-08-16 三井化学株式会社 光学材料、レンズ及びアイウェア

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101696273A (zh) * 2004-11-26 2010-04-21 东洋油墨制造株式会社 聚合性组合物
TW201351039A (zh) * 2012-05-15 2013-12-16 Adeka Corp 光硬化性樹脂組合物

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07325391A (ja) * 1994-05-31 1995-12-12 New Oji Paper Co Ltd 可視光反応性樹脂組成物およびそれを用いたシート状光記録材料
JPH11116611A (ja) * 1997-10-13 1999-04-27 Tokuyama Sekiyu Kagaku Kk 光重合性組成物
JP4431336B2 (ja) 2003-04-09 2010-03-10 株式会社日本触媒 樹脂組成物、光学フィルターおよびプラズマディスプレー
JP4152928B2 (ja) * 2004-08-02 2008-09-17 株式会社シンク・ラボラトリー ポジ型感光性組成物
US20060121392A1 (en) * 2004-11-24 2006-06-08 Dai Nippon Printing Co., Ltd. Optical filter and display using the same
JP4538351B2 (ja) 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物
JP2007084733A (ja) * 2005-09-26 2007-04-05 Sumitomo Bakelite Co Ltd 樹脂組成物、及び赤外線吸収成形体
KR20070084940A (ko) * 2006-02-22 2007-08-27 삼성코닝 주식회사 디스플레이 필터 및 이를 포함한 디스플레이 장치
JP4958461B2 (ja) 2006-03-30 2012-06-20 富士フイルム株式会社 近赤外吸収色素含有硬化性組成物
CA2648734C (en) * 2006-04-07 2013-01-15 Nippon Kayaku Kabushiki Kaisha Porphyrazine coloring matter, ink, ink set and colored product
WO2009031406A1 (ja) * 2007-09-05 2009-03-12 Yamamoto Chemicals, Inc. テトラアザポルフィリン混合物、これを用いた光学フィルター及び表示装置
WO2010143619A1 (ja) * 2009-06-12 2010-12-16 日本化薬株式会社 ポルフィラジン色素、インク組成物、記録方法及び着色体
JP2012163636A (ja) 2011-02-03 2012-08-30 Yamamoto Chem Inc ディスプレイ用フィルタ
CN103454859A (zh) * 2012-05-29 2013-12-18 住友化学株式会社 着色固化性树脂组合物
JP6064205B2 (ja) * 2012-10-02 2017-01-25 パナソニックＩｐマネジメント株式会社 照明装置
JP6064607B2 (ja) * 2013-01-16 2017-01-25 大日本印刷株式会社 体積型ホログラム記録用感光性組成物、体積型ホログラム記録体、及び体積型ホログラム記録体の製造方法
WO2014196464A1 (ja) * 2013-06-07 2014-12-11 株式会社Adeka 着色感光性組成物及び新規化合物
CN103587272B (zh) * 2013-11-04 2019-01-18 北京中科纳新印刷技术有限公司 一种热敏无砂目印版及其制备方法与应用
JP6285539B2 (ja) * 2014-03-31 2018-02-28 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP6619627B2 (ja) * 2015-11-20 2019-12-11 株式会社Adeka 着色組成物
KR102466334B1 (ko) * 2016-10-06 2022-11-14 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101696273A (zh) * 2004-11-26 2010-04-21 东洋油墨制造株式会社 聚合性组合物
TW201351039A (zh) * 2012-05-15 2013-12-16 Adeka Corp 光硬化性樹脂組合物

Also Published As

Publication number Publication date
JPWO2019138953A1 (ja) 2020-12-17
TW201934654A (zh) 2019-09-01
KR20200106022A (ko) 2020-09-10
JP7339161B2 (ja) 2023-09-05
KR102684570B1 (ko) 2024-07-17
CN111315828B (zh) 2023-09-29
WO2019138953A1 (ja) 2019-07-18
CN111315828A (zh) 2020-06-19

Similar Documents

Publication Publication Date Title
TWI785180B (zh) 組合物、硬化物、濾光器及硬化物之製造方法
TWI820164B (zh) 組合物、硬化物、濾光器及硬化物之製造方法
CN107922745B (zh) 热固化性树脂组合物
TWI700337B (zh) 硬化性組合物
JP5940259B2 (ja) 感光性組成物
TW201411283A (zh) 著色硬化性樹脂組成物
WO2013172145A1 (ja) 光硬化性樹脂組成物
WO2021044802A1 (ja) 組成物、硬化物、光学フィルタ及び硬化物の製造方法
CN110337454A (zh) 水溶性组合物、其固化物的制造方法及其固化物、以及酰基次膦酸盐
JP7374567B2 (ja) 組成物、硬化物、光学フィルタ及び硬化物の製造方法
CN110028465A (zh) 新型化合物、包含其的组合物及该组合物的固化物
TW202115194A (zh) 組合物、硬化物、光學濾光器及硬化物之製造方法
TWI850445B (zh) 組合物、硬化物、光學濾光器及硬化物之製造方法
KR20090104765A (ko) 컬러 필터
TW201922684A (zh) 化合物、潛在性防氧化劑、組合物、硬化物及硬化物之製造方法