TWI683745B - 附有膜之玻璃板、觸控感測器、膜及附有膜之玻璃板之製造方法 - Google Patents
附有膜之玻璃板、觸控感測器、膜及附有膜之玻璃板之製造方法 Download PDFInfo
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Abstract
本發明係一種附有膜之玻璃板,觸控感測器,膜及附有膜之玻璃板之製造方法,其中,附有膜之玻璃板(1)係層積複數的膜而成之層積膜(2)則加以形成於玻璃板(3)上。層積膜(2)係具備:加以形成於玻璃板(3)上之至少包含貴金屬之無機物膜(4),和加以形成於無機物膜(4)之鍍敷金屬膜(5),和加以形成於鍍敷金屬膜(5)上之金屬膜(6)。層積膜(2)則從玻璃板側(3)而視之情況為黑色。
Description
本發明係有關附有膜之玻璃板,觸控感測器,膜及附有膜之玻璃板之製造方法。
如周知,在近年中,伴隨著電子機器等之發達,加以使用遍及於液晶顯示器,電漿顯示器,場效發射顯示器(包含面發光顯示器)及電激發光顯示器等之平板顯示器(FPD)或感測器的基板,或者固體攝像元件或雷射二極體等之半導體封裝用蓋,更且薄膜化合物太陽能電池之基板等之多種的玻璃板。
但,例如,在使用於電視,個人電腦,智慧型手機等之顯示器裝置中,將形成電極於玻璃板等之透明基材上之構成,透明基材側則呈成為使用者側地配置於畫面上之情況,有著電極則被使用者所視認之事態,或產生有畫像之浮現黑階等之現象的可能性。並且,為了解決如此之問題,加以提案有黑色化電極之透明基材側者(例如,專利文獻1)。
[專利文獻1]日本特開2014-89689號公報
另一方面,為了製作電極於玻璃板上,作為加以使用於形成金屬膜於玻璃板上之情況的方法,一般而言,可舉出蒸鍍或濺鍍等。
但在蒸鍍或濺鍍中,將減壓環境作為必要之情況為多,製造設備則成為大規模者,製造成本則產生高升。另外,在蒸鍍或濺鍍中,於處理中,玻璃板之周圍則成為高溫之情況為多,而因此引起,產生應力於玻璃板與金屬膜,經由此而有金屬膜產生剝離之可能性。另外,在蒸鍍或濺鍍中,亦有所形成之金屬膜之表面粗度變大之可能性。
本發明係有鑑於上述情事,可未使用蒸鍍或濺鍍而製造之情況,具備金屬膜的膜則從玻璃板側而視之情況,提供為黑色之附有膜之玻璃板,膜及附有膜之玻璃板之製造方法者,作為技術課題。
為了解決前述課題所發明之本發明的附有膜
之玻璃板係層積複數的膜所成之層積膜則加以形成於玻璃板上之附有膜之玻璃板,其特徵為前述層積膜係具備形成於前述玻璃板上之至少包含貴金屬之無機物膜、和形成於該無機物膜上之鍍敷金屬膜,前述層積膜從前述玻璃板側視之時,為黑色者。
在此構成中,金屬膜係因由電鍍所形成之故,可未使用蒸鍍或濺鍍,而形成具備金屬膜之層積膜者。隨之,於製造成為無須減壓環境而成為無須大規模之製造設備,可抑制製造成本。另外,於處理中,未有玻璃板周圍變為高溫,而無在因熱引起之玻璃板與金屬膜之應力的產生,經由此,可抑制金屬膜產生剝離者。另外,金屬膜係因由電鍍加以形成之故,比較於蒸鍍或濺鍍,可縮小金屬膜之表面粗度者。如此,如根據本發明之附有膜之玻璃板,可未使用蒸鍍或濺鍍而進行製造者,可提供具備金屬膜的膜則從玻璃板側而視之情況為黑色之附有膜之玻璃板者。
