TWI580662B - 複合材料、吸熱用組件及用於製造該複合材料之方法 - Google Patents
複合材料、吸熱用組件及用於製造該複合材料之方法 Download PDFInfo
- Publication number
- TWI580662B TWI580662B TW103136462A TW103136462A TWI580662B TW I580662 B TWI580662 B TW I580662B TW 103136462 A TW103136462 A TW 103136462A TW 103136462 A TW103136462 A TW 103136462A TW I580662 B TWI580662 B TW I580662B
- Authority
- TW
- Taiwan
- Prior art keywords
- powder
- composite material
- phase
- microns
- fused vermiculite
- Prior art date
Links
- 239000002131 composite material Substances 0.000 title claims description 93
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000010455 vermiculite Substances 0.000 claims description 82
- 229910052902 vermiculite Inorganic materials 0.000 claims description 82
- 235000019354 vermiculite Nutrition 0.000 claims description 82
- 239000002245 particle Substances 0.000 claims description 48
- 239000000843 powder Substances 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 28
- 239000011159 matrix material Substances 0.000 claims description 27
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 26
- 230000003595 spectral effect Effects 0.000 claims description 23
- 238000005245 sintering Methods 0.000 claims description 22
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 21
- 210000001161 mammalian embryo Anatomy 0.000 claims description 20
- 238000009826 distribution Methods 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 16
- 239000000725 suspension Substances 0.000 claims description 16
- 239000007787 solid Substances 0.000 claims description 15
- 239000011148 porous material Substances 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000011863 silicon-based powder Substances 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910052684 Cerium Inorganic materials 0.000 claims description 10
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 10
- 238000005266 casting Methods 0.000 claims description 9
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 7
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 229910008065 Si-SiO Inorganic materials 0.000 claims description 5
- 229910006405 Si—SiO Inorganic materials 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 5
- 239000011812 mixed powder Substances 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000000407 epitaxy Methods 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 2
- 238000000429 assembly Methods 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims description 2
- 239000011859 microparticle Substances 0.000 claims description 2
- 239000004575 stone Substances 0.000 claims description 2
- 238000001238 wet grinding Methods 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims 1
- 239000012071 phase Substances 0.000 description 61
- 239000000463 material Substances 0.000 description 19
- 238000005259 measurement Methods 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 230000005855 radiation Effects 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 239000002002 slurry Substances 0.000 description 9
- 235000012431 wafers Nutrition 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 6
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 230000003993 interaction Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 230000036760 body temperature Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000001739 density measurement Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000007580 dry-mixing Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000006100 radiation absorber Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003303 ruthenium Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
- B28B1/00—Producing shaped prefabricated articles from the material
- B28B1/26—Producing shaped prefabricated articles from the material by slip-casting, i.e. by casting a suspension or dispersion of the material in a liquid-absorbent or porous mould, the liquid being allowed to soak into or pass through the walls of the mould; Moulds therefor ; specially for manufacturing articles starting from a ceramic slip; Moulds therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
- C03C14/004—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
- C03C14/006—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of microcrystallites, e.g. of optically or electrically active material
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
- C09K5/14—Solid materials, e.g. powdery or granular
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details specially adapted for crucible or pot furnaces
- F27B14/10—Crucibles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/04—Particles; Flakes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/08—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/16—Microcrystallites, e.g. of optically or electrically active material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2214/00—Nature of the non-vitreous component
- C03C2214/30—Methods of making the composites
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details specially adapted for crucible or pot furnaces
- F27B2014/0843—Lining or casing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Combustion & Propulsion (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/077,182 US9957431B2 (en) | 2013-11-11 | 2013-11-11 | Composite material, heat-absorbing component, and method for producing the composite material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201533006A TW201533006A (zh) | 2015-09-01 |
| TWI580662B true TWI580662B (zh) | 2017-05-01 |
Family
ID=51871021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103136462A TWI580662B (zh) | 2013-11-11 | 2014-10-22 | 複合材料、吸熱用組件及用於製造該複合材料之方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US9957431B2 (enExample) |
| EP (1) | EP3068739B1 (enExample) |
| JP (2) | JP6676525B2 (enExample) |
| KR (2) | KR102387005B1 (enExample) |
| CN (2) | CN105873874B (enExample) |
| IL (1) | IL245132B (enExample) |
| SG (1) | SG11201603037WA (enExample) |
| TW (1) | TWI580662B (enExample) |
| WO (1) | WO2015067688A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015119763A1 (de) * | 2015-11-16 | 2017-05-18 | Heraeus Quarzglas Gmbh & Co. Kg | Infrarotstrahler |
| EP3173386B1 (de) * | 2015-11-25 | 2018-05-02 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| US10015879B2 (en) | 2016-01-27 | 2018-07-03 | Corning Incorporated | Silica content substrate such as for use harsh environment circuits and high frequency antennas |
| EP3205630B1 (de) | 2016-02-12 | 2020-01-01 | Heraeus Quarzglas GmbH & Co. KG | Diffusormaterial aus synthetisch erzeugtem quarzglas sowie verfahren zur herstellung eines vollständig oder teilweise daraus bestehenden formkörpers |
| DE102016113815A1 (de) | 2016-07-27 | 2018-02-01 | Heraeus Noblelight Gmbh | Infrarotflächenstrahler und Verfahren zur Herstellung des Infrarotflächenstrahlers |
| KR102294826B1 (ko) | 2016-09-22 | 2021-08-27 | 헤레우스 노블라이트 게엠베하 | 적외선 방사 소자 |
| DE102016118137A1 (de) * | 2016-09-26 | 2018-03-29 | Heraeus Noblelight Gmbh | Infrarotflächenstrahler |
| DE102016120536A1 (de) * | 2016-10-27 | 2018-05-03 | Heraeus Noblelight Gmbh | Infrarotstrahler |
| EP3339256A1 (de) * | 2016-12-23 | 2018-06-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von opakem quarzglas, und rohling aus dem opaken quarzglas |
| KR101951440B1 (ko) * | 2017-01-12 | 2019-02-22 | 코닝 인코포레이티드 | 유리 리본을 드로잉하기 위한 풀링 롤, 장치 및 방법 |
| DE102017112611A1 (de) | 2017-06-08 | 2018-12-13 | Heraeus Noblelight Gmbh | Infrarotstrahler und Verfahren für dessen Herstellung |
| DE102017124456A1 (de) | 2017-10-19 | 2019-04-25 | Heraeus Noblelight Gmbh | Beheizbarer Gasinjektor |
| KR102015480B1 (ko) * | 2019-01-02 | 2019-08-28 | 코닝 인코포레이티드 | 유리 리본을 드로잉하기 위한 풀링 롤, 장치 및 방법 |
| JP7680917B2 (ja) * | 2020-10-01 | 2025-05-21 | 東ソ－・エスジ－エム株式会社 | 黒色石英ガラス及びその製造方法 |
| CN116348423B (zh) * | 2020-10-01 | 2025-11-07 | 东曹石英素材股份有限公司 | 黑色石英玻璃及其制造方法 |
| KR20230079076A (ko) | 2020-10-07 | 2023-06-05 | 토소 에스지엠 가부시키가이샤 | 흑색 석영 유리 및 그 제조 방법 |
| US20230078325A1 (en) * | 2021-09-14 | 2023-03-16 | Globalwafers Co., Ltd. | Crystal pulling systems having composite polycrystalline silicon feed tubes, methods for preparing such tubes, and methods for forming a single crystal silicon ingot |
| CN114890678B (zh) * | 2022-04-27 | 2023-05-02 | 中国科学院西安光学精密机械研究所 | 一种大尺寸低膨胀玻璃基复合材料及其注浆成型方法 |
| CN117228934A (zh) * | 2023-08-18 | 2023-12-15 | 江苏太平洋石英股份有限公司 | 高纯黑色不透明石英玻璃及其制造方法和其使用的染色剂 |
| WO2025215729A1 (ja) * | 2024-04-09 | 2025-10-16 | 東ソ－・エスジ－エム株式会社 | 黒色石英ガラス、その製造方法ならびにそれを応用した部材および製品 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4033780A (en) * | 1976-04-26 | 1977-07-05 | Corning Glass Works | Method of enhancing the refractoriness of high purity fused silica |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3301635A (en) * | 1965-07-01 | 1967-01-31 | Du Pont | Molded amorphous silica bodies and molding powders for manufacture of same |
| GB1384319A (en) * | 1971-04-19 | 1975-02-19 | Sherwood Refractories | Vitreous silica and process and apparatus for making same |
| US4911896A (en) * | 1986-07-24 | 1990-03-27 | General Electric Company | Fused quartz member for use in semiconductor manufacture |
| GB8721644D0 (en) * | 1987-09-15 | 1987-10-21 | Unilever Plc | Silicas |
| JP2676405B2 (ja) * | 1989-04-25 | 1997-11-17 | 信越石英株式会社 | 半導体製造装置若しくは治具用石英ガラス及びその製造方法 |
| DE4338807C1 (de) * | 1993-11-12 | 1995-01-26 | Heraeus Quarzglas | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
| US5674792A (en) * | 1993-11-12 | 1997-10-07 | Heraeus Quarzglas Gmbh | Shaped body having a high silicon dioxide content and a process for producing such shaped bodies |
| JP3011866B2 (ja) | 1994-11-30 | 2000-02-21 | 信越石英株式会社 | 枚葉式ウエーハ熱処理装置 |
| GB9603128D0 (en) * | 1996-02-15 | 1996-04-17 | Tsl Group Plc | Improved vitreous silica product and method of manufacture |
| AU759804B2 (en) * | 1998-09-28 | 2003-05-01 | Skeleton Technologies Ag | Method of manufacturing a diamond composite and a composite produced by same |
| DE19943103A1 (de) * | 1999-09-09 | 2001-03-15 | Wacker Chemie Gmbh | Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung |
| JP4458692B2 (ja) * | 2000-02-21 | 2010-04-28 | 日本碍子株式会社 | 複合材料 |
| US6486084B2 (en) | 2000-02-21 | 2002-11-26 | Ngk Insulators, Ltd. | Composite material and method of producing the same |
| JP2002283015A (ja) | 2001-03-21 | 2002-10-02 | Kawasaki Steel Corp | 鋼の連続鋳造方法 |
| EP1580170B1 (en) | 2002-11-29 | 2019-01-16 | Heraeus Quarzglas GmbH & Co. KG | Method for producing synthetic quartz glass and synthetic quartz glass article |
| FR2858611B1 (fr) * | 2003-08-07 | 2006-11-24 | Saint Gobain Ct Recherches | Procede de fabrication d'une piece en silice amorphe frittee, moule et barbotine mis en oeuvre dans ce procede |
| JP2006027930A (ja) * | 2004-07-13 | 2006-02-02 | Tosoh Corp | 黒色石英ガラスおよびその製造方法並びにそれを用いた部材 |
| CN101023040B (zh) * | 2004-08-23 | 2011-08-03 | 赫罗伊斯石英玻璃股份有限两合公司 | 涂覆的石英玻璃组件和制造所述组件的方法 |
| US20060060820A1 (en) * | 2004-09-21 | 2006-03-23 | Schumacher Ray F | Hollow porous-wall glass microspheres for hydrogen storage |
| US7745363B2 (en) * | 2005-05-09 | 2010-06-29 | Corning Incorporated | Geopolymer composites and structures formed therefrom |
| JP2006342023A (ja) * | 2005-06-09 | 2006-12-21 | Asahi Kasei Corp | 中空シリカゾル及び中空シリカ微粒子 |
| DE102005050593A1 (de) * | 2005-10-21 | 2007-04-26 | Esk Ceramics Gmbh & Co. Kg | Dauerhafte siliciumnitridhaltige Hartbeschichtung |
| TWI327990B (en) * | 2006-07-14 | 2010-08-01 | Univ Chung Yuan Christian | Biochip with a three dimensional mesoporous layer and method for forming the same |
