TWI659914B - Substrate processing device - Google Patents

Substrate processing device Download PDF

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Publication number
TWI659914B
TWI659914B TW104107547A TW104107547A TWI659914B TW I659914 B TWI659914 B TW I659914B TW 104107547 A TW104107547 A TW 104107547A TW 104107547 A TW104107547 A TW 104107547A TW I659914 B TWI659914 B TW I659914B
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substrate
processing
transfer
transfer mechanism
holding member
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TW104107547A
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Chinese (zh)
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TW201601986A (en
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得永直
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日商三星鑽石工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/03Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Feeding Of Workpieces (AREA)
  • Specific Conveyance Elements (AREA)

Abstract

本發明之基板加工裝置,能夠進行高效率的基板加工。該基板加工裝置,具備有:搬送基板之搬送帶2、配置在與搬送帶2之搬送方向交叉之方向的側方且對基板進行加工之裂斷裝置3、以及相互排列配置且在搬送帶2與裂斷裝置3之間同步搬送基板之下搬送機構4及上搬送機構5。 The substrate processing apparatus of the present invention can perform substrate processing with high efficiency. This substrate processing apparatus includes a conveying belt 2 for conveying a substrate, a breaking device 3 disposed on a side of a direction intersecting with the conveying direction of the conveying belt 2 and processing the substrate, and an arrangement and arrangement on the conveying belt 2 The substrate lower conveying mechanism 4 and the upper conveying mechanism 5 are conveyed in synchronization with the breaking device 3.

Description

基板加工裝置 Substrate processing device

本發明係關於一種基板加工裝置,尤其是關於一種具備有基板之搬送機構的基板加工裝置。 The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus including a substrate transfer mechanism.

對基板形成溝槽的刻劃裝置、或分斷基板的裂斷裝置,具有保持加工用頭的樑。樑,係藉由左右的支柱呈門型狀地支承的於橫方向延伸之樑,且配置於載置被加工基板的平台上方。 A scoring device for forming a groove in a substrate, or a breaking device for cutting a substrate, has a beam that holds a processing head. The beam is a beam extending in the horizontal direction and supported in a gate shape by left and right pillars, and is arranged above a platform on which a substrate to be processed is placed.

在如此般之基板加工裝置中,載置有基板之平台以潛行於樑之下方的方式移動。而且,藉由已裝附在加工頭的工具加工基板。因此,若直列地配置刻劃裝置或裂斷裝置,構成用於對基板進行分斷的加工產線,則加工產線整體的長度將變長。 In such a substrate processing apparatus, the platform on which the substrate is placed moves so as to sneak under the beam. The substrate is processed by a tool attached to the processing head. Therefore, if a scoring device or a severing device is arranged in series to constitute a processing line for severing a substrate, the entire length of the processing line becomes longer.

因此,在專利文獻1中,在相對於依序搬送基板的第1方向正交之第2方向,配置刻劃裝置或裂斷裝置。藉由成為如此般之構成,可使加工產線小型化。 Therefore, in Patent Document 1, a scoring device or a breaking device is arranged in a second direction orthogonal to the first direction in which the substrates are sequentially transported. With such a structure, the processing line can be miniaturized.

專利文獻1:日本特開平11-116260號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 11-116260

在專利文獻1之裝置中,首先,沿第1方向對基板進行搬送,並在搬送路徑上之加工基準位置(搬送路徑上與加工位置對應之位置)停止。接著,將基板往第2方向搬送並使其位於加工裝置中的加工位置,以 進行加工。在加工後,使基板返回搬送路徑上之加工基準位置,往搬送路徑上之下游側進行搬送。 In the device of Patent Document 1, first, the substrate is transferred in the first direction, and stopped at a processing reference position (a position corresponding to the processing position on the transfer path) on the transfer path. Next, the substrate is transported in the second direction and positioned at a processing position in the processing device, so that For processing. After processing, the substrate is returned to the processing reference position on the transfer path, and is transferred to the downstream side on the transfer path.

然而,在如此般的方法中,在先完成加工的基板返回加工基準位置,直到被往搬送路徑之下游側搬送前,並無法對下一個基板進行搬送及加工處理。因此,存在有作業效率低的問題。 However, in such a method, the substrate that has been processed first is returned to the processing reference position and cannot be transferred and processed to the next substrate until it is transferred to the downstream side of the transfer path. Therefore, there is a problem that the work efficiency is low.