由此構成,層積膜則從玻璃板側而視之情況,成為黑色的理由係雖然仍未清楚闡明,但例如,認為如以下者。在僅包含加以形成於玻璃板上之貴金屬的無機物膜中,於從玻璃板側而視之情況為深紅色。並且,在於此無機物膜上形成鍍敷金屬膜之後,層積膜則從玻璃板側而視之情況成為黑色。從此情況,認為因無機物膜中之貴金屬與鍍敷金屬膜中之金屬則引起某種反應而產生之化合物(例如,溴化金,氯化銀,氯化鉑,氯化鈀,氧化釕
等)引起而從玻璃板側而視之情況,成為黑色。
在上述之構成中,前述鍍敷金屬膜則經由無電解電鍍加以形成者為佳。
如為此構成,因可將含有貴金屬之無機物膜,作為無電解電鍍之觸媒者之故,可經由無電解電鍍而容易地形成鍍敷金屬膜者。
在上述之構成中,前述層積膜係更於前述鍍敷金屬膜上,還具備經由電解電鍍加以形成之金屬膜者為佳。
如為此構成,電解電鍍係比較於無電解電鍍,因金屬膜之形成速度為快之故,可效率佳地形成層積膜之金屬膜部分。
在上述之構成中,經由無電解電鍍形成之前述鍍敷金屬膜係由銅或鎳加以構成者為佳。
如為此構成,銅或鎳係因為可微細蝕刻之金屬材料之故,成為對於層積膜而言可做微細蝕刻。
在上述任一之構成中,前述玻璃板之板厚係300μm以下者為佳。
如為此構成,因玻璃板具有可撓性之故,成為可使用於畫面為曲面之顯示器等之電子機器。
在上述任一之構成中,前述層積膜係如加工成觸控感應器用之電極形狀時,此附有膜之玻璃板係對於觸控感應器成為最佳。另外,具備此構成之附有膜之玻璃板者為特徵之觸控感應器,亦可解決前述課題者。
另外,為了解決前述課題所發明之本發明的膜係其特徵為具備形成於玻璃板上之至少包含貴金屬之無機物膜、和形成於該無機物膜上之鍍敷金屬膜,從前述玻璃板側視之時,為黑色者。
在此構成中,可得到實質上與開始所說明之附有膜之玻璃板同一作用效果者。
另外,為了解決前述課題所發明之本發明的附有膜之玻璃板之製造方法係將層積複數之膜之層積膜,形成於玻璃板上之附有膜之玻璃板之製造方法,其特徵係令前述層積膜,於前述玻璃板上形成至少包含貴金屬之無機物膜之後、於該無機物膜上形成鍍敷金屬膜而形成,前述層積膜從前述玻璃板側視之時,為黑色者。
在此構成中,可得到實質上與開始所說明之附有膜之玻璃板同一作用效果者。
如以上,如根據本發明,可未使用蒸鍍或濺鍍而進行製造者,可提供具備金屬膜的膜則從玻璃板側而視之情況為黑色之附有膜之玻璃板,膜及附有膜之玻璃板之製造方法者。
1‧‧‧附有膜之玻璃板
2‧‧‧層積膜
3‧‧‧玻璃板
4‧‧‧無機物膜
5‧‧‧鍍敷金屬膜
6‧‧‧金屬膜
圖1係顯示有關本發明之第1實施形態的附有膜之玻
璃板的剖面圖。
圖2係顯示自玻璃板側對於各波長而測定層積膜之反射率的結果圖。
圖3係顯示有關本發明之第2實施形態的附有膜之玻璃板的剖面圖。
以下,對於為了實施本發明之形態,依據圖面而加以說明。
圖1係顯示有關本發明之第1實施形態的附有膜之玻璃板的剖面圖。此附有膜之玻璃板1係層積複數的膜而成之層積膜2則加以形成於玻璃板3上。層積膜2係具備:加以形成於玻璃板3上之至少包含貴金屬之無機物膜4,和加以形成於無機物膜4上之鍍敷金屬膜5。並且,層積膜2則從玻璃板3側而視之情況為黑色。作為貴金屬係例如,可舉出金、銀、白金、鈀、釕等。
