TWI590360B - 基板液體處理裝置 - Google Patents
基板液體處理裝置 Download PDFInfo
- Publication number
- TWI590360B TWI590360B TW103144685A TW103144685A TWI590360B TW I590360 B TWI590360 B TW I590360B TW 103144685 A TW103144685 A TW 103144685A TW 103144685 A TW103144685 A TW 103144685A TW I590360 B TWI590360 B TW I590360B
- Authority
- TW
- Taiwan
- Prior art keywords
- cup
- liquid
- flow path
- substrate
- exhaust
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims description 250
- 239000000758 substrate Substances 0.000 title claims description 85
- 230000007246 mechanism Effects 0.000 claims description 34
- 238000004140 cleaning Methods 0.000 claims description 25
- 230000002093 peripheral effect Effects 0.000 claims description 18
- 238000007599 discharging Methods 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- 210000003323 beak Anatomy 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 67
- 238000011084 recovery Methods 0.000 description 22
- 239000003595 mist Substances 0.000 description 20
- 239000012530 fluid Substances 0.000 description 16
- 238000005192 partition Methods 0.000 description 8
- 238000005406 washing Methods 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000003028 elevating effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000012447 hatching Effects 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013272204 | 2013-12-27 | ||
| JP2014211908A JP6287750B2 (ja) | 2013-12-27 | 2014-10-16 | 基板液処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201539610A TW201539610A (zh) | 2015-10-16 |
| TWI590360B true TWI590360B (zh) | 2017-07-01 |
Family
ID=53482645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103144685A TWI590360B (zh) | 2013-12-27 | 2014-12-22 | 基板液體處理裝置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9953848B2 (enExample) |
| JP (1) | JP6287750B2 (enExample) |
| KR (1) | KR102337721B1 (enExample) |
| TW (1) | TWI590360B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI751432B (zh) * | 2018-09-07 | 2022-01-01 | 日商芝浦機械電子裝置股份有限公司 | 基板處理裝置及基板處理方法 |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6090113B2 (ja) * | 2013-10-30 | 2017-03-08 | 東京エレクトロン株式会社 | 液処理装置 |
| WO2016076303A1 (ja) * | 2014-11-11 | 2016-05-19 | 株式会社荏原製作所 | 基板洗浄装置 |
| KR102062873B1 (ko) | 2015-10-04 | 2020-01-06 | 어플라이드 머티어리얼스, 인코포레이티드 | 작은 열 질량의 가압 챔버 |
| JP6703100B2 (ja) | 2015-10-04 | 2020-06-03 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 容積が縮小された処理チャンバ |
| CN116207033A (zh) * | 2015-10-04 | 2023-06-02 | 应用材料公司 | 基板支撑件和挡板设备 |
| JP6699335B2 (ja) * | 2016-05-10 | 2020-05-27 | トヨタ自動車株式会社 | 基板洗浄装置 |
| JP6665042B2 (ja) * | 2016-06-21 | 2020-03-13 | 東京エレクトロン株式会社 | 基板処理装置、基板処理装置の洗浄方法及び記憶媒体 |
| JP6739268B2 (ja) * | 2016-07-25 | 2020-08-12 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| TWI638394B (zh) * | 2016-07-25 | 2018-10-11 | 斯庫林集團股份有限公司 | 基板處理裝置 |
| JP6836913B2 (ja) * | 2017-01-17 | 2021-03-03 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及び記憶媒体 |
| JP6961362B2 (ja) * | 2017-03-03 | 2021-11-05 | 東京エレクトロン株式会社 | 基板処理装置 |
| US11498100B2 (en) * | 2017-03-06 | 2022-11-15 | Acm Research (Shanghai) Inc. | Apparatus for cleaning semiconductor substrates |
| JP6788542B2 (ja) * | 2017-03-31 | 2020-11-25 | 東京エレクトロン株式会社 | 基板液処理装置 |
| KR102447277B1 (ko) * | 2017-11-17 | 2022-09-26 | 삼성전자주식회사 | 스핀 코터 및 이를 구비하는 기판처리 장치와 기판처리 시스템 |
| JP7002969B2 (ja) * | 2018-03-19 | 2022-01-20 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| TWI743391B (zh) * | 2018-09-05 | 2021-10-21 | 大陸商盛美半導體設備（上海）股份有限公司 | 半導體基板清洗裝置 |