本發明之課題,即在於能夠高效率地對基板進行加工。 The subject of the present invention is to enable efficient processing of a substrate.

本發明之一基板加工裝置,具備有:搬送基板之第1搬送機構、配置在與第1搬送機構之搬送方向交叉之方向的側方且對基板進行加工之加工機構、以及相互排列配置且在第1搬送機構與加工機構之間搬送基板之第2搬送機構及第3搬送機構。 A substrate processing apparatus according to the present invention includes a first transfer mechanism that transfers a substrate, a processing mechanism that is disposed on a side of a direction that intersects the transfer direction of the first transfer mechanism, and processes the substrate, and is arranged and arranged in A second transfer mechanism and a third transfer mechanism that transfer substrates between the first transfer mechanism and the processing mechanism.

在該裝置中,藉由第1搬送機構搬送來的基板,藉由第2及第3搬送機構而在第1搬送機構與加工機構之間搬送。 In this device, the substrate transferred by the first transfer mechanism is transferred between the first transfer mechanism and the processing mechanism by the second and third transfer mechanisms.

此處,由於在與搬送基板的方向交叉之方向配置加工機構,因此能夠使加工產線之搬送方向之長度小型化。此外,在已加工之基板藉由第2及第3搬送機構之一方而返回第1搬送機構時,由於能夠對下一個基板藉由另一搬送機構而往加工機構進行搬送,因此能夠縮短基板之搬送及加工所花費的時間,能夠高效率地對基板進行加工。 Here, since the processing mechanism is disposed in a direction crossing the direction in which the substrate is transported, the length of the processing line in the transport direction can be miniaturized. In addition, when the processed substrate is returned to the first transfer mechanism by one of the second and third transfer mechanisms, the next substrate can be transferred to the processing mechanism by the other transfer mechanism, so the substrate can be shortened. The time taken for transportation and processing enables efficient processing of the substrate.

在本發明之另一基板加工裝置中,第2搬送機構及第3搬送機構,對藉由第1搬送機構搬送來的未加工之基板往加工機構進行搬送,同時對已藉由加工機構加工成的基板往第1搬送機構進行搬送。 In another substrate processing apparatus of the present invention, the second transfer mechanism and the third transfer mechanism transfer the unprocessed substrate transferred by the first transfer mechanism to the processing mechanism, and at the same time process the processed substrate by the processing mechanism. The substrate is transferred to the first transfer mechanism.

在本發明之再另一基板加工裝置中,第2搬送機構及第3搬送機構,在一方之搬送機構對已加工的基板進行搬送時,另一方之搬送 機構對下一個未加工的基板進行搬送。 In still another substrate processing apparatus of the present invention, when the second transfer mechanism and the third transfer mechanism transfer the processed substrate to one transfer mechanism, the other transfer mechanism The mechanism carries the next unprocessed substrate.

在本發明之再另一基板加工裝置中,第2搬送機構及第3搬送機構,在較第1搬送機構更上方,以於上下方向排列之方式配置。 In still another substrate processing apparatus according to the present invention, the second transfer mechanism and the third transfer mechanism are arranged above the first transfer mechanism so as to be aligned in the vertical direction.

此處,能夠使各搬送機構的佔有空間變小。 Here, the space occupied by each conveyance mechanism can be made small.

在本發明之再另一基板加工裝置中,第2搬送機構及第3搬送機構,分別具有配置於第1搬送機構與加工機構之間的軌條、保持基板的保持構件、以及使保持構件升降的升降機構。而且,保持構件及升降機構沿著軌條移動。 In still another substrate processing apparatus according to the present invention, the second transfer mechanism and the third transfer mechanism each include a rail disposed between the first transfer mechanism and the processing mechanism, a holding member for holding the substrate, and a holding member for raising and lowering. Lifting mechanism. The holding member and the lifting mechanism move along the rail.

在本發明之再另一基板加工裝置中,第1搬送機構具有載置基板之搬送帶。 In still another substrate processing apparatus of the present invention, the first transfer mechanism includes a transfer belt on which the substrate is placed.

在本發明之再另一基板加工裝置中,進一步具備有在第2搬送機構和第3搬送機構之加工機構側之端部與加工機構之加工位置之間搬送基板之加工用搬送帶。 In still another substrate processing apparatus according to the present invention, there is further provided a processing transfer belt for transferring the substrate between the end portions on the processing mechanism side of the second transfer mechanism and the third transfer mechanism and the processing position of the processing mechanism.

