TWI579658B - Uv led light source module unit for exposure photolithography process and exposure photolithography apparatus used the same - Google Patents

Description

Exposure light source module unit and exposure device including the same

The present invention relates to an exposure light source for use in a photolithography process for forming a fine circuit pattern on a semiconductor wafer or a display panel, and more particularly to an exposure light source module unit and the same The exposure device of the unit is improved by the combination of a plurality of ultraviolet light emitting element (UV LED) array modules and a collection lens array module, thereby being capable of effectively improving exposure performance and efficiency. It is easy and economical to replace the light source of the original exposer.

For example, a semiconductor element or a circuit board (PCB) and an LCD (Liquid Crystal Display) or an OLED (Organic Light Emitting Diode) built in as a main component of an electric and electronic device, and a pixel display panel such as a PDP (Plasma Display Panel) The image display panel, in an exposure process on its manufacturing process, is fabricated by means of a photofine processing technique known as photolithography to form a fine circuit pattern.

Generally, an exposure light source used in an original exposure process mainly uses an ultrahigh pressure mercury lamp or a halogen lamp, but as in the conventional exposure light source, it is known that Due to the low efficiency and high cost caused by low life and high power consumption, not only the efficiency of the exposure process but also various problems are exposed in the environment.

In particular, when TFT (Thin Film Transitor) fabrication or CF (Color Filter) fabrication is recently performed in the field of display devices such as liquid crystal display elements (LCDs) or organic light-emitting diodes (OLEDs), although the market is eager to realize the use of exposure patterns. The ultra-high resolution of the micro-finishing technology, but unfortunately, due to the technical limitations of the miniaturization process of the exposure pattern using the original exposure light source (Hg Lamp), the miniaturization of the exposure pattern and the core technology of the display device industry cannot be realized. Ultra high resolution.

In addition, the recent trend toward miniaturization, large capacity, high integration, and high density of semiconductor elements has increased the demand for miniaturization and high precision of exposure patterns, and thus, as an original light source for exposure, There is a problem in that the current requirements for realizing a fine pattern are limited.

Therefore, recent developments in new exposure technologies such as immersion exposure or extreme ultraviolet exposure are being actively carried out, in particular, ultraviolet light-emitting elements (UV LEDs) are selectively used and usable as low power consumption and long life, single wavelength. The short-wavelength and environmentally-friendly light source for exposure is attracting attention as a substitute for the original exposure light source.

However, an exposure apparatus using an ultraviolet light-emitting element (UV LED) as a light source can be used by reducing the configuration of the light path, the illuminance distribution degree, and the improvement of the power of the light output and the exposure pattern. In order to realize the development of high-efficiency new light sources (UV LEDs) such as ultra-high resolution, miniaturization, large capacity, and high density, there is an urgent need for development of optical components, modules, and units.

The present invention has been reproduced in the technical background as described above, and the problem of the background art described above is a content that the applicant has possessed or has secured in the process of exporting the present invention in order to remit the present invention. It is said to be content that is known to the general public prior to the application of the present invention.

[Prior Art Literature]

[Patent Literature]

(Patent Document 1) Korean Patent Publication No. 10-1440874

(Patent Document 2) Korean Patent Publication No. 10-1401238

(Patent Document 3) Korean Patent Publication No. 10-2012-0095520

(Patent Document 4) Korean Patent Publication No. 10-2015-0049563

The present invention has been made in view of the above-described background art, in view of the problems of the exposure light source of the prior exposure apparatus and in order to improve such problems, the object of the present invention is to provide a plurality of ultraviolet light-emitting elements by means of The low-power type exposure light source module unit capable of maximizing the light collection efficiency by optimal combination of the UV LED and the concentrating lens array module.

Another object of the present invention is to provide a low-power type exposure light source module unit and an exposure apparatus using the same as a light source, which can effectively improve the exposure performance and the exposure efficiency, so that the exposure pattern can be realized. Micro-fine and high resolution.

Still another object of the present invention is to provide an economical and practical low-power type light source module unit for exposure and an exposure apparatus using the unit as a light source, which is improved as an alternative interchangeable light source capable of easily replacing the original exposure apparatus. Module unit.

In order to achieve the above object, an exposure light source module unit according to the present invention includes a light source panel in which a plurality of unit ultraviolet light emitting elements are mounted on a circuit board in a matrix form array structure to be mounted on a support. An optical panel disposed on a lens panel on a light-emitting side of the light-emitting element face-to-face with the light source panel, wherein the plurality of unit collecting lenses are respectively aligned with respect to the main optical axis at positions corresponding to the light-emitting elements The array structure of the matrix form of the state in which the center of the ultraviolet light-emitting element array on the light source panel is eccentric on any reference center axis side is configured.

Moreover, in order to achieve the object, an exposure apparatus of the present invention includes: an exposure stage for supporting an exposure substrate coated with a sensitizer; and a driving means for causing the exposure stage to move on an XY plane coordinate Driving the state; the light source module unit for exposure is configured to emit illumination light for exposure to the substrate; the optical system is disposed between the substrate and the light source module unit for exposure; and the control means for controlling the driving means and the exposure Driving the light source unit; the light source module unit for exposure includes: a light source panel, wherein the plurality of unit ultraviolet light emitting elements are mounted on the circuit substrate in a matrix form array structure to be mounted on the support panel; the optical panel And disposed on the lens panel on the light-emitting side of the light-emitting element face-to-face with the light source panel, and the plurality of unit collecting lenses are respectively disposed on the light source panel with respect to the main optical axis at positions corresponding to the light-emitting elements Ultraviolet light emitting element array The array structure of the matrix form of the state in which the center of the center of the center of any center of the center of the center is eccentric.

According to the present invention, the unit collecting lenses are arranged in an array structure in a matrix form, and are gradually spaced from any reference center axis side passing through the center of the ultraviolet light emitting element array on the light source panel, so that the closer to the edge arrangement, the corresponding unit ultraviolet rays are formed. The amount of eccentricity of the light-emitting element with respect to the main optical axis increases, so that the diffused light irradiated from each unit ultraviolet light-emitting element is collected by the light-receiving region provided in the optical system of the exposure apparatus.

According to an aspect of the invention, the ultraviolet light-emitting element can be mounted on one or more rows of the LED light source in a package form on the unit circuit substrate. Therefore, on the support panel constituting the light source panel, it is possible to have a configuration in which a plurality of LED light sources of a plurality of package forms are attached to a plurality of unit circuit boards.

According to another aspect of the present invention, the ultraviolet light emitting element can be mounted on a single circuit substrate in a packaged form of LED light source.

According to still another aspect of the present invention, the ultraviolet light emitting element may be mounted as a single light source or a plurality of wafers on a single or a plurality of circuit substrates by an LED light source.

In the present invention, the unit light collecting lens on the optical panel is composed of a double-faced convex lens, and a double-convex lens having curvature surfaces different from each other in optical structure can be arranged according to the position of the array.

According to the present invention, it is preferable that the optical distance "a" provided in the optical system from the ultraviolet light-emitting element to the light-receiving region is ultraviolet rays spaced from the side of the reference center axis passing through the center of the ultraviolet light-emitting element array on the light source panel. The distance between the light-emitting elements is "b", the distance between the ultraviolet light-emitting elements and the face of the collecting lens is "c", and each ultraviolet light is emitted. The relationship between the eccentric distance "x" between the central axis of the optical element and the central axis of the collecting lens and the diameter "t" of the light receiving area A is set such that the reference of the eccentric distance "x" of the collecting lens satisfies "x=b" *c/a", the range of "x" is set to satisfy "bc(2b-t)/2ab<x<bc(2b+t)/2ab".

Further, a preferred distance between the surface of the ultraviolet light-emitting element and the collecting lens, c, and the diameter d of the collecting lens are set to satisfy the condition of 1.0 c < d < 2.5 c.

The preferred light source panel and optical panel are equipped to be supported by means of the outer casing so as to be able to be constructed in a unit state in which the exposure device is detached.

Further, it is preferable to have a configuration in which a heat radiation means is provided around the light source panel and the optical panel.

According to the light source module unit for exposure of the present invention, an optical panel which is a light-collecting lens array module capable of maximizing light collection efficiency can be combined with a light source panel which is a plurality of ultraviolet light-emitting element (UV LED) array modules. High output and high efficiency are achieved with low power consumption, especially at a single wavelength and a short wavelength of ultraviolet light, so that the exposure pattern can be miniaturized and the high resolution of the leap can be achieved by effectively improving the exposure performance and the exposure efficiency.

Further, according to the light source module unit for exposure of the present invention, it is possible to provide an economical and practical exposure apparatus, which can realize modular unitization instead of interchangeability, and can easily replace the light source of the conventional exposure apparatus.

In addition, after the light source module unit for exposure of the present invention is used, the power consumption is low, the cost of replacing the light source is saved, the startup time of the exposure equipment is improved, and environmental problems are solved, thereby achieving a drastic saving maintenance cost.

