TWI755704B - 流量控制裝置、流量控制方法、流量控制裝置的控制程式 - Google Patents

流量控制裝置、流量控制方法、流量控制裝置的控制程式 Download PDF

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Publication number
TWI755704B
TWI755704B TW109112189A TW109112189A TWI755704B TW I755704 B TWI755704 B TW I755704B TW 109112189 A TW109112189 A TW 109112189A TW 109112189 A TW109112189 A TW 109112189A TW I755704 B TWI755704 B TW I755704B
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TW
Taiwan
Prior art keywords
flow
sensor
filter
control device
flow rate
Prior art date
Application number
TW109112189A
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English (en)
Chinese (zh)
Other versions
TW202045847A (zh
Inventor
野澤崇浩
中村剛
Original Assignee
日商富士金股份有限公司
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Publication of TW202045847A publication Critical patent/TW202045847A/zh
Application granted granted Critical
Publication of TWI755704B publication Critical patent/TWI755704B/zh

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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/696—Circuits therefor, e.g. constant-current flow meters
    • G01F1/698—Feedback or rebalancing circuits, e.g. self heated constant temperature flowmeters
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/684—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow
    • G01F1/6842—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow with means for influencing the fluid flow
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/005—Valves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F5/00—Measuring a proportion of the volume flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B6/00—Internal feedback arrangements for obtaining particular characteristics, e.g. proportional, integral or differential
    • G05B6/02—Internal feedback arrangements for obtaining particular characteristics, e.g. proportional, integral or differential electric
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0623—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the set value given to the control element

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
TW109112189A 2019-05-14 2020-04-10 流量控制裝置、流量控制方法、流量控制裝置的控制程式 TWI755704B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019091491 2019-05-14
JP2019-091491 2019-05-14

Publications (2)

Publication Number Publication Date
TW202045847A TW202045847A (zh) 2020-12-16
TWI755704B true TWI755704B (zh) 2022-02-21

Family

ID=73290189

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109112189A TWI755704B (zh) 2019-05-14 2020-04-10 流量控制裝置、流量控制方法、流量控制裝置的控制程式

Country Status (6)

Country Link
US (1) US12123760B2 (https=)
JP (1) JP7763476B2 (https=)
KR (1) KR102608260B1 (https=)
CN (1) CN113544620A (https=)
TW (1) TWI755704B (https=)
WO (1) WO2020230574A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12003626B2 (en) 2020-11-25 2024-06-04 Qubit Moving And Storage, Llc System and method of verification, authentication, and/or certification using entangled photons
WO2022239447A1 (ja) * 2021-05-13 2022-11-17 株式会社堀場エステック 流体制御装置、流体制御システム、流体制御装置用プログラム、及び流体制御方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0916268A (ja) * 1995-06-29 1997-01-17 Hisashi Takahashi 遅れ補償機能付流量制御弁
JP2003157114A (ja) * 2001-11-19 2003-05-30 Toshiba Mach Co Ltd ロストモーション補正方法およびロストモーション補正装置
US20120298220A1 (en) * 2009-12-01 2012-11-29 Fujikin Incorporated Pressure type flow rate control device
WO2013115298A1 (ja) * 2012-02-03 2013-08-08 日立金属株式会社 流量制御装置及びプログラム
WO2014156042A1 (ja) * 2013-03-25 2014-10-02 株式会社フジキン 流量モニタ付流量制御装置
JP2018156557A (ja) * 2017-03-21 2018-10-04 株式会社日立産機システム 遅れ補償器のフィルタの設計方法、及びそれを用いたフィードバック制御方法、モータ制御装置
TW201841090A (zh) * 2017-03-28 2018-11-16 日商富士金股份有限公司 壓力式流量控制裝置及流量控制方法

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KR20050031109A (ko) 2002-07-19 2005-04-01 셀레리티 그룹 아이엔씨 질량 유량 제어기 내의 압력 보상을 위한 방법 및 장치
US6963184B2 (en) * 2002-09-26 2005-11-08 3M Innovative Properties Company Adaptable spatial notch filter
JP2005174082A (ja) 2003-12-12 2005-06-30 Yaskawa Electric Corp 位置決め制御装置
MX2007000685A (es) 2004-10-20 2007-03-30 Fisher Controls Int Arreglo de filtro de entrada de avance-retardo para ciclos de control electro-neumatico.
JP4602973B2 (ja) 2004-11-11 2010-12-22 日立オートモティブシステムズ株式会社 熱式流量測定装置
US7603186B2 (en) 2006-04-28 2009-10-13 Advanced Energy Industries, Inc. Adaptive response time closed loop control algorithm
US20070255125A1 (en) 2006-04-28 2007-11-01 Moberg Sheldon B Monitor devices for networked fluid infusion systems
US8160833B2 (en) 2009-07-14 2012-04-17 Hitachi Metals, Ltd Thermal mass flow sensor with improved response across fluid types
US8195312B2 (en) * 2009-08-27 2012-06-05 Hitachi Metals, Ltd Multi-mode control loop with improved performance for mass flow controller
JP5499381B2 (ja) 2009-10-20 2014-05-21 日立金属株式会社 流量制御装置
WO2012153454A1 (ja) * 2011-05-10 2012-11-15 株式会社フジキン 流量モニタ付圧力式流量制御装置と、これを用いた流体供給系の異常検出方法並びにモニタ流量異常時の処置方法
US10473500B2 (en) 2013-03-08 2019-11-12 Hitachi Metals, Ltd. System and method for improved indicated flow in mass flow controllers
JP6475516B2 (ja) * 2015-02-26 2019-02-27 株式会社フジキン 圧力制御装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0916268A (ja) * 1995-06-29 1997-01-17 Hisashi Takahashi 遅れ補償機能付流量制御弁
JP2003157114A (ja) * 2001-11-19 2003-05-30 Toshiba Mach Co Ltd ロストモーション補正方法およびロストモーション補正装置
US20120298220A1 (en) * 2009-12-01 2012-11-29 Fujikin Incorporated Pressure type flow rate control device
WO2013115298A1 (ja) * 2012-02-03 2013-08-08 日立金属株式会社 流量制御装置及びプログラム
WO2014156042A1 (ja) * 2013-03-25 2014-10-02 株式会社フジキン 流量モニタ付流量制御装置
JP2018156557A (ja) * 2017-03-21 2018-10-04 株式会社日立産機システム 遅れ補償器のフィルタの設計方法、及びそれを用いたフィードバック制御方法、モータ制御装置
TW201841090A (zh) * 2017-03-28 2018-11-16 日商富士金股份有限公司 壓力式流量控制裝置及流量控制方法

Also Published As

Publication number Publication date
WO2020230574A1 (ja) 2020-11-19
CN113544620A (zh) 2021-10-22
KR20210124364A (ko) 2021-10-14
JPWO2020230574A1 (https=) 2020-11-19
TW202045847A (zh) 2020-12-16
KR102608260B1 (ko) 2023-11-30
US20220307882A1 (en) 2022-09-29
US12123760B2 (en) 2024-10-22
JP7763476B2 (ja) 2025-11-04

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