TWI603919B - 用於製造太陽能電池吸光層的金屬硫屬化物奈米粒子以及其製法 - Google Patents
用於製造太陽能電池吸光層的金屬硫屬化物奈米粒子以及其製法 Download PDFInfo
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- TWI603919B TWI603919B TW103130836A TW103130836A TWI603919B TW I603919 B TWI603919 B TW I603919B TW 103130836 A TW103130836 A TW 103130836A TW 103130836 A TW103130836 A TW 103130836A TW I603919 B TWI603919 B TW I603919B
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- solution
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- metal chalcogenide
- chalcogenide
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- 239000002105 nanoparticle Substances 0.000 title claims description 83
- 229910052751 metal Inorganic materials 0.000 title claims description 69
- 239000002184 metal Substances 0.000 title claims description 69
- 150000004770 chalcogenides Chemical class 0.000 title claims description 67
- 238000000034 method Methods 0.000 title claims description 40
- 230000031700 light absorption Effects 0.000 title claims 2
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- 239000010949 copper Substances 0.000 claims description 95
- 239000011135 tin Substances 0.000 claims description 57
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- 239000002245 particle Substances 0.000 claims description 38
- 239000011669 selenium Substances 0.000 claims description 36
- 239000011701 zinc Substances 0.000 claims description 31
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 26
- 229910052717 sulfur Inorganic materials 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 23
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 claims description 22
- 239000010409 thin film Substances 0.000 claims description 21
- 229910052718 tin Inorganic materials 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 229910052711 selenium Inorganic materials 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
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- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 12
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 11
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- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 7
- -1 zinc (Zn) chalcogenide Chemical class 0.000 claims description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
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- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 6
