TWI639155B - 儲存元件、儲存裝置及磁頭 - Google Patents

儲存元件、儲存裝置及磁頭 Download PDF

Info

Publication number
TWI639155B
TWI639155B TW103134937A TW103134937A TWI639155B TW I639155 B TWI639155 B TW I639155B TW 103134937 A TW103134937 A TW 103134937A TW 103134937 A TW103134937 A TW 103134937A TW I639155 B TWI639155 B TW I639155B
Authority
TW
Taiwan
Prior art keywords
layer
storage
magnetization
storage element
magnetic
Prior art date
Application number
TW103134937A
Other languages
English (en)
Chinese (zh)
Other versions
TW201532040A (zh
Inventor
Kazutaka Yamane
山根一陽
Masanori Hosomi
細見政功
Hiroyuki Ohmori
大森廣之
Kazuhiro Bessho
別所和宏
Yutaka Higo
肥後豊
Hiroyuki Uchida
內田裕行
Original Assignee
Sony Corporation
新力股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corporation, 新力股份有限公司 filed Critical Sony Corporation
Publication of TW201532040A publication Critical patent/TW201532040A/zh
Application granted granted Critical
Publication of TWI639155B publication Critical patent/TWI639155B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/80—Constructional details
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165—Auxiliary circuits
    • G11C11/1675—Writing or programming circuits or methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/123—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys having a L10 crystallographic structure, e.g. [Co,Fe][Pt,Pd] thin films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3286—Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/80—Constructional details
    • H10N50/85—Materials of the active region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/329—Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Hall/Mr Elements (AREA)
  • Magnetic Heads (AREA)
TW103134937A 2013-10-28 2014-10-07 儲存元件、儲存裝置及磁頭 TWI639155B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-223352 2013-10-28
JP2013223352A JP6194752B2 (ja) 2013-10-28 2013-10-28 記憶素子、記憶装置、磁気ヘッド

Publications (2)

Publication Number Publication Date
TW201532040A TW201532040A (zh) 2015-08-16
TWI639155B true TWI639155B (zh) 2018-10-21

Family

ID=51866293

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103134937A TWI639155B (zh) 2013-10-28 2014-10-07 儲存元件、儲存裝置及磁頭

Country Status (5)

