TWI600807B - 熔化固體矽的方法 - Google Patents
熔化固體矽的方法 Download PDFInfo
- Publication number
- TWI600807B TWI600807B TW105121889A TW105121889A TWI600807B TW I600807 B TWI600807 B TW I600807B TW 105121889 A TW105121889 A TW 105121889A TW 105121889 A TW105121889 A TW 105121889A TW I600807 B TWI600807 B TW I600807B
- Authority
- TW
- Taiwan
- Prior art keywords
- crucible
- solid
- melt
- upper opening
- melting
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102015213474.1A DE102015213474A1 (de) | 2015-07-17 | 2015-07-17 | Verfahren zum Schmelzen von festem Silizium |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201704558A TW201704558A (zh) | 2017-02-01 |
TWI600807B true TWI600807B (zh) | 2017-10-01 |
Family
ID=54053857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105121889A TWI600807B (zh) | 2015-07-17 | 2016-07-12 | 熔化固體矽的方法 |
Country Status (4)
Country | Link |
---|---|
CN (1) | CN107923064A (de) |
DE (1) | DE102015213474A1 (de) |
TW (1) | TWI600807B (de) |
WO (1) | WO2017012733A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110106546B (zh) * | 2019-05-24 | 2021-04-27 | 浙江大学 | 一种高成品率铸造单晶硅生长方法和热场结构 |
US20220064816A1 (en) * | 2020-09-01 | 2022-03-03 | Globalwafers Co., Ltd. | Crystal pulling systems having a cover member for covering the silicon charge and methods for growing a melt of silicon in a crucible assembly |
CN113862772A (zh) * | 2021-09-27 | 2021-12-31 | 云南北方光学科技有限公司 | 大尺寸红外光学用锗窗口材料的制备装置及用其制备大尺寸红外光学用锗窗口材料的方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6313398B1 (en) * | 1999-06-24 | 2001-11-06 | Shin-Etsu Chemical Co., Ltd. | Ga-doped multi-crytsalline silicon, Ga-doped multi-crystalline silicon wafer and method for producing the same |
TW201413071A (zh) * | 2012-09-25 | 2014-04-01 | Memc Electronic Materials | 使用高壓熔毀以準備熔態矽熔化物 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03193694A (ja) * | 1989-12-21 | 1991-08-23 | Sumitomo Metal Ind Ltd | 結晶成長装置 |
DE102005006186A1 (de) * | 2005-02-10 | 2006-08-24 | Siltronic Ag | Verfahren zur Herstellung eines Einkristalls aus Silizium mit kontrolliertem Kohlenstoffgehalt |
JP5413354B2 (ja) * | 2010-10-22 | 2014-02-12 | 株式会社Sumco | シリコン単結晶引き上げ装置及びシリコン単結晶の製造方法 |
JP2015527295A (ja) * | 2012-09-10 | 2015-09-17 | ジーティーエイティー アイピー ホールディング エルエルシーGtat Ip Holding Llc | 連続チョクラルスキー法及び装置 |
TWM485251U (zh) * | 2014-04-03 | 2014-09-01 | Globalwafers Co Ltd | 晶體生長裝置及其保溫罩 |
-
2015
- 2015-07-17 DE DE102015213474.1A patent/DE102015213474A1/de not_active Ceased
-
2016
- 2016-05-17 CN CN201680041964.8A patent/CN107923064A/zh active Pending
- 2016-05-17 WO PCT/EP2016/061025 patent/WO2017012733A1/de active Application Filing
- 2016-07-12 TW TW105121889A patent/TWI600807B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6313398B1 (en) * | 1999-06-24 | 2001-11-06 | Shin-Etsu Chemical Co., Ltd. | Ga-doped multi-crytsalline silicon, Ga-doped multi-crystalline silicon wafer and method for producing the same |
TW201413071A (zh) * | 2012-09-25 | 2014-04-01 | Memc Electronic Materials | 使用高壓熔毀以準備熔態矽熔化物 |
Also Published As
Publication number | Publication date |
---|---|
DE102015213474A1 (de) | 2015-09-24 |
WO2017012733A1 (de) | 2017-01-26 |
CN107923064A (zh) | 2018-04-17 |
TW201704558A (zh) | 2017-02-01 |
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