- 239000000654 additive Substances 0.000 claims description 5
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- 229910052725 zinc Inorganic materials 0.000 claims description 5
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 150000001298 alcohols Chemical class 0.000 claims description 4
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- 150000002825 nitriles Chemical class 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 150000001336 alkenes Chemical class 0.000 claims description 3
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- 150000003003 phosphines Chemical class 0.000 claims description 3
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims description 3
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 150000003573 thiols Chemical class 0.000 claims description 3
- FXEIVSYQEOJLBU-UHFFFAOYSA-N 1-$l^{1}-selanylethanimine Chemical compound CC([Se])=N FXEIVSYQEOJLBU-UHFFFAOYSA-N 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
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- 150000004677 hydrates Chemical class 0.000 claims description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 2
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- 238000007641 inkjet printing Methods 0.000 claims description 2
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- AWTPFHXPJRMMAX-UHFFFAOYSA-N selenium;urea Chemical compound [Se].NC(N)=O AWTPFHXPJRMMAX-UHFFFAOYSA-N 0.000 claims description 2
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- 230000002194 synthesizing effect Effects 0.000 claims description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims description 2
- 150000001345 alkine derivatives Chemical class 0.000 claims 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 claims 1
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- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 11
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- 238000002441 X-ray diffraction Methods 0.000 description 7
- 229910021476 group 6 element Inorganic materials 0.000 description 7
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Classifications
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0326—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
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Description
本發明係關於用於製造太陽能電池吸光層的金屬硫屬化物奈米粒子以及其製法。
自從發展初期,人們業已使用高成本所形成的吸光層及作為半導體材料的矽(Si)製造太陽能電池。人們已發展出使用廉價吸光材料例如硫硒化銅銦鎵(CIGS)或Cu(In,Ga)(S,Se)2的薄膜太陽能電池結構,以更經濟地製造具商業利益的太陽能電池。這類CIGS系太陽能電池一般包含背電極層、N型接面部件、及P型吸光層。含有這類CIGS層之太陽能電池具有大於19%的光電轉換效率。然而,不管CIGS系薄膜太陽能電池的潛力如何,In的成本及供給不足是使用以CIGS為基礎的吸光層之薄膜太陽能電池廣泛商業應用的主要障礙。因此,急需發展不使用In或使用低價通用元素之太陽能電池。
因此就該以CIGS為基礎的吸光層之替代品而言,近來含有非常便宜的元素之銅(Cu)、鋅(Zn)、錫(Sn)、硫(S)、或硒(Se)之CZTS(Cu2ZnSn(S,Se)4)系太陽能電池業已受到重視。CZTS之直接能隙為約1.0eV至約1.5eV及吸收係數為104cm-1或更多,彼之儲量相對高,且CZTS使用廉價Sn與Zn。
在1996年,CZTS異質結光電池(hetero-junction PV batteries)首度被報告,但CZTS系太陽能電池進步的比CIGS系太陽能電池少,且CZTS系太陽能電池之光電效率為10%或更少,比CIGS系太陽能電池低得多。CZTS薄膜係藉由下列方法所製造:濺鍍法、複合濺鍍法、脈衝雷射沉積法、噴霧熱裂解法、電沉積/熱處理硫化法、電子束處理法、Cu/Zn/Sn/熱處理硫化法、及溶膠-凝膠法。
同時,PCT/US/2010-035792揭示藉由將基底上的含有CZTS/Se奈米粒子之墨液熱處理而形成薄膜。通常,當用CZTS/Se奈米粒子形成CZTS薄膜時,由於前面所形成的小結晶導致在薄膜形成過程很難擴大晶體粒徑。所以當各個晶粒很小時結晶界面擴大,因此在界面處發生電子損失導致效率衰退。
因此用於薄膜的奈米粒子必須包含Cu、Zn與Sn且不得為CZTS結晶式奈米粒子。然而由單一金屬元素構成的金屬奈米粒子可能容易被氧化而在後續的製程需要使用大量Se及高溫的去氧製程。此外,當分別將含有各種金屬之硫屬化物合成及混合時,不均勻的金屬組成比可能引
起問題。所以有發展用於含有具穩定的抗氧化性之高效率吸光層且由於均質組成而使彼之缺點減到最少的薄膜太陽能電池之技術的高度需要。
因此本發明之目的是解決前述及其他尚待解決的技術難題。
由於各式各樣精深研究及各式各樣實驗之結果,本發明之發明者發展出金屬硫屬化物奈米粒子,其含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含鋅(Zn)硫屬化物的第二相,且證實在使用該金屬硫屬化物奈米粒子製造薄膜時可阻止該薄膜中的第二相產生,該薄膜具有完全均勻的組成且藉由加入S或Se到該奈米粒子中而有穩定的抗氧化性,及最終薄膜中的第VI族元素含量增加導致優異品質的薄膜,從而完成本發明。
根據本發明一方面,本發明提供形成太陽能電池吸光層的金屬硫屬化物奈米粒子,其含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含鋅(Zn)硫屬化物的第二相。
本發明之術語「硫屬化物」意指含有第VI族元素例
如硫(S)或硒(Se)之材料。就一具體實施方式而言,該銅(Cu)-錫(Sn)硫屬化物可為CuaSnSb(1.2a3.2與2.5b4.5),與/或CuxSnSey(1.2x3.2,2.5y4.5),該含鋅(Zn)硫屬化物可為ZnS與/或ZnSe。
該構成金屬硫屬化物奈米粒子的二相獨立地存在於一個金屬硫屬化物奈米粒子中,而金屬硫屬化物奈米粒子中的金屬組成比可為在0.5Cu/(Zn+Sn)1.5與0.5Zn/Sn2.0範圍內,特別地可為在0.7Cu/(Zn+Sn)1.2與0.8Zn/Sn1.4範圍內。
該金屬硫屬化物奈米粒子之結構,即,沒有被具體限制的第一相與第二相分布形式可為該第一相與第二相均勻分布形式,如圖13至15所示。該第一相與第二相可以總體存在所以可形成複合體(complex)。或者,該金屬硫屬化物奈米粒子可具有核-殼結構,其中該第一相形成核而該第二相形成殼。
若該金屬硫屬化物奈米粒子均勻分布,當使用SEM-EDX或TEM-EDX觀測該金屬硫屬化物中的某一區域時,在該觀測區域中金屬硫屬化物奈米粒子之金屬組成比可被測定為在0.5Cu/(Zn+Sn)1.5與0.5Zn/Sn2.0範圍內,特別地可被測定為在0.7Cu/(Zn+Sn)1.2與0.8Zn/Sn1.4範圍內。
當該金屬硫屬化物奈米粒子具有核-殼結構時,該核之直徑可為5nm到200nm而該殼之厚度可為1nm到100nm,係在和佔有該奈米粒子的第一相與第二相之體積
相對應的考慮到核之直徑的範圍內。
在該範圍之外,當該核之粒徑太大時,形成該殼的金屬硫屬化物奈米粒子太大,所以在厚度為1微米到2微米之最終薄膜中在粒子中間的孔隙擴大。反之,當該核之粒徑太小時,粒子可能容易聚集。此外,為了提供具有適當組成比之最終薄膜,該殼之厚度變成太薄所以很難形成適當厚度的殼。
同時,不拘於形狀,總金屬硫屬化物奈米粒子中的該第一相與第二相之組成比可被測定為在0.5Cu/(Zn+Sn)1.5與0.5Zn/Sn2.0範圍內,特別地可被測定為在0.7Cu/(Zn+Sn)1.2與0.8Zn/Sn1.4範圍內。
就一具體實施方式而言,該金屬硫屬化物奈米粒子依據1mol之金屬元素計算可含有0.5mol至3mol的硫屬化物元素。在這裡該金屬元素指所有的金屬型式。
在前述範圍之外,當該金屬元素含量太多時,不可能充分地供應第VI族元素,所以不能形成例如前述金屬硫屬化物之穩定相,因此在後續製程中相可能變化而形成第二相或分離的金屬可能被氧化。反之,當該硫屬化物元素含量太多時,第VI族源在用於製造薄膜之熱處理過程中汽化,所以最終薄膜可能有太多孔隙。
本發明還提供合成該金屬硫屬化物奈米粒子之方法。該方法可特別地包含:(i)製造第一溶液,其含有至少一種的選自由下列所組成之組群中的第VI族源:含硫(S)或硒(Se)之化
合物;(ii)製造含有銅(Cu)鹽與錫(Sn)鹽之第二溶液及含有鋅(Zn)鹽之第三溶液;(iii)使該第一溶液與第二溶液混合與反應;及(iv)使該第三溶液與該混合與反應步驟之反應產物混合與反應。
也就是說,根據本發明之製造金屬硫屬化物奈米粒子的方法是藉由溶液製程而非藉由慣用的真空製程所進行,所以可大幅減少加工費。此外,就用於製備溶液的溶劑而言,由於不使用有害的肼,所以可除去在慣用的溶液製程中可能發生的風險。
就一具體實施方式而言,當該步驟(iv)之第三溶液被混合時可進一步加入第VI族源。
如前文所述,該第VI族源含量依據1mol之金屬元素計算是0.5mol至3mol。若該第一溶液含有足量的第VI族源,則當該第三溶液被混合時不需要額外的第VI族源。然而當該第一溶液沒含有足量的第VI族源時,可進一步加入第VI族源以解決第VI族元素的部份不足。在這裡,可考慮存在於該第一溶液與該第二溶液之反應產物中的第VI族元素含量而加入該第VI族源。
在一具體實施方式中,用於該第一溶液、第二溶液與第三溶液之溶劑可為選自由下列所組成之組群中的至少一種:水、醇類、二乙二醇(DEG)、油胺、乙二醇、三乙二醇、二甲亞碸、二甲基甲醯胺與N-甲基-2-吡咯啶酮
(NMP)。尤其該醇溶劑可為具有1至8個碳的甲醇、乙醇、丙醇、丁醇、戊醇、己醇、庚醇與辛醇。
在一具體實施方式中,該銅(Cu)鹽、錫(Sn)鹽與鋅(Zn)鹽各獨立地可為至少一種選自由下列所組成之組群中的鹽:氯化物、溴化物、碘化物、硝酸鹽、亞硝酸鹽、硫酸鹽、乙酸鹽、亞硫酸鹽、乙醯丙酮化物與氫氧化物。就該錫(Sn)鹽而言,可使用二價鹽或四價鹽,但本發明之具體實施方式不限於此。
在一具體實施方式中,該第VI族源可為至少一種選自由下列所組成之組群中的鹽:Se、Na2Se、K2Se、CaSe、(CH3)2Se、SeO2、SeCl4、H2SeO3、H2SeO4、Na2S、K2S、CaS、(CH3)2S、H2SO4、S、Na2S2O3、NH2SO3H與彼等之水合物、硫脲、硫代乙醯胺、硒代乙醯胺與硒脲。
同時,該第一溶液至第三溶液可進一步含有封閉劑。
在溶液製程中含有該封閉劑可控制經合成之金屬硫屬化物奈米粒子的粒徑與粒子相位。此外,該封閉劑包含N、O、S等原子,因此該封閉劑藉由該原子之未共用電子對而與該金屬硫屬化物奈米粒子表面容易地結合且包圍該表面。所以可防止該金屬硫屬化物奈米粒子之氧化。
該封閉劑沒有特別限制且可,例如,為選自由下列所組成之組群中的至少一種:聚乙烯吡咯啶酮、去水L-酒石酸鈉、酒石酸鈉鉀、丙酮二酸鈉、丙烯酸鈉、聚丙烯酸鈉鹽、聚乙烯吡咯啶酮、檸檬酸鈉、檸檬酸三鈉、檸檬酸
二鈉、葡萄糖酸鈉、抗壞血酸鈉、山梨糖醇、磷酸三乙酯、乙二胺、丙二胺、1,2-乙二硫醇、與乙硫醇。
本發明還提供用於製造含有該金屬硫屬化物奈米粒子之吸光層的墨液組成物以及使用該墨液組成物來製造薄膜的方法。
該根據本發明之製造薄膜的方法包含:(i)把含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含鋅(Zn)硫屬化物的第二相之金屬硫屬化物奈米粒子分散於溶劑中而製造墨液;(ii)把該墨液被覆於裝備有電極的基底上;及(iii)乾燥然後熱處理被覆於裝備有電極的該基底上的該墨液。
在一特異具體實施方式中,該步驟(i)之溶劑沒有特別限制,只要該溶劑是一般有機溶劑即可,且可為選自下列之中的一種有機溶劑:烷類、烯類、炔類、芳香烴類、酮類、腈類、醚類、酯類、有機鹵化物類、醇類、胺類、硫醇類、羧酸類、膦類、亞磷酸酯、磷酸酯類、亞碸類、及醯胺類、或彼等之中的至少一者的混合物。
特別地,該醇類可為至少一種選自下列之中的混合溶劑:乙醇、1-丙醇、2-丙醇、1-戊醇、2-戊醇、1-己醇、2-己醇、3-己醇、庚醇、辛醇、乙二醇(EG)、二乙二醇一乙醚(DEGMEE)、乙二醇一甲醚(EGMME)、乙二醇一乙醚(EGMEE)、乙二醇二甲醚(EGDME)、乙二醇二乙醚(EGDEE)、乙二醇一丙醚(EGMPE)、乙二
醇一丁醚(EGMBE)、2-甲基-1-丙醇、環戊醇、環己醇、丙二醇丙醚(PGPE)、二乙二醇二甲醚(DEGDME)、1,2-丙二醇(1,2-PD)、1,3-丙二醇(1,3-PD)、1,4-丁二醇(1,4-BD)、1,3-丁二醇(1,3-BD)、α-萜品醇、二乙二醇(DEG)、甘油、2-(乙基胺基)乙醇、2-(甲基胺基)乙醇、及2-胺基-2-甲基-1-丙醇。
該胺類可為至少一種選自下列之中的混合溶劑:三乙胺、二丁胺、二丙胺、丁胺、乙醇胺、二伸乙三胺(DETA)、三伸乙四胺(TETA)、三乙醇胺、2-胺基乙基哌、2-羥基乙基哌、二丁胺、及三(2-胺基乙基)胺。
該硫醇類可為至少一種選自下列之中的混合溶劑:1,2-乙二硫醇、戊硫醇、己硫醇、及巰基乙醇。
該烷類可為至少一種選自下列之中的混合溶劑:己烷、庚烷、及辛烷。
該芳香烴類可為至少一種選自下列之中的混合溶劑:甲苯、二甲苯、硝基苯、及吡啶。
該有機鹵化物類可為至少一種選自下列之中的混合溶劑:三氯甲烷、二氯甲烷、四氯甲烷、二氯乙烷、及氯苯。
該腈類可為乙腈。
該酮類可為至少一種選自下列之中的混合溶劑:丙酮、環己酮、環戊酮、及乙醯丙酮。
該醚類可為至少一種選自下列之中的混合溶劑:乙
醚、四氫呋喃、及1,4-二烷。
該亞碸類可為至少一種選自下列之中的混合溶劑:二甲亞碸(DMSO)及環丁碸。
該醯胺類可為至少一種選自下列之中的混合溶劑:二甲基甲醯胺(DMF)及N-甲基-2-吡咯啶酮(NMP)。
該酯類可為至少一種選自下列之中的混合溶劑:乳酸乙酯、γ-丁內酯、及乙醯乙酸乙酯。
該羧酸類可為至少一種選自下列之中的混合溶劑:丙酸、己酸、間-2,3-二巰基丁二酸、硫代乳酸、及硫代乙醇酸。
然而,該溶劑只被供給作為實例用,且本發明之具體實施方式不限於此。
在某些情况下,可另外加入添加劑以製造該墨液。
該添加劑可,例如,為選自由下列所組成之群組中的至少一種:分散劑、界面活性劑、聚合物、黏合劑、交聯劑、乳化劑、消泡劑、乾燥劑、填料、填充劑、增稠劑、薄膜處理劑、抗氧化劑、助流劑、整平劑、及腐蝕抑制劑。特別地,該添加劑可為選自由下列所組成之群組中的至少一種:聚乙烯吡咯啶酮(PVP)、聚乙烯醇、Anti-terra 204、Anti-terra 205、乙基纖維素、及DispersBYK110。
一種藉由被覆該墨液而形成被覆層的方法可,例如,為選自由下列所組成之群組中的任一種:濕式塗覆、噴霧塗覆、旋轉塗覆、刮刀塗覆、接觸印刷、上進料反印、下進料反印、噴嘴進料反印、凹板印刷、微凹板印刷、反向
式微凹板印刷、輥筒塗覆、狹縫式塗覆、毛細管塗覆、噴墨印刷、噴射沉積、及噴霧沉積。
該步驟(iii)之熱處理可在溫度為400℃到900℃下進行。
同時,可包含硒化製程以製備密度高得多的太陽能電池薄膜。該硒化製程可藉由各式各樣方法而進行。
就第一個實例而言,可藉由將粒子形式的S與/或Se分散於步驟(i)之帶有金屬硫屬化物奈米粒子的溶劑中而製造墨液,及合併該步驟(iii)之熱處理而達成從該硒化製程所得之功效。
就第二個實例而言,可藉由在S或Se存在下的步驟(iii)之熱處理而達成從該硒化製程所得之功效。
特別地,S或Se可藉由供應氣態H2S或H2Se或透過加熱來供應氣態Se或S而存在。
就第三個實例而言,在步驟(ii)後,可將S或Se沉積於該經被覆之基底上,接著進行步驟(iii)。特別地,該沉積製程可藉由溶液製程或沉積法而進行。
本發明也提供使用前述方法所製造的薄膜。
該薄膜之厚度可為0.5μm到3.0μm,較特別地可為0.5μm到2.5μm。
當該薄膜厚度少於0.5μm時,該吸光層之密度與份量不足,所以可能得不到期望的光電效率。反之,當該薄膜厚度超過3.0μm時,載子遷移距離增加,所以復合的可能性增加導致效率減低。
本發明也提供使用該薄膜所製造的薄膜太陽能電池。
製造薄膜太陽能電池之方法是該技術領域內已知的,所以在本案中省略對彼之詳細說明。
本發明之前述及其他的目的、特徵及其他優點將從下列與附圖有關的詳細說明中被更清楚地理解,其中:圖1是根據實施例1所形成的Cu2SnS3-ZnS奈米粒子之SEM影像;圖2是根據實施例1所形成的Cu2SnS3-ZnS奈米粒子之TEM影像;圖3是根據實施例1所形成的Cu2SnS3-ZnS奈米粒子之XRD圖;圖4是根據實施例1所形成的Cu2SnS3-ZnS奈米粒子之SEM影像;圖5是根據實施例1所形成的Cu2SnS3-ZnS奈米粒子之XRD圖;圖6是根據實施例17所製造的薄膜之SEM影像;圖7是根據實施例17所製造的薄膜之XRD圖;圖8是根據比較例3所製造的薄膜之XRD圖;圖9是根據比較例4所製造的薄膜之XRD圖;圖10是根據實施例18所製造的薄膜太陽能電池之IV特性圖;圖11是根據比較例5所製造的薄膜太陽能電池之IV
特性圖;圖12是根據比較例6所製造的薄膜太陽能電池之IV特性圖;圖13是說明證實在根據本發明所合成之粒子中的均勻粒子分布的Cu2SnS3-ZnS奈米粒子之SEM-EDX結果的表;圖14是證實在根據本發明所合成之粒子中的均勻金屬分布的Cu2SnS3-ZnS奈米粒子之EDS元素分布結果;及圖15是證實在根據本發明所合成之粒子中的均勻金屬分布的Cu2SnS3-ZnS奈米粒子之行掃描結果。
現在,將參見下列實施例更詳細地說明本發明。這些實施例之提供僅用於介紹本發明且不應被理解為限制了本發明之範圍與精神。
取含有30mmol硫代乙醯胺之DEG溶液加到含有10mmol CuCl2之DEG溶液與含有5mmol SnCl2之DEG溶液中,然後將溫度升高到175℃,然後使該溶液於攪拌
下反應3小時。接著在室溫下將含有7mmol ZnCl2之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。該所形成之粒子的掃瞄電子顯微鏡(SEM)影像、穿透式電子顯微鏡(TEM)影像與XRD圖請參見圖1至3。
取含有30mmol硫代乙醯胺之DEG溶液加到含有10mmol CuSO4之DEG溶液與含有5mmol SnCl2之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應3小時。接著在室溫下將含有7mmol ZnCl2之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol硫代乙醯胺之DEG溶液加到含有10mmol CuSO4之DEG溶液與含有5mmol Sn(OAc)2之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應3小時。接著在室溫下將含有7mmol ZnCl2之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到
