TWI767725B - 離子束刻蝕旋轉平臺 - Google Patents

離子束刻蝕旋轉平臺 Download PDF

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TWI767725B
TWI767725B TW110119355A TW110119355A TWI767725B TW I767725 B TWI767725 B TW I767725B TW 110119355 A TW110119355 A TW 110119355A TW 110119355 A TW110119355 A TW 110119355A TW I767725 B TWI767725 B TW I767725B
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magnetic fluid
electrostatic chuck
fluid shaft
rotating magnetic
cooling water
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程實然
郭頌
陳兆超
李娜
王鋮熠
劉海洋
胡冬冬
開東 許
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大陸商北京魯汶半導體科技有限公司
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Abstract

本申請涉及一種離子束刻蝕旋轉平臺，屬於半導體加工領域。旋轉平臺的上部結構上端面設有基座；基座上端面設有靜電卡盤，靜電卡盤的下端面內設有多條靜電卡盤內冷卻水道；上部結構與下部結構的軸向中心處設有與其內腔體相互貫通的旋轉磁流體軸；上部結構的下端設有延伸部，延伸部延伸至下部結構的腔體內；下部結構的腔體內高扭矩電機；高扭矩電機佈置在下部結構的腔體內，高扭矩電機與旋轉磁流體軸相連並驅動轉動；旋轉磁流體軸的頂端與靜電卡盤相固定；上部結構的腔體內位於基座的下端面設有頂針裝置。離子束刻蝕旋轉平臺為上下圓柱體結構，結構緊湊、簡單，區分明顯，旋轉平臺為上下圓柱體結構，結構區分明顯，重量較小，安裝維護方便。

Description

離子束刻蝕旋轉平臺
本申請涉及半導體加工領域，尤其涉及一種離子束刻蝕旋轉平臺。
在離子束刻蝕系統（IBE）中，旋轉平臺是核心部件之一。離子束刻蝕平臺是一個複雜的自動化系統，涉及氣、電、液等系統的集成。由於涉及系統較多，且保持精密的運動性能，因此對於旋轉平臺的要求至關重要。
通常旋轉平臺包含，中空電機，用於平臺旋轉，動力傳遞；旋轉接頭，用於氣、電、液的傳遞；靜電卡盤或者機械卡盤，用於放置晶圓；頂針系統，用於晶圓的傳輸交互；旋轉磁流體軸，用於隔離大氣和真空的旋轉運動等。現有的結構存在如下問題： 1.旋轉平臺體型較大，使得整個腔室空間變大，從而整機占地較大，在珍貴的無塵室內，廣受詬病。 2.旋轉平臺較重，從而維護組裝較麻煩。 3.內部空間狹小，操作維護不方便。 4.存在電機散熱問題，長時間運行電機容易阻轉。 5.旋轉平臺涉及水電氣的連接，系統較多，裝配複雜，平臺旋轉時，系統誤差大，平臺旋轉軸向徑向跳動大，影響刻蝕均勻性。 6.傳統旋轉平臺通常採用的伺服電機和減速器或者中空電機等驅動載台旋轉，由於減速機齒形等間隙的存在，平臺旋轉精度低。
