CN103592821B - Novel LED (light-emitting diode) light source system for ultraviolet exposure machine - Google Patents
Novel LED (light-emitting diode) light source system for ultraviolet exposure machine Download PDFInfo
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- CN103592821B CN103592821B CN201310481112.9A CN201310481112A CN103592821B CN 103592821 B CN103592821 B CN 103592821B CN 201310481112 A CN201310481112 A CN 201310481112A CN 103592821 B CN103592821 B CN 103592821B
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Abstract
The invention relates to a novel LED (light-emitting diode) light source system for an ultraviolet exposure machine. The novel LED light source system for the ultraviolet exposure machine comprises a light source mounting rack, wherein the light source mounting rack is successively provided with multiple rows of ultraviolet LED light sources which are arranged at an equal distance; the ultraviolet LED light sources comprise lenses and UVLEDs (ultraviolet light-emitting diode), wherein the LEDs and the lenses of the light sources are arranged into a matrix array, the UVLEDs are high-power LEDs (more than 3W) the optical wavelengths of which are changed according to the different light materials, and the sizes of the diameters of the lenses are changed according to the requirements of the light materials on energy. The novel LED light source system for the ultraviolet exposure machine, which is provided by the invention, has the advantages that the light energy is effectively utilized, an emergent ray achieves the parallel light effect, and the arrangement mode of the lenses is firstly arranged in a malposed lens matrix and is arranged into an array of an area array according to the size of an exposure platform surface; the light source system is applied into the ultraviolet exposure machine, and the light source characteristic requirements of angles of the light sources, the exposure uniformity and an exposure material are greatly improved.
Description
Technical field
The present invention relates to a kind of light-source system of exposure machine, particularly a kind of novel LED ultraviolet exposure machine light-source system.
Background technology
The depth of parallelism and the exposure uniformity coefficient of the light shooting angle of ultraviolet light are two important technology indexs of ultraviolet exposure machine.Existing ultraviolet exposure machine because of its purposes different, or high and its complex structure of exposure resolution ratio, luminous energy effect utilization factor is low, and energy consumption is high and working service cost is high makes it in the today of advocating energy-conserving and environment-protective, day by day becomes the equipment that need substitute or improve.
Because optical exposure illumination system irradiance is uneven, cause line weight uneven, the ill-exposed phenomenons such as the resolution in entire plate is inconsistent, and the resolution in raw entire plate is inconsistent occur. this is unallowed in the production run of PCB or liquid crystal display.Optical exposure lighting source many employings metal halide (as mercuric bromide) of traditional exposure machine ionize luminescent material as being excited, belong to high-intensity gas discharge lamp, inside is all containing high pressure, high temperature and noxious material, high-pressure sodium lamp has very strong radiation from long wave ultraviolet to visible ray, but only the optical wavelength of some UVA-UVB section can act on uv-exposure purposes, the radiation of other optical wavelength wave bands all can be distributed on other objects of space in the mode of luminous energy and radiation energy, causes environment temperature to raise; The lighting angle of high-pressure sodium lamp is 360 degree, needs quite large-area reflex housing and larger distance to carry out beam shaping to meet application demand, but can make the loss of light intensity 50-70% of exposure system.In sum, it is low to there is light transmittance efficiency in the optical exposure illumination system of traditional exposure machine, and energy consumption is high, use material to be unfavorable for the shortcomings such as environmental protection.And the feature that the optical exposure illumination system in the present invention possesses is: use LED as luminophor, being aided with collimation lens and matrix organiser, to realize luminescent light wave long single, utilization ratio of optical energy is high, can more than 95% be reached, the use material formed is glass, GaN based semiconductor, the metals such as X alloy; Have environmentally friendly, reduce power consumption, the advantages such as economize energy.
LED is adopted to expose, change and the mode of change with lighting angle because LED exists luminous intensity, its arrangement mode causes LED may occur that the place that the intensity of light source is strong is over-exposed in exposure, and the problem of the low place under-exposure of the intensity of light source, how to remove design LED arrangement mode, make exposure homogenising urgently to be resolved hurrily, adopted simultaneously in the past and carried out moving exposure under exposure light source, easy appearance exposure table top shifts out effective exposure area, or adopt exposure light source translation, exposure table top is exposed, both easily occur that the defect of effective exposure area is shifted out in position to be exposed, because the characteristic of all exposing materials uniform exposure light source that to be all needs one lasting, so the mode of narrow light source rapid scanning does not meet the requirement of exposing material, the qualification rate of product is not high.
In order to solve the deficiency of above-mentioned technology, the object of this invention is to provide a kind of novel LED ultraviolet exposure machine light-source system and LED ultraviolet exposure machine, it effectively raises the uniformity coefficient of proximity large area ultraviolet Uniform Irradiation exposure and the angle of light, and the effective utilization factor of luminous energy.
The technical solution adopted in the present invention is: a kind of novel LED ultraviolet exposure machine light-source system, it comprises light source erecting frame, described light source erecting frame arranges the ultraviolet LED light source of at least one group of multirow equidistant arrangement, described ultraviolet LED light source comprises lens and UVLED, the diameter of described lens is φ, K is the difference of the centre distance of the ultraviolet LED light source of the same row of adjacent rows, described lens arrangement forms lens matrix, the line number of described lens matrix is L, K=φ/L, described LED ultraviolet exposure machine light-source system forms relative vertically moving with to be exposed.