Country Link
US (1) US9818932B2 (enExample)
JP (1) JP6194752B2 (enExample)
CN (1) CN105684178B (enExample)
TW (1) TWI639155B (enExample)
WO (1) WO2015064049A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102451098B1 (ko) 2015-09-23 2022-10-05 삼성전자주식회사 자기 메모리 장치 및 이의 제조 방법
WO2017086481A1 (ja) * 2015-11-18 2017-05-26 国立大学法人東北大学 磁気トンネル接合素子及び磁気メモリ
US10490732B2 (en) 2016-03-11 2019-11-26 Toshiba Memory Corporation Magnetic memory device with sidewall layer containing boron and manufacturing method thereof
JP2017195269A (ja) * 2016-04-20 2017-10-26 ソニー株式会社 磁気記憶素子
JP2018032805A (ja) * 2016-08-26 2018-03-01 ソニー株式会社 磁気抵抗素子及び電子デバイス
TWI688131B (zh) * 2016-09-14 2020-03-11 日商東芝記憶體股份有限公司 半導體裝置
WO2018134929A1 (ja) * 2017-01-18 2018-07-26 国立大学法人東北大学 磁気抵抗効果素子、磁気メモリ及び磁気抵抗効果素子の製造方法
JP2020068214A (ja) * 2017-02-28 2020-04-30 Tdk株式会社 強磁性多層膜、磁気抵抗効果素子、及び強磁性多層膜を製造する方法
US9911483B1 (en) 2017-03-21 2018-03-06 International Business Machines Corporation Thermally-assisted spin transfer torque memory with improved bit error rate performance
JP2019054095A (ja) 2017-09-14 2019-04-04 東芝メモリ株式会社 磁気抵抗素子
US10727401B2 (en) * 2017-11-10 2020-07-28 Taiwan Semiconductor Manufacturing Co., Ltd. Magnetic random access memory
CN113517015B (zh) * 2021-04-29 2024-05-14 中国科学院上海微系统与信息技术研究所 一种实现存储单元多级存储的方法及装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1970911B1 (en) 2007-03-15 2010-06-16 Sony Corporation Spin-polarised current driven magnetic memory device and memory
CN102376873A (zh) 2010-08-19 2012-03-14 索尼公司 磁存储器元件
US8374025B1 (en) 2007-02-12 2013-02-12 Avalanche Technology, Inc. Spin-transfer torque magnetic random access memory (STTMRAM) with laminated free layer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6130814A (en) 1998-07-28 2000-10-10 International Business Machines Corporation Current-induced magnetic switching device and memory including the same
JP2003017782A (ja) 2001-07-04 2003-01-17 Rikogaku Shinkokai キャリヤスピン注入磁化反転型磁気抵抗効果膜と該膜を用いた不揮発性メモリー素子及び該素子を用いたメモリー装置
US20070297220A1 (en) * 2006-06-22 2007-12-27 Masatoshi Yoshikawa Magnetoresistive element and magnetic memory
JP2008028362A (ja) * 2006-06-22 2008-02-07 Toshiba Corp 磁気抵抗素子及び磁気メモリ
US20090218645A1 (en) * 2007-02-12 2009-09-03 Yadav Technology Inc. multi-state spin-torque transfer magnetic random access memory
DE102007007874A1 (de) * 2007-02-14 2008-08-21 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Silane
JP2009239121A (ja) * 2008-03-27 2009-10-15 Toshiba Corp 磁気抵抗効果素子及び磁気ランダムアクセスメモリ
US8223533B2 (en) * 2008-09-26 2012-07-17 Kabushiki Kaisha Toshiba Magnetoresistive effect device and magnetic memory
JP5203871B2 (ja) * 2008-09-26 2013-06-05 株式会社東芝 磁気抵抗効果素子及び磁気メモリ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8374025B1 (en) 2007-02-12 2013-02-12 Avalanche Technology, Inc. Spin-transfer torque magnetic random access memory (STTMRAM) with laminated free layer
EP1970911B1 (en) 2007-03-15 2010-06-16 Sony Corporation Spin-polarised current driven magnetic memory device and memory
CN102376873A (zh) 2010-08-19 2012-03-14 索尼公司 磁存储器元件

Also Published As

Publication number Publication date
TW201532040A (zh) 2015-08-16
JP6194752B2 (ja) 2017-09-13
JP2015088520A (ja) 2015-05-07
US20160268496A1 (en) 2016-09-15
CN105684178A (zh) 2016-06-15
US9818932B2 (en) 2017-11-14
CN105684178B (zh) 2019-02-01
WO2015064049A1 (en) 2015-05-07

Similar Documents

Publication Publication Date Title
US10217501B2 (en) Memory element and memory apparatus
TWI530945B (zh) Memory elements and memory devices
CN103151454B (zh) 存储元件和存储设备
US10692521B2 (en) Storage element
CN106887247B (zh) 信息存储元件和存储装置
JP6194752B2 (ja) 記憶素子、記憶装置、磁気ヘッド
TWI487155B (zh) Memory elements and memory devices
JP5987613B2 (ja) 記憶素子、記憶装置、磁気ヘッド
US9196336B2 (en) Storage cell, storage device, and magnetic head
JPWO2013153942A1 (ja) 磁気抵抗効果素子および磁気メモリ
CN102403038B (zh) 存储元件和存储器件
JP2013115319A (ja) 記憶素子、記憶装置
CN103137853A (zh) 存储元件和存储设备
CN103137854A (zh) 存储元件和存储装置
TW201222546A (en) Memory element and memory device
JP2017212464A (ja) 記憶素子、記憶装置、磁気ヘッド

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees