TWI601573B - Resin sealing material and its manufacturing method - Google Patents

Resin sealing material and its manufacturing method Download PDF

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TWI601573B
TWI601573B TW102100215A TW102100215A TWI601573B TW I601573 B TWI601573 B TW I601573B TW 102100215 A TW102100215 A TW 102100215A TW 102100215 A TW102100215 A TW 102100215A TW I601573 B TWI601573 B TW I601573B
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resin
resin sealing
sealing material
sealing
particle diameter
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TW102100215A
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TW201334873A (en
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Shinji Takase
Mamoru Sunada
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Towa Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29BPREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B7/00Mixing; Kneading
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29BPREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B9/00Making granules
    • B29B9/12Making granules characterised by structure or composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/16Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
    • H01L23/18Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Description

樹脂密封用材料及其製造方法 Resin sealing material and manufacturing method thereof

本發明係關於使用壓縮成形用的成形模而對晶片狀的電子零件進行樹脂密封時所使用的、呈粉狀或粒狀的樹脂密封用材料及其製造方法。 The present invention relates to a resin-sealing material used in powder or granular form used for resin-sealing a wafer-shaped electronic component using a molding die for compression molding, and a method for producing the same.

在對IC(Integrated Circuit)晶片、LED(Light Emitting Diode)晶片、晶片電容器等晶片狀電子零件(以下稱為「晶片」)進行樹脂密封的步驟中,藉由使流動性樹脂固化而形成由固化樹脂構成的密封樹脂。藉此,安裝於引線框架(lead frame)、印刷基板等(以下稱為「基板本體」)的晶片被樹脂密封。近年來,作為樹脂密封的方法,除了轉移成形(transfer molding)之外,另有使用壓縮成形(compressing molding)(例如,參照專利文獻1)。與轉移成形相比,壓縮成形具有流動性樹脂對接合用的引線施加的壓力小、能夠對應密封樹脂的薄型化等的優點。在壓縮成形中,作為流動性樹脂的原料,使用由熱固性樹脂構成的粉狀或粒狀的樹脂密封用材料、或者在常溫下為液狀的樹脂密封用材料(液狀樹脂)。 In the step of resin-sealing a wafer-shaped electronic component such as an IC (Integrated Circuit) wafer, an LED (Light Emitting Diode) wafer, or a wafer capacitor (hereinafter referred to as a "wafer"), the fluid resin is cured to form a cured layer. A sealing resin composed of a resin. Thereby, the wafer mounted on a lead frame, a printed board, or the like (hereinafter referred to as "substrate body") is sealed with a resin. In recent years, as a method of resin sealing, in addition to transfer molding, compression molding is also used (for example, refer to Patent Document 1). Compared with the transfer molding, the compression molding has an advantage that the pressure applied to the lead wire for bonding by the fluid resin is small, and the sealing resin can be made thinner. In the compression molding, as a raw material of the fluid resin, a powdery or granular resin sealing material made of a thermosetting resin or a resin sealing material (liquid resin) which is liquid at normal temperature is used.

本發明係以使用由熱固性樹脂構成的粉狀或粒狀的樹脂密封用材料的情形作為對象。對樹脂密封裝置具有的成形模的腔室供給樹脂密封用材料,藉由設置在成形模的加熱器,加熱樹脂密封用材料並使其熔融,且生成具有流動性的熔融樹脂(以下稱為「流動性樹脂」)。繼而藉由 繼續加熱流動性樹脂並使其固化,而在腔室中形成由固化樹脂構成的密封樹脂。 The present invention is directed to the case of using a powdery or granular resin sealing material composed of a thermosetting resin. The resin sealing material is supplied to the chamber of the molding die of the resin sealing device, and the resin sealing material is heated and melted by a heater provided in the molding die to form a fluid resin (hereinafter referred to as " Fluid resin"). Then by The fluid resin is continuously heated and solidified, and a sealing resin composed of a cured resin is formed in the chamber.

然而,在此種技術領域中,近年來以下之需求越來越強烈。第1個需求係對於作為完成品的電子零件(以下稱為「電子元件」)的所謂的輕薄短小化的需求。隨之,引線的小徑化及密封樹脂的薄型化的需求更加強烈。第2個需求係伴隨著廣泛採用LED而產生的需求,具體而言係如下所示者。亦即,在電子元件之中以LED為代表的發光元件中,使用具有透光性的密封樹脂,但在這種密封樹脂中殘存氣泡(空隙)的情形下,將有損光學特性。第2個需求係要求在發光元件中,在密封樹脂不存在氣泡。 However, in this technical field, the following needs have become more and more intense in recent years. The first demand is a demand for so-called thinness and thinness of electronic parts (hereinafter referred to as "electronic components") as finished products. Accordingly, there is a growing demand for a smaller diameter of the lead wire and a thinner sealing resin. The second demand is accompanied by the demand for the widespread use of LEDs, specifically as shown below. In other words, a light-emitting sealing resin is used for a light-emitting element represented by an LED in an electronic component. However, when air bubbles (voids) remain in the sealing resin, optical characteristics are impaired. The second requirement is that in the light-emitting element, there is no bubble in the sealing resin.

專利文獻1:日本特開2007-125783號公報(第5~9頁、第1圖) Patent Document 1: JP-A-2007-125783 (pages 5 to 9, FIG. 1)

作為密封樹脂的原材料即粉狀或粒狀的樹脂密封用材料,通常被轉用使用作為轉移成形的樹脂密封用材料的樹脂錠(tablet)的原材料。樹脂錠係藉由將原材料即粉狀或粒狀的樹脂密封用材料壓錠成圓柱狀而形成。在轉移成形中,藉由加熱並熔融供給到被稱為坩堝(pot)的圓筒形的空間的樹脂錠而生成熔融樹脂。生成的熔融樹脂,藉由柱塞(plunger)按壓並注入腔室。注入腔室的熔融樹脂,藉由加熱而固化。藉由到此為止的步驟,形成由固化樹脂構成的密封樹脂。 A material for sealing a resin which is a raw material of a sealing resin, that is, a powder or a granular resin, is usually used as a raw material of a resin tablet which is a resin sealing material for transfer molding. The resin ingot is formed by pressing a raw material, that is, a powdery or granular resin sealing material into a columnar shape. In the transfer molding, a molten resin is produced by heating and melting a resin ingot supplied to a cylindrical space called a pot. The resulting molten resin is pressed by a plunger and injected into the chamber. The molten resin injected into the chamber is solidified by heating. By the steps up to this point, a sealing resin composed of a cured resin is formed.

在轉移成形中,藉由圓柱狀的樹脂錠在坩堝中被加熱而生成熔融樹脂。因此,對於樹脂錠的原材料即粉狀或粒狀的樹脂密封用材料,並不那麽被要求粒徑(粒子徑)的偏差小。由此,樹脂錠的原材料、即在 壓縮成形中使用的粉狀或粒狀的樹脂密封用材料的粒徑,在多數情形下具有較大偏差。另外,在本申請文件中,「粉狀或粒狀」之用語,包含微粉狀、顆粒狀、粒狀、短棒狀、塊狀、小板狀、類似球的形狀即不確定的形狀(例如,扭曲的形狀、不規則的形狀、具有凹凸的形狀)等。在以下,作為「粉狀或粒狀的樹脂密封用材料」的總稱,適當地使用「粒狀樹脂」之用語。 In the transfer molding, a cylindrical resin ingot is heated in a crucible to form a molten resin. Therefore, the material for resin sealing which is a raw material of the resin ingot, that is, powder or granular, is not so much required to have a small variation in particle diameter (particle diameter). Thereby, the raw material of the resin ingot, that is, The particle diameter of the powdery or granular resin sealing material used for compression molding has a large variation in many cases. In addition, in the present application, the term "powdered or granulated" includes a shape of a fine powder, a granule, a granule, a short rod, a block, a small plate, a ball-like shape, that is, an indeterminate shape ( For example, a twisted shape, an irregular shape, a shape having irregularities, and the like. In the following, the term "granular resin" is used as a general term for "powder or granular resin sealing material".

然而,本發明的發明人等發現以下情況。第1個發現,係樹脂密封用材料的粒徑,具有從μm級至2~3mm左右之大的偏差。 However, the inventors of the present invention found the following. The first found that the particle diameter of the resin sealing material has a large variation from about μm to about 2 to 3 mm.

第2個發現,係於使用具有上述大的偏差的樹脂密封用材料的情形下,使供給到腔室的樹脂密封用材料,具有在腔室底面(腔室的內底面)被配置成斑塊狀(不均等地混亂)的傾向。尤其是,在使用具有大的偏差的樹脂密封用材料並欲製造密封樹脂的厚度(指從基板本體的上面到密封樹脂的上面的尺寸)的目標值t為t=0.2~0.3mm左右的封裝的情形,該傾向係顯著的,在該情形下,應供給到腔室的樹脂密封用材料係少量,而引起被配置成斑塊狀的傾向強。在該情形下,關於粒徑具有大的偏差的樹脂密封用材料,成為在腔室底面不均勻地配置。由此引起,在腔室中,在樹脂密封用材料熔融並直到生成的流動性樹脂中浸漬晶片的過程中,存在有不均勻地存在之流動性樹脂進行流動的情形。流動性樹脂的流動,成為引線的變形、密封樹脂的未填充(換言之即氣泡)等發生的原因。 In the case of using the resin sealing material having the above-described large variation, the resin sealing material supplied to the chamber has a plaque disposed on the bottom surface of the chamber (the inner bottom surface of the chamber). The tendency to be disordered (unevenly confusing). In particular, a package having a large value of the resin sealing material and having a target value t of a thickness (refer to a size from the upper surface of the substrate body to the upper surface of the sealing resin) of the sealing resin is t=0.2 to 0.3 mm. In this case, the tendency is remarkable. In this case, the amount of the resin sealing material to be supplied to the chamber is small, and the tendency to be arranged in a patch shape is strong. In this case, the resin sealing material having a large variation in particle diameter is unevenly arranged on the bottom surface of the chamber. As a result, in the chamber, in the process in which the resin sealing material is melted and the wafer is immersed in the formed fluid resin, there is a case where the fluid resin which is unevenly distributed flows. The flow of the fluid resin causes deformation of the lead, and unfilled (in other words, bubbles) of the sealing resin.

第3個發現,係於存在具有突出且大的粒徑(例如,10t程度:t為如上述般密封樹脂的厚度的目標值)的粒狀的樹脂密封用材料的情形下,在該樹脂密封用材料未充分熔融的階段中,具有與引線接觸的情形。與引線的如此的接觸,將引起引線的變形。 In the case of a granular resin sealing material having a large and large particle diameter (for example, a degree of 10 t: t is a target value of the sealing resin as described above), the resin is sealed in the resin. In the stage where the material is not sufficiently melted, there is a case of contact with the lead. Such contact with the leads will cause deformation of the leads.

第4個發現,係於組合擋板(shutter)與狹縫(slit)構件並將樹脂密封用材料供給到腔室的情形下(例如,參照專利文獻1),具有突出且大的粒徑的樹脂密封用材料的存在,將引起流動性樹脂的重量的增加。據此,封裝的密封樹脂的厚度t的偏差變大。 The fourth finding is that in the case of combining a shutter and a slit member and supplying a resin sealing material to a chamber (for example, refer to Patent Document 1), it has a large and large particle diameter. The presence of the resin sealing material will cause an increase in the weight of the fluid resin. According to this, the variation in the thickness t of the encapsulating sealing resin becomes large.

第5個發現,係根據樹脂密封用材料的特性,具有小粒徑的樹脂密封用材料,在被供給到腔室的情形下,恐有可能附著在本來樹脂密封用材料不應該存在的地方。如此之附著,存在有在樹脂密封用材料的密度為較小的情形下,因具有小粒徑的樹脂密封用材料進行浮游而引起的情況。此外,如此之附著,在樹脂密封用材料易於帶電的情形下,存在有因具有小粒徑的樹脂密封用材料帶靜電而引起的情況。樹脂密封用材料往未被意圖的地方的附著,將引起以下的弊端。第1個弊端,係在腔室底面使樹脂密封用材料不均勻地配置。第2個弊端,係成形模的沾污。第3個弊端,係合模不充分造成的樹脂毛刺的發生。 In the fifth, it is found that the resin sealing material having a small particle diameter is attached to the chamber when it is supplied to the chamber, and may adhere to a place where the original resin sealing material should not be present. In such a case, when the density of the resin sealing material is small, the resin sealing material having a small particle diameter floats. In addition, in the case where the resin sealing material is easily charged, there is a case where the resin sealing material having a small particle diameter is electrostatically charged. The adhesion of the resin sealing material to an unintended place causes the following drawbacks. The first drawback is that the resin sealing material is unevenly arranged on the bottom surface of the chamber. The second drawback is the staining of the forming mold. The third drawback is the occurrence of resin burrs caused by insufficient clamping.

本發明所欲解決的課題,係消除由密封樹脂的原材料即粉狀或粒狀的樹脂密封用材料的粒徑的偏差引起的引線的變形、密封樹脂中的氣泡的發生、密封樹脂的厚度t的偏差增大等的弊端。 The problem to be solved by the present invention is to eliminate the deformation of the lead wire caused by the variation in the particle diameter of the powder-like or granular resin sealing material which is a raw material of the sealing resin, the occurrence of bubbles in the sealing resin, and the thickness of the sealing resin. The disadvantage of the increase in deviations.

為了解決上述的課題,本發明之樹脂密封用材料,係在使用設置於樹脂密封裝置且具有腔室的壓縮成形用的成形模並藉由密封樹脂對電子零件進行樹脂密封時,被使用作為密封樹脂的原材料,包含樹脂材料且呈粉狀或粒狀的樹脂密封用材料,其特徵在於,在對密封樹脂的厚度的目標值t(mm)設定第1規格的情形,樹脂密封用材料的粒徑D滿足D≦a×t(mm)之第2規格,且第1規格係0.03(mm)≦t≦1.2(mm)(a為正實 數)。 In order to solve the problem, the resin sealing material of the present invention is used as a seal when a mold for compression molding provided in a resin sealing device and having a chamber is used and resin is sealed by a sealing resin. In the resin sealing material, the resin sealing material is a powdery or granular resin sealing material. When the first specification is set to the target value t (mm) of the thickness of the sealing resin, the resin sealing material is granulated. The diameter D satisfies the second specification of D≦a×t (mm), and the first specification is 0.03 (mm) ≦t ≦ 1.2 (mm) (a is positive number).

此外,本發明之樹脂密封用材料之製造方法,係在使用設置於樹脂密封裝置且具有腔室的壓縮成形用的成形模並藉由密封樹脂對電子零件進行樹脂密封時,被使用作為密封樹脂的原材料,且呈粉狀或粒狀的樹脂密封用材料的製造方法,其特徵在於,包含:準備至少包含呈粉狀或粒狀的樹脂材料、添加劑及填充劑的原材料組的步驟;混煉原材料組的步驟;混煉原材料組並生成第1中間材料的步驟;粉碎中間材料並生成第2中間材料的步驟;在對密封樹脂的厚度的目標值t(mm)設定第1規格的情形,根據樹脂密封用材料的粒徑D為D≦a×t(mm)之第2規格(a為正實數),分選第2中間材料的步驟;以及將原材料組之中判斷為滿足第2規格的第1規格內材料決定為樹脂密封用材料的步驟;第1規格係0.03(mm)≦t≦1.2(mm)。 Further, the method for producing a resin sealing material of the present invention is used as a sealing resin when a molding die for compression molding provided in a resin sealing device and having a chamber is used and resin sealing is performed on the electronic component by a sealing resin. And a method for producing a resin sealing material in a powder or granular form, comprising: a step of preparing a raw material group containing at least a powdery or granular resin material, an additive, and a filler; and kneading a step of the raw material group; a step of kneading the raw material group to form the first intermediate material; a step of pulverizing the intermediate material to form the second intermediate material; and setting the first specification to the target value t (mm) of the thickness of the sealing resin, The step of sorting the second intermediate material according to the second specification (a is a positive real number) of the particle diameter D of the resin sealing material is D≦a×t (mm); and determining that the second specification is satisfied among the raw material groups The material in the first specification is determined as a material for resin sealing; the first specification is 0.03 (mm) ≦ t ≦ 1.2 (mm).