在本實施形態中,鍍敷金屬膜5則經由將無機物膜4作為觸媒之無電解電鍍而加以形成。另外,層積膜2係更具備經由電解電鍍而加以形成於鍍敷金屬膜5上之金屬膜6。
玻璃板3之材料係無特別加以限定者,例如,可舉出鈉鈣玻璃,無鹼玻璃等,另外,亦可為作為強化玻璃所使用之鋁矽酸鹽玻璃。
玻璃板3之板厚亦無特別加以限定者,例
如,10μm~300μm、理想為20μm~200μm、最理想為50μm~100μm。對於玻璃板3之板厚為不足10μm之情況,經由鍍敷金屬膜5之應力而玻璃板則有產生彎曲,以及引起波紋之可能性。另外,對於玻璃板3之板厚則超過300μm之情況,因對於玻璃板3幾乎無可撓性之故,而有無法使用於畫面為曲面之顯示器等電子機器之可能性。
作為至少含有貴金屬之無機物膜4,係例如,可舉出於容易吸附於玻璃板3之氯化錫,氯化鋅,氯化銅等,賦予亞硫酸金娜,氯化銀,氯鉑酸白金(IV)酸6水合物,氯化鈀,氯化釕等者。無機物膜4係加上於上述之貴金屬,例如,含有,成為鎳,鈷,銅等之無電解電鍍之觸媒之金屬亦可。在本實施形態中,無機物膜4係例如,如以下所形成。將玻璃板3,浸漬於含有錫,鋅,銅之中一種類或複數種類以上之溶液,使此等金屬離子吸附於玻璃板3表面,接著,浸漬於包含貴金屬之水溶液。經由此,根據離子化傾向的差,加以置換錫,鋅,銅等之金屬離子與貴金屬離子,於玻璃板3上,加以形成將貴金屬或者貴金屬化合物作為主成分的膜。並且,將加以形成有此膜之玻璃板3,浸漬於還原性溶液。經由此,還原膜的表面附近之貴金屬,做為成具有無電解電鍍之觸媒作用之狀態。如此作為所形成之無機物膜4係以銅或鎳的蝕刻液而可蝕刻之物質。
無機物膜4之膜厚係例如,為0.07μm~1.0μm,而0.1μm~0.7μm更佳,0.2μm~0.5μm則最佳。
無機物膜4之膜厚則不足0.07μm之情況,無電解電鍍之電鍍速度則有變為非常慢之可能性。對於無機物膜4之膜厚為超過1.0μm之情況,對於從玻璃板3側而視層積膜2之情況,以無機物膜4所具有之紅色的影響,而有未成為黑色之可能性。
鍍敷金屬膜5係並非特別加以限定者,但銅或鎳,係從可微細蝕刻之金屬材料的觀點為佳。銅係電性阻抗性為低,在無電解電鍍中,膜的均一性為佳。另外,鎳係與銅做比較具有反射率低(黑)之優點,對於面積小之顯示器裝置為最佳。另外,無電解電鍍鎳係亦具有對於無機物膜4之密著性為良好之長處。
鍍敷金屬膜5之膜厚係例如,為0.05μm~5.0μm,而0.1μm~1.0μm更佳,0.2μm~0.5μm則最佳。鍍敷金屬膜5之膜厚則對於不足0.05μm之情況,對於從玻璃板3側而視層積膜2之情況,有著未成為黑色之可能性。對於鍍敷金屬膜5之膜厚則超過5.0μm之情況,對於成膜花上時間,而有生產效率下降之可能性。
金屬膜6係雖無特別加以限定者,但當考慮作為電極之用途時,電性阻抗為低者為佳,從此觀點,銅與鎳為最佳。體積阻抗率係在無電解電鍍銅及電解電鍍銅為3μΩ.cm、而在電解電鍍鎳中為8μΩ.cm。另外,銅或鎳係如上述,從可微細蝕刻之金屬材料的觀點亦為佳。
