TWI612390B - 曝光裝置 - Google Patents

曝光裝置 Download PDF

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Publication number
TWI612390B
TWI612390B TW102129405A TW102129405A TWI612390B TW I612390 B TWI612390 B TW I612390B TW 102129405 A TW102129405 A TW 102129405A TW 102129405 A TW102129405 A TW 102129405A TW I612390 B TWI612390 B TW I612390B
Authority
TW
Taiwan
Prior art keywords
exposure
substrate
guide
guiding
exposure apparatus
Prior art date
Application number
TW102129405A
Other languages
English (en)
Chinese (zh)
Other versions
TW201423281A (zh
Inventor
克勞斯 朱格
漢斯 歐泡爾
Original Assignee
克奧哈貝特技術公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 克奧哈貝特技術公司 filed Critical 克奧哈貝特技術公司
Publication of TW201423281A publication Critical patent/TW201423281A/zh
Application granted granted Critical
Publication of TWI612390B publication Critical patent/TWI612390B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
TW102129405A 2012-09-04 2013-08-16 曝光裝置 TWI612390B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012108211.1A DE102012108211A1 (de) 2012-09-04 2012-09-04 Belichtungsanlage
??102012108211.1 2012-09-04

Publications (2)

Publication Number Publication Date
TW201423281A TW201423281A (zh) 2014-06-16
TWI612390B true TWI612390B (zh) 2018-01-21

Family

ID=49115517

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102129405A TWI612390B (zh) 2012-09-04 2013-08-16 曝光裝置

Country Status (5)

Country Link
KR (1) KR102221450B1 (de)
CN (1) CN104885011B (de)
DE (1) DE102012108211A1 (de)
TW (1) TWI612390B (de)
WO (1) WO2014037302A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200000171U (ko) 2018-07-13 2020-01-22 이선영 도로공사 표지판을 갖는 차량

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4666294A (en) * 1984-12-31 1987-05-19 Klimsch & Co Kg Apparatus for exposure of both sides of printed circuit plates
US5875023A (en) * 1997-01-31 1999-02-23 International Business Machines Corporation Dual-sided expose mechanism for web product
WO2003079419A1 (fr) * 2002-03-15 2003-09-25 Nikon Corporation Dispositif de stockage de masque, dispositif d'exposition, et procede de fabrication de dispositif
WO2011049133A1 (ja) * 2009-10-20 2011-04-28 株式会社ニコン 基板支持装置、基板支持部材、基板搬送装置、露光装置、及びデバイス製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3340653A1 (de) * 1983-11-10 1985-05-23 Hans 6250 Limburg Haus Vorrichtung zum gleichzeitigen oder aufeinanderfolgenden belichten von, auf beide seiten von leiterplatten o. dgl. aufgelegten ebenen kopiervorlagen
DE3530414C1 (de) * 1984-12-31 1986-11-27 Klimsch & Co KG, 6000 Frankfurt Vorrichtung zum doppelseitigen Belichten von Leiterplatten
DE3737830A1 (de) * 1987-11-06 1989-05-24 Du Pont Deutschland Vorrichtung zum beidseitigen bestrahlen von leiterplatten
JPH05335198A (ja) * 1992-06-02 1993-12-17 Hitachi Ltd 露光装置
KR100696160B1 (ko) * 2005-05-31 2007-03-20 지에스티 반도체장비(주) 연성 인쇄회로기판 제조용 양면 노광장치
DE102006008080A1 (de) * 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
DE102006059818B4 (de) 2006-12-11 2017-09-14 Kleo Ag Belichtungsanlage
FR2917850B1 (fr) * 2007-10-12 2009-10-16 Automa Tech Sa Machine d'exposition pour panneaux de circuit imprime
JP5451175B2 (ja) * 2009-05-15 2014-03-26 サンエー技研株式会社 露光装置
DE102009046809B4 (de) 2009-11-18 2019-11-21 Kleo Ag Belichtungsanlage
GB201019874D0 (en) * 2010-11-23 2011-01-05 Rainbow Technology Systems Ltd Improved photoimaging

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4666294A (en) * 1984-12-31 1987-05-19 Klimsch & Co Kg Apparatus for exposure of both sides of printed circuit plates
US5875023A (en) * 1997-01-31 1999-02-23 International Business Machines Corporation Dual-sided expose mechanism for web product
WO2003079419A1 (fr) * 2002-03-15 2003-09-25 Nikon Corporation Dispositif de stockage de masque, dispositif d'exposition, et procede de fabrication de dispositif
WO2011049133A1 (ja) * 2009-10-20 2011-04-28 株式会社ニコン 基板支持装置、基板支持部材、基板搬送装置、露光装置、及びデバイス製造方法

Also Published As

Publication number Publication date
KR20160003620A (ko) 2016-01-11
KR102221450B1 (ko) 2021-03-02
TW201423281A (zh) 2014-06-16
CN104885011B (zh) 2018-07-17
WO2014037302A1 (de) 2014-03-13
CN104885011A (zh) 2015-09-02
DE102012108211A1 (de) 2014-03-06

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Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees