TWI707207B - 包含多個可個別控制之寫入頭的微影裝置 - Google Patents

包含多個可個別控制之寫入頭的微影裝置 Download PDF

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Publication number
TWI707207B
TWI707207B TW104113490A TW104113490A TWI707207B TW I707207 B TWI707207 B TW I707207B TW 104113490 A TW104113490 A TW 104113490A TW 104113490 A TW104113490 A TW 104113490A TW I707207 B TWI707207 B TW I707207B
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TW
Taiwan
Prior art keywords
light
substrate wafer
scanning
individual
writing
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Application number
TW104113490A
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English (en)
Chinese (zh)
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TW201619716A (zh
Inventor
史蒂芬 里奇特
安里柯 傑斯勒
德克 朵林
庫瑪 拉斯曼儂 森希爾
古特 魯道夫
馬丁 佛克
馬庫斯 狄君特
Original Assignee
德商卡爾蔡司Ｓｍｔ有限公司
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Publication of TW201619716A publication Critical patent/TW201619716A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW104113490A 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置 TWI707207B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014224314.9 2014-11-27
DE102014224314 2014-11-27

Publications (2)

Publication Number Publication Date
TW201619716A TW201619716A (zh) 2016-06-01
TWI707207B true TWI707207B (zh) 2020-10-11

Family

ID=53039409

Family Applications (2)

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TW104113490A TWI707207B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置
TW109131151A TWI737491B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置

Family Applications After (1)

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TW109131151A TWI737491B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置

Country Status (7)

Country Link
US (2) US20170255110A1 (enExample)
EP (1) EP3224675A1 (enExample)
JP (2) JP2017535821A (enExample)
KR (2) KR102595081B1 (enExample)
CN (1) CN107003616B (enExample)
TW (2) TWI707207B (enExample)
WO (1) WO2016082941A1 (enExample)

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KR102595081B1 (ko) 2014-11-27 2023-10-27 칼 짜이스 에스엠티 게엠베하 복수의 개별적으로 제어가능한 기록 헤드를 포함하는 리소그래피 장치
US9864139B1 (en) * 2016-01-22 2018-01-09 Seagate Technology Llc Uniform laser direct writing for waveguides
US10288808B1 (en) 2016-01-22 2019-05-14 Seagate Technology Llc Laser direct writing for non-linear waveguides
US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
EP4180871A1 (en) * 2021-11-16 2023-05-17 Mycronic Ab Multi head scanning lithographic laser writer
CN117192913B (zh) * 2023-09-11 2025-05-16 安徽工程大学 一种基于三维移动曝光提高光刻分辨率的系统及方法

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US20080226034A1 (en) * 2007-03-12 2008-09-18 Weir Michael P Power modulation of a scanning beam for imaging, therapy, and/or diagnosis

Also Published As

Publication number Publication date
JP7235808B2 (ja) 2023-03-08
CN107003616A (zh) 2017-08-01
KR102415072B1 (ko) 2022-06-30
US11003090B2 (en) 2021-05-11
WO2016082941A1 (en) 2016-06-02
KR20170093168A (ko) 2017-08-14
TW201619716A (zh) 2016-06-01
TW202105084A (zh) 2021-02-01
US20170255110A1 (en) 2017-09-07
JP2017535821A (ja) 2017-11-30
JP2021152683A (ja) 2021-09-30
US20200166852A1 (en) 2020-05-28
KR20220098039A (ko) 2022-07-08
TWI737491B (zh) 2021-08-21
EP3224675A1 (en) 2017-10-04
CN107003616B (zh) 2021-11-30
KR102595081B1 (ko) 2023-10-27

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