TWI644078B - 狹縫光源及具有狹縫光源的視覺檢查裝置 - Google Patents

狹縫光源及具有狹縫光源的視覺檢查裝置 Download PDF

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Publication number
TWI644078B
TWI644078B TW105138656A TW105138656A TWI644078B TW I644078 B TWI644078 B TW I644078B TW 105138656 A TW105138656 A TW 105138656A TW 105138656 A TW105138656 A TW 105138656A TW I644078 B TWI644078 B TW I644078B
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TW
Taiwan
Prior art keywords
slit
light
light source
optical system
cylindrical lens
Prior art date
Application number
TW105138656A
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English (en)
Chinese (zh)
Other versions
TW201719114A (zh
Inventor
柳弘俊
李明國
裵秀珉
Original Assignee
南韓商宰體有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 南韓商宰體有限公司 filed Critical 南韓商宰體有限公司
Publication of TW201719114A publication Critical patent/TW201719114A/zh
Application granted granted Critical
Publication of TWI644078B publication Critical patent/TWI644078B/zh

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8812Diffuse illumination, e.g. "sky"
    • G01N2021/8816Diffuse illumination, e.g. "sky" by using multiple sources, e.g. LEDs
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/063Illuminating optical parts
    • G01N2201/0634Diffuse illumination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/06Illumination; Optics
    • G01N2201/063Illuminating optical parts
    • G01N2201/0638Refractive parts
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/10Image acquisition modality
    • G06T2207/10004Still image; Photographic image
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Quality & Reliability (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW105138656A 2015-11-27 2016-11-24 狹縫光源及具有狹縫光源的視覺檢查裝置 TWI644078B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20150167170 2015-11-27
??10-2015-0167170 2015-11-27

Publications (2)

Publication Number Publication Date
TW201719114A TW201719114A (zh) 2017-06-01
TWI644078B true TWI644078B (zh) 2018-12-11

Family

ID=58764246

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105138656A TWI644078B (zh) 2015-11-27 2016-11-24 狹縫光源及具有狹縫光源的視覺檢查裝置

Country Status (3)

Country Link
KR (1) KR20170062380A (ko)
TW (1) TWI644078B (ko)
WO (1) WO2017090922A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107990215A (zh) * 2017-12-11 2018-05-04 苏州大学 线光源的聚光结构、光源系统及应用
KR20200015049A (ko) * 2018-08-02 2020-02-12 (주)제이티 슬릿광원 및 이를 포함하는 비전검사장치
CN111595779A (zh) * 2020-05-11 2020-08-28 中国科学院西安光学精密机械研究所 一种具有净化光路功能的免调试狭缝光源模块

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4186431A (en) * 1978-04-28 1980-01-29 Westinghouse Electric Corp. Linear light source
US4232359A (en) * 1979-04-09 1980-11-04 Berkey-Colortran, Inc. Spotlight or other illuminator
US5020891A (en) * 1988-09-14 1991-06-04 Washington University Single aperture confocal scanning biomicroscope and kit for converting single lamp biomicroscope thereto
US5099354A (en) * 1988-09-14 1992-03-24 Washington University Kit for converting a slit lamp biomicroscope into a single aperture confocal scanning biomicroscope
US6862097B2 (en) * 2002-07-04 2005-03-01 Murata Manufacturing Co., Ltd. Three-dimensional shape measuring method, and three-dimensional shape measuring apparatus
KR20140081159A (ko) * 2012-12-21 2014-07-01 에이티아이 주식회사 실린더 랜즈 및 라인광 폭 조절수단을 구비한 광삼각법 측정장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100760214B1 (ko) * 2006-08-04 2007-09-20 진 호 정 웨이퍼 검사용 광학계
US8154810B2 (en) * 2009-07-16 2012-04-10 Microscan Systems, Inc. Optical assemblies for adjusting working distance and field of view in an imaging system
KR20110017158A (ko) * 2009-08-13 2011-02-21 (주) 인텍플러스 광삼각법을 이용한 측정장치 및 측정방법
KR101517929B1 (ko) * 2013-06-28 2015-05-06 (주)가람이앤씨 논스톱 부품 검사가 가능한 고속 로봇비전 장치

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4186431A (en) * 1978-04-28 1980-01-29 Westinghouse Electric Corp. Linear light source
US4232359A (en) * 1979-04-09 1980-11-04 Berkey-Colortran, Inc. Spotlight or other illuminator
US5020891A (en) * 1988-09-14 1991-06-04 Washington University Single aperture confocal scanning biomicroscope and kit for converting single lamp biomicroscope thereto
US5099354A (en) * 1988-09-14 1992-03-24 Washington University Kit for converting a slit lamp biomicroscope into a single aperture confocal scanning biomicroscope
US6862097B2 (en) * 2002-07-04 2005-03-01 Murata Manufacturing Co., Ltd. Three-dimensional shape measuring method, and three-dimensional shape measuring apparatus
KR20140081159A (ko) * 2012-12-21 2014-07-01 에이티아이 주식회사 실린더 랜즈 및 라인광 폭 조절수단을 구비한 광삼각법 측정장치

Also Published As

Publication number Publication date
TW201719114A (zh) 2017-06-01
WO2017090922A1 (ko) 2017-06-01
KR20170062380A (ko) 2017-06-07

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