TWI687971B - 基板處理裝置及基板處理方法 - Google Patents
基板處理裝置及基板處理方法 Download PDFInfo
- Publication number
- TWI687971B TWI687971B TW106109910A TW106109910A TWI687971B TW I687971 B TWI687971 B TW I687971B TW 106109910 A TW106109910 A TW 106109910A TW 106109910 A TW106109910 A TW 106109910A TW I687971 B TWI687971 B TW I687971B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- shielding plate
- processing liquid
- processing
- nozzle
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/041—Cleaning travelling work
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016-073352 | 2016-03-31 | ||
JP2016073352 | 2016-03-31 | ||
JP2017-040452 | 2017-03-03 | ||
JP2017040452A JP6934732B2 (ja) | 2016-03-31 | 2017-03-03 | 基板処理装置及び基板処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201802870A TW201802870A (zh) | 2018-01-16 |
TWI687971B true TWI687971B (zh) | 2020-03-11 |
Family
ID=60044245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106109910A TWI687971B (zh) | 2016-03-31 | 2017-03-24 | 基板處理裝置及基板處理方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6934732B2 (ko) |
KR (1) | KR102091726B1 (ko) |
CN (1) | CN107275260B (ko) |
TW (1) | TWI687971B (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7045867B2 (ja) * | 2018-01-26 | 2022-04-01 | 株式会社Screenホールディングス | 基板処理方法 |
JP7149118B2 (ja) * | 2018-07-03 | 2022-10-06 | 株式会社Screenホールディングス | 基板処理装置 |
FR3085603B1 (fr) * | 2018-09-11 | 2020-08-14 | Soitec Silicon On Insulator | Procede pour le traitement d'un susbtrat soi dans un equipement de nettoyage monoplaque |
JP6979935B2 (ja) * | 2018-10-24 | 2021-12-15 | 三菱電機株式会社 | 半導体製造装置および半導体製造方法 |
JP7353079B2 (ja) * | 2019-07-04 | 2023-09-29 | 株式会社Screenホールディングス | 基板処理装置 |
TWI756850B (zh) * | 2019-09-30 | 2022-03-01 | 日商芝浦機械電子裝置股份有限公司 | 基板處理裝置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW480555B (en) * | 1999-10-19 | 2002-03-21 | Tokyo Electron Ltd | Substrate processing apparatus and substrate processing |
JP2003045838A (ja) * | 2001-07-26 | 2003-02-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置ならびに基板処理装置に備えられた回転板および周囲部材の洗浄方法 |
US20130104940A1 (en) * | 2011-10-27 | 2013-05-02 | Tokyo Electron Limited | Liquid processing apparatus, liquid processing method, and storage medium |
TW201541542A (zh) * | 2014-03-28 | 2015-11-01 | Screen Holdings Co Ltd | 基板處理裝置及基板處理方法 |
TWI520795B (zh) * | 2007-10-17 | 2016-02-11 | 荏原製作所股份有限公司 | 基板洗淨裝置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3698567B2 (ja) | 1998-10-23 | 2005-09-21 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP3808719B2 (ja) * | 2001-04-17 | 2006-08-16 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4074814B2 (ja) * | 2002-01-30 | 2008-04-16 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP4494840B2 (ja) * | 2003-06-27 | 2010-06-30 | 大日本スクリーン製造株式会社 | 異物除去装置、基板処理装置および基板処理方法 |
JP4762098B2 (ja) * | 2006-09-28 | 2011-08-31 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
US9640383B2 (en) * | 2011-08-26 | 2017-05-02 | Tokyo Electron Limited | Liquid treatment apparatus and liquid treatment method |
JP6017999B2 (ja) * | 2013-03-15 | 2016-11-02 | 株式会社Screenホールディングス | 基板処理装置 |
KR101579507B1 (ko) * | 2013-05-08 | 2015-12-22 | 세메스 주식회사 | 기판 처리 장치 |
JP6215748B2 (ja) * | 2014-03-28 | 2017-10-18 | 株式会社Screenホールディングス | 基板処理装置 |
JP6626762B2 (ja) * | 2016-03-30 | 2019-12-25 | 株式会社Screenホールディングス | 基板処理装置 |
-
2017
- 2017-03-03 JP JP2017040452A patent/JP6934732B2/ja active Active
- 2017-03-24 TW TW106109910A patent/TWI687971B/zh active
- 2017-03-30 KR KR1020170040535A patent/KR102091726B1/ko active IP Right Grant
- 2017-03-31 CN CN201710207077.XA patent/CN107275260B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW480555B (en) * | 1999-10-19 | 2002-03-21 | Tokyo Electron Ltd | Substrate processing apparatus and substrate processing |
JP2003045838A (ja) * | 2001-07-26 | 2003-02-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置ならびに基板処理装置に備えられた回転板および周囲部材の洗浄方法 |
TWI520795B (zh) * | 2007-10-17 | 2016-02-11 | 荏原製作所股份有限公司 | 基板洗淨裝置 |
US20130104940A1 (en) * | 2011-10-27 | 2013-05-02 | Tokyo Electron Limited | Liquid processing apparatus, liquid processing method, and storage medium |
TW201541542A (zh) * | 2014-03-28 | 2015-11-01 | Screen Holdings Co Ltd | 基板處理裝置及基板處理方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201802870A (zh) | 2018-01-16 |
CN107275260B (zh) | 2021-08-24 |
JP2017188665A (ja) | 2017-10-12 |
KR20170113388A (ko) | 2017-10-12 |
CN107275260A (zh) | 2017-10-20 |
KR102091726B1 (ko) | 2020-03-20 |
JP6934732B2 (ja) | 2021-09-15 |
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