Further, in the light source module unit for exposure of the present invention, in particular, high-efficiency, high-output single-wavelength and short-wavelength ultraviolet light can be selectively used as needed, thereby achieving high-quality exposure performance. The pattern of the core technology is refined to enable high resolution.

10‧‧‧ glass substrate

100‧‧‧Exposure light source module unit

110‧‧‧Light source panel

111‧‧‧UV light-emitting elements

112‧‧‧ circuit board

113‧‧‧Support panel

120‧‧‧Optical panel

121‧‧‧ collecting lens

122‧‧‧ lens panel

130, 140‧‧‧ shell

141‧‧‧flow entrance

142‧‧‧Export

200‧‧‧Exposure device

210, 230‧‧‧ mirror

221‧‧‧Future eye lens

222‧‧‧ Concentrating lens

223, 224‧‧ ‧ flat lens

240‧‧‧ mask

250‧‧‧ exposure station

A‧‧‧light receiving area/aperture

O‧‧‧Array Center

E1, e2, en‧‧‧ eccentricity

P‧‧‧ interval

Fig. 1 is a perspective view showing an example of separation of a light source module unit for exposure according to the present invention.

Fig. 2 is a perspective view showing an exemplary diagram for explaining a unit light source and a collecting lens array structure of the exposure light source module unit of the present invention.

Fig. 3 is a plan view showing an example of an array structure of an ultraviolet light-emitting element composed of a unit light source of the exposure light source module unit of the present invention.

4 and 5 are an analog diagram for explaining an array structure in which the unit light source of the exposure light source module unit of the present invention and the collecting lens are eccentric.

Fig. 6 is a graph showing the measurement results of the collected light amount in the light collecting structure of the exposure light source module unit of the present invention.

Fig. 7 is a view showing a state in which light is irradiated by the light source module unit for exposure of the present invention.

8 and 9 are external perspective views schematically showing a state in which the light source module unit for exposure of the present invention is unitized in mutually different housings.

10 and 11 are respectively a perspective view and a plan view showing a configuration of a light source and a collecting lens array structure of an exposure light source module unit according to another embodiment of the present invention.

Fig. 12 is a view showing a main part of a circuit pattern formed on a wafer by means of an exposure light source module unit of the present invention and a mercury lamp (Hg Lamp) as an original exposure light source, and displays different masks in comparison with each other. A graph of the results of the CD values of the line.

Figure 13 is a comparison of CD values according to different mask lines of a circuit pattern formed on a wafer by means of the exposure light source module unit of the present invention and a mercury lamp (Hg Lamp) as a light source for the original exposure. The result is also shown as a graph of the chart.

Fig. 14 is a view showing an exemplary configuration of an analogous drawing of a main part of an exposure apparatus to which the light source module unit for exposure of the present invention is applied.

Hereinafter, the light source module unit for exposure of the present invention will be described in detail with reference to the drawings. The following description and drawings are merely illustrative of preferred embodiments of the present invention, and are not intended to limit the light source module unit for exposure of the present invention described in the claims.

Referring to FIGS. 1 and 2 , the exposure light source module unit 100 of the present invention includes a light source panel 110 having a matrix structure in a matrix form on a plurality of unit ultraviolet light emitting elements (UV LEDs) 111 on a circuit substrate 112. Mounted on the support panel 113; the optical panel 120 is disposed on the lens panel 122 on the light-emitting side of the ultraviolet light-emitting element 111 facing the light source panel 110, and is illuminated by the plurality of unit light collecting lenses 121. The position of the interval p corresponding to the interval p of the array of elements 111 is eccentric with respect to the main optical axis toward an arbitrary reference center axis side passing through the center O (see FIG. 2) of the array of ultraviolet light-emitting elements 111 on the light source panel 110. The array structure of the matrix forms of states e1 and e2 is configured.

According to an aspect of the present invention, the ultraviolet light-emitting element 111 is preferably arranged on the unit circuit substrate 112 in the form of a strip as shown in the exemplarily illustrated in FIG. The above-mentioned wafer, package, or LED light source in which a combination of a 100 nm band and a 410 nm band emits ultraviolet light is attached.

Therefore, the light source panel 110 is mounted in a state in which the plurality of strip-shaped unit circuit boards 112 are arranged side by side in the support panel 113, and the ultraviolet light-emitting elements 111 attached to the respective unit circuit boards 112 constitute an array of matrix forms on the xy coordinates. .