根據本發明,在藉由密封樹脂對電子零件進行樹脂密封時,被使用作為密封樹脂的原材料的樹脂密封用材料,滿足以下的第1、第2規格。亦即,在本發明中,在對密封樹脂的厚度的目標值t(mm)設定第1規格的情形,樹脂密封用材料的粒徑D滿足D≦3.0×t(mm)之第2規格。該等規格,係藉由根據拍攝樹脂密封用材料而得到的影像計算出投影面積,且將該投影面積的面積等效圓直徑處理作為粒徑D而被應用。藉由樹脂密封用材料滿足該等規格,可抑制相對於厚度的目標值t具有較大的粒徑D的粒狀樹脂的存在所引起的弊端的發生。藉由將第1規格設為0.03(mm)≦t≦1.2(mm),而增大抑制上述弊端發生的效果。 According to the present invention, when the electronic component is resin-sealed by the sealing resin, the resin sealing material used as the material of the sealing resin satisfies the following first and second specifications. In the present invention, when the first specification is set to the target value t (mm) of the thickness of the sealing resin, the particle diameter D of the resin sealing material satisfies the second specification of D ≦ 3.0 × t (mm). These specifications are calculated by calculating the projected area from the image obtained by photographing the resin sealing material, and applying the area equivalent circular diameter processing of the projected area as the particle diameter D. When the resin sealing material satisfies these specifications, it is possible to suppress the occurrence of disadvantages caused by the presence of the granular resin having a large particle diameter D with respect to the target value t of the thickness. By setting the first specification to 0.03 (mm) ≦ t ≦ 1.2 (mm), the effect of suppressing the occurrence of the above drawbacks is increased.

此外,根據本發明,供給到樹脂密封裝置的樹脂密封用材 料,係根據與樹脂密封用材料的粒徑D相關的第2規格即D≦3.0×t(mm)之規格而分選。將分選的結果判斷為滿足第2規格的第1規格內材料,搬送到成形模。藉此,在供給原有的樹脂密封用材料的情形,能夠將判斷為滿足第2規格的第1規格內材料所構成的樹脂密封用材料搬送到成形模。因此,能夠抑制相對於厚度的目標值t具有較大的粒徑D的粒狀樹脂的存在引起的弊端的發生。 Further, according to the present invention, a resin sealing material supplied to a resin sealing device The material was sorted according to the specifications of D第 3.0 × t (mm) which is the second specification relating to the particle diameter D of the resin sealing material. The result of the sorting is judged to be the material of the first specification that satisfies the second specification, and is transferred to the forming mold. By the way, when the original resin sealing material is supplied, the resin sealing material which is determined by the material of the first specification which satisfies the second specification can be conveyed to the molding die. Therefore, it is possible to suppress the occurrence of a drawback caused by the presence of the granular resin having a large particle diameter D with respect to the target value t of the thickness.

此外,根據本發明,將分選的結果判斷為不滿足第2規格的規格外材料粉碎,且進一步分選粉碎後的規格外材料。將分選的結果判斷為滿足第2規格的第2規格內材料,搬送到成形模。因此,可抑制相對於厚度的目標值t具有較大的粒徑D的粒狀樹脂的存在引起的弊端的發生。進一步地,有效地利用樹脂密封用材料。 Further, according to the present invention, the result of the sorting is determined to be that the material outside the specification that does not satisfy the second specification is pulverized, and the pulverized outer material is further sorted. The result of the sorting is judged to be the material of the second specification that satisfies the second specification, and is transferred to the forming mold. Therefore, it is possible to suppress the occurrence of the disadvantages caused by the presence of the granular resin having a large particle diameter D with respect to the target value t of the thickness. Further, the material for resin sealing is effectively utilized.

1‧‧‧下模 1‧‧‧下模

2‧‧‧上模 2‧‧‧上模

3‧‧‧第1供給手段 3‧‧‧1st means of supply

4‧‧‧腔室 4‧‧‧ chamber

5‧‧‧樹脂密封用材料 5‧‧‧Resin sealing materials

6‧‧‧脫模膜 6‧‧‧ release film

7‧‧‧外框構件 7‧‧‧Outer frame members

8‧‧‧腔室構件 8‧‧‧Cell components

9‧‧‧吸引通道(吸引手段) 9‧‧‧Attraction channel (attraction means)

10‧‧‧加熱器(加熱手段) 10‧‧‧heater (heating means)

11‧‧‧密封構件(外氣隔絕手段) 11‧‧‧ Sealing members (outside air isolation means)

12‧‧‧吸引通道(減壓手段) 12‧‧‧Attraction channel (decompression means)

13‧‧‧基板本體 13‧‧‧Substrate body

14‧‧‧晶片(電子零件) 14‧‧‧ wafer (electronic parts)

15‧‧‧密封前基板 15‧‧‧ Sealing the front substrate

16‧‧‧引線 16‧‧‧ lead

17‧‧‧邊界線 17‧‧‧ boundary line

18‧‧‧區域 18‧‧‧Area

19‧‧‧外框 19‧‧‧Front frame

20‧‧‧供給用擋板 20‧‧‧Supply baffle

21‧‧‧收容部 21‧‧‧ Housing Department

22‧‧‧熔融樹脂 22‧‧‧ molten resin

23‧‧‧外氣隔絕空間 23‧‧‧External air isolation space

24‧‧‧被排出的氣體等 24‧‧‧Exhausted gases, etc.

25‧‧‧密封樹脂 25‧‧‧ sealing resin

26‧‧‧成形體(樹脂密封體) 26‧‧‧Formed body (resin seal)

27‧‧‧旋轉刀片 27‧‧‧Rotating blade

28‧‧‧電子元件 28‧‧‧Electronic components

29‧‧‧單位基板 29‧‧‧unit substrate

30‧‧‧單位密封樹脂 30‧‧‧Unit sealing resin

31‧‧‧材料接收手段 31‧‧‧Material receiving means

32、59‧‧‧樹脂材料處理手段 32, 59‧‧‧Resin materials processing means

33‧‧‧成形手段 33‧‧‧ Forming means

34‧‧‧成形體分配手段 34‧‧‧Forming means

35、57‧‧‧基板接收手段 35, 57‧‧‧Substrate receiving means

36、58‧‧‧樹脂材料接收手段 36, 58‧‧‧Receiving means for resin materials

37‧‧‧搬送軌道 37‧‧‧Transfer track

38‧‧‧主搬送手段(第1搬送手段) 38‧‧‧Main transport means (first transport means)

39‧‧‧基板接收部 39‧‧‧Substrate Receiving Department

40‧‧‧基板搬送部 40‧‧‧Substrate transport department

41‧‧‧樹脂接收部 41‧‧‧Resin Receiving Department

42‧‧‧計量部 42‧‧‧Measuring Department

43‧‧‧容器 43‧‧‧ Container

44‧‧‧第1樹脂搬送部 44‧‧‧1st resin transfer unit

45、49‧‧‧擋板(分隔手段) 45, 49‧‧ ‧ baffle (separation means)

46‧‧‧分選手段 46‧‧‧ sorting means

47‧‧‧粉碎手段 47‧‧‧Smashing means

48‧‧‧第2樹脂搬送部(第2搬送手段) 48‧‧‧Second resin conveying unit (second conveying means)

50‧‧‧集塵手段 50‧‧‧ dust collection means

51‧‧‧追逐保持器 51‧‧‧Chasing Keeper

52‧‧‧第2供給手段 52‧‧‧2nd means of supply

53‧‧‧減壓泵(減壓手段) 53‧‧‧Relief pump (decompression means)

54‧‧‧成形體搬送部 54‧‧‧Formed body transport department

55‧‧‧成形體用容器 55‧‧‧Shaped container

56‧‧‧成形體收容部 56‧‧‧Formed body containment department

60‧‧‧樹脂材料用手段 60‧‧‧Resin materials

A1、A2‧‧‧樹脂密封裝置 A1, A2‧‧‧ resin sealing device

D‧‧‧粒徑 D‧‧‧particle size

t‧‧‧密封樹脂的厚度的目標值 T‧‧‧ target value of the thickness of the sealing resin

圖1的(1)~(3),係分別表示在使用本發明之樹脂密封用材料之樹脂密封體之製造方法中,供給樹脂密封用材料的步驟、加熱樹脂密封用材料的步驟、以及合模成形模的步驟的概略圖。 (1) to (3) of the present invention, in the method of manufacturing a resin sealing body using the resin sealing material of the present invention, the step of supplying a resin sealing material, the step of heating the resin sealing material, and the combination A schematic view of the steps of the mold forming mold.

圖2的(1)~(4),係分別表示在合模成形模的狀態下,使流動性樹脂固化的步驟、形成密封樹脂之後開模成形模的步驟、使由樹脂密封體構成的成形體單片化的步驟、以及完成單片化的電子元件的概略圖。 (1) to (4) of FIG. 2 show a step of curing a fluid resin in a state of a mold clamping mold, a step of forming a mold after forming a sealing resin, and a molding comprising a resin sealing body. The step of singulation and the outline of the singulated electronic components.

圖3,係表示對於本發明之樹脂密封用材料,在密封樹脂的厚度的目標值t為0.19mm、樹脂密封用材料的供給量w為4.91g的情形下,調查對粒徑設定的4個水準與在腔室底面樹脂密封用材料不均勻地配置的狀況的關 係的實驗結果的說明圖。 3, in the case of the resin sealing material of the present invention, when the target value t of the thickness of the sealing resin is 0.19 mm and the supply amount w of the resin sealing material is 4.91 g, four of the particle diameters are set. The level of the condition that the resin sealing material is unevenly arranged on the bottom surface of the chamber An illustration of the experimental results of the system.

圖4,係表示對於本發明之樹脂密封用材料,在密封樹脂的厚度的目標值t為0.32mm、樹脂密封用材料的供給量w為7.91g的情形下,調查對粒徑設定的4個水準與在腔室底面樹脂密封用材料不均勻地配置的狀況的關係的實驗結果的說明圖。 In the case of the resin sealing material of the present invention, when the target value t of the thickness of the sealing resin is 0.32 mm and the supply amount w of the resin sealing material is 7.91 g, four materials for the particle diameter are set. An explanatory diagram of the experimental results of the relationship between the level and the state in which the resin sealing material on the bottom surface of the chamber is unevenly arranged.

圖5,係表示使用本發明之樹脂密封用材料之樹脂密封裝置的一個例子的俯視圖。 Fig. 5 is a plan view showing an example of a resin sealing device using the resin sealing material of the present invention.

圖6,係表示使用本發明之樹脂密封用材料之樹脂密封裝置的另一例子的俯視圖。 Fig. 6 is a plan view showing another example of a resin sealing device using the resin sealing material of the present invention.

根據本發明,在密封樹脂的厚度具有其厚度的目標值設為t(mm)的0.03(mm)≦t≦1.2(mm)之第1規格的情形下,根據與樹脂密封用材料的粒徑(粒子徑)D相關的第2規格即D≦3.0×t(mm),分選應供給到樹脂密封裝置的成形模的樹脂密封用材料。將分選的結果判斷為滿足第2規格的第1規格內材料搬送到成形模。另一方面,將分選的結果判斷為不滿足第2規格的規格外材料粉碎,並分選粉碎後的規格外材料。將分選的結果判斷為滿足第2規格的第2規格內材料搬送到成形模。 According to the present invention, in the case where the thickness of the sealing resin has a target value of 0.03 (mm) ≦ t ≦ 1.2 (mm) of t (mm), the particle size of the material for sealing with the resin is D ≦ 3.0 × t (mm), which is a second specification relating to the particle diameter D, is sorted and supplied to the resin sealing material of the molding die of the resin sealing device. The result of the sorting is determined to be that the material in the first specification that satisfies the second specification is transferred to the forming mold. On the other hand, the result of the sorting is judged to be that the material outside the specification of the second specification is not pulverized, and the material outside the pulverized specification is sorted. The result of the sorting is determined to be that the material in the second specification that satisfies the second specification is transferred to the forming mold.

[實施例1]參照圖1~圖4,對使用本發明之樹脂密封用材料之樹脂密封方法以及樹脂密封裝置進行說明。另外,為了易於理解,對本申請文件中的任何圖式,亦進行適宜地省略或誇張地、示意性地描繪。對於相同的構成元件標記相同的符號,並適宜地省略說明。 [First Embodiment] A resin sealing method and a resin sealing device using the resin sealing material of the present invention will be described with reference to Figs. 1 to 4 . In addition, for the sake of easy understanding, any drawings in the present application are also appropriately omitted or exaggeratedly and schematically depicted. The same constituent elements are denoted by the same reference numerals, and the description is omitted as appropriate.

如圖1的(1)所示,使用本發明之樹脂密封用材料之樹脂 密封裝置,具有下模1和上模2。下模1與上模2,一起構成成形模。在下模1與上模2之間,將供給樹脂密封用材料(後述)的第1供給手段3設置成進退自如。在下模1,設置有由凹部構成的腔室4。第1供給手段3,將呈粉狀或粒狀的樹脂密封用材料5供給到腔室4。亦即,腔室4係用於被供給樹脂密封用材料5的空間。脫模膜6在被拉伸的狀態下供給到下模1與上模2之間。 As shown in (1) of Fig. 1, the resin for the resin sealing material of the present invention is used. The sealing device has a lower die 1 and an upper die 2. The lower mold 1 and the upper mold 2 together form a forming mold. Between the lower mold 1 and the upper mold 2, the first supply means 3 for supplying a resin sealing material (described later) is provided to be movable forward and backward. In the lower mold 1, a chamber 4 composed of a recess is provided. In the first supply means 3, the resin sealing material 5 in the form of powder or pellets is supplied to the chamber 4. That is, the chamber 4 is used for the space in which the resin sealing material 5 is supplied. The release film 6 is supplied between the lower mold 1 and the upper mold 2 in a state of being stretched.

下模1與上模2,能夠相對地進行升降。藉此,下模1與上模2相對地接近並合模,且相對地遠離並開模。在圖1中,揭示有下模1由外框構件7與腔室構件8構成,且外框構件7藉由彈性構件(渦捲彈簧等;未圖示)而彈性支撐的例子。外框構件7構成腔室4的側面,腔室構件8構成腔室4的底面。不限於此,腔室4亦可以被刻入一體地設置的下模1。取代外框構件7被彈性支撐,或者除此之外,亦可腔室構件8藉由彈性構件而彈性支撐。 The lower mold 1 and the upper mold 2 can be lifted and lowered relatively. Thereby, the lower mold 1 and the upper mold 2 are relatively close to and closed, and are relatively far apart and open. In Fig. 1, there is disclosed an example in which the lower mold 1 is constituted by the outer frame member 7 and the chamber member 8, and the outer frame member 7 is elastically supported by an elastic member (scroll spring or the like; not shown). The outer frame member 7 constitutes the side of the chamber 4, and the chamber member 8 constitutes the bottom surface of the chamber 4. Not limited to this, the chamber 4 can also be engraved into the integrally formed lower mold 1. Instead of or in addition to the outer frame member 7, the chamber member 8 may be elastically supported by the elastic member.

在下模1,設置有用於吸引脫模膜6並使其與下模1的模面緊貼的、換言之係用於將脫模膜6吸附於下模1的模面的吸引通道9。在圖1中,對兩個吸引通道9分別描繪的向下的兩個箭頭,呈現出外部吸引機構(未圖示)吸引脫模膜6的樣子。在下模1,設置有加熱樹脂密封用材料5的加熱器10。另外,設置在腔室構件8的加熱器並未圖示。 In the lower mold 1, a suction passage 9 for sucking the release film 6 against the mold surface of the lower mold 1, in other words, for adsorbing the release film 6 to the mold surface of the lower mold 1, is provided. In Fig. 1, the downward two arrows, which are respectively depicted on the two suction passages 9, present an external suction mechanism (not shown) that attracts the release film 6. In the lower mold 1, a heater 10 for heating the resin sealing material 5 is provided. Further, the heater provided in the chamber member 8 is not shown.

在上模2,在與下模1相對向的面(以下稱為「上模2的型面」)中,以俯視為包圍腔室4的方式設置有密封構件11。在上模2的模面中,俯視為在密封構件11的內側設置有吸引包含腔室4的空間中的氣體的吸引通道12。 In the upper mold 2, a sealing member 11 is provided so as to surround the chamber 4 in a plan view on a surface facing the lower mold 1 (hereinafter referred to as "profile of the upper mold 2"). In the die face of the upper die 2, a suction passage 12 for sucking a gas in a space including the chamber 4 is provided inside the sealing member 11 in a plan view.