本申請各示例性實施例提供了一種離子束刻蝕旋轉平臺。
本申請採用如下技術方案： 本申請所述的離子束刻蝕旋轉平臺，該旋轉平臺分為上部結構、下部結構；上部結構、下部結構內均為腔體結構；上部結構的上端面設有基座；基座上端面設有靜電卡盤，靜電卡盤的下端面內設有多條靜電卡盤內冷卻水道；上部結構與下部結構的軸向中心處設有與其內腔體相互貫通的旋轉磁流體軸；上部結構的下端設有延伸部，該延伸部延伸至下部結構的腔體內；下部結構的腔體內高扭矩電機；高扭矩電機佈置在下部結構的腔體內，高扭矩電機與旋轉磁流體軸相連並驅動轉動；旋轉磁流體軸的頂端與靜電卡盤相固定；上部結構的腔體內位於基座的下端面設有頂針裝置。
本申請所述的離子束刻蝕旋轉平臺，所述的旋轉磁流體軸的位於下部結構的部分設有多個環形通槽；多個所述的環形通槽佈置在旋轉磁流體軸的圓周面；環形通槽內設有通孔，旋轉磁流體軸內開設有多個與多個環形通槽相通的獨立通道；該獨立通道包括液體獨立通道與氣體獨立通道；所述的基座內開設與頂針裝置及磁流體軸相互連通的介質通道； 所述的上部結構面向下部結構的銜接面靠近旋轉磁流體軸處設有高扭矩電機冷卻水道，下部結構的腔體側壁位於高扭矩電機定子部設有冷卻水道。
本申請所述的離子束刻蝕旋轉平臺，所述的靜電卡盤內的冷卻水道成螺旋環形佈置，所述的基座內開設通管，靜電卡盤上的冷卻水道與基座內通管相連通；基座內通管還與旋轉磁流體軸內的獨立通道相連。
本申請所述的離子束刻蝕旋轉平臺，所述的下部結構的底端設有冷卻液出入接口，空氣出入接口，旋轉磁流體軸的底部側壁設有氦氣出入接口；冷卻液出入接口，空氣出入接口及氦氣出入接口分別與環形通槽相連通； 本申請所述的離子束刻蝕旋轉平臺，所述的冷卻液出入接口與上部結構、下部結構內的冷卻水道相互連通；冷卻水道用於冷卻高扭矩電機； 所述的空氣出入接口通過旋轉磁流體軸內的氣體獨立通道相連通，氣體獨立通道與頂針裝置相互連通；空氣出入接口將氣體通入頂針裝置內，用於作動頂針裝置運作； 冷卻液出入接口通過旋轉磁流體軸內的液體獨立通道相連通，液體獨立通道與靜電卡盤的冷卻水道相互連通，冷卻液出入接口將冷卻液體通入靜電卡盤內的冷卻水道內，用於靜電卡盤降溫； 所述的氦氣出入接口通過旋轉磁流體軸內的氣體獨立通道相連通，氣體獨立通道相連通至靜電卡盤，用於為靜電卡盤上的晶圓冷卻。
本申請所述的離子束刻蝕旋轉平臺，其特徵在於：所述的旋轉磁流體軸的底部側壁與高壓電電刷相連，高壓電電刷通過導線與外部電源相連，高壓電電刷為靜電卡盤靜電吸附傳遞電力。
有益效果
本申請所述的離子束刻蝕旋轉平臺，離子束刻蝕旋轉平臺為上下圓柱體結構，結構緊湊、簡單，區分明顯，旋轉平臺為上下圓柱體結構，結構區分明顯，重量較小，安裝維護方便。
本申請所述的離子束刻蝕旋轉平臺, 採用力矩電機直接連接旋轉軸，結構緊湊，旋轉平臺同軸度好，平臺旋轉精度高，減小對刻蝕均勻性的影響；避免了同類旋轉平臺通常使用電機與減速機連接，導致旋轉平臺外形尺寸偏大，重量較重。
本申請所述的離子束刻蝕旋轉平臺,整體的內腔為封閉式結構，通過該封閉結構其內的封閉電機冷卻水道，能對系統進行有效冷卻，避免長時間運行發生高溫阻轉。
本申請所述的離子束刻蝕旋轉平臺將各種氣、液、電通道集成在磁流體旋轉軸上，減小旋轉軸上的附屬連接零件，從而降低旋轉平臺旋轉誤差，且顯著降低了旋轉平臺的外形尺寸及重量，從而可以縮小整個外部真空腔室的尺寸，因此本申請所採用的整機空間尺寸結構得到合理控制。
為使本申請實施例的目的和技術方案更加清楚，下面將結合本申請實施例的附圖，對本申請實施例的技術方案進行清楚、完整地描述。顯然，所描述的實施例是本申請的一部分實施例，而不是全部的實施例。基於所描述的本申請的實施例，本領域普通技術人員在無需創造性勞動的前提下所獲得的所有其他實施例，都屬於本申請保護的範圍。
如圖1所示，本申請各示例性實施例提出一種離子束刻蝕旋轉平臺，該旋轉平臺分為上部結構108、下部結構204；上部結構108、下部結構204內均為腔體結構；上部結構108形狀為中空圓柱體，材料為航空鋁材，圖示區域A內為真空環境，與112旋轉磁流體通過螺栓連接，通過密封圈密隔離大氣環境；製程時，108為固定狀態。下部結構204材質為航空鋁材，圖示區域B為大氣環境，204與108通過螺栓連接固定。
上部結構108的上端面設有基座106；基座106上端面設有靜電卡盤102，基座106，形狀為圓柱體，材質為航空鋁材或不銹鋼，用於傳遞氣、電、液等介質，傳遞介質的接口通過密封圈密封；製程過程中，106隨轉檯一起旋轉，需保證同軸度及圓柱度。
靜電卡盤102的下端面內設有多條靜電卡盤內冷卻水道302；靜電卡盤102內的冷卻水道302成螺旋環形佈置，基座106內開設通管，靜電卡盤102上的冷卻水道302與基座106內通管相連通；基座106內通管還與旋轉磁流體軸112內的獨立通道相連。
102為靜電卡盤(ESC)，作為晶圓載台；302為靜電卡盤內冷卻水道；製程時，晶圓被靜電吸附，晶圓在轉檯上勻速旋轉。卡座104用於保護靜電卡盤ESC，形狀為圓環狀，通過螺栓與基座106連接，刻蝕過程中，保護靜電卡盤周邊被高能粒子轟擊，延長靜電卡盤使用壽命，104材質為石英或陶瓷，隨旋轉平臺一起運動。
上部結構108與下部結構204的軸向中心處設有與其內腔體相互貫通的旋轉磁流體軸112；旋轉磁流體軸112主體材質為不銹鋼，需採用較高精度軸承，保證同軸度及圓柱度；旋轉磁流體軸112既能維持該系統高真空的環境，又能保證平臺的穩定可靠旋轉； 上部結構102的下端設有延伸部，該延伸部延伸至下部結構204的腔體內；下部結構204的腔體內高扭矩電機；高扭矩電機佈置在下部結構204的腔體內，高扭矩電機與旋轉磁流體軸112相連並驅動轉動；旋轉磁流體軸112的頂端與靜電卡盤相固定；上部結構102的腔體內位於基座的下端面設有頂針裝置110。
整個旋轉平臺為圓柱體，上下結構，圖示108為上部腔室，旋轉平臺上部為旋轉部分，包括旋轉磁流體軸、頂針系統、靜電卡盤及附屬部件等；上部分各部件由下到上，由內向外連接；旋轉平臺下部分固定，圖示204為下部腔室，需要連接的氣、電、液等介質，全部在下部連接，下部分各部件由上到下，由內到外連接；整個結構連接緊湊，維護安裝方便。
頂針系統110用於晶圓的升降傳遞，升降信號通過光纖傳遞，402為光纖接口；110頂針系統與106通過氣缸連接；製程時，頂針系統隨旋轉平臺同步運動。
高扭矩電機定子202，定子部分鑲嵌在上部結構108、下部結構204的內部，通過下部結構204周邊壓住，206為高扭矩電機轉子，驅動旋轉磁流體軸112旋轉，電機轉子206與旋轉磁流體軸112通過鍵過盈配合，電機定子部分由下部結構204與上部結構108定位，高扭矩直驅電機與磁流體直接軸連接，減小了操作空間，降低轉檯的高度，從而降低了整體外形尺寸，避免了齒輪間隙等對運動精度的影響。
