TWI608232B - 用於次表面缺陷再檢測之樣本之準備的系統與方法 - Google Patents

用於次表面缺陷再檢測之樣本之準備的系統與方法 Download PDF

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Publication number
TWI608232B
TWI608232B TW101144873A TW101144873A TWI608232B TW I608232 B TWI608232 B TW I608232B TW 101144873 A TW101144873 A TW 101144873A TW 101144873 A TW101144873 A TW 101144873A TW I608232 B TWI608232 B TW I608232B
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TW
Taiwan
Prior art keywords
defect
location
cutting
result file
electron microscope
Prior art date
Application number
TW101144873A
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English (en)
Chinese (zh)
Other versions
TW201333457A (zh
Inventor
西西里亞 坎柏契洛
蕭宏
萊爾特 麥可 梵
班傑明 詹姆士 湯瑪士 克拉克
赫許 辛哈
Original Assignee
克萊譚克公司
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Publication of TW201333457A publication Critical patent/TW201333457A/zh
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Publication of TWI608232B publication Critical patent/TWI608232B/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/31—Electron-beam or ion-beam tubes for localised treatment of objects for cutting or drilling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW101144873A 2011-11-29 2012-11-29 用於次表面缺陷再檢測之樣本之準備的系統與方法 TWI608232B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161564733P 2011-11-29 2011-11-29
US13/687,244 US9318395B2 (en) 2011-11-29 2012-11-28 Systems and methods for preparation of samples for sub-surface defect review

Publications (2)

Publication Number Publication Date
TW201333457A TW201333457A (zh) 2013-08-16
TWI608232B true TWI608232B (zh) 2017-12-11

Family

ID=48467234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101144873A TWI608232B (zh) 2011-11-29 2012-11-29 用於次表面缺陷再檢測之樣本之準備的系統與方法

Country Status (8)

Country Link
US (1) US9318395B2 (ja)
EP (1) EP2789008A4 (ja)
JP (1) JP6244307B2 (ja)
KR (1) KR101887730B1 (ja)
IL (1) IL232703B (ja)
SG (1) SG11201402475YA (ja)
TW (1) TWI608232B (ja)
WO (1) WO2013082181A1 (ja)

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US11035804B2 (en) 2017-06-28 2021-06-15 Kla Corporation System and method for x-ray imaging and classification of volume defects
CN108061736B (zh) * 2017-11-14 2020-11-13 东旭光电科技股份有限公司 使用反射电子探针对玻璃缺陷进行分析的方法

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CN1735866A (zh) * 2002-11-12 2006-02-15 Fei公司 缺陷分析仪
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CN102087985B (zh) * 2009-12-03 2013-03-13 无锡华润上华半导体有限公司 晶圆缺陷的检测方法

Also Published As

Publication number Publication date
US20130137193A1 (en) 2013-05-30
IL232703A0 (en) 2014-07-31
SG11201402475YA (en) 2014-06-27
KR20140108662A (ko) 2014-09-12
EP2789008A1 (en) 2014-10-15
KR101887730B1 (ko) 2018-08-10
JP2014534452A (ja) 2014-12-18
EP2789008A4 (en) 2015-07-22
JP6244307B2 (ja) 2017-12-06
WO2013082181A1 (en) 2013-06-06
US9318395B2 (en) 2016-04-19
TW201333457A (zh) 2013-08-16
IL232703B (en) 2018-03-29

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