180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol硫脲之DEG溶液加到含有10mmol CuCl2之DEG溶液與含有5mmol SnCl2之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應3小時。接著在室溫下將含有7mmol ZnCl2之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有15mmol硫代乙醯胺之DEG溶液加到含有10mmol CuCl2之DEG溶液與含有5mmol SnCl2之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應5小時。接著在室溫下將含有6mmol ZnCl2之DEG溶液與含有6mmol硫代乙醯胺之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有20mmol硫代乙醯胺之DEG溶液加到含有10mmol CuCl2之DEG溶液與含有5mmol SnCl2之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應3小時。接著在室溫下將含有6mmol ZnCl2之DEG溶液與含有12mmol硫代乙醯胺之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有20mmol硫代乙醯胺之DEG溶液加到含有10mmol CuCl2之DEG溶液與含有5mmol SnCl2之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應6小時。接著在室溫下將含有6mmol ZnCl2之DEG溶液與含有12mmol硫代乙醯胺之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。該所形成之粒子的掃瞄電子顯微鏡(SEM)影像與XRD圖請參見圖4與5。
取含有30mmol硫代乙醯胺之EG溶液加到含有10mmol CuCl2之EG溶液與含有5mmol SnCl2之EG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應3小時。接著在室溫下將含有6mmol ZnCl2之EG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol硫代乙醯胺之DEG溶液加到含有10mmol CuCl2之DEG溶液、含有5mmol SnCl2之DEG溶液與含有1mmol PVP之DEG溶液中,將溫度升高到175℃,然後使該溶液於攪拌下反應3小時。接著在室溫下將含有7mmol ZnCl2之DEG溶液慢慢逐滴加到該反應溶液中。接著將該溶液加熱到180℃或更多,然後保持該溫度且攪拌3小時。接著藉由離心將該溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol硫代乙醯胺之H2O溶液加到含有10mmol CuCl2之H2O溶液與含有5mmol SnCl2之H2O溶液
中,將溫度升高到100℃,然後使該混合物於攪拌下反應3小時。接著在室溫下將含有6mmol ZnCl2之H2O溶液慢慢逐滴加到該反應溶液中,然後將溫度升高到100℃。保持該溫度且攪拌該溶液3小時,然後藉由離心純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol硫代乙醯胺之H2O溶液加到含有10mmol CuCl2之H2O溶液、含有5mmol SnCl2之H2O溶液與含有10mmol檸檬酸鈉之H2O溶液中,將溫度升高到100℃,然後使該混合物於攪拌下反應6小時。接著在室溫下將含有6mmol ZnCl2之H2O溶液與含有12mmol硫代乙醯胺之H2O溶液慢慢逐滴加到該反應溶液中,然後將溫度升高到100℃。保持該溫度且攪拌該溶液3小時,然後藉由離心純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol硫代乙醯胺之H2O溶液加到含有10mmol Cu(NO3)2之H2O溶液、含有5mmol SnCl2之H2O溶液與含有10mmol丙酮二酸鈉之H2O溶液中,將溫度升高到100℃,然後使該混合物於攪拌下反應6小時。接著在室溫下將含有6mmol Zn(OAc)2之H2O溶液與含有
12mmol硫代乙醯胺之H2O溶液慢慢逐滴加到該反應溶液中,然後將溫度升高到100℃。保持該溫度且攪拌該溶液5小時,然後藉由離心純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol Na2S之H2O溶液加到含有10mmol CuCl2之H2O溶液與含有5mmol SnCl2之H2O溶液中,使該所得之溶液於室溫下於攪拌下反應3小時。接著將含有6mmol ZnCl2之H2O溶液慢慢逐滴加到該反應溶液中,在室溫下攪拌該所得之溶液3小時。藉由離心將該所得之溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol Na2S之H2O溶液加到含有10mmol CuSO4之H2O溶液、含有5mmol SnCl2之H2O溶液與含有15mmol檸檬酸鈉之H2O溶液中,使該所得之溶液於室溫下於攪拌下反應3小時。接著將含有6mmol ZnCl2之H2O溶液慢慢逐滴加到該反應溶液中,在室溫下攪拌該所得之溶液3小時。藉由離心將該所得之溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol Na2S之H2O溶液加到含有10mmol CuSO4之H2O溶液與含有5mmol SnCl2之H2O溶液中,使該所得之溶液於室溫下於攪拌下反應3小時。接著將含有6mmol ZnCl2之H2O溶液慢慢逐滴加到該反應溶液中,在室溫下攪拌該所得之溶液3小時。藉由離心將該所得之溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取含有30mmol Na2S之H2O溶液加到含有10mmol Cu(NO3)2之H2O溶液與含有5mmol SnCl2之H2O溶液中,使該溶液於室溫下於攪拌下反應3小時。接著將含有6mmol ZnCl2之H2O溶液慢慢逐滴加到該反應溶液中,在室溫下攪拌該所得之溶液3小時。藉由離心將該所得之溶液純化,得到Cu2SnS3-ZnS奈米粒子。