金屬膜6之膜厚係例如,為0.1μm~5.0μm,而0.3μm~3.0μm更佳,0.5μm~2.0μm則最佳。對於金屬
膜6之膜厚則不足0.1μm之情況,係有無法充分地得到金屬膜6之特長的可能性。對於金屬膜6之膜厚則超過5.0μm之情況,係有製造成本增大之可能性。
對於以無電解電鍍銅而構成鍍敷金屬膜5,而以電解電鍍銅而構成金屬膜6之情況,係可以短時間而得到膜厚均一性良好之低阻抗率的層積膜2。另外,亦可以無電解電鍍鎳而構成鍍敷金屬膜5,而以電解電鍍鎳而構成金屬膜6,但如以無電解電鍍鎳而構成鍍敷金屬膜5,而以電解電鍍銅而構成金屬膜6時,可更使層積膜2之阻抗率下降者。
對於以無電解電鍍銅而構成鍍敷金屬膜5,而以無電解電鍍銅而構成金屬膜6之情況,係同時經由銅而加以構成之故,經由蝕刻之微細加工則變為容易。
對於以無電解電鍍銅而構成鍍敷金屬膜5,而以無電解電鍍鎳或電解電鍍鎳而構成金屬膜6之情況,係表面則由鎳而加以構成之故,對於耐蝕性優越。
對於以無電解電鍍鎳而構成鍍敷金屬膜5,而以電解電鍍銅而構成金屬膜6之情況,係可使用廉價之電鍍浴之故,而可廉價地生產性佳而形成低阻抗之層積膜2者。
對於以無電解電鍍鎳而構成鍍敷金屬膜5,而以電解電鍍銅而構成金屬膜6之情況,係可以形成膜厚均一性良好的層積膜2。另外,作為電鍍浴,即使使用廉價之硫酸銅水溶液,鍍敷金屬膜5未產生變質,而未有與無
機物膜4之密著性降地之虞。
對於以無電解電鍍鎳而構成鍍敷金屬膜5,而以無電解電鍍鎳或電解電鍍鎳而構成金屬膜6之情況,係同時經由鎳而加以構成之故,經由蝕刻之微細加工則變為容易。另外,表面則由鎳而加以構成之故,對於耐蝕性優越。
圖2係顯示自玻璃板3側對於各波長而測定層積膜2之反射率的結果圖。然而,使用於此測定之層積膜2係由加以形成於玻璃板3上之包含銀之無機物膜4,和加以形成於無機物膜4上之鍍敷金屬膜5而加以構成者(在圖1未加以形成有金屬膜6者),鍍敷金屬膜5係無電解電鍍鎳。另外,此圖之反射率係除去自玻璃板3與空氣之界面的4%程度之反射光者。
雖以實線顯示之資料則為層積膜2之反射率,以點線所顯示之資料則為為了比較之銅的反射率。比較於銅的反射率,層積膜2之反射率係為低,成為10%以下,並且了解到經由波長之反射率的差為小者。因此,層積膜2則自玻璃板3側而視之情況,成為黑色,而對於加以配置於畫面上之電極之情況,可理解抑制由使用者所視認之事態或畫像之浮現黑階等之現象的效果為大。
然而,層積膜2之反射率係30%以下則為佳,而10%以下則最佳。
在如以上所構成之本實施形態之附有膜之玻璃板3中,可享受以下之效果。
未使用蒸鍍或濺鍍,而可形成具備鍍敷金屬膜5或金屬膜6之層積膜2者。隨之,於製造成為無須減壓環境而成為無須大規模之製造設備,可抑制製造成本。另外,於處理中,未有玻璃板3周圍變為高溫,而無在因熱引起之玻璃板3與鍍敷金屬膜5或金屬膜6之應力的產生,經由此,可抑制鍍敷金屬膜5或金屬膜6產生剝離者。另外,鍍敷金屬膜5或金屬膜6係因由電鍍加以形成故,比較於蒸鍍或濺鍍,可縮小鍍敷金屬膜5或金屬膜6之表面粗度。如此,如根據本實施形態,可提供可未使用蒸鍍或濺鍍而製造者,具備鍍敷金屬膜5或金屬膜6之層積膜2則從玻璃板3側而視之情況,為黑色之附有膜之玻璃板3。
