TWI588112B - 用於製造具光學及易於清潔之塗層的玻璃製品之製程 - Google Patents
用於製造具光學及易於清潔之塗層的玻璃製品之製程 Download PDFInfo
- Publication number
- TWI588112B TWI588112B TW101145135A TW101145135A TWI588112B TW I588112 B TWI588112 B TW I588112B TW 101145135 A TW101145135 A TW 101145135A TW 101145135 A TW101145135 A TW 101145135A TW I588112 B TWI588112 B TW I588112B
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- TW
- Taiwan
- Prior art keywords
- coating
- chamber
- optical
- substrate
- refractive index
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 210
- 238000000034 method Methods 0.000 title claims description 87
- 230000008569 process Effects 0.000 title claims description 78
- 239000011521 glass Substances 0.000 title claims description 67
- 239000006119 easy-to-clean coating Substances 0.000 title description 3
- 238000000576 coating method Methods 0.000 claims description 546
- 239000011248 coating agent Substances 0.000 claims description 512
- 230000003670 easy-to-clean Effects 0.000 claims description 192
- 239000000758 substrate Substances 0.000 claims description 181
- 239000000463 material Substances 0.000 claims description 143
- 239000010410 layer Substances 0.000 claims description 66
- 238000000151 deposition Methods 0.000 claims description 57
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 33
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 22
- 238000002955 isolation Methods 0.000 claims description 21
- -1 perfluoroalkyl decane Chemical compound 0.000 claims description 19
- 239000011247 coating layer Substances 0.000 claims description 13
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 7
- KODMFZHGYSZSHL-UHFFFAOYSA-N aluminum bismuth Chemical compound [Al].[Bi] KODMFZHGYSZSHL-UHFFFAOYSA-N 0.000 claims description 7
- 238000004132 cross linking Methods 0.000 claims description 7
- 239000010702 perfluoropolyether Substances 0.000 claims description 7
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 6
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000005299 abrasion Methods 0.000 claims description 4
- 239000005388 borosilicate glass Substances 0.000 claims description 4
- 239000004744 fabric Substances 0.000 claims description 4
- 239000005361 soda-lime glass Substances 0.000 claims description 4
- 238000012360 testing method Methods 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 2
- 229910002367 SrTiO Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims 1
- 230000003667 anti-reflective effect Effects 0.000 description 60
- 238000005229 chemical vapour deposition Methods 0.000 description 31
- 230000008021 deposition Effects 0.000 description 30
- 238000005240 physical vapour deposition Methods 0.000 description 29
- 238000000231 atomic layer deposition Methods 0.000 description 22
- 238000004544 sputter deposition Methods 0.000 description 16
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 14
- 238000002207 thermal evaporation Methods 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 12
- 239000002243 precursor Substances 0.000 description 11
- 241000894007 species Species 0.000 description 11
- 238000011068 loading method Methods 0.000 description 10
- 239000006227 byproduct Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 230000004913 activation Effects 0.000 description 7
- 239000013307 optical fiber Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 239000002356 single layer Substances 0.000 description 7
- 238000011109 contamination Methods 0.000 description 6
- 238000005566 electron beam evaporation Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000313 electron-beam-induced deposition Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000010574 gas phase reaction Methods 0.000 description 4
- 238000011065 in-situ storage Methods 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000003032 molecular docking Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 210000002268 wool Anatomy 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 239000005345 chemically strengthened glass Substances 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000869 ion-assisted deposition Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 241000282575 Gorilla Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- CFTFRNVHBXMNKE-UHFFFAOYSA-N aluminum iridium Chemical compound [Al].[Ir] CFTFRNVHBXMNKE-UHFFFAOYSA-N 0.000 description 1
- 230000000845 anti-microbial effect Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000109 continuous material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161565024P | 2011-11-30 | 2011-11-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201331143A TW201331143A (zh) | 2013-08-01 |