在如以上之本發明中,能夠高效率地對基板進行加工。 In the present invention as described above, the substrate can be processed efficiently.

1‧‧‧基板加工裝置 1‧‧‧ substrate processing equipment

2‧‧‧搬送帶(第1搬送機構) 2‧‧‧ transport belt (first transport mechanism)

3‧‧‧裂斷裝置(加工裝置) 3‧‧‧ Cracking device (processing device)

4‧‧‧下搬送機構(第2搬送機構) 4‧‧‧ lower transfer mechanism (second transfer mechanism)

5‧‧‧上搬送機構(第3搬送機構) 5‧‧‧ upper transfer mechanism (third transfer mechanism)

6‧‧‧加工用搬送帶 6‧‧‧ Processing Belt

41、51‧‧‧軌條 41, 51‧‧‧ rails

42、52‧‧‧保持構件 42, 52‧‧‧ holding members

43、53‧‧‧升降機構 43, 53‧‧‧Lifting mechanism

圖1,係本發明之一實施形態之基板加工裝置的俯視圖。 FIG. 1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention.

圖2,係表示基板之加工態樣的示意圖。 FIG. 2 is a schematic view showing a processing state of a substrate.

圖3A,係表示加工動作的圖式。 FIG. 3A is a drawing showing a machining operation.

圖3B,係表示加工動作的圖式。 FIG. 3B is a drawing showing a machining operation.

圖3C,係表示加工動作的圖式。 FIG. 3C is a drawing showing a machining operation.

圖3D,係表示加工動作的圖式。 FIG. 3D is a drawing showing a machining operation.

圖1係本發明之一實施形態之基板加工裝置的俯視圖。另外,在圖1中,以示意性的方式來表示裝置整體。 FIG. 1 is a plan view of a substrate processing apparatus according to an embodiment of the present invention. In addition, in FIG. 1, the whole apparatus is shown typically.

該基板加工裝置1,係用於依序對基板進行搬送,並且使在被搬送來的基板之端部所形成端子部分露出的裝置。在該基板加工裝置1的前段,設置有未圖示的刻劃裝置及裂斷裝置。利用刻劃裝置,對一片母基板形成裂斷用之多個溝槽。此外,利用裂斷裝置,將一片母基板裂斷成多個單位基板(以下,簡記「基板」)。因此,在該基板加工裝置1中,依序搬送多個基板S。各基板S係貼合基板,且在基板S之端部(形成有端子的部分),形成有溝槽。 This substrate processing apparatus 1 is a device for sequentially transferring a substrate and exposing a terminal portion formed on an end portion of the transferred substrate. A scribing device and a breaking device (not shown) are provided at a front stage of the substrate processing apparatus 1. Using a scoring device, a plurality of trenches for cracking are formed on one mother substrate. In addition, a mother substrate is fractured into a plurality of unit substrates by a breaking device (hereinafter, abbreviated as "substrate"). Therefore, in this substrate processing apparatus 1, a plurality of substrates S are sequentially conveyed. Each substrate S is a bonded substrate, and a groove is formed at an end portion (a portion where a terminal is formed) of the substrate S.

基板加工裝置1,具有搬送帶(第1搬送機構)2、多個裂斷裝置3、分別為多個的下搬送機構(第2搬送機構)4及上搬送機構(第3搬送機構)5、以及加工用搬送帶6。 The substrate processing apparatus 1 includes a conveying belt (first conveying mechanism) 2, a plurality of breaking devices 3, a plurality of lower conveying mechanisms (second conveying mechanism) 4, and an upper conveying mechanism (third conveying mechanism) 5, And processing conveyor belt 6.

搬送帶2,在圖1中,對多個基板S往第1方向(圖之左右方向)進行搬送。此處,從圖1之左方搬入的基板S,藉由裂斷裝置3加工,並往右方向搬出。 The conveyance belt 2 conveys a plurality of substrates S in the first direction (the left-right direction in the drawing) in FIG. 1. Here, the board | substrate S carried in from the left side of FIG. 1 is processed by the breaking device 3, and is carried out to the right.