在基板本體13安裝有多個晶片14的密封前基板15,藉由吸附等眾知的方法固定於上模2。密封前基板15,以在俯視為完全包含腔室4並且位於密封構件11與吸引通道12的內側的方式固定。基板本體13的電極與晶片14的電極(均未圖示)藉由金線等引線16而電連接。基板本體13,藉由虛擬設置的格子狀的邊界線17而劃分成多個區域18。在各區域18安裝有一個或多個晶片14。 The pre-sealed substrate 15 on which the plurality of wafers 14 are mounted on the substrate body 13 is fixed to the upper mold 2 by a known method such as adsorption. The front substrate 15 is sealed so as to be fixed in such a manner as to completely surround the chamber 4 in a plan view and located inside the sealing member 11 and the suction passage 12. The electrodes of the substrate body 13 and the electrodes of the wafer 14 (none of which are shown) are electrically connected by leads 16 such as gold wires. The substrate body 13 is divided into a plurality of regions 18 by a grid-shaped boundary line 17 that is virtually disposed. One or more wafers 14 are mounted in each region 18.

第1供給手段3,具有外框19、及在外框19的下部設置成開閉自如的供給用擋板20。在供給用擋板20關閉的狀態下,收容樹脂密封用材料5的收容部21形成於外框19的內側。 The first supply means 3 has an outer frame 19 and a supply baffle 20 that is openably and closably provided at a lower portion of the outer frame 19. In a state where the supply baffle 20 is closed, the accommodating portion 21 accommodating the resin sealing material 5 is formed inside the outer frame 19.

針對本發明之樹脂密封用材料5進行說明。樹脂密封用材料5如以下說明般製造。首先,準備至少包含由熱固化樹脂構成的粉狀或粒狀的樹脂材料、添加劑、以及由二氧化矽等構成的填料(填充劑)的原材料組。接著,混煉原材料組並生成第1中間材料。接著,粉碎混煉後的第1中間材料並生成第2中間材料。接著,根據既定的規格分選第2中間材料。將第2中間材料之中判斷為滿足既定的規格的第1規格內材料決定為樹脂密封用材料5。 The resin sealing material 5 of the present invention will be described. The resin sealing material 5 is produced as described below. First, a raw material group containing at least a powdery or granular resin material composed of a thermosetting resin, an additive, and a filler (filler) composed of cerium oxide or the like is prepared. Next, the raw material group is kneaded to form a first intermediate material. Next, the kneaded first intermediate material is pulverized to form a second intermediate material. Next, the second intermediate material is sorted according to a predetermined specification. Among the second intermediate materials, the material of the first specification that satisfies the predetermined specification is determined as the resin sealing material 5.

作為樹脂材料,可以包含環氧系樹脂或矽系樹脂。在以製造光學元件為目的而使用樹脂密封用材料5之情形,樹脂材料具有透光性。此外,在使用樹脂密封用材料5之情形,亦可於樹脂密封用材料5中含有作為添加劑之螢光體。 As the resin material, an epoxy resin or a lanthanoid resin may be contained. In the case where the resin sealing material 5 is used for the purpose of producing an optical element, the resin material has light transmissivity. Further, in the case of using the resin sealing material 5, a fluorescent material as an additive may be contained in the resin sealing material 5.

在本發明中,使用樹脂密封用材料5,形成由固化樹脂構成且具有厚度的目標值t的密封樹脂。作為厚度的目標值t的規格(第1規格), 例如考量近年來之對於電子元件的輕薄短小化的需求而設為0.1(mm)≦t≦1.2(mm)。在考量與輕薄短小化相關的更強烈的需求之情形下,第1規格較佳為0.05(mm)≦t≦1.2(mm),更佳為0.05(mm)≦t≦1.0(mm)。在根據電子元件的用途而考量晶片厚為15μm左右之預測之情形下,第1規格較佳為0.03(mm)≦t≦1.0(mm)。此外,在包含材料的有效利用而考量之情形下,第1規格較佳為0.03(mm)≦t≦1.2(mm)。從現實的需求觀點來看,第1規格較佳為0.2(mm)≦t≦1.0(mm)。 In the present invention, the resin sealing material 5 is used to form a sealing resin composed of a cured resin and having a target value t of thickness. As the specification of the target value t of the thickness (the first specification), For example, in consideration of the demand for thinness and thinning of electronic components in recent years, it is set to 0.1 (mm) ≦ t ≦ 1.2 (mm). In the case of considering a more intense demand related to thinness and lightness, the first specification is preferably 0.05 (mm) ≦ t ≦ 1.2 (mm), more preferably 0.05 (mm) ≦ t ≦ 1.0 (mm). In the case where the prediction of the wafer thickness is about 15 μm in consideration of the use of the electronic component, the first specification is preferably 0.03 (mm) ≦ t ≦ 1.0 (mm). Further, in the case of considering the effective use of the material, the first specification is preferably 0.03 (mm) ≦ t ≦ 1.2 (mm). From the viewpoint of practical demand, the first specification is preferably 0.2 (mm) ≦ t ≦ 1.0 (mm).

樹脂密封用材料5,滿足與粒徑(粒子徑)D與密封樹脂的厚度的目標值t相關的0.03(mm)≦D≦3t(mm)之既定的規格(第2規格)。該第2規格較佳為0.05(mm)≦D≦2t(mm)。關於樹脂密封用材料5之相關的該等第2規格,將在後面詳細說明。在本申請文件中,樹脂密封用材料5的粒徑D,係指藉由光學性手段拍攝樹脂密封用材料5而得到的影像中的該等粒子的投影面積的面積等效圓直徑。具體而言,根據拍攝樹脂密封用材料5而得到的影像計算出投影面積,且將該等投影面積的面積等效圓直徑處理作為粒徑D。在圖1的(1)中簡單地呈現出粒徑D。 The resin sealing material 5 satisfies a predetermined specification (second specification) of 0.03 (mm) ≦ D ≦ 3 t (mm) in relation to the particle diameter (particle diameter) D and the target value t of the thickness of the sealing resin. The second specification is preferably 0.05 (mm) ≦ D ≦ 2 t (mm). These second specifications relating to the resin sealing material 5 will be described in detail later. In the present specification, the particle diameter D of the resin sealing material 5 refers to the area equivalent circular diameter of the projected area of the particles in the image obtained by photographing the resin sealing material 5 by optical means. Specifically, the projected area is calculated from the image obtained by photographing the resin sealing material 5, and the area equivalent circular diameter of the projected areas is treated as the particle diameter D. The particle diameter D is simply exhibited in (1) of Fig. 1 .

另外,針對藉由光學性手段以外的其他手段,例如氣流產生的離心力、篩網等眾知的手段測定樹脂密封用材料5的粒徑D的情形進行說明。在該情形下,藉由上述的光學性手段測定的粒徑D的測定值A與藉由其他手段測定的粒徑D的測定值B有可能不同。因此,較佳為,預先調查測定值A與測定值B的相關性,根據該相關性而決定新的第2規格。較佳為,取代現有的第2規格而採用新的第2規格,根據該新的第2規格而對樹脂密封用材料5的粒徑D進行判斷。 In addition, a case where the particle diameter D of the resin sealing material 5 is measured by a means other than an optical means, such as a centrifugal force generated by a gas flow, a screen, or the like, will be described. In this case, the measured value A of the particle diameter D measured by the optical means described above may be different from the measured value B of the particle diameter D measured by another means. Therefore, it is preferable to investigate the correlation between the measured value A and the measured value B in advance, and determine a new second standard based on the correlation. It is preferable to use a new second specification instead of the conventional second specification, and to determine the particle diameter D of the resin sealing material 5 based on the new second specification.

以下,針對藉由使用本發明之樹脂密封用材料5對晶片14進行樹脂密封而製造樹脂密封體的樹脂密封體的製造方法,參照圖1和圖2進行說明。繼而對晶片14進行樹脂密封而形成的成形體、換言之係對由樹脂密封體製造電子元件的電子元件的製造方法進行說明。 In the following, a method of manufacturing a resin sealing body in which a resin sealing body is produced by resin-sealing the wafer 14 by using the resin sealing material 5 of the present invention will be described with reference to FIGS. 1 and 2 . Next, a molded body formed by resin-sealing the wafer 14 , in other words, a method of manufacturing an electronic component in which an electronic component is manufactured from a resin sealed body will be described.

如圖1的(1)所示,在下模1與上模2之間,將脫模膜6以拉伸之方式供給於腔室4的上方。然後,藉由吸引通道9朝向腔室4的底面吸引脫模膜6。藉此,使脫模膜6吸附於構成腔室4的模面(以下稱為「腔室面」。)的整面。至少在到對晶片14進行樹脂密封之後下模1與上模2開模的階段,持續吸附脫模膜6。另外,在本申請文件中,為方便起見,對於在腔室面的整面吸附脫模膜6的狀態下用於被供給樹脂密封用材料5的空間亦稱為「腔室」。 As shown in (1) of FIG. 1, between the lower mold 1 and the upper mold 2, the release film 6 is supplied to the upper side of the chamber 4 by stretching. Then, the release film 6 is attracted toward the bottom surface of the chamber 4 by the suction passage 9. Thereby, the release film 6 is adsorbed to the entire surface of the mold surface (hereinafter referred to as "chamber surface") constituting the chamber 4. At least the stage in which the lower mold 1 and the upper mold 2 are opened after the resin sealing of the wafer 14 is performed, the release film 6 is continuously adsorbed. Further, in the present application, the space for supplying the resin sealing material 5 in the state in which the release film 6 is adsorbed on the entire surface of the chamber surface is also referred to as a "chamber" for the sake of convenience.

接著,使第1供給手段3進入下模1與上模2之間,且在腔室4的上方使第1供給手段3停止。然後,往圖式的左右方向打開供給用擋板20,對腔室4供給樹脂密封用材料5。 Next, the first supply means 3 is moved between the lower mold 1 and the upper mold 2, and the first supply means 3 is stopped above the chamber 4. Then, the supply shutter 20 is opened in the left-right direction of the drawing, and the resin sealing material 5 is supplied to the chamber 4.

接著,如圖1的(2)所示,使用加熱器10加熱供給到腔室4的樹脂密封用材料5。藉此,使第1供給手段3熔融並生成流動性樹脂(參照圖1的(3)的熔融樹脂22)。與加熱樹脂密封用材料5並行地,使上模2下降。另外,亦可以使下模1上升。重點是,若下模1與上模2相對地接近即可。 Next, as shown in (2) of FIG. 1, the resin sealing material 5 supplied to the chamber 4 is heated by the heater 10. Thereby, the first supply means 3 is melted to form a fluid resin (see the molten resin 22 of (3) of FIG. 1). The upper mold 2 is lowered in parallel with the material 5 for heating the resin sealing. In addition, the lower mold 1 can also be raised. The point is that if the lower mold 1 and the upper mold 2 are relatively close to each other.

接著,如圖1的(3)所示,進一步使上模2下降而使密封構件11的下端與下模1的模面接觸。藉此,形成包含腔室4的空間、與成形模的外部隔絕的外氣隔絕空間23。使用設置在成形模的外部的減壓泵(吸 引泵)、減壓槽等減壓手段(未圖示),對外氣隔絕空間23進行減壓。藉此,將包含在外氣隔絕空間23中的微小的粒子、與包含在外氣隔絕空間23及熔融樹脂22中的氣體等排出到成形模的外部。在圖1的(3)中,在吸引通道12附近所示的兩個向上的箭頭,係表示藉由減壓而被排出到成形模的外部的氣體等24。較佳為:在從密封構件11的下端與下模1的模面接觸,到下模1與上模2完全合模的狀態(中間合模狀態)下,開始對外氣隔絕空間23進行減壓的步驟。此外,較佳為:在直到熔融樹脂22完全固化的期間,執行對外氣隔絕空間23進行減壓的步驟。 Next, as shown in (3) of FIG. 1, the upper mold 2 is further lowered to bring the lower end of the sealing member 11 into contact with the mold surface of the lower mold 1. Thereby, a space including the chamber 4 and an outside air insulating space 23 isolated from the outside of the forming die are formed. Use a decompression pump (sucking) placed outside the forming die A pressure reducing means (not shown) such as a pump (a pump) or a pressure reducing groove is used to depressurize the external air insulating space 23. Thereby, the fine particles contained in the external air insulating space 23, the gas contained in the external air insulating space 23 and the molten resin 22, and the like are discharged to the outside of the forming mold. In (3) of Fig. 1, two upward arrows shown in the vicinity of the suction passage 12 indicate gas or the like 24 which is discharged to the outside of the forming mold by pressure reduction. It is preferable that the external air insulating space 23 is decompressed in a state in which the lower end of the sealing member 11 is in contact with the die surface of the lower mold 1 and the lower mold 1 and the upper mold 2 are completely closed (intermediate mold clamping state). A step of. Further, it is preferable to perform the step of decompressing the external air insulating space 23 until the molten resin 22 is completely solidified.

接著,如圖2的(1)所示,繼續使上模2下降。藉此,在熔融樹脂22中浸漬(浸泡)晶片14與引線16,並完全合模下模1與上模2。在下模1與上模2完全合模的狀態(完全密合狀態)下,一邊藉由下模1與上模2加壓熔融樹脂22,一邊繼續加熱熔融樹脂22。藉此,使熔融樹脂22固化,如圖2的(2)所示,形成由固化樹脂構成的密封樹脂25。 Next, as shown in (1) of FIG. 2, the upper mold 2 is continuously lowered. Thereby, the wafer 14 and the lead 16 are immersed (soaked) in the molten resin 22, and the lower mold 1 and the upper mold 2 are completely closed. The molten resin 22 is continuously heated while the lower mold 1 and the upper mold 2 pressurize the molten resin 22 in a state in which the lower mold 1 and the upper mold 2 are completely closed (completely closed). Thereby, the molten resin 22 is solidified, and as shown in FIG. 2 (2), the sealing resin 25 made of a cured resin is formed.

接著,如圖2的(2)所示,使上模2上升而開模下模1與上模2。之後,將由具有基板本體13、晶片14、引線16及密封樹脂25的樹脂密封體(密封後基板)構成的成形體26取出到成形模之外。藉由到目前為止的步驟,完成對安裝於基板本體13的多個晶片14進行樹脂密封的步驟,而完成多個晶片14被樹脂密封的成形體26。 Next, as shown in (2) of FIG. 2, the upper mold 2 is raised to open the lower mold 1 and the upper mold 2. Thereafter, the molded body 26 composed of the resin sealing body (the sealed substrate) having the substrate body 13, the wafer 14, the lead 16 and the sealing resin 25 is taken out of the forming mold. The steps of resin sealing of the plurality of wafers 14 mounted on the substrate body 13 are completed by the steps up to now, and the molded body 26 in which the plurality of wafers 14 are resin-sealed is completed.

接著,如圖2的(3)所示,使用黏著膜或吸附等眾知的方法,將成形體26固定於工作臺(未圖示)。使用旋轉刀片27,沿著各邊界線17完全地切斷成形體26(全切)。具體而言,分別沿著圖2的(3)中的X方向的各邊界線17與Y方向的各邊界線17,完全地切斷成形體26。藉 此,執行成形體26的單片化(singulation)。藉由到目前為止的步驟,成形體26以各區域18為單位而單片化,而製造圖2的(4)所示的電子元件28。各電子元件28具有基板本體13以各區域18為單位而單片化的單位基板29、晶片14、引線16及密封樹脂25以各區域18為單位而單片化的單位密封樹脂30。 Next, as shown in (3) of FIG. 2, the molded body 26 is fixed to a table (not shown) by a known method such as an adhesive film or adsorption. Using the rotary blade 27, the formed body 26 is completely cut along the boundary line 17 (full cut). Specifically, the molded body 26 is completely cut along each boundary line 17 in the X direction and the boundary line 17 in the Y direction in (3) of FIG. 2 . borrow Thereby, singulation of the molded body 26 is performed. By the steps up to now, the molded body 26 is singulated in units of the respective regions 18, and the electronic component 28 shown in (4) of Fig. 2 is produced. Each of the electronic components 28 includes a unit substrate 29 in which the substrate main body 13 is diced in units of the respective regions 18, a wafer 14 , a lead 16 , and a sealing resin 25 which are diced in units of the respective regions 18 .