取油胺溶液溶解乙醯丙酮酸銅(Cu(acac)2)、乙酸鋅(Zn(OAc)2)與Sn(acac)2Br2,將溫度升高到225℃。將S元素之油胺溶液逐滴加入。藉由離心將所形成之粒子純化,得到CZTS奈米粒子。
取二乙二醇溶液溶解CuCl2‧2H2O、SnCl2與硫代乙醯胺,然後將該所得之溶液加熱到175℃維持2.5小時。藉由離心將所合成之粒子純化,得到Cu2SnS3粒子。此外,另取二乙二醇溶液溶解ZnCl2、硫代乙醯胺與PVP,然後將該所得之溶液加熱到175℃維持2.5小時。藉由離心將所合成之粒子純化,得到ZnS粒子。
使該根據實施例8所製造之Cu2SnS3-ZnS分散於以醇為基礎的溶劑混合物中而製造墨液。接著將該墨液被覆於經被覆鉬(Mo)的玻璃基板上而形成被覆膜,然後乾燥該被覆膜。接著該被覆膜被經積鍍Se之玻璃基板加熱而提供Se氣氛,然後在575℃進行快速熱退火(RTA),得到以CZTSSe為基礎的薄膜。該所得之薄膜的SEM影像與XRD圖請分別參見圖6與7。
使該根據比較例1所製造之CZTS奈米粒子分散於作為溶劑的甲苯中而製造墨液,將該墨液被覆於經被覆Mo的鈉鈣玻璃基板上而形成被覆膜。接著乾燥該被覆膜,然後在450℃的Se氣氛中進行熱處理,得到以CZTSSe為
基礎的薄膜。該所得之薄膜的XRD圖請參見圖8。
使該根據比較例2所製造之Cu2SnS3奈米粒子與ZnS奈米粒子分散於以醇為基礎的溶劑混合物中而製造墨液。接著將該墨液被覆於經被覆鉬(Mo)的玻璃基板上而形成被覆膜,然後乾燥該被覆膜。接著該被覆膜被經積鍍Se之玻璃基板加熱而提供Se氣氛,然後在575℃進行快速熱退火(RTA),得到以CZTSSe為基礎的薄膜。該所得之薄膜的XRD圖請參見圖9。
使用氰化鉀(KCN)溶液蝕刻該根據實施例17所製造的以CZTSSe為基礎之薄膜,在該薄膜上藉由化學水浴沉積法(CBD)而形成厚度為50nm的CdS層,在其上藉由濺鍍法而循序地堆疊厚度為100nm的ZnO層與厚度為500nm的經摻雜Al之ZnO層,藉此完成薄膜之製造。接著在該薄膜上形成Al電極,藉此完成薄膜太陽能電池之製造。顯示該薄膜太陽能電池之電流-電壓(I-V)特性的圖請參見圖10。
在該根據比較例3所製造的以CZTSSe為基礎之薄膜上藉由化學水浴沉積法(CBD)而形成CdS層,然後在其上藉由濺鍍法而循序地堆疊ZnO層與ITO層,藉此完成薄膜太陽能電池之製造。顯示該薄膜太陽能電池之電流-電壓(I-V)特性的圖請參見圖10。
在該根據比較例4所製造的以CZTSSe為基礎之薄膜上藉由化學水浴沉積法(CBD)而鑲嵌CdS層,然後在其上藉由濺鍍法而循序地堆疊ZnO層與ITO層,藉此完成薄膜太陽能電池之製造。顯示該薄膜太陽能電池之電流-電壓(I-V)特性的圖請參見圖12。
對實施例18和比較例5與6之薄膜太陽能電池測量光電效率,測量結果請參見下表2及圖10至12。
在表1中,Jsc,其係測定各種太陽能電池效率的變數,代表電流密度,Voc表示在輸出電流為零時所測得的開路電壓,該光電效率意指根據在太陽能電池板上的入射光照射度之電池輸出率,及填充因數(FF)代表在最大輸出功率時的電流密度與電壓的乘積除以Voc與Jsc的乘積所得之值。
如上表1所示,當將該根據本發明所製造的金屬硫屬化物奈米粒子用於形成吸光層時,在和根據習知方法所製造的金屬硫屬化物奈米粒子相比時,該吸光層由於高的電流密度與電壓而顯出優異的光電效率。
儘管本發明之優選具體實施方式業已被揭示以介紹本發明,然而該領域之習知技藝者會瞭解在不脫離後附的申請專利範圍所揭示的本發明之範圍與精神的前提下,各式各樣的修改、加添及替換是有可能的。
如前文所述,根據本發明之金屬硫屬化物奈米粒子在一個粒子中含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含鋅(Zn)硫屬化物的第二相。因此當使用該金屬硫屬化物奈米粒子製造薄膜時可阻止第二相產生,且由於一個粒子含有所有的該金屬所以該薄膜可具有完全均勻的組成。此外,由於奈米粒子含有S或Se,所以該奈米粒子有穩定的抗氧化性,且最終薄膜中的第VI族元素含量可增加。此外,由於加入第VI族元素所以在硒化製程中粒子的體積擴大,藉此可生長具有較高的密度之吸光層。
此外,由於藉由溶液製程而製造根據本發明之金屬硫屬化物奈米粒子,所以和慣用的製程相比時可大幅減少加工費。此外,不使用有害的還原劑例如肼,所以可除去由於使用有害的還原劑所導致的風險。
Claims (22)
