KR102221450B1 - 노광 장치 - Google Patents

노광 장치 Download PDF

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Publication number
KR102221450B1
KR102221450B1 KR1020157008230A KR20157008230A KR102221450B1 KR 102221450 B1 KR102221450 B1 KR 102221450B1 KR 1020157008230 A KR1020157008230 A KR 1020157008230A KR 20157008230 A KR20157008230 A KR 20157008230A KR 102221450 B1 KR102221450 B1 KR 102221450B1
Authority
KR
South Korea
Prior art keywords
exposure
substrate
guide
exposure apparatus
guide surface
Prior art date
Application number
KR1020157008230A
Other languages
English (en)
Korean (ko)
Other versions
KR20160003620A (ko
Inventor
한스 오포버
클라우스 정거
Original Assignee
클레오 할프라이터테크니크 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 클레오 할프라이터테크니크 게엠베하 filed Critical 클레오 할프라이터테크니크 게엠베하
Publication of KR20160003620A publication Critical patent/KR20160003620A/ko
Application granted granted Critical
Publication of KR102221450B1 publication Critical patent/KR102221450B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
KR1020157008230A 2012-09-04 2013-09-02 노광 장치 KR102221450B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012108211.1A DE102012108211A1 (de) 2012-09-04 2012-09-04 Belichtungsanlage
DE102012108211.1 2012-09-04
PCT/EP2013/068081 WO2014037302A1 (de) 2012-09-04 2013-09-02 Belichtungsanlage

Publications (2)

Publication Number Publication Date
KR20160003620A KR20160003620A (ko) 2016-01-11
KR102221450B1 true KR102221450B1 (ko) 2021-03-02

Family

ID=49115517

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157008230A KR102221450B1 (ko) 2012-09-04 2013-09-02 노광 장치

Country Status (5)

Country Link
KR (1) KR102221450B1 (de)
CN (1) CN104885011B (de)
DE (1) DE102012108211A1 (de)
TW (1) TWI612390B (de)
WO (1) WO2014037302A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200000171U (ko) 2018-07-13 2020-01-22 이선영 도로공사 표지판을 갖는 차량

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3340653A1 (de) * 1983-11-10 1985-05-23 Hans 6250 Limburg Haus Vorrichtung zum gleichzeitigen oder aufeinanderfolgenden belichten von, auf beide seiten von leiterplatten o. dgl. aufgelegten ebenen kopiervorlagen
US4666294A (en) * 1984-12-31 1987-05-19 Klimsch & Co Kg Apparatus for exposure of both sides of printed circuit plates
DE3530414C1 (de) * 1984-12-31 1986-11-27 Klimsch & Co KG, 6000 Frankfurt Vorrichtung zum doppelseitigen Belichten von Leiterplatten
DE3737830A1 (de) * 1987-11-06 1989-05-24 Du Pont Deutschland Vorrichtung zum beidseitigen bestrahlen von leiterplatten
JPH05335198A (ja) * 1992-06-02 1993-12-17 Hitachi Ltd 露光装置
US5875023A (en) * 1997-01-31 1999-02-23 International Business Machines Corporation Dual-sided expose mechanism for web product
WO2003079419A1 (fr) * 2002-03-15 2003-09-25 Nikon Corporation Dispositif de stockage de masque, dispositif d'exposition, et procede de fabrication de dispositif
KR100696160B1 (ko) * 2005-05-31 2007-03-20 지에스티 반도체장비(주) 연성 인쇄회로기판 제조용 양면 노광장치
DE102006008080A1 (de) * 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
DE102006059818B4 (de) 2006-12-11 2017-09-14 Kleo Ag Belichtungsanlage
FR2917850B1 (fr) * 2007-10-12 2009-10-16 Automa Tech Sa Machine d'exposition pour panneaux de circuit imprime
JP5451175B2 (ja) * 2009-05-15 2014-03-26 サンエー技研株式会社 露光装置
TW201135372A (en) * 2009-10-20 2011-10-16 Nikon Corp Substrate supporting apparatus, substrate supporting member, substrate transfer apparatus, exposure apparatus, and device manufacturing method
DE102009046809B4 (de) 2009-11-18 2019-11-21 Kleo Ag Belichtungsanlage
GB201019874D0 (en) * 2010-11-23 2011-01-05 Rainbow Technology Systems Ltd Improved photoimaging

Also Published As

Publication number Publication date
KR20160003620A (ko) 2016-01-11
TW201423281A (zh) 2014-06-16
CN104885011B (zh) 2018-07-17
WO2014037302A1 (de) 2014-03-13
CN104885011A (zh) 2015-09-02
DE102012108211A1 (de) 2014-03-06
TWI612390B (zh) 2018-01-21

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E701 Decision to grant or registration of patent right
GRNT Written decision to grant