如圖2所示：冷卻水通道接口404為電機及系統提供循環冷卻水；A1為冷卻水A通道，A2為冷卻水B通道;冷卻水由外部水機供應，一般水溫維持22±2℃，從底部404接口接入，404接口與204通過螺栓連接，在旋轉平臺內部形成回路，所有水道連接部位通過密封圈與外部隔離。
如圖3壓縮空氣通道示意所示：壓縮空氣通道接口406為頂針系統升降提供動力源；B1為壓縮空氣A通道，B2為壓縮空氣B通道；氣源潔淨乾燥，一般氣源壓力為0.5-0.6Mpa，壓縮空氣從底部接口406接入，406接口與204通過螺栓連接固定，氣道進入磁流體旋轉軸，通過旋轉密封隔離，分別通入頂針氣缸，兩組氣道分別用於氣缸的升降運動，所有氣道連接部位通過密封圈密封與外部隔離。
如圖4高壓電通道示意所示：高壓電電刷412為靜電卡盤靜電吸附傳遞電力；C1為高壓電A通道，C2為高壓電B通道；其中電滑環定子部分為416，外部導線接在416上，通道用於穿過高壓電導線，高壓電通常通過旋轉電滑環傳遞電力，電滑環轉子部分414固定在磁流體軸上，導線與磁流體軸同步旋轉，接入靜電卡盤。
如圖5氦氣通道示意所示408為氦氣通道接口，D為氦氣通道。製程時，氦氣為晶圓冷卻；氦氣由底部接口408通入，408接口與204通過螺栓連接，氦氣通入磁流體旋轉軸內，通過旋轉密封隔離外部環境。
圖6冷卻液通道示意所示：冷卻液通道接口410為冷卻液通往靜電卡盤，用於晶圓冷卻；冷卻液由外部接入，E1為冷卻液A通道，E2為冷卻液B通道；410接口固定在204上，冷卻液通入磁流體旋轉軸內，通過旋轉密封隔離外部環境，所有冷卻液通道連接部分通過密封圈隔離，冷卻液通道在旋轉平臺內部形成回路。
在實際使用中，整個系統內部處於密封環境下，散熱不暢，且外部高能粒子不斷轟擊，亦會引起環境溫度升高，電機常常因為環境溫度過高發生阻轉等故障，圖示304為力矩電機部分冷卻水道，306為下部腔體部分冷卻水道，與304聯通，循環的冷卻水能及時將熱量帶走，保證系統的穩定可靠，冷卻介質與外部環境通過密封圈隔離。
以上所述，僅為本申請較佳的具體實施方式，但本申請的保護範圍並不局限於此，任何熟悉本技術領域的技術人員在本申請揭露的技術範圍內，可輕易想到的變化或替換，都應涵蓋在本申請的保護範圍之內。因此，本申請的保護範圍應該以權利要求的保護範圍為准。
102:靜電卡盤 104:卡座 106:基座 108:上部結構 110:頂針系統 112:旋轉磁流體軸 202:高扭矩電機定子 204:下部結構 206:電機轉子 302:冷卻水道 304:力矩電機部分冷卻水道 306:下部腔體部分冷卻水道 402:光纖接口 404:冷卻水通道接口 406:壓縮空氣通道接口 408:氦氣通道接口 410:冷卻液通道接口 412:高壓電電刷 414:電滑環轉子部分 416:電滑環定子部分
圖1是本申請一實施例的離子束刻蝕旋轉平臺的結構示意圖。 圖2是本申請一實施例的冷卻水通道示意圖。 圖3是本申請一實施例的壓縮空氣通道示意圖。 圖4是本申請一實施例的高壓電通路示意圖。 圖5是本申請一實施例的氦氣通道示意圖。 圖6是本申請一實施例的冷卻液通道示意圖。
102:靜電卡盤
104:卡座
106:基座
