TWI600807B - 熔化固體矽的方法 - Google Patents

熔化固體矽的方法 Download PDF

Info

Publication number
TWI600807B
TWI600807B TW105121889A TW105121889A TWI600807B TW I600807 B TWI600807 B TW I600807B TW 105121889 A TW105121889 A TW 105121889A TW 105121889 A TW105121889 A TW 105121889A TW I600807 B TWI600807 B TW I600807B
Authority
TW
Taiwan
Prior art keywords
crucible
solid
melt
upper opening
melting
Prior art date
Application number
TW105121889A
Other languages
English (en)
Chinese (zh)
Other versions
TW201704558A (zh
Inventor
庫克 泰 度
湯瑪士 巴士查哈德
德克 澤馬克
Original Assignee
世創電子材料公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 世創電子材料公司 filed Critical 世創電子材料公司
Publication of TW201704558A publication Critical patent/TW201704558A/zh
Application granted granted Critical
Publication of TWI600807B publication Critical patent/TWI600807B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14Heating of the melt or the crystallised materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
TW105121889A 2015-07-17 2016-07-12 熔化固體矽的方法 TWI600807B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102015213474.1A DE102015213474A1 (de) 2015-07-17 2015-07-17 Verfahren zum Schmelzen von festem Silizium

Publications (2)

Publication Number Publication Date
TW201704558A TW201704558A (zh) 2017-02-01
TWI600807B true TWI600807B (zh) 2017-10-01

Family

ID=54053857

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105121889A TWI600807B (zh) 2015-07-17 2016-07-12 熔化固體矽的方法

Country Status (4)

Country Link
CN (1) CN107923064A (de)
DE (1) DE102015213474A1 (de)
TW (1) TWI600807B (de)
WO (1) WO2017012733A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110106546B (zh) * 2019-05-24 2021-04-27 浙江大学 一种高成品率铸造单晶硅生长方法和热场结构
US20220064816A1 (en) * 2020-09-01 2022-03-03 Globalwafers Co., Ltd. Crystal pulling systems having a cover member for covering the silicon charge and methods for growing a melt of silicon in a crucible assembly
CN113862772A (zh) * 2021-09-27 2021-12-31 云南北方光学科技有限公司 大尺寸红外光学用锗窗口材料的制备装置及用其制备大尺寸红外光学用锗窗口材料的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6313398B1 (en) * 1999-06-24 2001-11-06 Shin-Etsu Chemical Co., Ltd. Ga-doped multi-crytsalline silicon, Ga-doped multi-crystalline silicon wafer and method for producing the same
TW201413071A (zh) * 2012-09-25 2014-04-01 Memc Electronic Materials 使用高壓熔毀以準備熔態矽熔化物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03193694A (ja) * 1989-12-21 1991-08-23 Sumitomo Metal Ind Ltd 結晶成長装置
DE102005006186A1 (de) * 2005-02-10 2006-08-24 Siltronic Ag Verfahren zur Herstellung eines Einkristalls aus Silizium mit kontrolliertem Kohlenstoffgehalt
JP5413354B2 (ja) * 2010-10-22 2014-02-12 株式会社Sumco シリコン単結晶引き上げ装置及びシリコン単結晶の製造方法
JP2015527295A (ja) * 2012-09-10 2015-09-17 ジーティーエイティー アイピー ホールディング エルエルシーGtat Ip Holding Llc 連続チョクラルスキー法及び装置
TWM485251U (zh) * 2014-04-03 2014-09-01 Globalwafers Co Ltd 晶體生長裝置及其保溫罩

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6313398B1 (en) * 1999-06-24 2001-11-06 Shin-Etsu Chemical Co., Ltd. Ga-doped multi-crytsalline silicon, Ga-doped multi-crystalline silicon wafer and method for producing the same
TW201413071A (zh) * 2012-09-25 2014-04-01 Memc Electronic Materials 使用高壓熔毀以準備熔態矽熔化物

Also Published As

Publication number Publication date
DE102015213474A1 (de) 2015-09-24
WO2017012733A1 (de) 2017-01-26
CN107923064A (zh) 2018-04-17
TW201704558A (zh) 2017-02-01

Similar Documents

Publication Publication Date Title
JP4225688B2 (ja) ポリシリコン装填物からシリコンメルトを製造する方法
TWI600807B (zh) 熔化固體矽的方法
TWI428482B (zh) 製備用於矽晶體成長之矽粉末融化物之方法
US9359691B2 (en) Method of loading a charge of polysilicon into a crucible
TWI609104B (zh) 連續cz方法和設備
JP2006219366A (ja) 制御された炭素含有量を有するシリコンからなる単結晶の製造方法
CN113073384A (zh) 一种可有效减少SiC单晶缺陷的方法及装置
US20110114011A1 (en) Method of manufacturing silicon single crystal
JP6681687B2 (ja) 炭化珪素単結晶インゴット製造用の黒鉛坩堝及び炭化珪素単結晶インゴットの製造方法
JP6579046B2 (ja) シリコン単結晶の製造方法
JP2005053722A (ja) 単結晶製造装置及び単結晶の製造方法
JP6471700B2 (ja) リチャージ装置を用いたシリコン原料の融解方法
JP6708173B2 (ja) リチャージ管及び単結晶の製造方法
JPH06100394A (ja) 単結晶製造用原料供給方法及び装置
JP7398702B2 (ja) 単結晶育成装置及び単結晶育成装置保護方法
JP2009274928A (ja) 分割式ヒーターならびにこれを用いた単結晶引上げ装置および引上げ方法
JP7285197B2 (ja) 単結晶引上方法及び単結晶引上装置
JP6451478B2 (ja) シリコン単結晶の製造方法
KR102138455B1 (ko) 단결정 성장용 열차폐 부재 및 이를 적용한 단결정 성장장치
JP2011057460A (ja) シリコン単結晶の育成方法
JP2007254162A (ja) 単結晶製造装置およびリチャージ方法
JP2010006657A (ja) シリコン単結晶の製造装置およびシリコン単結晶の製造方法
JP2019043788A (ja) 単結晶育成方法及び単結晶育成装置
JP2004292288A (ja) シリコン単結晶原料の溶解方法
JP5510359B2 (ja) 炭素ドープシリコン単結晶の製造方法