另外,在使成形體26單片化的步驟中,取代全切,亦可以在成形體26的厚度方向的途中形成槽之後(半切之後),對成形體26施加外力而進行單片化。取代旋轉刀片27,亦可以使用鐳射光、水刀(water-jet)、線鋸(wire saw)等。 In addition, in the step of singulating the molded body 26, instead of the full cut, the groove may be formed in the middle of the thickness direction of the molded body 26 (after half-cut), and an external force may be applied to the molded body 26 to be singulated. Instead of the rotary blade 27, laser light, a water-jet, a wire saw, or the like can also be used.

以下,針對本發明之樹脂密封用材料5,對與粒徑D與密封樹脂25的厚度的目標值t相關的既定的規格進行說明。首先,關於對樹脂密封用材料5的粒徑D設定的第2規格的下限進行說明。粒徑D的第2規格的下限,無論是在密封樹脂25的厚度的目標值t較大之情形,亦或在較小之情形,原則上無需確定。但是,根據樹脂密封用材料的特性,而存在有如下問題發生:因樹脂密封用材料浮游或帶電引起樹脂密封用材料5附著在本來樹脂密封用材料5不應該存在的地方。為了防止該問題,樹脂密封用材料5的粒徑D的第2規格的下限較佳為某種程度大的值。根據經驗,辨明了在粒徑D的值未滿0.05mm之情形下,在供給或搬送樹脂密封用材料5時,易於發生上述的浮游或帶電等。而且,辨明了在粒徑D的值未滿0.03mm之情形下,更易發生上述的浮游或帶電等。根據該等情況,關於粒徑D的第2規格的下限,可以說較佳為0.03mm以上,更佳為0.05mm以上。因此,在對粒徑D的第2規格設置下限之情形,決定作為下限為0.03(mm)≦D, 較佳為0.05(mm)≦D。 In the resin sealing material 5 of the present invention, a predetermined specification relating to the target value t of the particle diameter D and the thickness of the sealing resin 25 will be described. First, the lower limit of the second specification for setting the particle diameter D of the resin sealing material 5 will be described. The lower limit of the second specification of the particle diameter D is not necessarily determined in the case where the target value t of the thickness of the sealing resin 25 is large or small. However, depending on the characteristics of the resin sealing material, there is a problem that the resin sealing material 5 adheres to the place where the original resin sealing material 5 should not be present because the resin sealing material floats or is charged. In order to prevent this problem, the lower limit of the second specification of the particle diameter D of the resin sealing material 5 is preferably a value which is somewhat large. According to the experience, when the value of the particle diameter D is less than 0.05 mm, it is recognized that the above-described floating or charging is likely to occur when the resin sealing material 5 is supplied or conveyed. Further, it has been found that when the value of the particle diameter D is less than 0.03 mm, the above-described floating or charging is more likely to occur. From the above, the lower limit of the second specification of the particle diameter D can be preferably 0.03 mm or more, and more preferably 0.05 mm or more. Therefore, when the lower limit is set for the second specification of the particle diameter D, the lower limit is determined to be 0.03 (mm) ≦D, It is preferably 0.05 (mm) ≦D.

接著,對粒徑D設定的第2規格的上限進行說明。關於第2規格的上限,藉由以下順序而決定。作為第1順序,係在將成為粒徑D的水準的多個(本實施例以四個為例)特定的範圍設定為粒徑D的基礎上,以使粒徑D落入設定的特定的範圍內之方式分選樹脂密封用材料5。另外,該等特定的範圍與上述的第2規格不同。作為第2順序,係設定由作為密封樹脂25的厚度的目標值t(mm)適當的值構成的兩個水準值。另外,該等水準值,係與上述的第1規格不同。作為第3順序,係計算出與各個密封樹脂25的厚度的目標值t對應的樹脂密封用材料5的重量w(g),並將該重量的樹脂密封用材料5散佈在實際評價用腔室(平面尺寸:233×67mm)中。光學性地測定已散佈的樹脂密封用材料5覆蓋該腔室底面的比例(以下稱為「樹脂佔有率」)。作為第4順序,係針對在已使用該樹脂密封用材料5樹脂密封之情形,若為何種程度的樹脂佔有率則可以允許實際的密封樹脂25的厚度的偏差等進行評價。關於樹脂密封用材料5的粒徑D,按照以上四個順序,決定被認為可實際使用的第2規格的上限。 Next, the upper limit of the second specification set by the particle diameter D will be described. The upper limit of the second specification is determined by the following procedure. In the first order, a specific range of a plurality of levels (four in the present embodiment) of the particle diameter D is set as the particle diameter D, so that the particle diameter D falls within the specific setting. The resin sealing material 5 is sorted in a range. Further, the specific ranges are different from the above-described second specifications. In the second order, two level values which are formed by values suitable as the target value t (mm) of the thickness of the sealing resin 25 are set. Further, the level values are different from the first specification described above. In the third order, the weight w (g) of the resin sealing material 5 corresponding to the target value t of the thickness of each sealing resin 25 is calculated, and the resin sealing material 5 of this weight is dispersed in the actual evaluation chamber. (Plan size: 233 × 67mm). The ratio of the dispersed resin sealing material 5 covering the bottom surface of the chamber (hereinafter referred to as "resin occupancy rate") was optically measured. In the fourth step, in the case where the resin sealing material 5 resin is used for sealing, it is possible to allow the actual thickness of the sealing resin 25 to be varied or the like in order to determine the degree of resin occupation. Regarding the particle diameter D of the resin sealing material 5, the upper limit of the second specification which is considered to be practically usable is determined in the above four orders.

以下,針對已決定樹脂密封用材料5的粒徑D設定的第2規格的上限的順序,參照圖3和圖4進行說明。作為第1順序,係分選樹脂密封用材料5,並準備粒徑D分別落入成為四個水準的特定的範圍1~4中的樹脂密封用材料Ma、Mb、Mc、Md。其中,特定範圍1為D=1.0~2.0(mm),特定範圍2為D=0.2~2.0(mm),特定範圍3為D=0.2~1.0(mm),特定範圍4為D=0.2~0.4(mm)。 In the following, the procedure of the upper limit of the second specification in which the particle diameter D of the resin sealing material 5 is determined will be described with reference to FIGS. 3 and 4 . In the first step, the resin sealing material 5 is sorted, and the resin sealing materials Ma, Mb, Mc, and Md in which the particle diameter D falls within the specific ranges 1 to 4 which are four levels are prepared. Wherein, the specific range 1 is D=1.0~2.0 (mm), the specific range 2 is D=0.2~2.0 (mm), the specific range 3 is D=0.2~1.0 (mm), and the specific range 4 is D=0.2~0.4. (mm).

樹脂密封用材料Ma:D=1.0~2.0(mm) Resin sealing material Ma: D=1.0~2.0(mm)

樹脂密封用材料Mb:D=0.2~2.0(mm) Resin sealing material Mb: D = 0.2 ~ 2.0 (mm)

樹脂密封用材料Mc:D=0.2~1.0(mm) Resin sealing material Mc: D = 0.2 ~ 1.0 (mm)

樹脂密封用材料Md:D=0.2~0.4(mm) Resin sealing material Md: D = 0.2 ~ 0.4 (mm)

作為第2順序,係設定t=0.19(mm)和t=0.32(mm)的兩個水準值作為密封樹脂25的厚度的目標值。t=0.19(mm)之水準值,係考量近年來對電子元件28的輕薄短小化的需求而設定的水準值。 As the second order, two level values of t = 0.19 (mm) and t = 0.32 (mm) are set as the target values of the thickness of the sealing resin 25. The level value of t=0.19 (mm) is a level value set in consideration of the demand for the thinness and thinness of the electronic component 28 in recent years.

作為第3順序,係在上述兩個水準值(密封樹脂25的厚度的目標值為t=0.19(mm)和0.32(mm))的情形下,計算出與其目標值t分別對應的樹脂密封用材料5的重量。計算出的重量在水準值1(目標值t=0.19(mm))之情形為4.91(g),在水準值2(目標值t=0.32(mm))之情形為7.91(g)。另外,上述重量的值,係安裝有晶片14之情形的計算值(理論值)。 In the third order, in the case where the above two level values (the target values of the thicknesses of the sealing resin 25 are t=0.19 (mm) and 0.32 (mm)), the resin seals corresponding to the target values t are respectively calculated. The weight of material 5. The calculated weight is 4.91 (g) in the case of the level value 1 (target value t = 0.19 (mm)), and 7.91 (g) in the case of the level value 2 (target value t = 0.32 (mm)). Further, the value of the above weight is a calculated value (theoretical value) in the case where the wafer 14 is mounted.

另外,在實驗中,在晶片14未安裝於基板本體13的狀態,換言之係以虛擬基板為對象,供給樹脂密封用材料5。作為實際的供給量w,係取代相當於水準值1(目標值t=0.19(mm))之情形的w=4.91(g),而將w=6.03(g)的樹脂密封用材料5散佈在評價用腔室中,此外,取代相當於水準值2(目標值t=0.32(mm))之情形的w=7.91(g),而將w=10.16(g)的樹脂密封用材料5分別散佈在評價用腔室中。 In the experiment, in the state in which the wafer 14 is not attached to the substrate body 13, in other words, the resin sealing material 5 is supplied to the dummy substrate. The actual supply amount w is w=4.91 (g) instead of the level 1 (target value t = 0.19 (mm)), and the resin sealing material 5 of w = 6.03 (g) is dispersed. In the evaluation chamber, w=7.91 (g), which is equivalent to the level 2 (target value t=0.32 (mm)), and the resin sealing material 5 of w=10.16 (g) are respectively dispersed. In the evaluation chamber.

繼而,作為第3順序,係準備相當於供給量w=4.91(g)的樹脂密封用材料5的樹脂密封用材料Ma、Mb、Mc、Md,並將該等依次散佈在評價用腔室中。同樣地,準備相當於供給量w=7.91(g)的樹脂密封用材料5的樹脂密封用材料Ma、Mb、Mc、Md,並將該等依次散佈在評價 用腔室中。從評價用腔室的上方拍攝散佈的樹脂密封用材料5的狀態。對藉由拍攝而得到的影像進行二值化處理,計算出樹脂密封用材料5的樹脂佔有率。具體而言,在具有256階度(將級別0作為黑,將級別255作為白)的影像中,將級別25作為閾值而對影像進行二值化處理。在二值化影像中,將級別25以下判斷為「存在樹脂密封用材料」,並計算出在評價用腔室的底面存在樹脂密封用材料的部分的面積比。 Then, in the third order, the resin sealing materials Ma, Mb, Mc, and Md corresponding to the resin sealing material 5 having a supply amount of w = 4.91 (g) are prepared, and these are sequentially dispersed in the evaluation chamber. . In the same manner, the resin sealing materials Ma, Mb, Mc, and Md corresponding to the resin sealing material 5 having a supply amount of w = 7.91 (g) are prepared, and these are sequentially dispersed in the evaluation. Used in the chamber. The state of the resin sealing material 5 to be dispersed is taken from above the evaluation chamber. The image obtained by the imaging was binarized to calculate the resin occupancy of the resin sealing material 5. Specifically, in an image having 256 gradations (level 0 is black and level 255 is white), the image is binarized using level 25 as a threshold. In the binarized image, the level 25 or less was judged as "the material for resin sealing", and the area ratio of the portion where the resin sealing material was present on the bottom surface of the evaluation chamber was calculated.

圖3的(1)~(4)中呈現出,在供給量w=4.91(g)的情形下,對分別散佈有樹脂密封用材料Ma~Md的狀態進行二值化處理而得到的影像和樹脂佔有率的圓餅圖。圖4的(1)~(4)中呈現出,在供給量w=7.91(g)的情形下,對分別散佈有樹脂密封用材料Ma~Md的狀態進行二值化處理而得到的影像和樹脂佔有率的圓餅圖。 (1) to (4) of FIG. 3 show an image obtained by binarizing the state in which the resin sealing materials Ma to Md are dispersed, in the case where the supply amount w is 4.91 (g). A pie chart of resin occupancy. In the case of the supply amount w=7.91 (g), the image obtained by binarizing the state in which the resin sealing materials Ma to Md are respectively dispersed is shown in (1) to (4) of FIG. A pie chart of resin occupancy.

作為第4順序,係使用圖3的(1)~(4)中所示的四種樹脂密封用材料Ma~Md,成形目標值t=0.19(mm)的密封樹脂25(參照圖的2(2))。根據其結果,在圖3的(1)~(3)的情形,判斷為不允許作為密封樹脂25,圖3的(4)的情形,判斷為十分充分允許作為密封樹脂25。 In the fourth order, the sealing resin 25 having the target value t=0.19 (mm) is formed by using the four kinds of resin sealing materials Ma to Md shown in (1) to (4) of FIG. 3 (see FIG. 2 ( 2)). According to the results of (1) to (3) of FIG. 3, it is determined that the sealing resin 25 is not allowed, and in the case of (4) of FIG. 3, it is determined that the sealing resin 25 is sufficiently sufficiently allowed.

根據圖3所示的結果,第一,作為對樹脂密封用材料5的粒徑D(mm)設定的第2規格的下限,判斷D=0.2(mm)係妥當。在作為第2規格的下限係D=1.0(mm)之情形,由於在評價用腔室的底面樹脂密封用材料5被配置成斑塊狀的傾向較強(參照圖3的(1)),因此清楚可知不允許作為密封樹脂25。 According to the results shown in FIG. 3, first, as a lower limit of the second specification set for the particle diameter D (mm) of the resin sealing material 5, it is judged that D = 0.2 (mm). In the case where the lower limit of the second specification is D = 1.0 (mm), the resin sealing material 5 on the bottom surface of the evaluation chamber is strongly arranged in a patch shape (see (1) in Fig. 3). Therefore, it is clear that it is not allowed to function as the sealing resin 25.

根據圖3所示的結果,第二,樹脂密封用材料5的粒徑D(mm)的第2規格的上限,預想成存在於D=0.4(mm)以上、1.0(mm) 以下的範圍內。對如此之粒徑D的第2規格設定的範圍,在樹脂密封用材料5的粒徑D(mm)的第2規格的下限為0.2mm的情形之中,為圖3的(3)所示的情形與圖3的(4)所示的情形之間,樹脂佔有率相當於41%以上、84%以下的範圍。 According to the results shown in FIG. 3, the upper limit of the second specification of the particle diameter D (mm) of the resin sealing material 5 is expected to exist in D = 0.4 (mm) or more and 1.0 (mm). Within the scope below. In the range of the second specification of the particle size D, the lower limit of the second specification of the particle diameter D (mm) of the resin sealing material 5 is 0.2 mm, which is shown in (3) of FIG. 3 . In the case of the case shown in (4) of FIG. 3, the resin occupancy rate is in the range of 41% or more and 84% or less.

繼而,作為第4順序,係使用圖4的(1)~(4)所示的四種樹脂密封用材料Ma~Md,成形厚度的目標值t=0.32(mm)的密封樹脂25(參照圖2的(2))。根據其結果,在成為圖4的(1)、(2)所示的狀態之情形,判斷為不允許作為密封樹脂25者,在成為圖4的(3)、(4)所示的狀態之情形,判斷為允許作為密封樹脂25者。進而,在成為圖4的(3)所示的狀態之情形,判斷為係允許的界限。因此,根據圖4(尤其是圖4的(3))所示的結果,在樹脂密封用材料5的粒徑D(mm)的第2規格的下限為0.2mm的情形下,作為第2規格的上限推定D=1.0(mm)是適當的。作為第2規格的上限的D=1.0(mm)之值,相當於相對於密封樹脂25的厚度的目標值t=0.32(mm),D/t=3.125之關係。另外,在成為圖4的(3)所示的狀態的情形(D=0.2~1.0mm)下,樹脂佔有率為72%。 Then, as the fourth order, the sealing resin 25 having the target value t=0.32 (mm) of the thickness is formed by using the four kinds of resin sealing materials Ma to Md shown in (1) to (4) of FIG. 4 (see the figure). 2 (2)). In the case of the state shown in (1) and (2) of FIG. 4, it is determined that the sealing resin 25 is not allowed, and the state shown in (3) and (4) of FIG. 4 is obtained. In the case, it is judged that it is allowed to be the sealing resin 25. Further, in the case of the state shown in (3) of FIG. 4, it is determined that the limit is allowed. Therefore, in the case where the lower limit of the second specification of the particle diameter D (mm) of the resin sealing material 5 is 0.2 mm, the second specification is obtained as shown in Fig. 4 (especially, (3) of Fig. 4). The upper limit of the estimated D = 1.0 (mm) is appropriate. The value of D=1.0 (mm) which is the upper limit of the second specification corresponds to the target value t=0.32 (mm) and the D/t=3.125 with respect to the thickness of the sealing resin 25. Further, in the case of the state shown in (3) of FIG. 4 (D=0.2 to 1.0 mm), the resin occupancy rate was 72%.