108:上部結構
110:頂針系統
112:旋轉磁流體軸
202:高扭矩電機定子
204:下部結構
206:電機轉子
302:冷卻水道
304:力矩電機部分冷卻水道
306:下部腔體部分冷卻水道
402:光纖接口
404:冷卻水通道接口
406:壓縮空氣通道接口
408:氦氣通道接口
410:冷卻液通道接口
412:高壓電電刷
414:電滑環轉子部分
416:電滑環定子部分

Claims (6)

  1. 一種離子束刻蝕旋轉平臺，其中，所述旋轉平臺分為上部結構、下部結構，所述上部結構、所述下部結構內均為腔體結構，所述上部結構的上端面設有基座，所述基座上端面設有靜電卡盤，所述靜電卡盤的下端面內設有多條靜電卡盤內冷卻水道，所述上部結構與所述下部結構的軸向中心處設有與其內腔體相互貫通的旋轉磁流體軸，所述上部結構的下端設有延伸部，所述延伸部延伸至所述下部結構的腔體內，所述下部結構的腔體內佈置有高扭矩電機，所述高扭矩電機環繞所述旋轉磁流體軸，所述高扭矩電機與所述旋轉磁流體軸相連並驅動轉動，所述旋轉磁流體軸的頂端與所述靜電卡盤相固定，所述上部結構的腔體內位於所述基座的下端面設有頂針裝置。
  2. 如請求項1所述的旋轉平臺，其中，所述的旋轉磁流體軸的位於所述下部結構的部分設有多個環形通槽，所述多個環形通槽佈置在所述旋轉磁流體軸的圓周面，所述環形通槽內設有通孔，所述旋轉磁流體軸內開設有多個與所述多個環形通槽相通的獨立通道，所述獨立通道包括液體獨立通道與氣體獨立通道，所述基座內開設與所述頂針裝置及所述磁流體軸相互連通的介質通道；所述上部結構面向所述下部結構的銜接面靠近所述旋轉磁流體軸處設有高扭矩電機冷卻水道，所述下部結構的腔體側壁位於高扭矩電機定子部設有冷卻水道。
  3. 如請求項2所述的旋轉平臺，其中，所述靜電卡盤內的所述冷卻水道呈螺旋環形佈置，所述基座內開設通管，所述靜電卡盤上的所述冷卻水道與所述基座內通管相連通，所述基座內通管還與所述旋轉磁流體軸內的所述獨立通道相連。
  4. 如請求項2所述的旋轉平臺，其中，所述下部結構的底端設有冷卻液出入接口和空氣出入接口，所述旋轉磁流體軸的底部側壁設有氦氣出入接口；所述冷卻液出入接口，所述空氣出入接口及所述氦氣出入接口分別與所述環形通槽相連通。
  5. 如請求項4所述的旋轉平臺，其中，所述冷卻液出入接口與所述上部結構、所述下部結構內的冷卻水道相互連通；所述冷卻水道用於冷卻所述高扭矩電機；所述的空氣出入接口通過所述旋轉磁流體軸內的所述氣體獨立通道相連通，所述氣體獨立通道與所述頂針裝置相互連通；所述空氣出入接口將氣體通入所述頂針裝置內，用於作動所述頂針裝置運作；所述冷卻液出入接口通過所述旋轉磁流體軸內的所述液體獨立通道相連通，所述液體獨立通道與所述靜電卡盤的冷卻水道相互連通，所述冷卻液出入接口將冷卻液體通入所述靜電卡盤內的冷卻水道內，用於所述靜電卡盤降溫；所述的氦氣出入接口通過所述旋轉磁流體軸內的所述氣體獨立通道相連通，所述氣體獨立通道相連通至所述靜電卡盤，用於為所述靜電卡盤上的晶圓冷卻。
  6. 如請求項1所述的旋轉平臺，其中，所述旋轉磁流體軸的底部側壁與高壓電電刷相連，所述高壓電電刷通過導線與外部電源相連，所述高壓電電刷為所述靜電卡盤靜電吸附傳遞電力。
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