TWI707444B - 半導體封裝體配置裝置、製造裝置、半導體封裝體的配置方法以及電子零件的製造方法 - Google Patents

半導體封裝體配置裝置、製造裝置、半導體封裝體的配置方法以及電子零件的製造方法 Download PDF

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TWI707444B
TWI707444B TW107108686A TW107108686A TWI707444B TW I707444 B TWI707444 B TW I707444B TW 107108686 A TW107108686 A TW 107108686A TW 107108686 A TW107108686 A TW 107108686A TW I707444 B TWI707444 B TW I707444B
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Taiwan
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semiconductor package
imaging element
imaging
suction
arrangement member
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TW107108686A
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Chinese (zh)
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TW201843799A (zh
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今井一郎
深井元樹
片岡昌一
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日商Ｔｏｗａ股份有限公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
TW107108686A 2017-03-16 2018-03-14 半導體封裝體配置裝置、製造裝置、半導體封裝體的配置方法以及電子零件的製造方法 TWI707444B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-051101 2017-03-16
JP2017051101A JP6626027B2 (ja) 2017-03-16 2017-03-16 製造装置および電子部品の製造方法

Publications (2)

Publication Number Publication Date
TW201843799A TW201843799A (zh) 2018-12-16
TWI707444B true TWI707444B (zh) 2020-10-11

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TW107108686A TWI707444B (zh) 2017-03-16 2018-03-14 半導體封裝體配置裝置、製造裝置、半導體封裝體的配置方法以及電子零件的製造方法

Country Status (4)

Country Link
JP (1) JP6626027B2 (ko)
KR (1) KR102089097B1 (ko)
CN (1) CN108630579B (ko)
TW (1) TWI707444B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI785885B (zh) * 2021-01-18 2022-12-01 日商Ｔｏｗａ股份有限公司 搬送機構、切斷裝置及切斷品的製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102143715B1 (ko) * 2019-01-31 2020-08-11 한미반도체 주식회사 테이핑 시스템 및 테이핑 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200402828A (en) * 2002-07-17 2004-02-16 Matsushita Electric Ind Co Ltd Method and apparatus for picking up semiconductor chip and suction and exfoliation tool used therefor
JP2010135574A (ja) * 2008-12-05 2010-06-17 Alpha- Design Kk 移載装置
TW201616566A (zh) * 2014-09-04 2016-05-01 Towa Corp 切斷裝置、吸附機構及具備吸附機構之裝置
TW201635420A (zh) * 2015-03-16 2016-10-01 韓華泰科股份有限公司 貼合裝置以及貼合方法

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JPS6412637A (en) * 1987-07-06 1989-01-17 Yamatake Honeywell Co Ltd Automatic restoration system of loopback type
JP2770817B2 (ja) * 1996-06-19 1998-07-02 日本電気株式会社 チップマウント装置及び方法
KR100434832B1 (ko) * 2001-05-29 2004-06-07 주식회사 탑 엔지니어링 플립칩본더장치 및 그 작동방법
JP2007281503A (ja) * 2007-06-01 2007-10-25 Renesas Technology Corp チップ移載装置、およびチップ移載方法
KR101360007B1 (ko) * 2012-09-27 2014-02-07 한미반도체 주식회사 플립칩 본딩장치
JP6000902B2 (ja) * 2013-06-24 2016-10-05 Ｔｏｗａ株式会社 電子部品用の収容治具、その製造方法及び個片化装置
JP6017382B2 (ja) 2013-07-29 2016-11-02 Ｔｏｗａ株式会社 個片化された電子部品の搬送装置及び搬送方法
WO2015145530A1 (ja) * 2014-03-24 2015-10-01 富士機械製造株式会社 ダイ実装システム及びダイ実装方法
US20160111375A1 (en) * 2014-10-17 2016-04-21 Tango Systems, Inc. Temporary bonding of packages to carrier for depositing metal layer for shielding
JP5845546B1 (ja) 2014-10-31 2016-01-20 アキム株式会社 搬送装置、組立装置および組立方法
JP6320323B2 (ja) * 2015-03-04 2018-05-09 Ｔｏｗａ株式会社 製造装置、搬送方法、搬送プログラム、および搬送プログラムを格納した記録媒体
KR101590593B1 (ko) * 2015-12-03 2016-02-02 제너셈(주) 반도체패키지의 스퍼터링 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200402828A (en) * 2002-07-17 2004-02-16 Matsushita Electric Ind Co Ltd Method and apparatus for picking up semiconductor chip and suction and exfoliation tool used therefor
JP2010135574A (ja) * 2008-12-05 2010-06-17 Alpha- Design Kk 移載装置
TW201616566A (zh) * 2014-09-04 2016-05-01 Towa Corp 切斷裝置、吸附機構及具備吸附機構之裝置
TW201635420A (zh) * 2015-03-16 2016-10-01 韓華泰科股份有限公司 貼合裝置以及貼合方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI785885B (zh) * 2021-01-18 2022-12-01 日商Ｔｏｗａ股份有限公司 搬送機構、切斷裝置及切斷品的製造方法

Also Published As

Publication number Publication date
TW201843799A (zh) 2018-12-16
CN108630579A (zh) 2018-10-09
KR20180106876A (ko) 2018-10-01
JP2018157010A (ja) 2018-10-04
CN108630579B (zh) 2022-05-10
JP6626027B2 (ja) 2019-12-25
KR102089097B1 (ko) 2020-03-13

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