CN107003616B - 包含多个单独可控的写入头的光刻设备 - Google Patents

包含多个单独可控的写入头的光刻设备 Download PDF

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Publication number
CN107003616B
CN107003616B CN201580064789.XA CN201580064789A CN107003616B CN 107003616 B CN107003616 B CN 107003616B CN 201580064789 A CN201580064789 A CN 201580064789A CN 107003616 B CN107003616 B CN 107003616B
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China
Prior art keywords
light
substrate wafer
write head
scanning
spot
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Chinese (zh)
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CN107003616A (zh
Inventor
S.里克特
E.盖斯勒
D.多林
S.K.拉克什马南
G.鲁道夫
M.沃尔克
M.德冈瑟
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN107003616A publication Critical patent/CN107003616A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201580064789.XA 2014-11-27 2015-04-28 包含多个单独可控的写入头的光刻设备 Active CN107003616B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014224314.9 2014-11-27
DE102014224314 2014-11-27
PCT/EP2015/059143 WO2016082941A1 (en) 2014-11-27 2015-04-28 Lithography apparatus comprising a plurality of individually controllable write heads

Publications (2)

Publication Number Publication Date
CN107003616A CN107003616A (zh) 2017-08-01
CN107003616B true CN107003616B (zh) 2021-11-30

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CN201580064789.XA Active CN107003616B (zh) 2014-11-27 2015-04-28 包含多个单独可控的写入头的光刻设备

Country Status (7)

Country Link
US (2) US20170255110A1 (enExample)
EP (1) EP3224675A1 (enExample)
JP (2) JP2017535821A (enExample)
KR (2) KR102595081B1 (enExample)
CN (1) CN107003616B (enExample)
TW (2) TWI707207B (enExample)
WO (1) WO2016082941A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102595081B1 (ko) 2014-11-27 2023-10-27 칼 짜이스 에스엠티 게엠베하 복수의 개별적으로 제어가능한 기록 헤드를 포함하는 리소그래피 장치
US9864139B1 (en) * 2016-01-22 2018-01-09 Seagate Technology Llc Uniform laser direct writing for waveguides
US10288808B1 (en) 2016-01-22 2019-05-14 Seagate Technology Llc Laser direct writing for non-linear waveguides
US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
EP4180871A1 (en) * 2021-11-16 2023-05-17 Mycronic Ab Multi head scanning lithographic laser writer
CN117192913B (zh) * 2023-09-11 2025-05-16 安徽工程大学 一种基于三维移动曝光提高光刻分辨率的系统及方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1467517A (zh) * 2002-06-07 2004-01-14 ��ʿ��Ƭ��ʽ���� 光布线电路制造方法及具有该光布线电路的光布线基板

