TWI601618B - 電暈處理方法及偏光板製造方法 - Google Patents

電暈處理方法及偏光板製造方法 Download PDF

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Publication number
TWI601618B
TWI601618B TW101103202A TW101103202A TWI601618B TW I601618 B TWI601618 B TW I601618B TW 101103202 A TW101103202 A TW 101103202A TW 101103202 A TW101103202 A TW 101103202A TW I601618 B TWI601618 B TW I601618B
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TW
Taiwan
Prior art keywords
corona treatment
corona
electrode
discharge
film
Prior art date
Application number
TW101103202A
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English (en)
Chinese (zh)
Other versions
TW201236843A (en
Inventor
武藤清
出口修央
倉本賢尚
Original Assignee
住友化學股份有限公司
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Application filed by 住友化學股份有限公司 filed Critical 住友化學股份有限公司
Publication of TW201236843A publication Critical patent/TW201236843A/zh
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/47Generating plasma using corona discharges
    • H05H1/473Cylindrical electrodes, e.g. rotary drums
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/47Generating plasma using corona discharges
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/47Generating plasma using corona discharges
    • H05H1/471Pointed electrodes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Electrostatic Charge, Transfer And Separation In Electrography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
TW101103202A 2011-02-03 2012-02-01 電暈處理方法及偏光板製造方法 TWI601618B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011021461A JP5787306B2 (ja) 2011-02-03 2011-02-03 コロナ処理方法

Publications (2)

Publication Number Publication Date
TW201236843A TW201236843A (en) 2012-09-16
TWI601618B true TWI601618B (zh) 2017-10-11

Family

ID=46602717

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101103202A TWI601618B (zh) 2011-02-03 2012-02-01 電暈處理方法及偏光板製造方法

Country Status (5)

Country Link
JP (1) JP5787306B2 (ko)
KR (2) KR20140004712A (ko)
CN (2) CN107041060B (ko)
TW (1) TWI601618B (ko)
WO (1) WO2012105503A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101713864B1 (ko) * 2016-10-13 2017-03-09 주식회사 포스텍 이지-필 필름 제조장치
JP7309843B2 (ja) * 2017-03-03 2023-07-18 住友化学株式会社 光学フィルム原反ロールの製造方法、および光学部材シートの製造方法
JP6421962B1 (ja) * 2017-08-09 2018-11-14 春日電機株式会社 表面改質装置
CN108705788B (zh) * 2018-05-24 2020-05-05 金凌印刷(苏州)有限公司 一种材料表面处理装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246540A (ja) * 1988-03-28 1989-10-02 Konica Corp コロナ放電処理におけるオゾン除去方法
JP2001290338A (ja) * 2000-04-04 2001-10-19 Canon Inc 電子写真装置
JP2007103205A (ja) * 2005-10-05 2007-04-19 Kasuga Electric Works Ltd フィルム等の長尺処理対象物の表面処理装置
JP2009237489A (ja) * 2008-03-28 2009-10-15 Sumitomo Chemical Co Ltd 表面保護フィルム付き偏光板の製造方法
JP2010043215A (ja) * 2008-08-18 2010-02-25 Toray Ind Inc 電気絶縁性シートの表面処理装置、表面処理方法、および、電気絶縁性シートの製造方法
JP2010115575A (ja) * 2008-11-11 2010-05-27 Nichirei Foods:Kk 表面処理装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3427130B2 (ja) * 1993-12-17 2003-07-14 藤森工業株式会社 偏光板又は位相差板貼付用粘着剤層の積層方法
JP2681625B2 (ja) * 1995-06-27 1997-11-26 春日電機株式会社 放電処理方法及び放電処理装置
AU2607799A (en) * 1998-03-10 1999-09-27 Ist Instant Surface Technology S.A. Method for treating the surface of a material or an object and implementing device
WO2000029157A1 (fr) * 1998-11-13 2000-05-25 Mitsubishi Denki Kabushiki Kaisha Procede de traitement de surface par decharge et electrode utilisee pour ce traitement
JP4194766B2 (ja) 2001-01-12 2008-12-10 株式会社リコー コロナ放電装置及び画像形成装置
JP3823172B2 (ja) * 2002-09-05 2006-09-20 春日電機株式会社 コロナ処理用電極構造
JP4830258B2 (ja) 2004-01-28 2011-12-07 住友化学株式会社 粘着剤層の貼合方法。
KR20070116309A (ko) * 2006-06-05 2007-12-10 동우 화인켐 주식회사 접착제 및 편광판
JP4744483B2 (ja) 2007-06-27 2011-08-10 日東電工株式会社 偏光板の製造方法、偏光板、光学フィルムおよび画像表示装置
JP2009122641A (ja) * 2007-10-25 2009-06-04 Sumitomo Chemical Co Ltd 光学表示パネルの製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01246540A (ja) * 1988-03-28 1989-10-02 Konica Corp コロナ放電処理におけるオゾン除去方法
JP2001290338A (ja) * 2000-04-04 2001-10-19 Canon Inc 電子写真装置
JP2007103205A (ja) * 2005-10-05 2007-04-19 Kasuga Electric Works Ltd フィルム等の長尺処理対象物の表面処理装置
JP2009237489A (ja) * 2008-03-28 2009-10-15 Sumitomo Chemical Co Ltd 表面保護フィルム付き偏光板の製造方法
JP2010043215A (ja) * 2008-08-18 2010-02-25 Toray Ind Inc 電気絶縁性シートの表面処理装置、表面処理方法、および、電気絶縁性シートの製造方法
JP2010115575A (ja) * 2008-11-11 2010-05-27 Nichirei Foods:Kk 表面処理装置

Also Published As

Publication number Publication date
JP5787306B2 (ja) 2015-09-30
KR20190053277A (ko) 2019-05-17
CN103338856A (zh) 2013-10-02
CN103338856B (zh) 2016-11-09
TW201236843A (en) 2012-09-16
CN107041060B (zh) 2019-08-23
KR20140004712A (ko) 2014-01-13
CN107041060A (zh) 2017-08-11
WO2012105503A1 (ja) 2012-08-09
KR102137918B1 (ko) 2020-07-24
JP2012161703A (ja) 2012-08-30

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