裂斷裝置3,在搬送帶2之搬送方向下游側,配置在搬送帶2兩側。更詳細而言,在搬送帶2之一側,以於搬送方向排列之方式配置有3台裂斷裝置3,在搬送帶2之另一側,以於搬送方向排列之方式配置有3台裂斷裝置3。各裂斷裝置3,如於圖2放大表示一部分般,從上方按壓基板S之端部,去除基板S之端部之下層部分。藉此,形成於基板S端部的端子部分露出。 The breaking device 3 is disposed on both sides of the conveying belt 2 on the downstream side in the conveying direction of the conveying belt 2. More specifically, three splitting devices 3 are arranged on one side of the conveying belt 2 so as to be aligned in the conveying direction, and three splitting devices are arranged on the other side of the conveying belt 2 so as to be aligned in the conveying direction.断 装置 3。 Off device 3. Each of the breaking devices 3 presses an end portion of the substrate S from above as shown in FIG. 2 in an enlarged manner, and removes a portion below the end portion of the substrate S. Thereby, the terminal portion formed on the end portion of the substrate S is exposed.

下搬送機構4及上搬送機構5,對藉由搬送帶2搬送來的基板S及藉由裂斷裝置3加工成的基板S,往與第1方向正交之第2方向進行搬送。下搬送機構4及上搬送機構5,如圖1及圖3A~圖3D所示般,在搬送帶2及加工用搬送帶6之上方,以於上下方向排列之方式配置。在圖1中,下搬送機構4之一部分(具體而言即軌條),與上搬送機構5重疊,並未加以表示。 The lower transfer mechanism 4 and the upper transfer mechanism 5 transfer the substrate S transferred by the transfer belt 2 and the substrate S processed by the breaking device 3 in a second direction orthogonal to the first direction. As shown in FIGS. 1 and 3A to 3D, the lower conveying mechanism 4 and the upper conveying mechanism 5 are arranged above the conveying belt 2 and the processing conveying belt 6 so as to be aligned in the vertical direction. In FIG. 1, a part of the lower conveying mechanism 4 (specifically, a rail) overlaps the upper conveying mechanism 5 and is not shown.

下搬送機構4,具有一對軌條41、保持構件42、及升降機構43。一對軌條41配置在搬送帶2與裂斷裝置3之間。保持構件42及升降機構43,沿一對軌條41移動。保持構件42,例如藉由真空吸附而將基板S保持於下面。升降機構43,例如具有齒條‧小齒輪(rack-and-pinion)機構,使保持構件42升降。保持構件42之搬送方向之寬度,較一對軌條41間之距離短。 The lower conveyance mechanism 4 includes a pair of rails 41, a holding member 42, and a lifting mechanism 43. A pair of rails 41 are arranged between the conveying belt 2 and the breaking device 3. The holding member 42 and the lifting mechanism 43 move along a pair of rails 41. The holding member 42 holds the substrate S under the surface by, for example, vacuum suction. The elevating mechanism 43 includes, for example, a rack-and-pinion mechanism to elevate the holding member 42. The width in the carrying direction of the holding member 42 is shorter than the distance between the pair of rails 41.

上搬送機構5,亦為與下搬送機構4完全同樣之構成,具有一對軌條51、保持構件52、及升降機構53。另外,如上述般,由於保持構件52之搬送方向之寬度,較一對軌條51間之距離短,因此上搬送機構5之保持構件52,能夠通過下搬送機構4之一對軌條41間而進行升降。 The upper conveyance mechanism 5 has the same configuration as the lower conveyance mechanism 4, and includes a pair of rails 51, a holding member 52, and a lifting mechanism 53. In addition, as described above, since the width in the conveying direction of the holding member 52 is shorter than the distance between the pair of rails 51, the holding member 52 of the upper conveying mechanism 5 can pass between one of the rails 41 through the lower conveying mechanism 4. Lifting.

[加工動作] [Processing action]

圖3A~圖3D,揭示有對藉由搬送帶2而搬送至加工基準位置的基板S進行加工時之動作。此處,所謂的「加工基準位置」,係在搬送帶2上,與在裂斷裝置3中實際進行加工的位置在搬送方向為相同的位置。另外,在以下,將說明一個裂斷裝置3之加工動作,而在其他所有的裂斷裝置3中, 亦實行完全同樣的加工動作。 FIGS. 3A to 3D show operations during processing of the substrate S that has been transferred to the processing reference position by the transfer belt 2. Here, the so-called “processing reference position” is on the conveyance belt 2 and is the same position in the conveying direction as the position where processing is actually performed in the breaking device 3. In addition, in the following, the processing operation of one breaking device 3 will be described, and in all other breaking devices 3, The exact same machining operation is also performed.

