TWI662376B - Exposure device, exposure method, and article manufacturing method - Google Patents

Exposure device, exposure method, and article manufacturing method Download PDF

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Publication number
TWI662376B
TWI662376B TW106119299A TW106119299A TWI662376B TW I662376 B TWI662376 B TW I662376B TW 106119299 A TW106119299 A TW 106119299A TW 106119299 A TW106119299 A TW 106119299A TW I662376 B TWI662376 B TW I662376B
Authority
TW
Taiwan
Prior art keywords
exposure
light
area
illuminance
scanning direction
Prior art date
Application number
TW106119299A
Other languages
English (en)
Chinese (zh)
Other versions
TW201812460A (zh
Inventor
川島春名
大阪昇
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW201812460A publication Critical patent/TW201812460A/zh
Application granted granted Critical
Publication of TWI662376B publication Critical patent/TWI662376B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW106119299A 2016-07-13 2017-06-09 Exposure device, exposure method, and article manufacturing method TWI662376B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-138167 2016-07-13
JP2016138167A JP2018010105A (ja) 2016-07-13 2016-07-13 露光装置、露光方法、および物品製造方法

Publications (2)

Publication Number Publication Date
TW201812460A TW201812460A (zh) 2018-04-01
TWI662376B true TWI662376B (zh) 2019-06-11

Family

ID=60995508

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106119299A TWI662376B (zh) 2016-07-13 2017-06-09 Exposure device, exposure method, and article manufacturing method

Country Status (4)

Country Link
JP (1) JP2018010105A (ja)
KR (1) KR20180007672A (ja)
CN (1) CN107621754A (ja)
TW (1) TWI662376B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7446069B2 (ja) * 2019-09-03 2024-03-08 キヤノン株式会社 露光装置及び物品の製造方法
KR102096851B1 (ko) * 2019-10-17 2020-04-03 주식회사 옵티플렉스 광학계 및 이를 포함하는 노광장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI221628B (en) * 2000-08-25 2004-10-01 Canon Kk Illumination system and method, exposure apparatus using the same, and liquid crystal display device manufacturing method using the same
US20070132978A1 (en) * 2005-12-08 2007-06-14 Haruna Kawashima Exposure apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3200244B2 (ja) * 1993-07-16 2001-08-20 キヤノン株式会社 走査型露光装置
JP3711586B2 (ja) * 1995-06-02 2005-11-02 株式会社ニコン 走査露光装置
WO1999054922A1 (fr) * 1998-04-22 1999-10-28 Nikon Corporation Methode et systeme d'exposition
US6710847B1 (en) * 1998-11-06 2004-03-23 Nikon Corporation Exposure method and exposure apparatus
JP2000286188A (ja) * 1999-03-31 2000-10-13 Nikon Corp 露光装置、基板履歴保持装置および基板履歴保持プログラムを記憶した記憶媒体
JP2001313250A (ja) * 2000-02-25 2001-11-09 Nikon Corp 露光装置、その調整方法、及び前記露光装置を用いるデバイス製造方法
JP2004325872A (ja) * 2003-04-25 2004-11-18 Fuji Photo Film Co Ltd 露光装置及び露光方法
JP2004335864A (ja) * 2003-05-09 2004-11-25 Nikon Corp 露光装置及び露光方法
JP5184808B2 (ja) * 2007-04-03 2013-04-17 Ｎｓｋテクノロジー株式会社 露光方法及び露光装置
JP2013238670A (ja) * 2012-05-11 2013-11-28 Canon Inc 露光装置、露光方法、デバイスの製造方法及び開口板
JP6015930B2 (ja) * 2012-12-07 2016-10-26 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI221628B (en) * 2000-08-25 2004-10-01 Canon Kk Illumination system and method, exposure apparatus using the same, and liquid crystal display device manufacturing method using the same
US20070132978A1 (en) * 2005-12-08 2007-06-14 Haruna Kawashima Exposure apparatus

Also Published As

Publication number Publication date
CN107621754A (zh) 2018-01-23
TW201812460A (zh) 2018-04-01
KR20180007672A (ko) 2018-01-23
JP2018010105A (ja) 2018-01-18

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