| TWI588112B true TWI588112B (zh) | 2017-06-21 |
Family
ID=47324476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101145135A TWI588112B (zh) | 2011-11-30 | 2012-11-30 | 用於製造具光學及易於清潔之塗層的玻璃製品之製程 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20140113083A1 (enExample) |
| EP (1) | EP2785662A2 (enExample) |
| JP (2) | JP2015506893A (enExample) |
| KR (1) | KR20140098178A (enExample) |
| CN (2) | CN104321290A (enExample) |
| TW (1) | TWI588112B (enExample) |
| WO (1) | WO2013082477A2 (enExample) |
Families Citing this family (69)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011076756A1 (de) * | 2011-05-31 | 2012-12-06 | Schott Ag | Substratelement für die Beschichtung mit einer Easy-to-clean Beschichtung |
| US20130127202A1 (en) * | 2011-11-23 | 2013-05-23 | Shandon Dee Hart | Strengthened Glass and Glass Laminates Having Asymmetric Impact Resistance |
| US9957609B2 (en) * | 2011-11-30 | 2018-05-01 | Corning Incorporated | Process for making of glass articles with optical and easy-to-clean coatings |
| US10077207B2 (en) | 2011-11-30 | 2018-09-18 | Corning Incorporated | Optical coating method, apparatus and product |
| JP6376607B2 (ja) | 2012-11-30 | 2018-08-22 | コーニング インコーポレイテッド | 反射低減ガラス物品ならびにその製造方法および使用方法 |
| US9703011B2 (en) | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
| US9359261B2 (en) | 2013-05-07 | 2016-06-07 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US9366784B2 (en) | 2013-05-07 | 2016-06-14 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US9684097B2 (en) | 2013-05-07 | 2017-06-20 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| EP2886205A1 (en) * | 2013-12-19 | 2015-06-24 | Institute of Solid State Physics, University of Latvia | Method for antireflective coating protection with organosilanes |
| US9335444B2 (en) | 2014-05-12 | 2016-05-10 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
| US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
| EP3146368A1 (en) * | 2014-05-23 | 2017-03-29 | Corning Incorporated | Low contrast anti-reflection articles with reduced scratch and fingerprint visibility |
| US9790593B2 (en) | 2014-08-01 | 2017-10-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| EP3300520B1 (en) | 2015-09-14 | 2020-11-25 | Corning Incorporated | High light transmission and scratch-resistant anti-reflective articles |
| WO2017070769A1 (ru) * | 2015-10-29 | 2017-05-04 | ШИРИПОВ, Владимир Яковлевич | Комбинированное оптическое покрытие и способ его изготовления (варианты) |
| CN108430944A (zh) * | 2015-12-25 | 2018-08-21 | 华为技术有限公司 | 增透膜及其制备方法 |
| US20170242503A1 (en) * | 2016-02-19 | 2017-08-24 | Intevac, Inc. | Smudge, scratch and wear resistant glass via ion implantation |
| US10401539B2 (en) | 2016-04-21 | 2019-09-03 | Corning Incorporated | Coated articles with light-altering features and methods for the production thereof |
| JP6983864B2 (ja) | 2016-07-11 | 2021-12-17 | コーニング インコーポレイテッド | 非平面基板のコーティング及びその生産方法 |
| KR20180050457A (ko) | 2016-11-04 | 2018-05-15 | 코닝 인코포레이티드 | 코팅 과정 동안에 글래스 기반 제품의 주변 에지를 마스킹하는 장치 및 방법, 그리고 이에 의해 제조된 제품 |
| KR20180050452A (ko) | 2016-11-04 | 2018-05-15 | 코닝 인코포레이티드 | 코팅 과정에서의 글래스 기반 제품의 마스킹 및 고정, 및 이에 의해 제조된 제품 |
| EP3562793A1 (en) | 2016-12-30 | 2019-11-06 | Corning Incorporated | Coated articles with optical coatings having residual compressive stress |
| WO2018148243A2 (en) | 2017-02-13 | 2018-08-16 | Corning Incorporated | Substrate supports for a sputtering device |
| WO2018175195A1 (en) | 2017-03-21 | 2018-09-27 | Corning Incorporated | Hardcoated glass-ceramic articles |
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| CN106883441B (zh) * | 2017-03-24 | 2019-07-12 | 怀化学院 | 一种氟化物改性聚乙烯醇薄膜 |
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- 2012-11-30 EP EP12798576.0A patent/EP2785662A2/en not_active Withdrawn
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Also Published As
| Publication number | Publication date |
|---|---|
| CN109384399A (zh) | 2019-02-26 |
| CN104321290A (zh) | 2015-01-28 |
| WO2013082477A2 (en) | 2013-06-06 |
| JP2015506893A (ja) | 2015-03-05 |
| KR20140098178A (ko) | 2014-08-07 |
| TW201331143A (zh) | 2013-08-01 |
| WO2013082477A3 (en) | 2013-09-26 |
| EP2785662A2 (en) | 2014-10-08 |
| JP2018090489A (ja) | 2018-06-14 |
| US20140113083A1 (en) | 2014-04-24 |
| JP6896671B2 (ja) | 2021-06-30 |
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