On the other hand, the ultraviolet light-emitting element 111 can be mounted by a wafer, a package, or an LED light source in a mixed form of a wafer and a package in which a range of ultraviolet light of a wavelength range of 100 nm to 410 nm is emitted, so that a single circuit board in a larger area is formed. An array structure of the matrix form is formed on 112.

Fig. 3 is a plan view showing an example of an array structure of an ultraviolet light-emitting element 111 which is constituted by a unit light source of the exposure light source module unit 100 of the present invention.

Referring to FIG. 3, the exposure light source module unit 100 of the present invention is configured such that a plurality of ultraviolet light-emitting elements 111 are formed on the xy orthogonal coordinates having the origin O of the array of ultraviolet light-emitting elements 111 on the light source panel 110 as an origin. The array structure of the arranged matrix form is separated by a predetermined interval p.

On the other hand, although the support panel 113 is exemplified by a quadrangular panel, the shape of the support panel 113 is merely an embodiment, and does not limit the exposure light source module unit 100 of the present invention.

Therefore, the exposure light source module unit 100 of the present invention can be applied, for example, to an embodiment in which various shapes and structures such as a disk-shaped panel are deformed.

That is, the exposure light source module unit 100 of the present invention can be deformed into various types according to the specification or configuration of the exposure apparatus to which the light source is attached or the exposure object or the exposure pattern. The shape is such that the shape structure of the support panel 113 in which the ultraviolet light-emitting elements 111 form an array is employed in an optimum state.

According to an aspect of the present invention, as shown in FIG. 3, in the structure in which an odd (ninth) course and a column are formed in an array on the support panel 113, the unit ultraviolet light-emitting element 111 may be disposed in the light source. The center O of the array of ultraviolet light emitting elements of the panel 110.

On the other hand, in the structure in which the ultraviolet light-emitting elements 111 are arrayed in an even number of courses and columns on the support panel 113, there is an array in which the center O of the ultraviolet light-emitting element array disposed on the light source panel 110 excluding the unit ultraviolet light-emitting elements 111 is excluded. structure.

In other words, the center O of the ultraviolet light-emitting element array on the light source panel 110 and the light-receiving area where the diffused light emitted from each unit ultraviolet light-emitting element is collected by the collecting lens 121 (see the elements of FIGS. 4 and 5). The center of the symbol "A" is disposed coaxially, and serves as a reference for determining the amount of eccentricity of each unit of the collecting lens 121 (see e1, e2, and en of FIGS. 2 and 4).

The light-receiving area (refer to the symbol "A" of FIGS. 4 and 5) is provided in an aperture form so that a mirror provided in the optical system of the exposure apparatus not shown in the drawing is formed to allow the collected light to pass through. The target of the light collection.

Therefore, the light source module unit 100 for exposure of the present invention collects light so that the diffused light irradiated from each unit ultraviolet light-emitting element 111 is condensed by the collecting lens 121, and passes through the light collecting target of the light receiving region (target) ) The aperture formed.

That is, in the exposure light source module unit 100 of the present invention, the center O of the array of the ultraviolet light emitting elements 111 on the light source panel 110 is aligned with the center of the lens panel 122. The light collecting lens 121 disposed on the coaxial line and gradually spaced apart from the side of the arbitrary reference center axis passing through the center O and disposed close to the edge is disposed to the reference central axis with respect to the main optical axis of the ultraviolet light emitting element 111 corresponding thereto The distance from the side eccentricity gradually increases.

For example, the light source module unit 100 for exposure of the present invention causes the collecting lens 121 to be eccentrically arranged with respect to the main optical axis of the ultraviolet light emitting element 111, and for example, performs the action and function of a strabismus lens, and is configured to The light collecting efficiency of the diffused light irradiated by each unit ultraviolet light emitting element 111 is maximized.

On the other hand, in the exposure light source module unit 100 of the present invention having the above configuration, in order to maximize the light collecting efficiency of the diffused light irradiated from the ultraviolet light emitting element 111, it is preferable that the collecting lens 121 is constituted by a double convex lens. Preferably, a biconvex lens having curvature faces having mutually different optical structures is provided in accordance with the position of the array.

4 and 5 are an analog diagram for explaining an array structure in which the collecting lens 121 of the exposure light source module unit 100 of the present invention is eccentric with respect to the main optical axis of the ultraviolet light emitting element 111.

In FIGS. 4 and 5, "a" represents the optical distance from the ultraviolet light-emitting element 111 to the aperture of the light-receiving area A provided as a light-collecting target.