繼而,作為第4順序,係根據相當於根據圖4所推定的粒徑D(mm)的第2規格的上限(D=1.0(mm))的樹脂佔有率(72%),對圖3所示的情形下的粒徑D(mm)的第2規格的上限進行研究。在圖3的(3)中,粒徑D(mm)為D=0.2~1.0mm,樹脂佔有率為41%,在圖3的(4)中,粒徑D(mm)為D=0.2~0.4mm,樹脂佔有率為84%。當在該等之間按比例計算樹脂佔有率為72%的情形時,作為粒徑D(mm)的第2規格的上限,得到D=0.567mm。該D=0.567mm之值,相當於樹脂佔有率為72% 的情形,並且相當於相對於密封樹脂25的厚度的目標值t=0.19(mm),D/t=2.99之關係。 Then, the fourth order is based on the resin occupancy ratio (72%) corresponding to the upper limit (D=1.0 (mm)) of the second specification of the particle diameter D (mm) estimated from FIG. 4, and is shown in FIG. The upper limit of the second specification of the particle diameter D (mm) in the case shown is examined. In (3) of Fig. 3, the particle diameter D (mm) is D = 0.2 to 1.0 mm, and the resin occupancy rate is 41%. In (4) of Fig. 3, the particle diameter D (mm) is D = 0.2~ 0.4mm, the resin occupancy rate is 84%. When the resin occupancy ratio was calculated to be 72% between these, the upper limit of the second specification of the particle diameter D (mm) was D=0.567 mm. The value of D=0.567mm corresponds to a resin occupancy rate of 72%. In the case of the target value t = 0.19 (mm) and D/t = 2.99 with respect to the thickness of the sealing resin 25.

綜上所述,關於對粒徑D(mm)設定的第2規格,第2規格的下限為0.2mm的情形下的第2規格的上限與密封樹脂25的厚度的目標值t(mm)的關係(D/t),在圖3的情形為D/t=3.125,圖4的情形為D/t=2.99。根據該等情況,關於粒徑D(mm)的第2規格的上限與密封樹脂25的厚度的目標值t(mm)的關係,判斷為D/t=3.0大致是妥當的。 As described above, in the second specification set for the particle diameter D (mm), the upper limit of the second specification in the case where the lower limit of the second specification is 0.2 mm and the target value t (mm) of the thickness of the sealing resin 25 are The relationship (D/t) is D/t = 3.125 in the case of Fig. 3 and D/t = 2.99 in the case of Fig. 4. In view of the above, the relationship between the upper limit of the second specification of the particle diameter D (mm) and the target value t (mm) of the thickness of the sealing resin 25 is determined to be approximately D/t=3.0.

另外,圖3的(4)的情形判斷為十分充分允許作為密封樹脂25。根據該情況,判斷較佳為圖3的(4)所示的情形,亦即對粒徑D(mm)設定的第2規格的上限與密封樹脂25的厚度的目標值t(mm)的關係為D/t≒2.11的情形。因此,關於粒徑D(mm)的第2規格的上限與密封樹脂25的厚度的目標值t(mm)的較佳關係,判斷為D/t=2.0大致是妥當的。 In addition, the case of (4) of FIG. 3 is judged to be sufficiently sufficient as the sealing resin 25. In this case, it is preferable to determine the relationship between the upper limit of the second specification set for the particle diameter D (mm) and the target value t (mm) of the thickness of the sealing resin 25, as shown in (4) of FIG. 3 . It is the case of D/t≒2.11. Therefore, a preferable relationship between the upper limit of the second specification of the particle diameter D (mm) and the target value t (mm) of the thickness of the sealing resin 25 is determined to be approximately D/t = 2.0.

根據到目前為止的說明,關於粒徑D(mm)可以說以下的規格是妥當的。第一,在設置粒徑D的第2規格的下限之情形係為0.03(mm)≦D,且較佳為0.05(mm)≦D。第二,作為粒徑D的第2規格的上限,與密封樹脂25的厚度的目標值t(mm)的關係係為D≦3.0×t,且較佳係為D≦2.0×t。 According to the description so far, the following specifications can be said to be appropriate regarding the particle diameter D (mm). First, in the case where the lower limit of the second specification of the particle diameter D is set, it is 0.03 (mm) ≦D, and preferably 0.05 (mm) ≦D. Second, the relationship between the upper limit of the second specification of the particle diameter D and the target value t (mm) of the thickness of the sealing resin 25 is D ≦ 3.0 × t, and preferably D ≦ 2.0 × t.

因此,對粒徑D(mm)設定的第2規格為如下所示。亦即,第2規格成為粒徑D與密封樹脂25的厚度的目標值t(mm)相關的D≦3.0×t(mm)之規格。該第2規格,從提高樹脂密封用材料5的產率(有效利用率)之觀點來看是佳的。另一方面,從與更薄的電子元件28對應之觀點來看,較佳為D≦2.0×t(mm)之第2規格。根據抑制樹脂密封用材料5的 浮游和帶電之觀點,在對該等第2規格設置下限之情形,可附加0.03(mm)≦D之規格、或0.05(mm)≦D之規格。 Therefore, the second specification set for the particle diameter D (mm) is as follows. In other words, the second specification is a specification of D ≦ 3.0 × t (mm) in which the particle diameter D is related to the target value t (mm) of the thickness of the sealing resin 25 . This second specification is preferable from the viewpoint of improving the yield (effective utilization rate) of the resin sealing material 5. On the other hand, from the viewpoint of corresponding to the thinner electronic component 28, the second specification of D ≦ 2.0 × t (mm) is preferable. According to the material for suppressing resin sealing 5 From the viewpoint of floating and charging, a specification of 0.03 (mm) ≦D or a specification of 0.05 (mm) ≦D may be added in the case where the lower limit is set for the second specification.

本實施例之樹脂密封用材料5,作為密封樹脂25的厚度的目標值t的規格(第1規格),以滿足0.03(mm)≦t≦1.2(mm)之規格(較佳為0.05(mm)≦t≦1.0(mm)之規格)為前提,並滿足以下的第2規格。係粒徑D與密封樹脂25的厚度的目標值t相關的、D≦3.0×t(mm)之第2規格。從與更薄的電子元件28對應的觀點來看,較佳為D≦2.0×t(mm)之第2規格。在對該等第2規格設置下限之情形,可附加0.03(mm)≦D之規格、或0.05(mm)≦D之規格。 The resin sealing material 5 of the present embodiment has a specification (first specification) of the target value t of the thickness of the sealing resin 25, and satisfies the specification of 0.03 (mm) ≦ t ≦ 1.2 (mm) (preferably 0.05 (mm). The specification of ≦t≦1.0 (mm) is based on the premise and meets the following second specifications. The second dimension of D ≦ 3.0 × t (mm) in relation to the target value t of the thickness of the sealing resin 25 is the particle diameter D. From the viewpoint of corresponding to the thinner electronic component 28, the second specification of D ≦ 2.0 × t (mm) is preferable. In the case where the lower limit is set for the second specification, a specification of 0.03 (mm) ≦D or a specification of 0.05 (mm) ≦D may be added.

藉由樹脂密封用材料5滿足該等規格,而可得到以下的效果。第一,即使在密封樹脂25的厚度的目標值t較小之情形,換言之,即使在供給到腔室4的樹脂密封用材料5少量的情形下,亦可抑制樹脂密封用材料5在腔室底面不均勻地配置之情況。藉此,在圖1、2所示的腔室4中,可抑制樹脂密封用材料5熔融而生成的流動性樹脂22流動。因此,抑制引線16的變形、密封樹脂25中的未填充等的發生。 The resin sealing material 5 satisfies these specifications, and the following effects can be obtained. First, even in the case where the target value t of the thickness of the sealing resin 25 is small, in other words, even in the case where the resin sealing material 5 supplied to the chamber 4 is small, the resin sealing material 5 can be suppressed in the chamber. The case where the bottom surface is unevenly arranged. Thereby, in the chamber 4 shown in FIGS. 1 and 2, the fluid resin 22 generated by melting the resin sealing material 5 can be prevented from flowing. Therefore, the deformation of the lead 16 and the occurrence of unfilling or the like in the sealing resin 25 are suppressed.

第二,粒徑D的上限可控制成適當的值。因此,可抑制相對於厚度的目標值t具有較大的粒徑的粒狀樹脂的存在而引起的弊端的發生。具體而言,可抑制封裝中的密封樹脂的厚度的偏差。 Second, the upper limit of the particle diameter D can be controlled to an appropriate value. Therefore, it is possible to suppress the occurrence of the drawbacks caused by the presence of the granular resin having a large particle diameter with respect to the target value t of the thickness. Specifically, variations in the thickness of the sealing resin in the package can be suppressed.

第三,可抑制由具有小粒徑的樹脂密封用材料5浮游、或者由帶靜電而引起的樹脂密封用材料5往未意圖的地方附著。因此,可抑制如此之樹脂密封用材料5的附著而引起的弊端的發生。 Third, it is possible to suppress the resin sealing material 5 having a small particle diameter from floating, or the resin sealing material 5 caused by static electricity from adhering to an unintended place. Therefore, it is possible to suppress the occurrence of the drawbacks caused by the adhesion of the resin sealing material 5 as described above.

另外,在本申請文件中,對粒徑D設定的第2規格的下限, 並不意味著排除包含較該下限小的粒徑D的樹脂密封用材料5者。實際上,在搬送或計量樹脂密封用材料5等的過程中,因樹脂密封用材料5破裂或殘缺等,有可能生成微小的粉體或粒體(樹脂密封用材料5引起的微粒子,以下稱為「樹脂系微粒子」)。如此之樹脂系微粒子,有可能具有較粒徑D的第2規格的下限小的粒徑D。因此,以存在具有較粒徑D的第2規格的下限小的粒徑D的樹脂系微粒子為理由,而判斷為不屬於本發明之樹脂密封用材料5是不妥當的。 Further, in the present application, the lower limit of the second specification set for the particle diameter D is It does not mean that the resin sealing material 5 containing the particle diameter D smaller than the lower limit is excluded. In the process of transporting or measuring the resin sealing material 5 or the like, the resin sealing material 5 may be broken or defective, and minute powder or granules may be generated (fine particles caused by the resin sealing material 5, hereinafter referred to as It is "resin-based fine particles"). Such resin-based fine particles may have a particle diameter D which is smaller than the lower limit of the second specification of the particle diameter D. Therefore, it is not appropriate to determine that the resin-based fine particles having the particle diameter D having the smaller limit of the second specification of the second particle diameter D are not included in the resin sealing material 5 of the present invention.

[實施例2]參照圖5針對使用本發明之樹脂密封用材料5的樹脂密封裝置的一個實施例進行說明。如圖5所示,樹脂密封裝置A1,具備材料接收手段31、樹脂材料處理手段32、多個(在圖5為兩個)成形手段33、以及成形體分配手段34。材料接收手段31,具備接收密封前基板15的基板接收手段35、以及接收樹脂密封用材料5的樹脂材料接收手段36。從材料接收手段31依序經由樹脂材料處理手段32與多個成形手段33,到成形體分配手段34,設置有搬送軌道37。在搬送軌道37設置有主搬送手段38。主搬送手段38能夠沿著搬送軌道37在圖式之橫方向移動。另外,成形手段33亦可以為單個。 [Embodiment 2] An embodiment of a resin sealing device using the resin sealing material 5 of the present invention will be described with reference to Fig. 5 . As shown in FIG. 5, the resin sealing device A1 includes a material receiving means 31, a resin material processing means 32, a plurality of (two in FIG. 5) forming means 33, and a molded body distributing means 34. The material receiving means 31 includes a substrate receiving means 35 for receiving the sealed front substrate 15, and a resin material receiving means 36 for receiving the resin sealing material 5. The material receiving means 31 sequentially supplies the conveying rail 37 to the formed body distributing means 34 via the resin material processing means 32 and the plurality of forming means 33. The main conveyance means 38 is provided in the conveyance rail 37. The main conveyance means 38 is movable in the horizontal direction of the drawing along the conveyance rail 37. Alternatively, the forming means 33 may be single.

材料接收手段31,具有從樹脂密封裝置A1的外部接收密封前基板15的基板接收部39、以及將接收的密封前基板15搬送到主搬送手段38的基板搬送部40。樹脂材料接收手段36,具有從樹脂密封裝置A1的外部接收樹脂密封用材料5的樹脂接收部41、以及計量接收的樹脂密封用材料5的重量、體積等的計量部42。應計量的樹脂密封用材料5或計量後的樹脂密封用材料5,例如收容在由托盤(tray)等構成的容器43中。收容在 容器43的樹脂密封用材料5,藉由第1樹脂搬送部44就各容器43一起搬送到主搬送手段38。 The material receiving means 31 includes a substrate receiving portion 39 that receives the sealed front substrate 15 from the outside of the resin sealing device A1, and a substrate transfer portion 40 that transports the received sealed front substrate 15 to the main transfer means 38. The resin material receiving means 36 includes a resin receiving portion 41 that receives the resin sealing material 5 from the outside of the resin sealing device A1, and a measuring portion 42 that measures the weight, volume, and the like of the resin sealing material 5 that is received and received. The resin sealing material 5 to be measured or the resin sealing material 5 after the metering is housed, for example, in a container 43 made of a tray or the like. Contained in The resin sealing material 5 of the container 43 is transported to the main transport means 38 together with the respective containers 43 by the first resin transfer unit 44.

基板接收手段35與樹脂材料接收手段36,較佳為在第1樹脂搬送部44進退時,根據需要而藉由開閉的擋板45分隔。藉此,可抑制包含樹脂系微粒子的微粒子侵入基板接收手段35。 The substrate receiving means 35 and the resin material receiving means 36 are preferably separated by the opening and closing shutter 45 as needed when the first resin conveying unit 44 advances and retreats. Thereby, it is possible to suppress entry of fine particles containing resin-based fine particles into the substrate receiving means 35.

在使用本實施例之樹脂密封用材料5的樹脂密封裝置A1中,採用與樹脂材料處理手段32相關的以下的第1構成。亦即,在樹脂密封裝置A1中,樹脂材料處理手段32與材料接收手段31相鄰並設置成裝卸自如。藉由採用如此之第1構成,樹脂材料處理手段32根據需要而安裝於樹脂密封裝置A1,或者根據需要而從樹脂密封裝置A1拆卸。 In the resin sealing device A1 using the resin sealing material 5 of the present embodiment, the following first configuration relating to the resin material processing means 32 is employed. That is, in the resin sealing device A1, the resin material processing means 32 is adjacent to the material receiving means 31 and is detachably provided. By adopting such a first configuration, the resin material processing means 32 is attached to the resin sealing device A1 as needed, or is detached from the resin sealing device A1 as needed.

樹脂材料處理手段32,具有按照粒徑D的第2規格分選樹脂密封用材料5的分選手段46、以及粉碎分選的結果判斷為粒徑大於第2規格的規格外材料的粉碎手段47。此外,樹脂材料處理手段32,具有在樹脂接收部41、分選手段46與粉碎手段47之間,搬送樹脂密封用材料5及規格外材料的第2樹脂搬送部48。 The resin material processing means 32 has a sorting means 46 for sorting the resin sealing material 5 according to the second specification of the particle diameter D, and a pulverizing means 47 for determining that the particle diameter is larger than the outer material of the second specification by the result of the pulverization sorting. . In addition, the resin material processing means 32 has a second resin transfer portion 48 that transports the resin sealing material 5 and the specification material between the resin receiving portion 41, the sorting means 46, and the pulverizing means 47.

作為分選手段46,例如選擇或適宜組合光學性手段、氣流產生的離心力、篩網等眾知的手段而使用。作為粉碎手段47,例如使用攪拌、輥磨機(roll mill)等眾知的手段。分選手段46與粉碎手段47包含在樹脂材料處理手段32。 As the sorting means 46, for example, a known means such as selecting or suitably combining an optical means, a centrifugal force generated by a gas flow, or a screen is used. As the pulverizing means 47, for example, a known means such as stirring or a roll mill is used. The sorting means 46 and the pulverizing means 47 are included in the resin material processing means 32.