另外,無機物膜4係對於以銅或鎳而構成鍍敷金屬膜5與金屬膜6之情況,鍍敷金屬膜5與金屬膜6同時,可以同一之蝕刻液而一次進行蝕刻者。經由此,對於層積膜2進行經由蝕刻之加工情況,可使加工精確度提升,另外,可使生產效率提升者。另外,對於進行蝕刻之情況,因至無機物膜4為止無殘渣而可進行蝕刻之故,所蝕刻之處係玻璃板3則露出,光透過時,未有光散射,而得到良好的光特性。
接著,對於有關本發明之第2實施形態之附有膜之玻璃板3加以說明。
如圖3所示,在本實施形態中,於玻璃板3之兩面,加以形成有層積膜2、2。本實施形態之附有膜
之玻璃板3係因層積膜2、2則加以加工為觸控感測器用之電極形狀之故,如詳述時,層積膜2、2則經由蝕刻而加以圖案化(加工),成為觸控感測器用之電極的形狀。層積膜2、2係所謂成為網目型電極圖案。也就是,層積膜2、2係玻璃板3之兩面各自,以平面視複數則隔著間隔而並聯延伸於直線狀。並且,以平面視,玻璃板3之一方的面側之層積膜2係對於另一方之面側的層積膜2而言為正交。
在本實施形態中,層積膜2、2之鍍敷金屬膜5、5係無電解電鍍銅膜,而層積膜2、2之金屬膜6、6係電解電鍍銅。並且,對於金屬膜6、6之表面係加以形成有黑色的氧化銅被膜7、7。隨之,將玻璃板3,從任何面的側而視之情況,層積膜2、2係亦成為黑色。隨之,對於將玻璃板3之任何面配置於使用者側之情況,亦可得到抑制電極則由使用者所視認之事態或畫像之黑階浮現等之現象的效果。
如本實施形態對於加以形成有方向不同之直線狀的電極於玻璃板3兩面之情況,有產生莫瑞不勻之可能性。但當將玻璃板3之板厚,例如作為200μm以下時,玻璃板3兩面之電極圖案之校準精確度提升,而不易產生有莫瑞不勻。當將玻璃板3之板厚,更作為100μm以下時,玻璃板3兩面之電極圖案之校準精確度則更提升。並且,由從斜面而視時之視差亦變小者,遍及顯示器全面,成為呈可配置電極於畫素與畫素之間,而可得到在
觸控感測器的電極圖案之開口率的損失變少之優點。
另外,玻璃板3係比較於樹脂薄膜,可無膨脹或收縮,無經由從外部加以施加的力之伸展及皺褶,而精確度佳地形成網目型電極圖案者。特別是,對於如本實施形態,加以形成電極於玻璃板3兩面之情況,此效果則變為顯著。與此效果相互作用,在光微影工程中,未進行兩面的同時曝光,而將單面在圖案化後翻過來,由校準於既已形成之圖案而圖案化另一個的面者,可實現高精確度之位置調整。
另外,如本實施形態,對於加以使用附有膜之玻璃板1於觸控感測器之情況,為了抑制畫質之下降而電極的寬度係例如,必須作為微細至3μm為止,而要求高精確度之蝕刻。對此,銅與鎳係可同時以加水硫酸的液進行蝕刻之材料之故,如以銅或鎳而構成鍍敷金屬膜5與金屬膜6時,經由以同一之蝕刻液而可進行一次蝕刻,而可提高加工精確度者。
本申請之發明者們係對於有關本發明之附有膜的玻璃板,評估層積膜之加工性。
評估對象之附有膜的玻璃板係作為玻璃板,使用日本電氣硝子公司製OA-10G(板厚200μm)。對於此玻璃板之一面,形成無機物膜與鍍敷金屬膜與金屬膜所成之層積膜。無機物膜係以上述的方法加以形成。鍍敷金
屬膜係為無電解電鍍鎳,膜厚0.4μm、而金屬膜係電解電鍍銅,膜厚3μm。