| DE102007030698B4 (de) * | 2007-06-30 | 2009-06-10 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Verbundkörpers aus einem Basiskörper aus opakem Quarzglas und einer dichten Versiegelungsschicht sowie Verwendung des Verbundkörpers |
| DE102007053284A1 (de) * | 2007-11-08 | 2009-05-20 | Esk Ceramics Gmbh & Co. Kg | Fest haftende siliciumnitridhaltige Trennschicht |
| DE102009005446A1 (de) * | 2009-01-21 | 2010-07-22 | Schott Ag | Granulat, Verfahren zu dessen Herstellung sowie dessen Verwendung |
| JP4951040B2 (ja) * | 2009-08-05 | 2012-06-13 | 信越石英株式会社 | シリカ容器及びその製造方法 |
-
2013
- 2013-11-11 US US14/077,182 patent/US9957431B2/en active Active
-
2014
- 2014-10-22 TW TW103136462A patent/TWI580662B/zh active
- 2014-11-06 CN CN201480061685.9A patent/CN105873874B/zh active Active
- 2014-11-06 EP EP14796044.7A patent/EP3068739B1/en active Active
- 2014-11-06 SG SG11201603037WA patent/SG11201603037WA/en unknown
- 2014-11-06 KR KR1020207004740A patent/KR102387005B1/ko active Active
- 2014-11-06 WO PCT/EP2014/073906 patent/WO2015067688A1/en not_active Ceased
- 2014-11-06 JP JP2016530950A patent/JP6676525B2/ja active Active
- 2014-11-06 CN CN201911006807.5A patent/CN110713347B/zh active Active
- 2014-11-06 KR KR1020167015370A patent/KR102083617B1/ko active Active
-
2016
- 2016-04-14 IL IL245132A patent/IL245132B/en active IP Right Grant
-
2018
- 2018-03-27 US US15/937,711 patent/US20180215984A1/en not_active Abandoned
-
2020
- 2020-01-09 JP JP2020002055A patent/JP7009521B2/ja active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4033780A (en) * | 1976-04-26 | 1977-07-05 | Corning Glass Works | Method of enhancing the refractoriness of high purity fused silica |
Also Published As
| Publication number | Publication date |
|---|---|
| US20180215984A1 (en) | 2018-08-02 |
| WO2015067688A1 (en) | 2015-05-14 |
| KR20160085314A (ko) | 2016-07-15 |
| JP6676525B2 (ja) | 2020-04-08 |
| JP2016536254A (ja) | 2016-11-24 |
| US9957431B2 (en) | 2018-05-01 |
| CN105873874A (zh) | 2016-08-17 |
| TW201533006A (zh) | 2015-09-01 |
| EP3068739B1 (en) | 2018-04-04 |
| KR20200020023A (ko) | 2020-02-25 |
| KR102083617B1 (ko) | 2020-04-24 |
| CN110713347B (zh) | 2022-07-05 |
| SG11201603037WA (en) | 2016-05-30 |
| US20150132511A1 (en) | 2015-05-14 |
| IL245132A0 (en) | 2016-06-30 |
| CN110713347A (zh) | 2020-01-21 |
| EP3068739A1 (en) | 2016-09-21 |
| IL245132B (en) | 2020-09-30 |
| JP7009521B2 (ja) | 2022-01-25 |
| CN105873874B (zh) | 2019-11-08 |
| KR102387005B1 (ko) | 2022-04-18 |
| JP2020073440A (ja) | 2020-05-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI580662B (zh) | 複合材料、吸熱用組件及用於製造該複合材料之方法 | |
| US10005693B2 (en) | Opaque quartz glass and method for its production | |
| US5585173A (en) | High-purity, opaque quartz glass, method for producing same and use thereof | |
| KR20110110250A (ko) | 실리카 용기 및 그 제조 방법 | |
| JP6698585B2 (ja) | 細孔を含む不透明石英ガラスの製造方法 | |
| WO2010125739A1 (ja) | シリカ容器及びその製造方法 | |
| CN104844249A (zh) | 绝热材料 | |
| EP2202277A1 (en) | Manufacturing method of core-shell-type ceria-polymer hybrid nanoparticles and dispersion sols of them | |
| JP7311286B2 (ja) | アルミナ焼結体の製造方法およびアルミナ焼結体 | |
| TW202146357A (zh) | 燒結體之製造方法 | |
| KR100734970B1 (ko) | Ｓｉ3Ｎ4 코팅 ＳｉＯ2 성형체의 제조 방법 | |
| JP6379508B2 (ja) | 不透明石英ガラスおよびその製造方法 | |
| TWI523827B (zh) | 坩堝 | |
| US20210024357A1 (en) | Sintered metal carbide and heat-resistant member for silicon carbide semiconductor manufacturing device comprising same | |
| JP7680917B2 (ja) | 黒色石英ガラス及びその製造方法 | |
| KR20240161568A (ko) | 불투명 석영유리 및 이의 제조방법 | |
| JP2011236069A (ja) | 多結晶シリコンインゴット製造用角形シリカ容器及びその製造方法 | |
| WO2025215729A1 (ja) | 黒色石英ガラス、その製造方法ならびにそれを応用した部材および製品 | |
| TW201722741A (zh) | 製造具有高矽酸含量之材料的複合體之方法 | |
| TW202313500A (zh) | 不透明石英及其製造方法 | |
| Hossain et al. | Production of angular-selective films by interdiffusion for novel spectral responses | |
| JP2023077257A (ja) | 反射材用材料、及びこれを用いた反射材 | |
| JP2015166292A (ja) | 不透明石英ガラスおよびその製造方法 |