TWI627503B - 活性能量線硬化型樹脂組成物、及使用其之顯示元件用間隔物及／或彩色濾光片保護膜 - Google Patents

活性能量線硬化型樹脂組成物、及使用其之顯示元件用間隔物及／或彩色濾光片保護膜 Download PDF

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Publication number
TWI627503B
TWI627503B TW103141305A TW103141305A TWI627503B TW I627503 B TWI627503 B TW I627503B TW 103141305 A TW103141305 A TW 103141305A TW 103141305 A TW103141305 A TW 103141305A TW I627503 B TWI627503 B TW I627503B
Authority
TW
Taiwan
Prior art keywords
compound
meth
acid
acrylate
resin composition
Prior art date
Application number
TW103141305A
Other languages
English (en)
Chinese (zh)
Other versions
TW201527884A (zh
Inventor
Kazuyoshi Yamamoto
Kazumi Obuchi
Original Assignee
Nipponkayaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nipponkayaku Kk filed Critical Nipponkayaku Kk
Publication of TW201527884A publication Critical patent/TW201527884A/zh
Application granted granted Critical
Publication of TWI627503B publication Critical patent/TWI627503B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)
  • Epoxy Resins (AREA)
TW103141305A 2013-11-28 2014-11-28 活性能量線硬化型樹脂組成物、及使用其之顯示元件用間隔物及／或彩色濾光片保護膜 TWI627503B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013246536 2013-11-28

Publications (2)

Publication Number Publication Date
TW201527884A TW201527884A (zh) 2015-07-16
TWI627503B true TWI627503B (zh) 2018-06-21

Family

ID=53199085

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103141305A TWI627503B (zh) 2013-11-28 2014-11-28 活性能量線硬化型樹脂組成物、及使用其之顯示元件用間隔物及／或彩色濾光片保護膜

Country Status (5)

Country Link
JP (1) JP6506175B2 (ja)
KR (1) KR102255619B1 (ja)
CN (1) CN105745576B (ja)
TW (1) TWI627503B (ja)
WO (1) WO2015080146A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201227173A (en) * 2010-12-24 2012-07-01 Cheil Ind Inc Photosensitive resin composition and color filter using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2582884B2 (ja) * 1988-12-27 1997-02-19 タムラ化研株式会社 感光性樹脂組成物
JP2582883B2 (ja) * 1988-12-27 1997-02-19 タムラ化研株式会社 感光性樹脂組成物
JPH02209912A (ja) * 1989-02-10 1990-08-21 Nippon Kayaku Co Ltd 不飽和基含有ポリカルボン酸樹脂、これを含む樹脂組成物及びソルダーレジスト樹脂組成物
JP2676422B2 (ja) * 1990-06-19 1997-11-17 富士写真フイルム株式会社 光硬化性樹脂組成物
JP4150236B2 (ja) 2002-09-20 2008-09-17 太陽インキ製造株式会社 感光性樹脂組成物、及びそれらを用いたスペーサー又はカラーフィルターの形成方法
JP4276923B2 (ja) * 2003-02-27 2009-06-10 富士フイルム株式会社 光硬化性着色樹脂組成物及びそれを用いたカラーフィルター
JP3901658B2 (ja) 2003-03-31 2007-04-04 太陽インキ製造株式会社 活性エネルギー線硬化性樹脂、及びそれを用いる組成物並びに硬化物
JP4837315B2 (ja) 2005-06-29 2011-12-14 凸版印刷株式会社 フォトスペーサ用感光性樹脂組成物及びそれを用いた液晶表示装置用カラーフィルタ
JPWO2008004630A1 (ja) * 2006-07-06 2009-12-03 日本化薬株式会社 活性エネルギー線硬化型光学用組成物及び高屈折率樹脂
JP5343410B2 (ja) * 2007-06-11 2013-11-13 三菱化学株式会社 カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
JP5264691B2 (ja) * 2009-12-14 2013-08-14 日本化薬株式会社 感光性樹脂及びそれを含有する感光性樹脂組成物
JP6184087B2 (ja) * 2012-12-07 2017-08-23 日本化薬株式会社 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用スペーサー及び／またはカラーフィルター保護膜

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201227173A (en) * 2010-12-24 2012-07-01 Cheil Ind Inc Photosensitive resin composition and color filter using the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
A1 *

Also Published As

Publication number Publication date
JP6506175B2 (ja) 2019-04-24
KR102255619B1 (ko) 2021-05-25
TW201527884A (zh) 2015-07-16
CN105745576B (zh) 2019-12-17
JPWO2015080146A1 (ja) 2017-03-16
CN105745576A (zh) 2016-07-06
WO2015080146A1 (ja) 2015-06-04
KR20160090282A (ko) 2016-07-29

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