對於上述之附有膜的玻璃板之層積膜而言,如以下,使用光微影法而進行圖案化。以丙酮而超音波洗淨電解電鍍銅的表面,再以異丙醇進行置換後水洗,進行旋轉乾燥。接著,於電解電鍍銅表面,經由AZ公司製AZ1500而進行旋塗佈。光阻膜之塗佈後,在熱板上進行100℃,90秒間之預烘乾。接著,經由接觸方式之曝光機而進行光罩圖案曝光。顯像係由日本東京應化製NMD-3之TMAH鹼性液進行。並且,由水洗此等,乾燥後,進行120℃ 2分鐘之後烘者,作為蝕刻光罩之光阻膜圖案則完成。
蝕刻係首先,經由加水硫酸液而蝕刻銅與鎳膜。在本實施例中,作為加水硫酸液之組成,使用將過氧化氫濃度作為1.5%,而將硫酸濃度作為5%之水溶液。將此溶液加熱至60℃而進行蝕刻。以3分而蝕刻層積膜。在加水硫酸液中,無機物膜之蝕刻速度為慢之故,而使用日本三菱氣體化學製銅之蝕刻液的CPB-40N而進行無機物膜之蝕刻。具體而言,將CPB-40N浸漬於以水作為10倍稀釋之溶液加熱至60℃的液時,由90秒,玻璃板則成為透明,而可亦無殘渣進行蝕刻。
本發明係並無加以限定於上述說明者,可在其技術思想的範圍內,做種種的變形。例如,在上述實施形態中,層積膜係具備加上於無機物膜及鍍敷金屬膜,經
由電解電鍍而形成之金屬膜,但未有此金屬膜亦可。另外,在上述實施形態中,附有膜之玻璃板係其層積膜則作為電極而加以使用,但單作為看見黑階的板而使用於裝飾等亦可。
1‧‧‧附有膜之玻璃板
2‧‧‧層積膜
3‧‧‧玻璃板
4‧‧‧無機物膜
5‧‧‧鍍敷金屬膜
6‧‧‧金屬膜
Claims (9)
- 一種附有膜之玻璃板,層積複數之膜之層積膜,形成於玻璃板上之附有膜之玻璃板,其特徵係前述層積膜係具備形成於前述玻璃板之未改質之表面之至少包含貴金屬之無機物膜、和形成於該無機物膜上之鍍敷金屬膜;前述層積膜從前述玻璃板側視之時,為黑色者。
- 如申請專利範圍第1項所述之附有膜之玻璃板,其中,前述鍍敷金屬膜係經由無電解電鍍加以形成。
- 如申請專利範圍第2項所述之附有膜之玻璃板,其中,前述層積膜係更於前述鍍敷金屬膜上,還具備經由電解電鍍加以形成之金屬膜。
- 如申請專利範圍第2項或第3項所述之附有膜之玻璃板,其中,經由無電解電鍍形成之前述鍍敷金屬膜係由銅或鎳加以構成。
- 如申請專利範圍第1項至第3項中任一項所述之附有膜之玻璃板,其中,前述玻璃板之板厚係300μm以下。
- 如申請專利範圍第1項至第3項中任一項所述之附有膜之玻璃板,其中,前述層積膜係加工成觸控感應器用之電極形狀。
- 一種觸控感應器,其特徵係具備如申請專利範圍第6項所述之附有膜之玻璃板。
- 一種膜,其特徵係具備形成於玻璃板之未改質之 表面之至少包含貴金屬之無機物膜、和形成於該無機物膜上之鍍敷金屬膜;從前述玻璃板側視之時,為黑色者。
- 一種附有膜之玻璃板之製造方法,將層積複數之膜之層積膜,形成於玻璃板上之附有膜之玻璃板之製造方法,其特徵係令前述層積膜,於前述玻璃板之未改質之表面之形成至少包含貴金屬之無機物膜之後、於該無機物膜上形成鍍敷金屬膜而形成,前述層積膜從前述玻璃板側視之時,為黑色者。
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