JP2017535821A - 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置 - Google Patents

複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置 Download PDF

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JP2017535821A
JP2017535821A JP2017528794A JP2017528794A JP2017535821A JP 2017535821 A JP2017535821 A JP 2017535821A JP 2017528794 A JP2017528794 A JP 2017528794A JP 2017528794 A JP2017528794 A JP 2017528794A JP 2017535821 A JP2017535821 A JP 2017535821A
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light
scanning
substrate wafer
write head
individual
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JP2017535821A5 (enExample
Inventor
シュテファン リヒター
シュテファン リヒター
エンリコ ガイスラー
エンリコ ガイスラー
ディルク ドーリング
ディルク ドーリング
セントヒル クマル ラクシュマナン
セントヒル クマル ラクシュマナン
ギュンター ルドルフ
ギュンター ルドルフ
マルティン フェルカー
マルティン フェルカー
マルクス デギュンター
マルクス デギュンター
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2017535821A publication Critical patent/JP2017535821A/ja
Publication of JP2017535821A5 publication Critical patent/JP2017535821A5/ja
Priority to JP2021110224A priority Critical patent/JP7235808B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optical Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2017528794A 2014-11-27 2015-04-28 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置 Pending JP2017535821A (ja)

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JP2021110224A JP7235808B2 (ja) 2014-11-27 2021-07-01 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

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Application Number Priority Date Filing Date Title
DE102014224314.9 2014-11-27
DE102014224314 2014-11-27
PCT/EP2015/059143 WO2016082941A1 (en) 2014-11-27 2015-04-28 Lithography apparatus comprising a plurality of individually controllable write heads

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JP2017535821A true JP2017535821A (ja) 2017-11-30
JP2017535821A5 JP2017535821A5 (enExample) 2019-11-21

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JP2021110224A Active JP7235808B2 (ja) 2014-11-27 2021-07-01 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

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US (2) US20170255110A1 (enExample)
EP (1) EP3224675A1 (enExample)
JP (2) JP2017535821A (enExample)
KR (2) KR102595081B1 (enExample)
CN (1) CN107003616B (enExample)
TW (2) TWI707207B (enExample)
WO (1) WO2016082941A1 (enExample)

Cited By (1)

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JPWO2022230847A1 (enExample) * 2021-04-27 2022-11-03

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KR102595081B1 (ko) 2014-11-27 2023-10-27 칼 짜이스 에스엠티 게엠베하 복수의 개별적으로 제어가능한 기록 헤드를 포함하는 리소그래피 장치
US9864139B1 (en) * 2016-01-22 2018-01-09 Seagate Technology Llc Uniform laser direct writing for waveguides
US10288808B1 (en) 2016-01-22 2019-05-14 Seagate Technology Llc Laser direct writing for non-linear waveguides
US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
EP4180871A1 (en) * 2021-11-16 2023-05-17 Mycronic Ab Multi head scanning lithographic laser writer
CN117192913B (zh) * 2023-09-11 2025-05-16 安徽工程大学 一种基于三维移动曝光提高光刻分辨率的系统及方法

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JPH08272104A (ja) * 1995-03-31 1996-10-18 Sony Corp フォトレジストの露光方法及び装置
JP2002359184A (ja) * 2001-04-04 2002-12-13 Svg Lithography Syst Inc マスクエラー係数補償によりライン幅をコントロールするｄｕｖスキャナ
JP2004062157A (ja) * 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd 光配線回路の製造方法、及びその光配線回路を備えた光配線基板
JP2004354659A (ja) * 2003-05-29 2004-12-16 Dainippon Screen Mfg Co Ltd パターン描画装置
JP2009111430A (ja) * 2004-03-29 2009-05-21 Fujifilm Corp 露光装置
JP2006085072A (ja) * 2004-09-17 2006-03-30 Fuji Photo Film Co Ltd マルチビーム露光装置
JP2010512549A (ja) * 2006-12-11 2010-04-22 クレオ マシーネンバウ アクチェンゲゼルシャフト 露光装置
US20080226034A1 (en) * 2007-03-12 2008-09-18 Weir Michael P Power modulation of a scanning beam for imaging, therapy, and/or diagnosis
JP2011507292A (ja) * 2007-12-21 2011-03-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のマスク照明用の照明系
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022230847A1 (enExample) * 2021-04-27 2022-11-03
WO2022230847A1 (ja) * 2021-04-27 2022-11-03 株式会社ニコン 照明光学系、露光装置及びフラットパネルディスプレイの製造方法
JP7626207B2 (ja) 2021-04-27 2025-02-04 株式会社ニコン 照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法

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Publication number Publication date
JP7235808B2 (ja) 2023-03-08
CN107003616A (zh) 2017-08-01
KR102415072B1 (ko) 2022-06-30
US11003090B2 (en) 2021-05-11
WO2016082941A1 (en) 2016-06-02
KR20170093168A (ko) 2017-08-14
TW201619716A (zh) 2016-06-01
TW202105084A (zh) 2021-02-01
US20170255110A1 (en) 2017-09-07
JP2021152683A (ja) 2021-09-30
US20200166852A1 (en) 2020-05-28
KR20220098039A (ko) 2022-07-08
TWI737491B (zh) 2021-08-21
EP3224675A1 (en) 2017-10-04
TWI707207B (zh) 2020-10-11
CN107003616B (zh) 2021-11-30
KR102595081B1 (ko) 2023-10-27

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