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142603A (en) * 1981-02-27 1982-09-03 Canon Inc Optical scanner
US5015066A (en) * 1990-05-29 1991-05-14 Eastman Kodak Company Multichannel waveguide print head with symmetric output
JPH08272104A (ja) * 1995-03-31 1996-10-18 Sony Corp フォトレジストの露光方法及び装置
WO1998047042A1 (en) 1997-04-14 1998-10-22 Dicon A/S An apparatus and a method for illuminating a light-sensitive medium
US5930433A (en) * 1997-07-23 1999-07-27 Hewlett-Packard Company Waveguide array document scanner
US6731843B2 (en) 2000-12-29 2004-05-04 Intel Corporation Multi-level waveguide
US20020115742A1 (en) * 2001-02-22 2002-08-22 Trieu Hai H. Bioactive nanocomposites and methods for their use
IL142773A (en) * 2001-03-08 2007-10-31 Xtellus Inc Fiber optic damper
JP2002351086A (ja) 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
US6573975B2 (en) * 2001-04-04 2003-06-03 Pradeep K. Govil DUV scanner linewidth control by mask error factor compensation
DE10122484A1 (de) * 2001-05-09 2002-11-28 Heidelberger Druckmasch Ag Verfahren und Vorrichtung zur Belichtung von Druckformen
JP2003022961A (ja) * 2001-07-10 2003-01-24 Nikon Corp アライメントマーク、荷電粒子線露光装置用レチクル及び荷電粒子線露光方法
WO2003019245A2 (en) 2001-08-31 2003-03-06 Universite Louis Pasteur Optical transmission apparatus with directionality and divergence control
US6960035B2 (en) * 2002-04-10 2005-11-01 Fuji Photo Film Co., Ltd. Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method
JP2004062157A (ja) * 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd 光配線回路の製造方法、及びその光配線回路を備えた光配線基板
AT5708U3 (de) * 2002-07-17 2003-09-25 Plasser Bahnbaumasch Franz Maschine zur aufnahme von schwellen eines gleises
KR101060557B1 (ko) 2002-10-25 2011-08-31 마퍼 리쏘그라피 아이피 비.브이. 리소그라피 시스템
DE10309084A1 (de) 2003-03-03 2004-09-16 Carl Zeiss Smt Ag Reflektives optisches Element und EUV-Lithographiegerät
JP2004354659A (ja) * 2003-05-29 2004-12-16 Dainippon Screen Mfg Co Ltd パターン描画装置
US7448995B2 (en) * 2003-06-23 2008-11-11 Microvision, Inc. Scanning endoscope
US6936810B2 (en) * 2003-07-21 2005-08-30 Thomas Hiramatsu-Tie Method and apparatus for scanning an optical beam using an optical conduit
TW200602814A (en) * 2004-03-29 2006-01-16 Fuji Photo Film Co Ltd Exposure device
JP2006085072A (ja) * 2004-09-17 2006-03-30 Fuji Photo Film Co Ltd マルチビーム露光装置
US20060134535A1 (en) * 2004-12-22 2006-06-22 3M Innovative Properties Company Lensed fiber array for sub-micron optical lithography patterning
US20090059295A1 (en) * 2005-09-30 2009-03-05 Mitsuru Mushano Plotting Device and Image Data Creation Method
DE102006008080A1 (de) 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
JP2008065306A (ja) * 2006-08-10 2008-03-21 Ricoh Printing Systems Ltd マルチビーム発生素子、マルチビームを用いた光記録装置
DE102006059818B4 (de) * 2006-12-11 2017-09-14 Kleo Ag Belichtungsanlage
US8216214B2 (en) 2007-03-12 2012-07-10 Ethicon Endo-Surgery, Inc. Power modulation of a scanning beam for imaging, therapy, and/or diagnosis
FR2921501B1 (fr) * 2007-09-24 2009-12-18 Commissariat Energie Atomique Dispositif d'enregistrement et de lecture de donnees sur un support de stockage holographique
US8282222B2 (en) * 2007-10-10 2012-10-09 Gerard Dirk Smits Image projector with reflected light tracking
JP5267029B2 (ja) * 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
ATE532105T1 (de) * 2007-12-21 2011-11-15 Zeiss Carl Smt Gmbh Beleuchtungsmethode
US8194301B2 (en) * 2008-03-04 2012-06-05 Kla-Tencor Corporation Multi-spot scanning system and method
US9561622B2 (en) * 2008-05-05 2017-02-07 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
EP2389606B1 (en) * 2009-01-24 2019-08-28 Ecole Polytechnique Federale De Lausanne (EPFL) EPFL-TTO High-resolution microscopy and photolithography devices using focusing micromirrors
EP2369413B1 (en) * 2010-03-22 2021-04-07 ASML Netherlands BV Illumination system and lithographic apparatus
JP5408792B2 (ja) 2010-03-29 2014-02-05 西日本旅客鉄道株式会社 特殊信号発光機用カバー
KR102291997B1 (ko) 2012-03-09 2021-08-23 칼 짜이스 에스엠티 게엠베하 Euv 투영 리소그래피용 조명 옵틱스 및 이러한 조명 옵틱스를 갖는 광학 시스템
US9034720B2 (en) * 2012-08-17 2015-05-19 Globalfoundries Singapore Pte. Ltd. Litho scanner alignment signal improvement
JP5944876B2 (ja) * 2013-10-18 2016-07-05 増田　麻言 レーザ光を用いた距離測定装置
KR102595081B1 (ko) 2014-11-27 2023-10-27 칼 짜이스 에스엠티 게엠베하 복수의 개별적으로 제어가능한 기록 헤드를 포함하는 리소그래피 장치

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1467517A (zh) * 2002-06-07 2004-01-14 ��ʿ��Ƭ��ʽ���� 光布线电路制造方法及具有该光布线电路的光布线基板

Also Published As

Publication number Publication date
JP7235808B2 (ja) 2023-03-08
CN107003616A (zh) 2017-08-01
KR102415072B1 (ko) 2022-06-30
US11003090B2 (en) 2021-05-11
WO2016082941A1 (en) 2016-06-02
KR20170093168A (ko) 2017-08-14
TW201619716A (zh) 2016-06-01
TW202105084A (zh) 2021-02-01
US20170255110A1 (en) 2017-09-07
JP2017535821A (ja) 2017-11-30
JP2021152683A (ja) 2021-09-30
US20200166852A1 (en) 2020-05-28
KR20220098039A (ko) 2022-07-08
TWI737491B (zh) 2021-08-21
EP3224675A1 (en) 2017-10-04
TWI707207B (zh) 2020-10-11
KR102595081B1 (ko) 2023-10-27

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