Further, "b" represents a separation distance of the ultraviolet light-emitting elements 111 arranged to be spaced apart from the reference center axis side of the center O of the ultraviolet light-emitting element array passing through the light source panel 110.

Further, "c" represents a face-to-face distance between the ultraviolet light-emitting element 111 and the collecting lens 121, and "x" represents an eccentric distance between the central axis of the ultraviolet light-emitting element 111 and the central axis of the collecting lens 121, and "t" represents The diameter of the light receiving area A.

Referring to FIGS. 4 and 5, the exposure light source module unit 100 of the present invention preferably has an aperture with respect to the light-receiving area A provided as a light-collecting target from the ultraviolet light-emitting element 111. The optical distance "a" of "aperture", the relationship between "b" and "c", "x" and "t" is defined by the following formula.

That is, the reference of the eccentric distance "x" of the collecting lens 121 is set to satisfy "x=b*c/a", and the range of "x" is set to satisfy "bc(2b-t)/2ab<x<bc(2b) +t)/2ab".

Fig. 6 is a graph showing the measurement result of the collected light amount in the light collecting structure of the exposure light source module unit 100 of the present invention, and "a" represents the light receiving region from the ultraviolet light emitting element 111 to the light collecting target (target). The optical distance of the aperture of A, "c" represents the distance between the ultraviolet light-emitting elements 111 and the face of the collecting lens 121, and "d" represents the diameter of the collecting lens 121.

Referring to FIG. 6, in the light source module unit 100 for exposure of the present invention, when the diameter "d" of the collecting lens 121 is separated from the face of the ultraviolet illuminating element 111 and the collecting lens 121 by a distance "c" When the ratio value (d/c) is 1 or more, the amount of light sharply increases, and conversely, when the value of d/c is 2 or more, a predetermined amount of light is maintained.

Therefore, it is preferable that the exposure light source module unit 100 of the present invention is configured such that the distance between the ultraviolet light emitting element 111 and the collecting lens 121 facing the surface c and the diameter d of the collecting lens satisfy 1.0 c < d < 2.5 c. .

Fig. 7 is a view showing a light irradiation state of the light source module unit for exposure according to the present invention, and Fig. 7(a) is a view showing a light irradiation state of the light source panel 110 excluding the state of the optical panel 120, and Fig. 7 (b) A light irradiation state through the optical panel 120 is taken.

Referring to Fig. 7, it can be confirmed that the brightness of the light irradiation state by the optical panel 120 is brighter than the light irradiation state in which the state of the optical panel 120 is excluded.

On the other hand, in the light source module unit 100 for exposure of the present invention, as shown in FIGS. 8 and 9, respectively, the light source panel 110 and the optical panel 120 are attached to be supported by the outer casings 130 and 140, and have unitized Composition. The exposure light source module unit 100 thus attached to the outer casings 130, 140 to be unitized can be detachably used as a light source of an exposure device (not shown), and thus can be replaced with mercury or halogen very economically and easily. The light source of the original exposure device such as a lamp.

On the other hand, in the state in which the light source module unit 100 for exposure of the present invention is combined with the light source panel 110 and the optical panel 120, it may be attached to a structure such as a bracket or a flange provided in the exposure apparatus. A light source that is supported by the object.

Moreover, the light source module unit 100 for exposure according to the present invention further includes a heat dissipating means provided on the outer casings 130, 140, and the heat dissipating means is provided on the outer casings 130, 140 so as to be disposed around the light source panel 110 and the optical panel 120.

The heat dissipating means may be, for example, a heat sink built in the outer casings 130 and 140 for mounting the light source panel 110 and the optical panel 120, or an air-cooling heat dissipating means using a fan or a blower for air circulation, as shown in FIG. It is also possible to install a water-cooling heat-dissipating means connected to a chiller to recirculate the cooling water through the cooling water inlet 141 and the outlet 142, and the air-cooling and water-cooling heat-dissipating means can be installed in a combined state.

According to another aspect of the present invention, the light source module unit for exposure of the present invention can be configured to have an array of ultraviolet light-emitting elements 111 and arrays of light-collecting lenses 121 as shown in various embodiments of FIGS. 10 and 11. Structure. The advantages of this circular array structure Yes, light loss from the ultraviolet light-emitting element 111 of the array at the corner portion farthest from the center O can be excluded in the quadrilateral array structure.