為了防止樹脂系微粒子等侵入基板接收手段35,較佳為在樹脂材料處理手段32設置以下的構成元件。該等構成元件,包含與擋板45一起運作將包含樹脂材料接收手段36、分選手段46與粉碎手段47的空間 與其他空間隔絕的擋板49、以及對存在於藉由擋板45與擋板49隔絕的空間中的微粒子進行吸引並集塵的集塵手段50。 In order to prevent the resin-based fine particles or the like from entering the substrate receiving means 35, it is preferable to provide the following constituent elements in the resin material processing means 32. The constituent elements include a space that operates together with the baffle 45 to include the resin material receiving means 36, the sorting means 46, and the pulverizing means 47. A baffle 49 that is isolated from other spaces, and a dust collecting means 50 that sucks and collects dust particles present in the space isolated by the baffle 45 and the baffle 49.

作為在分選手段46中所適用的粒徑D的第2規格,可以與對密封樹脂25的厚度的目標值t設定的第1規格相關聯而採用以下的規格。作為厚度的目標值t的第1規格,例如採用0.03(mm)≦t≦1.2(mm)之規格(較佳為0.05(mm)≦t≦1.0(mm)之規格)。作為對粒徑D的特定的範圍設定的第2規格,例如採用0.03(mm)≦D≦3.0×t(mm)之規格(較佳為0.05(mm)≦D≦2.0×t(mm)之規格)。 As the second specification of the particle diameter D to be applied to the sorting means 46, the following specifications can be used in association with the first specification for setting the target value t of the thickness of the sealing resin 25. The first specification of the target value t of the thickness is, for example, a specification of 0.03 (mm) ≦ t ≦ 1.2 (mm) (preferably a specification of 0.05 (mm) ≦ t ≦ 1.0 (mm)). As a second specification for setting a specific range of the particle diameter D, for example, a specification of 0.03 (mm) ≦D ≦ 3.0 × t (mm) is used (preferably 0.05 (mm) ≦ D ≦ 2.0 × t (mm) specification).

多個成形手段33,分別具有以下的構成元件。亦即,作為構成元件而被提出者,係追逐(chase)保持器51、安裝於追逐保持器51且具有腔室4的下模1、與下模1相對向設置且固定密封前基板15的上模2(圖5中未圖示)、於下模1與上模2之間供給並捲繞脫模膜6的第2供給手段52、以及對形成在下模1與上模2之間的外氣隔絕空間(參照圖1的(3)所示的外氣隔絕空間23)進行減壓的減壓泵53。 Each of the plurality of forming means 33 has the following constituent elements. In other words, the present invention is a chase holder 51, a lower mold 1 having the chamber 4 attached to the chasing holder 51, and a lower mold 1 disposed opposite to the lower mold 1 and fixedly sealing the front substrate 15. The upper mold 2 (not shown in FIG. 5), the second supply means 52 for supplying and winding the release film 6 between the lower mold 1 and the upper mold 2, and the second supply means 52 formed between the lower mold 1 and the upper mold 2 The external air isolation space (see the external air isolation space 23 shown in (3) of Fig. 1) is a decompression pump 53 that decompresses.

在成形體分配手段34,設置有搬送成形體26的成形體搬送部54、以及配置有由收容成形體26的托盤等構成的成形體用容器55的成形體收容部56。 The molded body distribution unit 34 is provided with a molded body transport portion 54 that transports the molded body 26, and a molded body storage portion 56 in which the molded body container 55 including the tray or the like that houses the molded body 26 is disposed.

在使用本實施例之樹脂密封用材料5的樹脂密封裝置A1中,除了與樹脂材料處理手段32相關的前述的第1構成之外,另採用有與單個或多個(圖5中為兩個)成形手段33相關的以下的第2構成。亦即,圖5所示的左側的成形手段33,與樹脂材料處理手段32相鄰,且與右側的成形手段33相鄰(換言之,係被樹脂材料處理手段32與右側的成形手段 33夾著),在樹脂密封裝置A1中設置成裝卸自如。此外,右側的成形手段33,與左側的成形手段33相鄰,且與成形體分配手段34相鄰(換言之,係被左側的成形手段33與成形體分配手段34夾著),在樹脂密封裝置A1中設置成裝卸自如。 In the resin sealing device A1 using the resin sealing material 5 of the present embodiment, in addition to the aforementioned first configuration relating to the resin material processing means 32, there are also one or more (two in FIG. 5). The following second configuration related to the forming means 33. That is, the forming means 33 on the left side shown in FIG. 5 is adjacent to the resin material processing means 32 and adjacent to the forming means 33 on the right side (in other words, the resin material processing means 32 and the right side forming means) 33 is sandwiched) and is detachably provided in the resin sealing device A1. Further, the right forming means 33 is adjacent to the left forming means 33 and adjacent to the formed body distributing means 34 (in other words, the left forming means 33 and the formed body distributing means 34 are interposed), and the resin sealing means is provided. A1 is set to be detachable.

另外,在樹脂密封裝置A1設置有單個成形手段33之情形,在樹脂密封裝置A1中,該成形手段33安裝成被樹脂材料處理手段32與成形體分配手段34夾著。假若從樹脂密封裝置A1拆卸成形體分配手段34,則能夠在樹脂密封裝置A1中以與該單個成形手段33的右側相鄰之方式裝卸其他成形手段33。 Further, in the case where the resin sealing device A1 is provided with a single molding means 33, the molding means 33 is mounted so as to be sandwiched by the resin material processing means 32 and the molded body distributing means 34. When the molded body distributing means 34 is detached from the resin sealing device A1, the other forming means 33 can be attached and detached to the right side of the single forming means 33 in the resin sealing device A1.

使用本實施例之樹脂密封用材料5的樹脂密封裝置A1,發揮了以下的效果。第一,藉由粉碎手段47粉碎藉由分選手段46分選的結果判斷為不滿足第2規格的規格外材料。藉由分選手段46分選粉碎後的規格外材料。將分選的結果判斷為滿足第2規格的第2規格內材料搬送到成形模。因此,能夠有效地利用供給到樹脂密封裝置A1的樹脂密封用材料5。 The resin sealing device A1 using the resin sealing material 5 of the present embodiment exhibited the following effects. First, the result of the sorting by the sorting means 46 is pulverized by the pulverizing means 47, and it is judged that the material of the specification of the second specification is not satisfied. The pulverized outer material is sorted by the sorting means 46. The result of the sorting is determined to be that the material in the second specification that satisfies the second specification is transferred to the forming mold. Therefore, the resin sealing material 5 supplied to the resin sealing device A1 can be effectively utilized.

第二,關於樹脂材料處理手段32,藉由採用第1構成,能夠根據需要,於事後將樹脂材料處理手段32安裝於樹脂密封裝置A1,或者,於事後將樹脂材料處理手段32從樹脂密封裝置A1拆卸。藉此,能夠根據樹脂密封用材料5的規格、電子元件28的密封樹脂25的厚度的目標值t(參照圖2)等,於事後對樹脂密封裝置A1安裝樹脂材料處理手段32,以及,於事後從樹脂密封裝置A1拆卸樹脂材料處理手段32。此外,能夠將在第1工廠中從樹脂密封裝置A1拆卸的樹脂材料處理手段32,移送到需要該樹脂材料處理手段32的第2工廠,並安裝於第2工廠保有的樹脂密封裝置 A1。因此,使用樹脂密封裝置A1的電子元件28(參照圖2的(4))的製造商,能夠根據市場的動向、樹脂密封用材料5及電子元件28的規格的變化等,容易地對樹脂密封裝置A1裝卸樹脂材料處理手段32。 Secondly, in the resin material processing means 32, the resin material processing means 32 can be attached to the resin sealing device A1 afterwards, or the resin material processing means 32 can be removed from the resin sealing device afterwards. A1 disassembly. By this, the resin material processing means 32 can be attached to the resin sealing device A1 after the specification of the resin sealing material 5, the target value t (see FIG. 2) of the thickness of the sealing resin 25 of the electronic component 28, and the like. The resin material processing means 32 is detached from the resin sealing device A1 afterwards. In addition, the resin material processing means 32 detached from the resin sealing device A1 in the first factory can be transferred to the second factory which requires the resin material processing means 32, and can be attached to the resin sealing device held in the second factory. A1. Therefore, the manufacturer of the electronic component 28 (see (4) of FIG. 2) using the resin sealing device A1 can easily seal the resin according to changes in the market direction, the resin sealing material 5, and the specifications of the electronic component 28. The apparatus A1 attaches and detaches the resin material processing means 32.

第三,關於各成形手段33,藉由採用前述的第2構成,各成形手段33根據需要而安裝於樹脂密封裝置A1,或者,根據需要而從樹脂密封裝置A1拆卸。藉此,能夠根據市場的動向、或需求的增減等,對樹脂密封裝置A1安裝並增設成形手段33,以及,從樹脂密封裝置A1拆卸成形手段33並減少成形手段33的數量。此外,能夠將在第1工廠中從樹脂密封裝置A1拆卸的成形手段33,移送到例如位於需求旺盛的其他地區的第2工廠,並安裝於第2工廠保有的樹脂密封裝置A1。因此,使用樹脂密封裝置A2的電子元件28(參照圖2的(4))的製造商,能夠根據市場的動向、或需求的增減等,而容易地調整電子元件28的生產能力。 Third, each of the forming means 33 is attached to the resin sealing device A1 as needed by the second configuration described above, or is detached from the resin sealing device A1 as needed. By this means, the molding means 33 can be attached and added to the resin sealing device A1 in accordance with the trend of the market or the increase or decrease in demand, and the molding means 33 can be detached from the resin sealing device A1 to reduce the number of the molding means 33. In addition, the molding means 33 that has been detached from the resin sealing device A1 in the first factory can be transferred to a second factory located in another area where demand is strong, and can be attached to the resin sealing device A1 held in the second factory. Therefore, the manufacturer using the electronic component 28 of the resin sealing device A2 (refer to (4) of FIG. 2) can easily adjust the productivity of the electronic component 28 in accordance with the market trend or the increase or decrease of demand.

第四,設置有集塵手段50,該集塵手段50係藉由擋板45與擋板49而將包含樹脂材料接收手段36、分選手段46與粉碎手段47的空間與其他空間隔絕,對存在於隔絕的空間的樹脂系微粒子等進行吸引並集塵。藉此,能夠集塵包含樹脂系微粒子的微粒子。因此,能夠抑制因包含樹脂系微粒子的異物附著於密封前基板15等而發生的弊端。 Fourth, a dust collecting means 50 is provided which isolates the space including the resin material receiving means 36, the sorting means 46 and the pulverizing means 47 from other spaces by the baffle 45 and the baffle 49, Resin-based fine particles or the like existing in the isolated space are sucked and collected. Thereby, the fine particles containing the resin-based fine particles can be collected. Therefore, it is possible to suppress the disadvantage that the foreign matter containing the resin-based fine particles adheres to the pre-sealed substrate 15 or the like.

第五,藉由使用脫模膜6,而能夠使成形體26容易地從下模1脫模(參照圖2的(2))。此外,透過脫模膜6,能夠將設在腔室面的微細的凹凸確實地轉印於密封樹脂25。藉由該等,在製造電子元件28(參照圖2的(4))之情形,能夠使品質提高。尤其是,在製造具有包含微細的凹凸的透鏡(例如,菲涅爾透鏡等)的光學元件時,能夠顯著地使品質 提高。 Fifth, by using the release film 6, the molded body 26 can be easily released from the lower mold 1 (see (2) of Fig. 2). Further, the release film 6 can reliably transfer the fine unevenness provided on the chamber surface to the sealing resin 25. By the above, in the case of manufacturing the electronic component 28 (see (4) of FIG. 2), the quality can be improved. In particular, when manufacturing an optical element having a lens (for example, a Fresnel lens or the like) including fine unevenness, the quality can be remarkably improved. improve.

第六,至少在中間合模狀態下形成外氣隔絕空間23,對該外氣隔絕空間23進行減壓(參照圖1的(3))。藉此,可抑制密封樹脂25中的氣泡的發生。因此,在製造電子元件28(參照圖2的(4))之情形,能夠使品質提高。尤其是,在製造具有透光性的密封樹脂25的光學元件之情形,能夠顯著地使品質提高。 Sixth, the external air insulating space 23 is formed at least in the intermediate mold clamping state, and the external air insulating space 23 is decompressed (refer to (3) of Fig. 1). Thereby, the occurrence of bubbles in the sealing resin 25 can be suppressed. Therefore, in the case of manufacturing the electronic component 28 (see (4) of FIG. 2), the quality can be improved. In particular, in the case of manufacturing an optical element of the light-transmitting sealing resin 25, the quality can be remarkably improved.

[實施例3]參照圖6,針對使用本發明之樹脂密封用材料5的樹脂密封裝置的另一個實施例進行說明。如圖6所示,在樹脂密封裝置A2中,採用有以下的第1~第3構成。 [Embodiment 3] Another embodiment of a resin sealing device using the resin sealing material 5 of the present invention will be described with reference to Fig. 6 . As shown in Fig. 6, in the resin sealing device A2, the following first to third configurations are employed.

第1構成係如下所示。亦即,圖6所示的左側的成形手段33與基板接收手段57相鄰,且與右側的成形手段33相鄰(換言之,係被基板接收手段57與右側的成形手段33夾著),並在樹脂密封裝置A2中設置成裝卸自如。此外,右側的成形手段33與左側的成形手段33相鄰,且與成形體分配手段34相鄰(換言之,係被左側的成形手段33與成形體分配手段34夾著),並在樹脂密封裝置A2中設置成裝卸自如。 The first configuration is as follows. That is, the forming means 33 on the left side shown in FIG. 6 is adjacent to the substrate receiving means 57, and is adjacent to the forming means 33 on the right side (in other words, the substrate receiving means 57 is sandwiched between the forming means 33 on the right side), and It is detachably provided in the resin sealing device A2. Further, the forming means 33 on the right side is adjacent to the forming means 33 on the left side, and is adjacent to the formed body distributing means 34 (in other words, the forming means 33 on the left side is sandwiched between the forming means 34), and is in the resin sealing means. A2 is set to be detachable.

第2構成係如下所示。亦即,在圖5所示的樹脂密封裝置A1中,樹脂材料接收手段36包含在材料接收手段31,相對於此,在樹脂密封裝置A2中,從基板接收手段57獨立出的樹脂材料接收手段58,以與樹脂材料處理手段59相鄰之方式設置。在圖6中,樹脂材料接收手段58與樹脂材料處理手段59,在圖式的上下方向相鄰。樹脂材料接收手段58與樹脂材料處理手段59,一起構成樹脂材料用手段60。此外,樹脂材料接收手段58與樹脂材料處理手段59係分別獨立的模組,並以能夠在樹脂材料用 手段60中分別裝卸之方式構成。亦即,能夠於事後,在具有樹脂材料接收手段58的樹脂材料用手段60,安裝樹脂材料處理手段59。 The second configuration is as follows. In the resin sealing device A1 shown in FIG. 5, the resin material receiving means 36 is included in the material receiving means 31, and the resin material receiving means independently from the substrate receiving means 57 in the resin sealing device A2. 58 is disposed adjacent to the resin material processing means 59. In Fig. 6, the resin material receiving means 58 and the resin material processing means 59 are adjacent to each other in the vertical direction of the drawing. The resin material receiving means 58 and the resin material processing means 59 constitute a resin material means 60. Further, the resin material receiving means 58 and the resin material processing means 59 are separate modules, and can be used for a resin material. The means 60 are configured to be attached and detached. In other words, the resin material processing means 59 can be attached to the resin material means 60 having the resin material receiving means 58 afterwards.

另外,在樹脂密封裝置A2設置有單個成形手段33之情形,在樹脂密封裝置A2中,該成形手段33安裝成被基板接收手段57與成形體分配手段34夾著。假若從樹脂密封裝置A2拆卸樹脂材料用手段60與成形體分配手段34,則能夠在樹脂密封裝置A2中,以與該單個成形手段33的右側相鄰之方式裝卸其他成形手段33。 Further, in the case where the resin sealing device A2 is provided with a single molding means 33, the molding means 33 is mounted so as to be sandwiched by the substrate receiving means 57 and the formed body distributing means 34. When the resin material means 60 and the molded body distributing means 34 are detached from the resin sealing device A2, the other forming means 33 can be attached and detached to the right side of the single forming means 33 in the resin sealing device A2.