- 一種形成太陽能電池吸光層的金屬硫屬化物奈米粒子,該金屬硫屬化物奈米粒子含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含鋅(Zn)硫屬化物的第二相,其中該銅(Cu)-錫(Sn)硫屬化物是CuaSnSb(其中1.2a3.2與2.5b4.5)與/或CuxSnSey(其中1.2x3.2與2.5y4.5),其中該鋅(Zn)硫屬化物是ZnS與/或ZnSe,其中該第一相與第二相獨立地存在,以及其中該金屬硫屬化物奈米粒子之金屬組成比被測定是在0.5Cu/(Zn+Sn)1.5與0.5Zn/Sn2.0範圍內,其中該金屬硫屬化物奈米粒子是該第一相與該第二相以總體存在的複合體(complex),或是含有由該第一相組成之核與由該第二相組成之殼的核-殼結構。
- 如申請專利範圍第1項之金屬硫屬化物奈米粒子,其中該第一相與第二相被均勻地分散於金屬硫屬化物奈米粒子中。
- 如申請專利範圍第2項之金屬硫屬化物奈米粒子,其中當觀測該金屬硫屬化物的某一區域時,在該區域中金屬硫屬化物奈米粒子之金屬組成比被測定是在0.5Cu/(Zn+Sn)1.5與0.5Zn/Sn2.0範圍內。
- 如申請專利範圍第3項之金屬硫屬化物奈米粒子,其中在該區域中該金屬硫屬化物奈米粒子之金屬組成 比被測定是在0.7Cu/(Zn+Sn)1.2與0.8Zn/Sn1.4範圍內。
- 如申請專利範圍第1項之金屬硫屬化物奈米粒子,其中該核之直徑為5nm到200nm。
- 如申請專利範圍第1項之金屬硫屬化物奈米粒子,其中該殼之厚度為1nm到100nm。
- 一種合成如申請專利範圍第1項之金屬硫屬化物奈米粒子的方法,該方法包含:製造第一溶液,其含有至少一種的選自由下列所組成之組群中的第VI族源:含硫(S)或硒(Se)之化合物;製造含有銅(Cu)鹽與錫(Sn)鹽之第二溶液及含有鋅(Zn)鹽之第三溶液;使該第一溶液與該第二溶液混合與反應;及使該第三溶液與該混合與反應步驟之反應產物混合與反應,其中該金屬硫屬化物奈米粒子含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含鋅(Zn)硫屬化物的第二相,其中該金屬硫屬化物奈米粒子是該第一相與該第二相以總體存在的複合體(complex),或是含有由該第一相組成之核與由該第二相組成之殼的核-殼結構。
- 如申請專利範圍第7項之方法,其中當混合該混合與反應步驟之第三溶液時,進一步加入第VI族源。
- 如申請專利範圍第7項之方法,其中該第一溶 液、第二溶液與第三溶液之溶劑是選自由下列所組成之組群中的至少一種:水、二乙二醇、甲醇、乙醇、十八碳烯胺、乙二醇、三乙二醇、二甲亞碸、二甲基甲醯胺與NMP(N-甲基-2-吡咯啶酮)。
- 如申請專利範圍第7項之方法,其中該銅(Cu)鹽、該錫(Sn)鹽與該鋅(Zn)鹽各獨立地是選自由下列所組成之組群中的至少一種:氯化物、溴化物、碘化物、硝酸鹽、亞硝酸鹽、硫酸鹽、乙酸鹽、亞硫酸鹽、乙醯丙酮化物與氫氧化物。
- 如申請專利範圍第7項之方法,其中該第VI族源是選自由下列所組成之組群中的至少一種:Se、Na2Se、K2Se、CaSe、(CH3)2Se、SeO2、SeCl4、H2SeO3、H2SeO4、Na2S、K2S、CaS、(CH3)2S、H2SO4、S、Na2S2O3、NH2SO3H與彼等之水合物、硫脲、硫代乙醯胺、硒代乙醯胺與硒脲。
- 一種用於製造吸光層之墨液組成物,其含有如申請專利範圍第1項之金屬硫屬化物奈米粒子與溶劑,其中該溶劑是至少一種選自由下列所組成之組群中的有機溶劑:烷類、烯類、炔類、芳香烴類、酮類、腈類、醚類、酯類、有機鹵化物類、醇類、胺類、硫醇類、羧酸類、膦類、磷酸酯類、亞碸類、與醯胺類。
- 一種使用如申請專利範圍第12項之用於製造吸光層之墨液組成物來製造薄膜之方法,該方法包含:把含有含銅(Cu)-錫(Sn)硫屬化物的第一相及含 鋅(Zn)硫屬化物的第二相之金屬硫屬化物奈米粒子分散於溶劑中而製造墨液組成物;把該墨液組成物被覆於裝備有電極的基底上;及乾燥然後熱處理被覆於裝備有電極的該基底上的該墨液組成物,其中該熱處理是在400℃到900℃範圍內進行,其中該銅(Cu)-錫(Sn)硫屬化物是CuaSnSb(其中1.2a3.2與2.5b4.5)與/或CuxSnSey(其中1.2x3.2與2.5y4.5),其中該鋅(Zn)硫屬化物是ZnS與/或ZnSe,其中該第一相與第二相獨立地存在,其中該金屬硫屬化物奈米粒子之金屬組成比被測定是在0.5Cu/(Zn+Sn)1.5與0.5Zn/Sn2.0範圍內,以及其中該分散步驟之溶劑是至少一種選自由下外所組成之組群中的有機溶劑:烷類、烯類、炔類、芳香烴類、酮類、腈類、醚類、酯類、有機鹵化物類、醇類、胺類、硫醇類、羧酸類、膦類、磷酸酯類、亞碸類、與醯胺類。
- 如申請專利範圍第13項之方法,其中該分散步驟之墨液組成物是藉由進一步添加添加劑而製得。
- 如申請專利範圍第13項之方法,其中該添加劑是選自由下列所組成之組群中的至少一種:聚乙烯吡咯啶酮(PVP)、聚乙烯醇、Anti-terra 204、Anti-terra 205、乙基纖維素、與DispersBYK110。
- 如申請專利範圍第13項之方法,其中藉由下列 方式而進行該被覆:濕式塗覆、噴霧塗覆、刮刀塗覆與噴墨印刷。
- 如申請專利範圍第13項之方法,其中在該分散步驟中,S與/或Se以粒子形式與該金屬硫屬化物奈米粒子被分散於溶劑中。
- 如申請專利範圍第13項之方法,其中該熱處理是在S或Se存在下進行。
- 如申請專利範圍第18項之方法,其中該S或Se存在乃藉由供應氣態H2S或H2Se或加熱來供應氣態Se或S而得到。
- 如申請專利範圍第13項之方法,其進一步包含在該被覆步驟後堆疊S或Se。
- 一種薄膜,其係藉由如申請專利範圍第13至20項中任一項之方法製造。
- 一種薄膜太陽能電池,其係用如申請專利範圍第21項之薄膜製造。
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