On the other hand, Fig. 12 is a view showing the exposure performance of the mercury light source (Hg Lamp) which is the light source module unit for exposure of the present invention having the above-described configuration and the light source for the original exposure, and the result of the comparison is photographed and displayed. .

For the test results shown in Figure 12, a 1.5 um thick photoresist (PR name: DTFR-JC800) was coated on a 3.5-inch wafer, and the mask width was set to 0.2 in the range of 1.0 to 3.5 um, respectively. After exposure at intervals of (or 0.3 um), development was carried out with tetramethylammonium hydroxide (TMAH) 2.38 wt% developer, and the fineness formed by photolithography used in a usual LCD process was measured by photographing. The critical dimension of the circuit pattern (CD; Critical Dimension).

Referring to Fig. 12, it can be confirmed that the critical line width fine (CD) of the fine circuit pattern which can be realized by the mercury lamp as the original exposure light source has a limit of about 2.0 μm, and instead, the exposure light source of the present invention is used. The fact that the critical line size (CD) of the fine circuit pattern that can be realized by the module unit can reach about 1.4 um.

Moreover, Fig. 13 is a chart in which the critical line size (CD) measured by photographing in Fig. 12 is arranged to be compared with an ideal critical line size (CD).

Referring to Fig. 13, it can be confirmed that the critical line size (CD) of the fine circuit pattern which can be realized by the exposure light source module unit of the present invention can be realized by using a mercury lamp which is a light source for the original exposure. Fine line width of fine circuit pattern The size (CD) is compared to the fact that it is closer to the ideal critical line size (CD) pattern.

Therefore, it can be confirmed that the line width of the fine circuit pattern formed by the exposure light source module unit of the present invention can be made finer than the line pattern formed by the mercury lamp (Hg Lamp) which is the original exposure light source. Precision. Therefore, the light source module unit for exposure of the present invention can achieve a highly high resolution in the exposure process.

Fig. 14 is a view showing an exemplary configuration of an analogous drawing of a main part of an exposure apparatus to which the light source module unit for exposure of the present invention is applied. Here, the same reference numerals as those of the drawings shown in the drawings represent the same constituent elements.

Referring to FIG. 14, an exposure apparatus 200 of the present invention includes an exposure stage 250 for supporting an exposure glass substrate 10 coated with a sensitizer, and a driving means (no component symbol) for making the exposure stage 250 The light source module unit 100 for exposure is configured to emit illumination light for exposure to the glass substrate 10, and the optical systems 210 to 230 are provided for the glass substrate 10 and for exposure. Between the light source module units 100; and control means (without component symbols), the driving means and the driving of the exposure light source unit 100 are controlled and controlled. Here, the unillustrated element symbol 240 represents an exposure mask in which an exposure pattern is formed.

The glass substrate 10 is coated with a sensitizer on a surface on which illumination light irradiated from the exposure light source module unit 100 is incident, and a mask 240 having the same pattern as the photosensitive pattern formed on the photosensitive surface is formed, and is provided with an air layer. Placed between and supported by the exposure stage 250. Therefore, the illumination light emitted from the exposure light source module unit 100 is collected by the optical systems 210 to 230. Light, thereby passing through the mask 240, is irradiated onto the photosensitive surface of the glass substrate 10, thereby performing an exposure process in which the exposure pattern formed on the mask 240 is transferred to the photosensitive surface of the glass substrate 10.

The exposure stage 250 performs an exposure process in a state in which the position of the glass substrate 10 and the mask 240 are aligned on the X-Y plane coordinates by the driving means in accordance with the relative sizes of the glass substrate 10 and the mask 240.

On the other hand, the exposure apparatus 200 of the present invention exemplifies a configuration in which the glass substrate 10 and the mask 240 are spaced apart from each other, but the configuration is not limited to the present invention.

On the other hand, it is possible to have a configuration in which the mask 240 is in close contact with the photosensitive surface of the glass substrate 10. With this configuration, the photosensitive surface of the glass substrate 10 is closely exposed, and the pattern of the mask 240 is transferred to the photosensitive surface.

In addition, a gap between the glass substrate 10 and the mask 240 can be widened, and a pattern formed on the mask 240 can be reduced in projection by inserting a reduced projection lens between the glass substrate 10 and the mask 240. On the photosensitive surface of the glass substrate 10.