第3構成係如下所示。亦即,樹脂材料用手段60,在俯視中為夾著單個或多個成形手段33(圖6中為兩個),設置在與基板接收手段57相反側。因此,在樹脂密封裝置A2中,接收密封前基板15的基板接收手段57、與接收且分選呈粉狀或粒狀的樹脂密封用材料5並根據需要而粉碎規格外材料的樹脂材料用手段60,以相距最遠之方式位置。 The third structure is as follows. In other words, the resin material means 60 is disposed on the opposite side of the substrate receiving means 57 in a plan view by sandwiching a single or a plurality of forming means 33 (two in FIG. 6). Therefore, in the resin sealing device A2, the substrate receiving means 57 for sealing the front substrate 15 and the resin material for receiving and sorting the resin sealing material 5 in powder or granular form and pulverizing the material outside the specification as needed are used. 60, in the farthest position.

根據第1構成,各成形手段33,根據需要而安裝於樹脂密封裝置A2,或者,根據需要而從樹脂密封裝置A2拆卸。因此,使用樹脂密封裝置A2的電子元件28(參照圖2的(4))的製造商,能夠根據市場的動向、或需求的增減等而容易地調整電子元件28的生產能力。 According to the first configuration, each molding means 33 is attached to the resin sealing device A2 as needed, or is detached from the resin sealing device A2 as needed. Therefore, the manufacturer using the electronic component 28 of the resin sealing device A2 (refer to (4) of FIG. 2) can easily adjust the productivity of the electronic component 28 in accordance with the market trend, the increase or decrease of demand, and the like.

根據第2構成,能夠於事後,在具有樹脂材料接收手段58的樹脂材料用手段60,安裝樹脂材料處理手段59。因此,伴隨著電子元件28具有的單位密封樹脂30(參照圖2的(4))的薄型化的進展等技術動向的變化,且根據電子元件28的製造商的期望,而能夠於事後追加樹脂材料處理手段59。 According to the second configuration, the resin material processing means 59 can be attached to the resin material means 60 having the resin material receiving means 58 afterwards. Therefore, with the change in the technical direction such as the progress of the thinning of the unit sealing resin 30 (see (4) of FIG. 2) of the electronic component 28, it is possible to add a resin afterwards depending on the desire of the manufacturer of the electronic component 28. Material handling means 59.

根據第3構成,能夠防止樹脂系微粒子等侵入基板接收手段 57。因此,能夠防止因包含樹脂系微粒子的異物附著於密封前基板15等而發生的弊端。 According to the third configuration, it is possible to prevent the resin-based fine particles or the like from entering the substrate receiving means. 57. Therefore, it is possible to prevent the disadvantage that foreign matter containing the resin-based fine particles adheres to the pre-sealed substrate 15 or the like.

此外,由於在樹脂密封裝置A2設置有分選手段46與粉碎手段47,因此與圖5所示的樹脂密封裝置A1的情形同樣地,能夠有效地利用供給到樹脂密封裝置A2的樹脂密封用材料5。 In addition, since the sorting means 46 and the pulverizing means 47 are provided in the resin sealing device A2, the resin sealing material supplied to the resin sealing device A2 can be effectively utilized in the same manner as in the case of the resin sealing device A1 shown in Fig. 5 . 5.

此外,由於設置了集塵手段50,該集塵手段50係藉由擋板45而將包含樹脂材料接收手段58、分選手段46與粉碎手段47的空間與其他空間隔絕,並對存在於隔絕的空間的微粒子進行吸引並集塵,因此,與圖5所示的樹脂密封裝置A1的情形同樣地,能夠抑制因包含樹脂系微粒子的異物附著於密封前基板15等而發生的弊端。 Further, since the dust collecting means 50 is provided, the dust collecting means 50 isolates the space including the resin material receiving means 58, the sorting means 46, and the pulverizing means 47 from the other space by the baffle 45, and isolates it from the other space. In the same manner as in the case of the resin sealing device A1 shown in FIG. 5, it is possible to suppress the occurrence of defects in which the foreign matter containing the resin-based fine particles adheres to the sealing front substrate 15 or the like.

此外,在樹脂密封裝置A2中,由於使用脫模膜6,因此與圖5所示的樹脂密封裝置A1的情形同樣地,在製造電子元件28(參照圖2的(4))之情形,能夠使品質提高。 Further, in the resin sealing device A2, since the release film 6 is used, similarly to the case of the resin sealing device A1 shown in Fig. 5, in the case of manufacturing the electronic component 28 (see (4) of Fig. 2), Improve quality.

此外,在樹脂密封裝置A2中,由於至少在中間合模狀態下形成外氣隔絕空間23,並對該外氣隔絕空間23進行減壓(參照圖1的(3)),因此與圖5所示的樹脂密封裝置A1的情形同樣地,在製造電子元件28(參照圖2的(4))之情形,能夠使品質提高。 Further, in the resin sealing device A2, since the external air insulating space 23 is formed at least in the intermediate mold clamping state, and the external air insulating space 23 is decompressed (refer to (3) of FIG. 1), FIG. 5 In the case of the resin sealing device A1 shown in the same manner, in the case of manufacturing the electronic component 28 (see (4) of FIG. 2), the quality can be improved.

另外,在圖6所示的樹脂密封裝置A2中,亦可以交換成形體分配手段34與樹脂材料用手段60的平面位置。在如此交換後之情形,樹脂材料用手段60與圖6所示的右側的成形手段33相鄰,且與成形體分配手段34相鄰(換言之,係被右側的成形手段33與成形體分配手段34夾著),並在樹脂密封裝置A2中設置成裝卸自如。 Further, in the resin sealing device A2 shown in Fig. 6, the planar position of the molded body distributing means 34 and the resin material means 60 can be exchanged. In the case of such exchange, the resin material means 60 is adjacent to the right side forming means 33 shown in Fig. 6, and is adjacent to the formed body distributing means 34 (in other words, the right side forming means 33 and the formed body distributing means) 34 is sandwiched) and is detachably mounted in the resin sealing device A2.

在本申請文件中說明的粒徑D,係指藉由光學性手段拍攝樹脂密封用材料5而得到的影像中的該等粒子的投影面積的面積等效圓直徑。因此,以同一樹脂密封用材料5為對象,並使用面積等效圓直徑的測定(計算)以外的其他測定法,例如費雷特直徑的測定、遮光法或篩選法等測定粒徑D之情形,有可能得到與本申請文件中的粒徑D不同的測定值。在使用其他測定法測定粒徑D之情形,置換成藉由本申請文件中的測定法測定之情形的測定值,而判斷是否包含在本申請文件中所說明的粒徑D的第2規格中。換言之,將使用其他測定法而得到的測定值與本申請文件中所說明的粒徑D的第2規格直接進行比對並不妥當。 The particle diameter D described in the present specification refers to the area equivalent circle diameter of the projected area of the particles in the image obtained by photographing the resin sealing material 5 by optical means. Therefore, the same resin sealing material 5 is used, and other measurement methods other than the measurement (calculation) of the area equivalent circle diameter, for example, the measurement of the Feret diameter, the shading method, or the screening method, are used to measure the particle diameter D. It is possible to obtain a measurement value different from the particle diameter D in the present application. When the particle diameter D is measured by another measurement method, it is judged whether or not it is included in the second specification of the particle diameter D described in the present specification by replacing it with the measurement value measured by the measurement method in the present application. In other words, it is not appropriate to directly compare the measured value obtained by using another measurement method with the second specification of the particle diameter D described in the present specification.

在測定樹脂密封用材料5的粒徑D之情形,使用從上方拍攝散佈在托盤的樹脂密封用材料5的方法、從側方拍攝從給料機(feeder)自由落下的樹脂密封用材料5的方法等。但是,並不限定於該等。可以設定成欲供給的樹脂密封用材料5的全數作為對象而測定粒徑D。取而代之,亦可從設定成欲供給的樹脂密封用材料5取出一部分樣品,並以該樣品作為對象而測定粒徑D。 In the case of measuring the particle diameter D of the resin sealing material 5, a method of photographing the resin sealing material 5 dispersed on the tray from above, and a method of photographing the resin sealing material 5 freely dropped from a feeder from the side is used. Wait. However, it is not limited to these. The particle diameter D can be measured for the entire number of the resin sealing materials 5 to be supplied. Alternatively, a part of the sample may be taken out from the resin sealing material 5 set to be supplied, and the particle diameter D may be measured for the sample.

在到目前為止的說明中,已針對在樹脂密封裝置A1、A2的內部設置有按照對粒徑D設定的第2規格分選樹脂密封用材料5的分選手段46、以及粉碎分選的結果判斷為粒徑D較第2規格大的規格外材料的粉碎手段47的例子進行了說明(參照圖5、6)。不限於此,作為變形例,亦可在樹脂密封裝置的外部設置分選手段與粉碎手段之兩者。在此情形下,可將在樹脂密封裝置的外部預先分選並根據需要而粉碎的樹脂密封用材料5供給到樹脂密封裝置。 In the description of the resin sealing devices A1 and A2, the sorting means 46 for sorting the resin sealing material 5 according to the second specification set for the particle diameter D, and the result of the pulverization sorting have been provided. An example of the pulverizing means 47 which determines that the particle diameter D is larger than the second specification is described (see Figs. 5 and 6). Not limited to this, as a modification, both the sorting means and the pulverizing means may be provided outside the resin sealing device. In this case, the resin sealing material 5 which is previously sorted outside the resin sealing device and pulverized as needed may be supplied to the resin sealing device.

作為其他變形例,亦可在樹脂密封裝置的內部設置分選手段,在樹脂密封裝置的外部設置粉碎判斷為不滿足粒徑D的第2規格的規格外材料的粉碎手段。將規格外材料移送到粉碎手段的步驟,可由作業者以手動進行,亦可使用沿著軌道移動的搬送手段或具有往復地旋轉的臂(arm)的搬送手段來進行。 As another modification, a sorting means may be provided inside the resin sealing device, and a pulverizing means for pulverizing the material of the second specification which does not satisfy the particle diameter D may be provided outside the resin sealing device. The step of transferring the material outside the specification to the pulverizing means may be performed manually by the operator, or may be performed by using a conveying means that moves along the rail or a conveying means having an arm that reciprocates.

在到目前為止說明的構成中,取代供給用擋板20,亦可在第1供給手段3設置樹脂密封用材料5的落下口。在該構成中,藉由一邊使樹脂密封用材料5落到腔室4,一邊使第1供給手段3移動,而對腔室4供給樹脂密封用材料5。作為樹脂密封用材料5的落下口,較佳為幾乎水平地設置具有槽狀的形狀的落下口。此外,較佳為:以在俯視中,使樹脂密封用材料5落下的軌述相對於腔室4的模面不相互重疊且不相交的方式,使第1供給手段3移動。進一步地,較佳為:藉由使用加振手段而對落下口施加振動,而一邊使樹脂密封用材料5振動一邊使樹脂密封用材料5對著腔室4的模面落下。 In the configuration described so far, instead of the supply baffle 20, the drop port of the resin sealing material 5 may be provided in the first supply means 3. In this configuration, the first sealing means 3 is moved while the resin sealing material 5 is dropped into the chamber 4, and the resin sealing material 5 is supplied to the chamber 4. As the drop port of the resin sealing material 5, it is preferable to provide a drop port having a groove shape almost horizontally. Further, it is preferable that the first supply means 3 is moved such that the orientation in which the resin sealing material 5 is dropped in plan view does not overlap with each other and the mold faces of the chamber 4 do not overlap each other. Further, it is preferable that the resin sealing material 5 is dropped against the mold surface of the chamber 4 while vibrating the resin sealing material 5 by applying vibration to the dropping port by using the vibration applying means.

在到目前為止說明的構成中,亦可採用以下的第1、第2變化構成。第1變化構成,係設置具有外框的第1供給手段,且以在俯視中為覆蓋外框與外框的內側的方式,在第1供給手段的下面吸附矩形狀的脫模膜6,且對由外框與脫模膜6包圍的空間構成的收容部供給樹脂密封用材料5的構成。根據該構成,在收容部收容有樹脂密封用材料5的狀態下,使第1供給手段移動到腔室4的上方。解除對脫模膜6的吸附的同時,在腔室4的內面吸附脫模膜6。藉此,對腔室4供給脫模膜6與樹脂密封用材料5。 In the configuration described so far, the following first and second variation configurations may be employed. In the first variation, the first supply means having the outer frame is provided, and the rectangular release film 6 is adsorbed on the lower surface of the first supply means so as to cover the inner side of the outer frame and the outer frame in plan view, and The resin sealing material 5 is supplied to the accommodating portion including the space surrounded by the outer frame and the release film 6. According to this configuration, the first supply means is moved above the chamber 4 in a state in which the resin sealing material 5 is housed in the accommodating portion. The release film 6 is adsorbed on the inner surface of the chamber 4 while releasing the adsorption of the release film 6. Thereby, the release film 6 and the resin sealing material 5 are supplied to the chamber 4.

第2變化構成,係設置具有凹部的第1供給手段,且對凹部供給樹脂密封用材料5,並在第1供給手段的上面吸附矩形狀的脫模膜6,使第1供給手段反轉的構成。根據該構成,使反轉後的第1供給手段移動到腔室4的上方。解除對脫模膜6的吸附的同時,在腔室4的內面吸附脫模膜6。藉此,對腔室4供給脫模膜6與樹脂密封用材料5。 In the second variation, the first supply means having the concave portion is provided, and the resin sealing material 5 is supplied to the concave portion, and the rectangular release film 6 is adsorbed on the upper surface of the first supply means to reverse the first supply means. Composition. According to this configuration, the inverted first supply means is moved above the chamber 4. The release film 6 is adsorbed on the inner surface of the chamber 4 while releasing the adsorption of the release film 6. Thereby, the release film 6 and the resin sealing material 5 are supplied to the chamber 4.

即使在上述的兩個變化構成中的任一者,在對第1供給手段供給樹脂密封用材料5時,亦可使用加振手段。此外,藉由對使樹脂密封用材料5對著第1供給手段落下的落下口施加振動,而能夠使樹脂密封用材料5振動。此時,較佳為:在第1供給手段的上方,一邊使樹脂密封用材料5振動,一邊使樹脂密封用材料5對著第1供給手段落下。 In any of the above-described two variations, the vibration applying means can be used when the resin sealing material 5 is supplied to the first supply means. In addition, the resin sealing material 5 can be vibrated by applying vibration to the dropping port which the resin sealing material 5 falls to the first supply means. In this case, it is preferable that the resin sealing material 5 is dropped toward the first supply means while vibrating the resin sealing material 5 above the first supply means.

在到目前為止的說明中,已針對將搬送密封前基板15與成形體26的搬送系統、與搬送樹脂密封用材料5的搬送系統,共同作為主搬送手段38的例子進行了說明(參照圖5、6)。取代如此之構成,亦可以將搬送密封前基板15與成形體26的搬送系統、與搬送樹脂密封用材料5的搬送系統設定成另一系統。 In the above-described description, the transfer system that transports the front substrate 15 and the molded body 26 and the transport system that transports the resin sealing material 5 are collectively described as an example of the main transport means 38 (see FIG. 5). , 6). In place of such a configuration, the transport system that transports the sealed front substrate 15 and the molded body 26 and the transport system that transports the resin sealing material 5 may be set to another system.

在到目前為止的說明中,已針對在一個成形手段33設置有 一組成形模的構成進行了說明(參照圖5、6)。取代如此之構成,亦可對一個成形手段33準備兩組包含下模1與上模2的一組成形模,並在上段與下段的兩段分別配置一組成形模。在該構成中,藉由使共同的模開閉機構動作,而可實質且同時地對上段的一組成形模與下段的一組成形模進行合模及開模。作為共同的模開閉機構,例如使用伺服電動機、液壓缸等驅動源、以及齒條(rack)與齒輪(pinion)等的傳動手段。根據該構成,在使用具有相同 的專有面積的成形手段33之情形,能夠實現兩倍的生產效率。 In the description so far, it has been set for a forming means 33 The configuration of a group of forming dies has been described (see Figs. 5 and 6). Instead of such a configuration, a plurality of sets of forming dies including the lower mold 1 and the upper mold 2 may be prepared for one forming means 33, and a plurality of forming dies may be disposed in the upper and lower stages, respectively. In this configuration, by operating the common mold opening and closing mechanism, it is possible to substantially and simultaneously clamp and mold a group of forming dies of the upper stage and a group of forming dies of the lower stage. As a common mold opening and closing mechanism, for example, a drive source such as a servo motor or a hydraulic cylinder, and a transmission means such as a rack and a pinion are used. According to this configuration, the use has the same In the case of the forming means 33 of the exclusive area, it is possible to achieve twice the production efficiency.

