TWI758563B - 鋁積層體及其製造方法 - Google Patents

鋁積層體及其製造方法 Download PDF

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Publication number
TWI758563B
TWI758563B TW107141574A TW107141574A TWI758563B TW I758563 B TWI758563 B TW I758563B TW 107141574 A TW107141574 A TW 107141574A TW 107141574 A TW107141574 A TW 107141574A TW I758563 B TWI758563 B TW I758563B
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TW
Taiwan
Prior art keywords
aluminum
less
oxide film
thickness
anodic oxide
Prior art date
Application number
TW107141574A
Other languages
English (en)
Chinese (zh)
Other versions
TW201928126A (zh
Inventor
新宮享
大八木光成
Original Assignee
日商東洋鋁股份有限公司
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Publication date
Application filed by 日商東洋鋁股份有限公司 filed Critical 日商東洋鋁股份有限公司
Publication of TW201928126A publication Critical patent/TW201928126A/zh
Application granted granted Critical
Publication of TWI758563B publication Critical patent/TWI758563B/zh

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
TW107141574A 2017-12-08 2018-11-22 鋁積層體及其製造方法 TWI758563B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017236148A JP6974150B2 (ja) 2017-12-08 2017-12-08 アルミニウム積層体およびその製造方法
JP2017-236148 2017-12-08

Publications (2)

Publication Number Publication Date
TW201928126A TW201928126A (zh) 2019-07-16
TWI758563B true TWI758563B (zh) 2022-03-21

Family

ID=66750216

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107141574A TWI758563B (zh) 2017-12-08 2018-11-22 鋁積層體及其製造方法

Country Status (5)

Country Link
JP (1) JP6974150B2 (ja)
KR (1) KR102444981B1 (ja)
CN (1) CN111406128B (ja)
TW (1) TWI758563B (ja)
WO (1) WO2019111648A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102248714A (zh) * 2010-04-28 2011-11-23 富士胶片株式会社 绝缘反光基板
TW201351669A (zh) * 2012-05-08 2013-12-16 Fujifilm Corp 半導體裝置用基板、半導體裝置、調光型照明裝置、自發光顯示裝置、太陽電池及反射型液晶顯示裝置
TW201428141A (zh) * 2012-12-10 2014-07-16 Mitsubishi Rayon Co 陽極氧化多孔氧化鋁的製造方法、模具以及表面具有微細凹凸結構的成形體
CN104471091A (zh) * 2012-07-26 2015-03-25 株式会社神户制钢所 阳极氧化处理性优异的铝合金和阳极氧化处理铝合金构件
JP2015196867A (ja) * 2014-03-31 2015-11-09 株式会社神戸製鋼所 アルミニウム合金板

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4637696B2 (ja) 2005-07-20 2011-02-23 東洋アルミニウム株式会社 建材の耐火被覆方法
JP2008174764A (ja) 2007-01-16 2008-07-31 Furukawa Sky Kk 鏡面アルミニウム材
JP2012136749A (ja) * 2010-12-27 2012-07-19 Fujifilm Corp 光反射基板
JP5937937B2 (ja) * 2012-09-26 2016-06-22 株式会社神戸製鋼所 アルミニウム陽極酸化皮膜
TWI589705B (zh) * 2013-08-23 2017-07-01 Nippon Light Metal Co Aluminum alloy plate attached with high-strength alumite film for electronic equipment frame and its manufacturing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102248714A (zh) * 2010-04-28 2011-11-23 富士胶片株式会社 绝缘反光基板
TW201351669A (zh) * 2012-05-08 2013-12-16 Fujifilm Corp 半導體裝置用基板、半導體裝置、調光型照明裝置、自發光顯示裝置、太陽電池及反射型液晶顯示裝置
CN104471091A (zh) * 2012-07-26 2015-03-25 株式会社神户制钢所 阳极氧化处理性优异的铝合金和阳极氧化处理铝合金构件
TW201428141A (zh) * 2012-12-10 2014-07-16 Mitsubishi Rayon Co 陽極氧化多孔氧化鋁的製造方法、模具以及表面具有微細凹凸結構的成形體
JP2015196867A (ja) * 2014-03-31 2015-11-09 株式会社神戸製鋼所 アルミニウム合金板

Also Published As

Publication number Publication date
JP2019104945A (ja) 2019-06-27
CN111406128B (zh) 2022-05-31
KR102444981B1 (ko) 2022-09-19
TW201928126A (zh) 2019-07-16
WO2019111648A1 (ja) 2019-06-13
KR20200096244A (ko) 2020-08-11
CN111406128A (zh) 2020-07-10
JP6974150B2 (ja) 2021-12-01

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