一旦基板S搬送至加工基準位置,則暫時停止搬送帶2之搬送。然後,使下搬送機構4之保持構件42位於基板S之正上方(圖3A-a)。接著,藉由升降機構43使保持構件42下降,藉由保持構件42吸附基板S(圖3A-b)。 Once the substrate S is transferred to the processing reference position, the transfer of the transfer belt 2 is temporarily stopped. Then, the holding member 42 of the lower transport mechanism 4 is positioned directly above the substrate S (FIGS. 3A-a). Next, the holding member 42 is lowered by the lifting mechanism 43, and the substrate S is sucked by the holding member 42 (FIGS. 3A-b).

在如此之狀態下,使保持構件42上升而將基板S從搬送帶2抬起,並使保持構件42沿軌條41移動,而使其位於加工用搬送帶6之上方。另外,此時,使基板S移動至加工用搬送帶6之裂斷裝置3側之端部(圖3A-c)。然後,使保持構件42下降,將基板S載置於加工用搬送帶6(圖3A-d)。 In this state, the holding member 42 is raised to lift the substrate S from the conveyance belt 2, and the holding member 42 is moved along the rail 41 to be positioned above the processing conveyance belt 6. In addition, at this time, the board | substrate S is moved to the edge part on the side of the breaking device 3 of the processing conveyance belt 6 (FIG. 3A-c). Then, the holding member 42 is lowered, and the substrate S is placed on the processing conveyor 6 (FIGS. 3A-d).

之後,解除保持構件42對基板S之吸附並使保持構件42上升,同時驅動加工用搬送帶6而使基板S往裂斷裝置3之加工位置移動(圖3A-e)。在裂斷裝置3中,如圖2所示,從上方按壓基板S,裂斷基板S之端部而使端子部分露出。 Thereafter, the holding member 42 is released from the suction of the substrate S and the holding member 42 is lifted, and the processing conveyor 6 is driven to move the substrate S to the processing position of the breaking device 3 (FIGS. 3A to 3E). In the breaking device 3, as shown in FIG. 2, the substrate S is pressed from above, and the end portion of the substrate S is broken to expose the terminal portion.

當完成加工時,藉由加工用搬送帶6,使完成加工之基板S從裂斷裝置3之加工位置返回至下搬送機構4之下方位置(圖3B-a)。另外,在該時點,將下一個未加工基板S進行搬送至加工基準位置(圖3B-a)。 When the processing is completed, the processed substrate S is returned from the processing position of the breaking device 3 to the lower position of the lower transfer mechanism 4 by the processing conveying belt 6 (FIG. 3B-a). At this point, the next unprocessed substrate S is transferred to the processing reference position (FIG. 3B-a).

接著,使下搬送機構4之保持構件42下降並吸附已完成加工之基板S(圖3B-b)。此外,與此同時地,使上搬送機構5之保持構件52下降並吸附未加工基板S(圖3B-b)。然後,使下搬送機構4之保持構件42上升而將已完成加工之基板S從加工用搬送帶6抬起,並且使上搬送機構5之保持構件52上升而將未加工基板S從搬送帶2抬起(圖3B-c)。 Next, the holding member 42 of the lower conveyance mechanism 4 is lowered and sucks the processed substrate S (FIG. 3B-b). In addition, at the same time, the holding member 52 of the upper conveyance mechanism 5 is lowered and sucks the raw substrate S (FIG. 3B-b). Then, the holding member 42 of the lower conveying mechanism 4 is raised to lift the processed substrate S from the processing conveyance belt 6, and the holding member 52 of the upper conveying mechanism 5 is raised to lift the unprocessed substrate S from the conveying belt 2. Lift up (Figure 3B-c).