Moreover, the optical systems 210-230 are equipped to efficiently illuminate the illumination light to the mask 240, and include: a mirror 210 for reflecting the illumination light irradiated from the exposure light source module unit 100 so that the passage is set to An aperture A of the light-receiving area; a fly eye lens 221, a condense lens 222, and a plate lens 223, 224 for illuminating through the aperture A Light is refracted to the mirror 230 for collecting light onto the mask 240. The configuration of the optical systems 210 to 230 is not limited to the exposure apparatus 200 of the present invention, and various configurations of deformation may be applied depending on the exposure object and the mask specifications.

The light source module unit 100 for exposure includes, as a characteristic component of the exposure apparatus 200 of the present invention, a light source panel 110 which is attached to a plurality of unit ultraviolet light-emitting elements (UV LEDs) 111 on a circuit board 112 in a matrix structure. The optical panel 120 is mounted on the lens panel 122 on the light-emitting side of the light-emitting element 111 so as to face the support panel 113, and is respectively illuminated by the plurality of unit light collecting lenses 121. The position of the interval p corresponding to the array interval p of the element 111 is eccentric with respect to the main optical axis toward the arbitrary reference center axis side of the center O (see FIG. 2) of the array of the ultraviolet light-emitting elements 111 on the light source panel 110. The array structure of the matrix form of e2 is configured.

According to the exposure apparatus 200 of the present invention, as shown in the exemplary diagram of FIG. 1, the ultraviolet light-emitting element 111 preferably emits ultraviolet light in a range of 100 nm to 410 nm from one or more rows on the unit circuit substrate 112 in the form of a strip. The wafer, package or wafer is mounted with an LED light source in a mixed form of the package.

The exposure light source module unit 100 as described above is directed to a light source panel as a plurality of ultraviolet light emitting element (UV LED) array modules, and an optical panel as a collecting lens array module capable of maximizing light collecting efficiency is combined. The description has been made in detail with reference to FIGS. 1 to 12, and has the same configuration as that described in claims 1 to 10 of the patent application, and thus detailed description thereof will be omitted.

For example, the exposure apparatus 200 of the present invention has a configuration in which the exposure light source module unit 100 is installed instead of the conventional normal exposure apparatus, thereby reducing power consumption, saving light source replacement cost, improving exposure equipment startup time, and solving environmental problems. Therefore, it is possible to expect not only the effect of drastically saving maintenance costs, but also the single wavelength and shortness of ultraviolet rays. The high output and high efficiency are achieved by the wavelength. Therefore, by effectively improving the exposure performance and the exposure efficiency, there is an advantage that the exposure pattern can be made finer and more highly reflective.

The invention as described above is not limited to the specific preferred embodiments, and as long as it is a person of ordinary skill in the art to which the invention pertains, various embodiments can be implemented without departing from the gist of the invention as claimed in the appended claims. Modifications, and such modifications are included in the scope of the described patent application.

100‧‧‧Exposure light source module unit

110‧‧‧Light source panel

111‧‧‧UV light-emitting elements

112‧‧‧ circuit board

113‧‧‧Support panel

120‧‧‧Optical panel

122‧‧‧ lens panel

Claims (12)