| CN112053970B (zh) * | 2019-06-05 | 2024-11-08 | 东京毅力科创株式会社 | 基板处理装置 |
| JP7314634B2 (ja) * | 2019-06-11 | 2023-07-26 | 東京エレクトロン株式会社 | 塗布装置及び塗布方法 |
| KR102634281B1 (ko) * | 2020-12-21 | 2024-02-07 | 세메스 주식회사 | 기판 처리 장치 |
| KR102616061B1 (ko) * | 2021-08-24 | 2023-12-20 | (주)디바이스이엔지 | 바울 조립체를 포함하는 기판 처리장치 |
| JP7731250B2 (ja) * | 2021-09-22 | 2025-08-29 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| KR102869894B1 (ko) * | 2021-10-08 | 2025-10-10 | 세메스 주식회사 | 기판처리장치 및 기판처리방법 |
| CN115148623B (zh) * | 2021-12-31 | 2025-04-15 | 华海清科股份有限公司 | 一种晶圆后处理装置 |
| JP2023125797A (ja) * | 2022-02-28 | 2023-09-07 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および処理カップ洗浄方法 |
| US20230286713A1 (en) * | 2022-03-14 | 2023-09-14 | Semes Co., Ltd. | Bowl, mehtod of manufacturing bowl, and apparatus for treating substrate |
| JP2024014235A (ja) * | 2022-07-22 | 2024-02-01 | 株式会社ディスコ | スピンナ装置 |
| CN118268310A (zh) * | 2022-12-30 | 2024-07-02 | 盛美半导体设备(上海)股份有限公司 | 防反灌装置及基板处理设备 |
| CN117198938B (zh) * | 2023-09-15 | 2025-08-19 | 华海清科股份有限公司 | 一种晶圆后处理装置 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04144121A (ja) * | 1990-10-04 | 1992-05-18 | Nec Corp | フォトレジスト塗布用カップ |
| JP3289208B2 (ja) * | 1996-09-24 | 2002-06-04 | 東京エレクトロン株式会社 | 洗浄処理方法及び洗浄処理装置 |
| JP2004265912A (ja) | 2003-02-03 | 2004-09-24 | Personal Creation Ltd | 基板の処理装置 |
| JP2005019675A (ja) | 2003-06-26 | 2005-01-20 | Toshiba Corp | ウエット処理装置 |
| EP1848024B1 (en) | 2006-04-18 | 2009-10-07 | Tokyo Electron Limited | Liquid processing apparatus |
| JP4949338B2 (ja) * | 2008-08-06 | 2012-06-06 | 東京エレクトロン株式会社 | 液処理装置 |
| JP2012019025A (ja) * | 2010-07-07 | 2012-01-26 | Tokyo Electron Ltd | 液処理装置 |
| JP5425745B2 (ja) * | 2010-10-29 | 2014-02-26 | 東京エレクトロン株式会社 | 液処理装置、液処理方法、およびこの液処理方法を実行するためのコンピュータプログラムが記録された記録媒体 |
| JP5220838B2 (ja) * | 2010-12-28 | 2013-06-26 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
| JP5844681B2 (ja) * | 2011-07-06 | 2016-01-20 | 東京エレクトロン株式会社 | 基板液処理装置及び基板液処理方法 |
| JP6051919B2 (ja) * | 2012-04-11 | 2016-12-27 | 東京エレクトロン株式会社 | 液処理装置 |
-
2014
- 2014-10-16 JP JP2014211908A patent/JP6287750B2/ja active Active
- 2014-12-22 TW TW103144685A patent/TWI590360B/zh active
- 2014-12-23 US US14/580,557 patent/US9953848B2/en active Active
- 2014-12-24 KR KR1020140188281A patent/KR102337721B1/ko active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI751432B (zh) * | 2018-09-07 | 2022-01-01 | 日商芝浦機械電子裝置股份有限公司 | 基板處理裝置及基板處理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20150187613A1 (en) | 2015-07-02 |
| KR102337721B1 (ko) | 2021-12-08 |
| JP2015144239A (ja) | 2015-08-06 |
| KR20150077351A (ko) | 2015-07-07 |
| TW201539610A (zh) | 2015-10-16 |
| US9953848B2 (en) | 2018-04-24 |
| JP6287750B2 (ja) | 2018-03-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI590360B (zh) | 基板液體處理裝置 | |
| KR102364953B1 (ko) | 액 처리 장치 | |
| KR100827796B1 (ko) | 기판처리장치 | |
| KR100886021B1 (ko) | 액처리방법 및 액처리장치 | |
| KR102566736B1 (ko) | 기판 처리 장치, 기판 처리 방법 및 기억 매체 | |
| KR100267618B1 (ko) | 처리장치 및 처리방법 | |
| US7063094B2 (en) | Substrate processing apparatus | |
| JP6090113B2 (ja) | 液処理装置 | |
| JP5635452B2 (ja) | 基板処理システム | |
| KR102407530B1 (ko) | 기판 액처리 장치 | |
| JP3713447B2 (ja) | 現像処理装置 | |
| JP5503435B2 (ja) | 基板処理装置、基板処理方法、プログラム及びコンピュータ記憶媒体 | |
| KR102357066B1 (ko) | 기판 처리 장치 | |
| JP6125449B2 (ja) | 基板液処理装置及び基板液処理方法 | |
| TWI544558B (zh) | Liquid treatment device and liquid treatment method | |
| KR20210000355A (ko) | 기판 처리 장치 및 방법 | |
| JP2003031460A (ja) | 液処理装置及びその方法 | |
| JP4043039B2 (ja) | 現像方法及び現像装置 |