之後,使下搬送機構4之保持構件42往加工基準位置移動, 同時使上搬送機構5之保持構件52往加工用搬送帶6之上方移動(圖3B-d)。此時,與上述同樣地,使未加工基板S移動至加工用搬送帶6之裂斷裝置3側之端部。然後,使下搬送機構4之保持構件42下降而將已完成加工之基板S載置於搬送帶2上,並且使上搬送機構5之保持構件52下降而將未加工基板S載置於加工用搬送帶6(圖3B-e)。 After that, the holding member 42 of the lower conveying mechanism 4 is moved to the processing reference position. At the same time, the holding member 52 of the upper conveying mechanism 5 is moved above the processing conveying belt 6 (FIGS. 3B-d). At this time, as described above, the unprocessed substrate S is moved to the end portion on the side of the breaking device 3 of the processing transport belt 6. Then, the holding member 42 of the lower transfer mechanism 4 is lowered to place the processed substrate S on the transfer belt 2, and the holding member 52 of the upper transfer mechanism 5 is lowered to place the unprocessed substrate S on the processing Transport belt 6 (Fig. 3B-e).

接著,解除上搬送機構5之保持構件52對未加工基板S之吸附並使保持構件52上升,並且驅動加工用搬送帶6而使未加工基板S往裂斷裝置3之加工位置移動(圖3C-a)。然後,與上述同樣地,使裂斷裝置3作動,裂斷基板S之端部,使端子部分露出。 Next, the holding member 52 of the upper conveying mechanism 5 is released from the suction of the unprocessed substrate S and the holding member 52 is raised, and the processing conveyance belt 6 is driven to move the unprocessed substrate S to the processing position of the breaking device 3 (FIG. 3C). -a). Then, in the same manner as described above, the breaking device 3 is operated to break the end portion of the substrate S and expose the terminal portion.

當完成加工時,藉由加工用搬送帶6,使完成加工之基板S從裂斷裝置3之加工位置返回至上搬送機構5之下方位置(圖3C-b)。另外,在該時點,將下一個未加工基板S進行搬送至加工基準位置(圖3C-b)。 When the processing is completed, the processed substrate S is returned from the processing position of the breaking device 3 to the lower position of the upper conveying mechanism 5 by the processing conveying belt 6 (FIG. 3C-b). At this point, the next unprocessed substrate S is transferred to the processing reference position (FIG. 3C-b).

接著,使上搬送機構5之保持構件52下降並吸附已完成加工之基板S,並且使下搬送機構4之保持構件42下降並吸附下一個未加工基板S(圖3C-c)。然後,使上搬送機構5之保持構件52上升而將已完成加工之基板S從加工用搬送帶6抬起,並且使下搬送機構4之保持構件42上升而將下一個未加工基板S從搬送帶2抬起(圖3C-d)。 Next, the holding member 52 of the upper conveying mechanism 5 is lowered and sucks the processed substrate S, and the holding member 42 of the lower conveying mechanism 4 is lowered and sucks the next unprocessed substrate S (FIG. 3C-c). Then, the holding member 52 of the upper conveying mechanism 5 is raised to lift the processed substrate S from the processing conveyance belt 6, and the holding member 42 of the lower conveying mechanism 4 is lifted to convey the next unprocessed substrate S from the conveyance. The belt 2 is lifted (Fig. 3C-d).

之後,使上搬送機構5之保持構件52往加工基準位置移動,同時使下搬送機構4之保持構件42往加工用搬送帶6之上方移動(圖3C-e)。然後,使上搬送機構5之保持構件52下降而將已完成加工之基板S載置於搬送帶2上,並且使下搬送機構4之保持構件42下降而將下一個未加工基板S載置於加工用搬送帶6(圖3D-a)。 After that, the holding member 52 of the upper conveying mechanism 5 is moved to the processing reference position, and the holding member 42 of the lower conveying mechanism 4 is moved above the processing conveying belt 6 (FIG. 3C-e). Then, the holding member 52 of the upper transfer mechanism 5 is lowered to place the processed substrate S on the transfer belt 2, and the holding member 42 of the lower transfer mechanism 4 is lowered to place the next unprocessed substrate S. Processing conveyor belt 6 (Fig. 3D-a).

藉由反覆實行以上之處理,能夠對依序搬送來的基板S,以減少待機時間之方式進行加工。因此,能夠效率佳地進行搬送及加工,能夠縮短整體之加工時間。 By repeatedly performing the above processing, it is possible to process the substrates S that have been sequentially transferred, so as to reduce standby time. Therefore, conveyance and processing can be performed efficiently, and the overall processing time can be shortened.

[其他實施形態] [Other embodiments]

本發明並不限定於如以上般之實施形態,可在不脫離本發明之範圍的情形下,進行各種變形或修改。 The present invention is not limited to the embodiments described above, and various modifications or changes can be made without departing from the scope of the present invention.