An exposure light source module unit comprising: a light source panel, wherein a plurality of unit ultraviolet light emitting elements are mounted on a circuit substrate in a matrix form array structure to be mounted on a support panel; an optical panel is in The lens panel disposed on the side opposite to the light emitting side surface of the unit ultraviolet light-emitting element of the light source panel is located at a position corresponding to the unit ultraviolet light-emitting element by a plurality of unit light-collecting lenses, and is located with respect to the main optical axis. An array structure of a matrix form in a state in which an arbitrary reference center axis side of the center of an ultraviolet light-emitting element array on the light source panel is eccentric; wherein the optical distance "a" from the ultraviolet light-emitting element to the light-receiving area A is passed through a distance "b" of the ultraviolet light-emitting elements spaced apart from the reference center axis side of the center O of the ultraviolet light-emitting element array on the light source panel, and a distance "c" between the ultraviolet light-emitting elements and the face-to-face of the light collecting lens a deviation between a central axis of each of the ultraviolet light-emitting elements and a central axis of the collecting lens The relationship between the distance "x" and the diameter "t" of the light-receiving area A is such that the reference of the eccentric distance "x" of the collecting lens satisfies "x=b*c/a", and the range of "x" is set to satisfy " Bc(2b-t)/2ab<x<bc(2b+t)/2ab". The light source module unit for exposure according to claim 1, wherein the unit light collecting lens is provided in an array structure in a matrix form, and passes through an arbitrary reference from a center of the ultraviolet light emitting element array located on the light source panel. The center axis side is gradually spaced apart, so that the closer the edge is disposed, the more the eccentric amount of the unit ultraviolet light-emitting element relative to the main optical axis is increased, so that the diffused light irradiated from each of the unit ultraviolet light-emitting elements is collected. A light receiving area provided in an optical system of the exposure device. The light source module unit for exposure according to claim 1, wherein the ultraviolet light emitting element is on a single or a plurality of units of the circuit substrate, in any one of a wafer or a package, or both A mixed form of LED light source is mounted. The light source module unit for exposure according to claim 1, wherein the ultraviolet light emitting element is formed on a single circuit board in a form selected from a wafer or a package or a mixture of the two. The light emitting diode light source is mounted. The light source module unit for exposure according to any one of claims 1 to 4, wherein the unit light collecting lens is formed by a lenticular lens. The light source module unit for exposure according to any one of claims 1 to 4, wherein the unit light collecting lens is a lenticular lens having curvature surfaces different from each other according to an array arrangement position; form. The light source module unit for exposure according to any one of claims 1 to 4, wherein the unit ultraviolet light-emitting elements corresponding to each other are spaced apart from the face-to-face of the unit collecting lens by a distance c and the set The diameter d of the optical lens satisfies the condition of 1.0 c < d < 2.5 c. The light source module unit for exposure according to any one of claims 1 to 4, wherein the light source panel and the optical panel are equipped to be supported by means of a casing to be capable of being disassembled in an exposure apparatus The state of the assembly is unitized. The light source module unit for exposure according to any one of claims 1 to 4, further comprising a heat dissipating means around the light source panel and the optical panel. An exposure apparatus comprising: an exposure stage for supporting a substrate for exposure to which a sensitizer is applied; and a driving means for driving the exposure stage in a state capable of moving on an XY plane coordinate An exposure light source module unit equipped with a mask for emitting illumination light to a mask required to form an exposure pattern of the substrate; an optical system disposed between the substrate and the exposure light source module unit; a control means for contacting and controlling driving of the driving means and the light source unit for exposure, wherein the light source module unit for exposure comprises: a light source panel, which is formed in a matrix form on a circuit substrate by a plurality of unit ultraviolet light emitting elements The array structure is mounted on the support panel; and an optical panel is disposed on the lens panel disposed opposite to the light emitting side of the unit ultraviolet light emitting element of the light source panel, and the plurality of unit collecting lenses are respectively a position corresponding to the unit ultraviolet illuminating element, with respect to the main optical axis, passing through an ultraviolet illuminating element located on the light source panel An array structure configuration of a matrix form of an arbitrary eccentric state of the center of the array center; wherein the optical distance "a" from the ultraviolet ray element to the light receiving area A is from the ultraviolet ray on the light source panel a distance "b" of the ultraviolet light-emitting elements spaced apart from the reference center axis side of the light-emitting element array center O, a distance "c" between the ultraviolet light-emitting elements and the face-to-face of the light collecting lens, and each of the ultraviolet light-emitting elements The relationship between the eccentric distance "x" between the central axis and the central axis of the collecting lens and the diameter "t" of the light receiving region A is set such that the reference of the eccentric distance "x" of the collecting lens satisfies "x=b*" The range of c/a", "x" is set to satisfy "bc(2b-t)/2ab<x<bc(2b+t)/2ab". The exposure apparatus of claim 10, wherein the unit collecting lens is provided in an array structure in a matrix form, from the ultraviolet light passing through the light source panel The arbitrary reference center axis sides of the center of the line light-emitting element array are gradually spaced apart, so that the closer to the edge arrangement, the more the eccentricity of the corresponding unit ultraviolet light-emitting element relative to the main optical axis is increased, so that the ultraviolet light is emitted from each of the units. The diffused light irradiated by the element is collected in a light receiving region provided in an optical system of the exposure device. The exposure apparatus according to claim 10, wherein the optical distance "a" from the ultraviolet light emitting element to the light receiving area A passes through the ultraviolet light emitting element array located on the light source panel a distance "b" of the ultraviolet light-emitting elements spaced apart from the reference center axis side of the center O, a distance "c" between the ultraviolet light-emitting elements and the face-to-face of the light collecting lens, and a central axis of each of the ultraviolet light-emitting elements The relationship between the eccentric distance "x" between the central axes of the collecting lens and the diameter "t" of the light receiving region A is set such that the reference of the eccentric distance "x" of the collecting lens satisfies "x=b*c/a ", the range of "x" is set to satisfy "bc(2b-t)/2ab<x<bc(2b+t)/2ab".