在到目前為止的說明中,已針對使用脫模膜6的實施例進行了說明(參照圖2的(2)、5、6)。但是,亦可根據成形模所使用的材料的物性與密封樹脂25的物性的組合,而不使用脫模膜6。 In the description so far, the embodiment using the release film 6 has been described (refer to (2), 5, and 6 of Fig. 2). However, the release film 6 may not be used depending on the combination of the physical properties of the material used for the molding die and the physical properties of the sealing resin 25.

在到目前為止的說明中,已針對至少在中間合模狀態下形成外氣隔絕空間23,並對該外氣隔絕空間23進行減壓的實施例進行了說明(參照圖1的(3))。但是,亦可根據對密封樹脂25所要求的與氣泡等相關的品質水準,而不實施形成外氣隔絕空間23、不實施對該外氣隔絕空間23進行減壓。 In the description so far, an example has been described in which the external air insulating space 23 is formed at least in the intermediate mold clamping state, and the external air insulating space 23 is decompressed (refer to (3) of FIG. 1). . However, the external air insulating space 23 may not be formed according to the quality level related to the air bubbles or the like required for the sealing resin 25, and the external air insulating space 23 may not be decompressed.

在到目前為止的說明中,如圖2的(3)、(4)所示,使成形體26以各區域18為單位單片化。例如,在圖2的(3)中的X方向存在四個、且Y方向存在四個區域18之情形,成形體26單片化成分別由一個區域18構成的16個電子元件28。但不限於此,亦可使成形體26單片化成於X方向合計一個且於Y方向合計四個的區域(以下表示為「1×4」),或者,亦可使成形體26單片化成合計為4×1的區域。如此,能夠製造分別由四個區域18構成的四個電子元件28。此外,能夠使成形體26單片化成2×2的區域,而製造分別由四個區域18構成的四個電子元件28。進一步地,可從成形體26去除端部中的不需要的部分,使成形體26單片化成4×4的區域,而製造十六個由區域18構成的一個電子元件28。因此,在晶片14為LED晶片之情形,能夠容易地製造列狀或面狀的光學元件(發光體)。 In the description so far, as shown in (3) and (4) of FIG. 2, the molded body 26 is singulated in units of the respective regions 18. For example, in the case where there are four in the X direction in FIG. 2 (3) and four regions 18 exist in the Y direction, the molded body 26 is singulated into 16 electronic components 28 each composed of one region 18. However, the molded body 26 may be formed into a single region in the X direction and a total of four in the Y direction (hereinafter referred to as "1 × 4"), or the molded body 26 may be formed into a single piece. The total is 4 x 1 area. In this way, four electronic components 28 each composed of four regions 18 can be manufactured. Further, the molded body 26 can be singulated into a 2 × 2 region, and four electronic components 28 each composed of four regions 18 can be manufactured. Further, an unnecessary portion in the end portion can be removed from the formed body 26, the formed body 26 can be singulated into a 4x4 region, and sixteen electronic components 28 composed of the region 18 can be fabricated. Therefore, in the case where the wafer 14 is an LED wafer, it is possible to easily manufacture a columnar or planar optical element (illuminant).

本發明並不限定於上述的實施例者,在不脫離本發明的宗旨的範圍內,可以根據需要,而任意且適當地組合、變更或選擇而採用者。 The present invention is not limited to the above-described embodiments, and may be arbitrarily and appropriately combined, changed, or selected as needed, without departing from the spirit and scope of the invention.

1‧‧‧下模 1‧‧‧下模

2‧‧‧上模 2‧‧‧上模

3‧‧‧第1供給手段 3‧‧‧1st means of supply

4‧‧‧腔室 4‧‧‧ chamber

5‧‧‧樹脂密封用材料 5‧‧‧Resin sealing materials

6‧‧‧脫模膜 6‧‧‧ release film

7‧‧‧外框構件 7‧‧‧Outer frame members

8‧‧‧腔室構件 8‧‧‧Cell components

9‧‧‧吸引通道(吸引手段) 9‧‧‧Attraction channel (attraction means)

10‧‧‧加熱器(加熱手段) 10‧‧‧heater (heating means)

11‧‧‧密封構件(外氣隔絕手段) 11‧‧‧ Sealing members (outside air isolation means)

12‧‧‧吸引通道(減壓手段) 12‧‧‧Attraction channel (decompression means)

13‧‧‧基板本體 13‧‧‧Substrate body

14‧‧‧晶片(電子零件) 14‧‧‧ wafer (electronic parts)

15‧‧‧密封前基板 15‧‧‧ Sealing the front substrate

16‧‧‧引線 16‧‧‧ lead

17‧‧‧邊界線 17‧‧‧ boundary line

18‧‧‧區域 18‧‧‧Area

19‧‧‧外框 19‧‧‧Front frame

20‧‧‧供給用擋板 20‧‧‧Supply baffle

21‧‧‧收容部 21‧‧‧ Housing Department

22‧‧‧熔融樹脂 22‧‧‧ molten resin

23‧‧‧外氣隔絕空間 23‧‧‧External air isolation space

24‧‧‧被排出的氣體等 24‧‧‧Exhausted gases, etc.

D‧‧‧粒徑 D‧‧‧particle size

Claims (16)

一種樹脂密封用材料,係在使用設置於樹脂密封裝置且具有腔室的壓縮成形用的成形模並藉由密封樹脂對安裝於基板本體的電子零件進行樹脂密封時,被使用作為所述密封樹脂的原材料,包含樹脂材料且呈粉狀或粒狀,其特徵在於:所述密封樹脂的厚度,係從在所述基板本體中裝附有所述電子零件的面至所述密封樹脂的上面的尺寸;在對所述密封樹脂的厚度的目標值t(mm)設定第1規格的情形下,所述樹脂密封用材料的粒徑D滿足D≦a×t(mm)之第2規格;所述第1規格係0.03(mm)≦t≦1.2(mm),其中a為正實數;所述係數a滿足2.99≦a≦3.125。 A resin sealing material is used as the sealing resin when a molding die for compression molding provided in a resin sealing device and having a chamber is used, and an electronic component mounted on the substrate body is resin-sealed by a sealing resin. a raw material comprising a resin material and being in the form of powder or granules, wherein the thickness of the sealing resin is from a surface on which the electronic component is mounted in the substrate body to an upper surface of the sealing resin In the case where the first specification is set to the target value t (mm) of the thickness of the sealing resin, the particle diameter D of the resin sealing material satisfies the second specification of D≦a×t (mm); The first specification is 0.03 (mm) ≦ t ≦ 1.2 (mm), where a is a positive real number; the coefficient a satisfies 2.99 ≦ a ≦ 3.125. 如申請專利範圍第1項之樹脂密封用材料,其中,所述第1規格係0.05(mm)≦t≦1.0(mm)。 The resin sealing material according to claim 1, wherein the first specification is 0.05 (mm) ≦ t ≦ 1.0 (mm). 如申請專利範圍第1或2項之樹脂密封用材料,其中,所述第2規格藉由根據拍攝所述樹脂密封用材料而得到的影像計算出投影面積,且將該投影面積的面積等效圓直徑處理作為所述粒徑D而應用,所述a的值係3.0。 The resin sealing material according to claim 1 or 2, wherein the second specification calculates a projected area by an image obtained by photographing the resin sealing material, and the area of the projected area is equivalent The circular diameter treatment is applied as the particle diameter D, and the value of a is 3.0. 如申請專利範圍第1或2項之樹脂密封用材料,其中,利用氣流產生的離心力、或利用篩判斷所述樹脂密封用材料是否滿足所述第2規格。 The resin sealing material according to claim 1 or 2, wherein the resin sealing material is used to determine whether or not the resin sealing material satisfies the second specification by a centrifugal force generated by a gas flow or by a sieve. 如申請專利範圍第1或2項之樹脂密封用材料,其中,所述樹脂材料具 有熱固性。 The resin sealing material according to claim 1 or 2, wherein the resin material has It has thermosetting properties. 如申請專利範圍第5項之樹脂密封用材料,其中,所述樹脂材料包含環氧系樹脂或矽系樹脂。 The resin sealing material according to claim 5, wherein the resin material contains an epoxy resin or a lanthanum resin. 如申請專利範圍第1或2項之樹脂密封用材料,其中,所述樹脂材料具有透光性。 The resin sealing material according to claim 1 or 2, wherein the resin material has light transmissivity. 如申請專利範圍第1或2項之樹脂密封用材料,其中,該樹脂密封用材料包含至少具有所述樹脂材料、添加劑及填充劑的第1規格內材料;所述樹脂材料係粉狀或粒狀;所述第1規格內材料係至少混煉並粉碎所述樹脂材料、所述添加劑及所述填充劑而成的粉碎物根據所述第2規格(D≦a×t(mm))而分選的結果判斷為滿足所述第2規格的材料。 The resin sealing material according to claim 1 or 2, wherein the resin sealing material comprises a material of a first specification having at least the resin material, an additive, and a filler; the resin material is powder or granule The material of the first specification is obtained by kneading at least the resin material, the additive, and the filler, and the pulverized material is pulverized according to the second specification (D≦a×t(mm)). The result of the sorting was judged to be a material satisfying the second specification. 如申請專利範圍第1或2項之樹脂密封用材料,其中,該樹脂密封用材料包含至少具有所述樹脂材料、添加劑及填充劑的第2規格內材料;所述樹脂材料係粉狀或粒狀;所述第2規格內材料係在至少混煉並粉碎所述樹脂材料、所述添加劑及所述填充劑而成的第1粉碎物根據所述第2規格(D≦a×t(mm))而分選的結果判斷為不滿足所述第2規格的規格外材料被進一步粉碎而生成第2粉碎物下,該第2粉碎物根據所述第2規格分選的結果判斷為滿足所述第2規格的材料。 The resin sealing material according to claim 1 or 2, wherein the resin sealing material comprises a material of a second specification having at least the resin material, an additive, and a filler; the resin material is powder or granule The material of the second specification is a first pulverized material obtained by kneading and pulverizing at least the resin material, the additive, and the filler according to the second specification (D≦a×t (mm) And the result of the sorting is determined to be that the material other than the specification of the second specification is further pulverized to generate the second pulverized material, and the second pulverized material is judged to be satisfactory according to the result of the second specification sorting. The material of the second specification. 如申請專利範圍第1或2項之樹脂密封用材料,其中,所述樹脂密封用 材料包含第1規格內材料;所述樹脂密封用材料係在從供給到所述樹脂密封裝置到供給到所述腔室之間根據所述第2規格(D≦a×t(mm))而分選的結果判斷為滿足所述第2規格的材料。 The resin sealing material according to claim 1 or 2, wherein the resin sealing is used The material includes a material in the first specification; and the resin sealing material is supplied between the resin sealing device and the chamber to the chamber according to the second specification (D≦a×t(mm)). The result of the sorting was judged to be a material satisfying the second specification. 如申請專利範圍第1或2項之樹脂密封用材料,其中,所述樹脂密封用材料包含第2規格內材料;所述第2規格內材料係在所述樹脂密封用材料在從供給到所述樹脂密封裝置到供給到所述腔室之間根據所述第2規格(D≦a×t(mm))而分選的結果判斷為不滿足所述第2規格的規格外材料被粉碎而生成粉碎物下,該粉碎物根據所述第2規格而分選的結果判斷為滿足所述第2規格的材料。 The resin sealing material according to the first or second aspect of the invention, wherein the resin sealing material comprises a material of a second specification; and the material of the second specification is a material for sealing the resin. When the resin sealing device is supplied to the chamber and sorted according to the second specification (D≦a×t(mm)), it is determined that the material that does not satisfy the specification of the second specification is pulverized. When the pulverized material was produced, the pulverized material was sorted according to the second specification, and it was judged that the material of the second specification was satisfied. 一種樹脂密封用材料之製造方法,所述樹脂密封用材料係在使用設置於樹脂密封裝置且具有腔室的壓縮成形用的成形模並藉由密封樹脂對安裝於基板本體的電子零件進行樹脂密封時,被使用作為所述密封樹脂的原材料,且呈粉狀或粒狀;所述樹脂密封用材料之製造方法之特徵在於,包含:準備至少包含呈粉狀或粒狀的樹脂材料、添加劑及填充劑的原材料組的步驟;混煉所述原材料組的步驟;混煉所述原材料組並生成第1中間材料的步驟;粉碎所述中間材料並生成第2中間材料的步驟; 所述密封樹脂的厚度,係從在所述基板本體中裝附有所述電子零件的面至所述密封樹脂的上面的尺寸,而在對所述密封樹脂的厚度的目標值t(mm)設定第1規格的情形下,根據所述樹脂密封用材料的粒徑D為D≦a×t(mm)之第2規格(其中a為正實數),分選所述第2中間材料的步驟;以及將所述原材料組之中判斷為滿足所述第2規格的第1規格內材料決定為所述樹脂密封用材料的步驟;所述第1規格係0.03(mm)≦t≦1.2(mm);所述係數a滿足2.99≦a≦3.125。 A method for producing a resin sealing material which is obtained by resin-sealing an electronic component mounted on a substrate body by a sealing resin using a molding die for compression molding provided in a resin sealing device and having a chamber When it is used as a raw material of the sealing resin, and is in the form of powder or granules, the method for producing a resin sealing material is characterized by comprising: preparing a resin material containing at least powder or granules, an additive, and a step of a raw material group of the filler; a step of kneading the raw material group; a step of kneading the raw material group to form a first intermediate material; and a step of pulverizing the intermediate material to form a second intermediate material; The thickness of the sealing resin is a size from a surface on which the electronic component is mounted in the substrate body to an upper surface of the sealing resin, and a target value t (mm) to a thickness of the sealing resin. When the first specification is set, the step of sorting the second intermediate material is based on the second specification of the particle diameter D of the resin sealing material being D≦a×t (mm) (where a is a positive real number). And a step of determining, as the resin sealing material, a material in the first specification that satisfies the second specification among the raw material groups; the first specification is 0.03 (mm) ≦t ≦ 1.2 (mm) The coefficient a satisfies 2.99≦a≦3.125. 如申請專利範圍第12項之樹脂密封用材料之製造方法,其中,所述第1規格係0.05(mm)≦t≦1.0(mm)。 The method for producing a resin sealing material according to claim 12, wherein the first specification is 0.05 (mm) ≦t ≦ 1.0 (mm). 如申請專利範圍第13項之樹脂密封用材料之製造方法,其中,在分選所述原材料組的步驟中,藉由根據拍攝所述樹脂密封用材料而得到的影像計算出投影面積,且將該投影面積的面積等效圓直徑處理作為所述粒徑D而應用於所述第2規格;所述a的值係3.0。 The method for producing a resin sealing material according to claim 13, wherein in the step of sorting the raw material group, a projected area is calculated by an image obtained by photographing the resin sealing material, and The area equivalent circular diameter process of the projected area is applied to the second specification as the particle diameter D; the value of a is 3.0. 如申請專利範圍第13項之樹脂密封用材料之製造方法,其中,在分選所述原材料組的步驟中,利用氣流產生的離心力、或利用篩判斷所述樹脂密封用材料是否滿足所述第2規格。 The method for producing a resin sealing material according to claim 13, wherein in the step of sorting the raw material group, whether the resin sealing material satisfies the first portion by using a centrifugal force generated by a gas flow or using a sieve 2 specifications. 如申請專利範圍第12至15項中任一項之樹脂密封用材料之製造方法,其中,進一步包含: 粉碎在分選所述原材料組的步驟中根據所述第2規格而分選的結果判斷為不滿足所述第2規格(D≦a×t(mm))的規格外材料的步驟;根據所述第2規格而分選粉碎後的所述規格外材料的步驟;以及將粉碎後的所述規格外材料之中判斷為滿足所述第2規格的第2規格內材料決定為所述樹脂密封用材料的步驟。 The method for producing a resin sealing material according to any one of claims 12 to 15, wherein the method further comprises: a step of smashing the result of sorting according to the second specification in the step of sorting the raw material group, and determining that the material of the second specification (D≦a×t(mm)) is not satisfied; The step of sorting the pulverized outer material of the specification in the second specification; and determining the material in the second specification that satisfies the second specification among the pulverized outer materials as the resin seal The steps of using materials.
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