(a)在上述實施形態中,雖已針對在搬送帶兩側配置有裂斷裝置的情形進行了說明,但在僅於單側配置有裂斷裝置的情形,亦能夠同樣地適用本發明。此外,裂斷裝置之個數,亦不限定於上述實施形態。 (a) In the above-mentioned embodiment, although the case where a breaking device was arrange | positioned on both sides of a conveyance belt was demonstrated, this invention can be applied similarly also when the breaking device is arrange | positioned only on one side. In addition, the number of the breaking devices is not limited to the above embodiment.

(b)在上述實施形態中,雖已針對作為加工機構而以裂斷裝置為例進行了說明,但即使是其他的例如刻劃裝置,亦同樣地能夠適用本發明。 (b) In the embodiment described above, the splitting device has been described as an example of a processing mechanism. However, the present invention can be similarly applied to other scoring devices, for example.

(c)下搬送機構及上搬送機構之具體的構成並不限定於上述實施形態。 (c) The specific configurations of the lower conveyance mechanism and the upper conveyance mechanism are not limited to the above embodiments.

Claims (6)

一種基板加工裝置,其特徵在於,具備有:搬送基板之第1搬送機構、配置在與該第1搬送機構之搬送方向交叉之方向的側方且對該基板進行加工之加工機構、以及相互排列配置且在該第1搬送機構與該加工機構之間搬送基板之第2搬送機構及第3搬送機構,該第2搬送機構及該第3搬送機構,在較該第1搬送機構更上方,以於上下方向彼此一部分重合的方式排列配置。A substrate processing apparatus comprising a first transfer mechanism for transferring a substrate, a processing mechanism disposed on a side of a direction intersecting with a transfer direction of the first transfer mechanism, and processing the substrate, and an array thereof The second transfer mechanism and the third transfer mechanism which are arranged and transfer the substrate between the first transfer mechanism and the processing mechanism, and the second transfer mechanism and the third transfer mechanism are above the first transfer mechanism, and They are arranged in such a manner that they overlap each other in the up-down direction. 如申請專利範圍第1項之基板加工裝置,其中,該第2搬送機構及該第3搬送機構,對藉由該第1搬送機構搬送來的未加工之基板往該加工機構進行搬送,且對已藉由該加工機構加工成的基板往該第1搬送機構進行搬送。For example, the substrate processing apparatus of the first scope of the patent application, wherein the second transfer mechanism and the third transfer mechanism transfer unprocessed substrates transferred by the first transfer mechanism to the processing mechanism, and The substrate processed by the processing mechanism is transferred to the first transfer mechanism. 如申請專利範圍第1或2項之基板加工裝置,其中,該第2搬送機構及該第3搬送機構,在一方之搬送機構對已加工的基板進行搬送時,另一方之搬送機構對下一個未加工的基板進行搬送。For example, if the substrate processing device of the scope of the patent application is No. 1 or 2, the second transfer mechanism and the third transfer mechanism transfer the processed substrate to one transfer mechanism and the other transfer mechanism to the next Raw substrates are transported. 如申請專利範圍第1或2項之基板加工裝置,其中,該第2搬送機構及該第3搬送機構,分別具有:配置於該第1搬送機構與該加工機構之間的軌條、保持基板的保持構件、以及使該保持構件升降的升降機構;該保持構件及該升降機構沿著該軌條移動。For example, the substrate processing device of the scope of application for patents 1 or 2, wherein the second transfer mechanism and the third transfer mechanism each have a rail and a substrate disposed between the first transfer mechanism and the processing mechanism. A holding member and a lifting mechanism for lifting the holding member; the holding member and the lifting mechanism move along the rail. 如申請專利範圍第1或2項之基板加工裝置,其中,該第1搬送機構具有載置基板之搬送帶。For example, the substrate processing apparatus of the first or second patent application scope, wherein the first transfer mechanism has a transfer belt on which the substrate is placed. 如申請專利範圍第1或2項之基板加工裝置,其進一步具備有:加工用搬送帶,係在該第2搬送機構及該第3搬送機構之該加工機構側之端部與該加工機構之加工位置之間搬送基板。For example, the substrate processing apparatus for which the scope of the patent application is item 1 or 2 further includes: a processing belt, which is located at the end of the processing mechanism side of the second and third transport mechanisms and the processing mechanism. The substrate is transferred between processing positions.
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