Described ultraviolet LED light source is irradiated on exposure table top and forms light source irradiation region, the effective exposure area of to be exposed is provided with in light source irradiation region, described effective exposure area is relative to the length travel of light source irradiation region, light source irradiation region is greater than effective exposure area, and time mobile, effective exposure area is in light source irradiation region all the time.
The diameter of described lens is 20mm-80mm.
The horizontal and vertical of described arbitrary group of ultraviolet LED light source all aligns.
The top of described lens is 10mm-800mm to the distance A of exposure table top.
The shooting angle B of described ultraviolet LED light source scioptics is 0-60 degree.
Described LED ultraviolet exposure machine light-source system can transverse shifting.
The optical wavelength range of described UVLED is 250nm-450nm.
The invention has the beneficial effects as follows: adopt special arrangement mode, to improve exposure uniformity coefficient and to reduce premised on light source dispersion angle, avoid because optical exposure illumination system irradiance is uneven, cause line weight uneven, the resolution in entire plate is inconsistent, or has the generation of the phenomenons such as broken string, by the ultraviolet exposure machine that this light-source system is applied to, in the angle of light source, exposition uniformity, and exposing material has great raising in the requirement of light source characteristic.
Accompanying drawing explanation
Fig. 1 is arrangement and the mutual relationship figure of lens matrix.
Fig. 2 is the enlarged drawing at I place in Fig. 1.
Fig. 3 is the syntagmatic figure of lens and UVLED.
Fig. 4 is the schematic perspective view of lens support plate.
Fig. 5 is the position relationship schematic diagram of lens, lens support plate and UVLED.
Embodiment
Below in conjunction with accompanying drawing, embodiments of the present invention is further illustrated:
As shown in Figure 1, Figure 2 and Figure 3, a kind of novel LED ultraviolet exposure machine light-source system, it comprises light source erecting frame, described light source erecting frame arranges the ultraviolet LED light source of at least one group of multirow equidistant arrangement, described ultraviolet LED light source comprises lens and UVLED, the diameter of described lens is φ, K is the difference of the centre distance of the ultraviolet LED light source of the same row of adjacent rows, described lens arrangement forms lens matrix, the line number of described lens matrix is L, K=φ/L, described LED ultraviolet exposure machine light-source system forms relative vertically moving with to be exposed.The centre distance of adjacent two lens of often going is that M, M are more than or equal to φ, and the centre distance of the lens of the same row of adjacent rows is that N, N are more than or equal to φ, the line number L of lens matrix be 3-10 capable between.
Described ultraviolet LED light source is irradiated on exposure table top and forms light source irradiation region, the effective exposure area of to be exposed is provided with in light source irradiation region, described effective exposure area is relative to the length travel of light source irradiation region, and time mobile, effective exposure area is in light source irradiation region all the time.The area in the light source irradiation region that the light scioptics matrix of UVLED is formed is greater than the area of effective exposure area, and effective exposure area to be positioned within light source irradiation region and can relative longitudinal displacement.Effective exposure area is the rectangular area of 100 square millimeters to 40000 square millimeters, and effective exposure area becomes length travel to coordinate relative to lens matrix, and it is when being subjected to displacement, effective exposure area is within the scope of lens matrix all the time, ensure that effective exposure area is in effective exposure status always, avoid issuable effective exposure area in the past and leave lens matrix region, make it expose insufficient.
UVLED(ultraviolet LED) be the one of LED, it is the invisible light of Single wavelength, general at below 400nm, make UVLED can send a complete continuous ultraviolet light belt by specialized designs, meet edge sealing, the need of production in the fields such as printing, line source has the life-span of overlength, cold light source, non-thermal radiation, life-span is not by opening and closing times influence, energy is high, irradiate and evenly enhance productivity, not safer than traditional light source containing Toxic material, more environmental protection, ultraviolet LED adopts great power LED (more than 3W), its optical wavelength range is 250nm-450nm, according to the difference of exposing material, and select the UVLED of different wave length.
See Fig. 4 and Fig. 5, lens scioptics support plate is fixed on UVLED upper end, forms ultraviolet LED light source.
After the light source matrix that this lens matrix is formed adds longitudinal scanning, uniformity coefficient can bring up to 85% from 10%, the length of longitudinal scanning is the geometry multiple of single lens diameter and the product S(scanning distance of line number L)=φ * L, its sweep velocity is arranged according to the characteristic of exposing material.Wherein exposing material is photosensitive dry film and photosensitive liquid ink, can repeatedly move around simultaneously, mobile number of times >=1.
The diameter of described lens is 20mm-80mm, and the diameter of lens changes the demand difference of energy according to exposing material, and the most effectively utilizes luminous energy, and makes emergent ray reach the effect of directional light.Increase the range of choice of lens, light source arrangement can be carried out according to the size of lens diameter, adopt large diameter lens, the densely distributed degree of light source can be effectively reduced, reduce the use amount of light source, cost-saving, and in order to strengthen its exposure intensity, then can select the lens of minor diameter, improve its distribution of light sources closeness, strengthen exposure intensity simultaneously, exposure efficiency is improved.
The horizontal and vertical of described arbitrary group of ultraviolet LED light source all aligns, and forms all horizontal and vertical alignment of arbitrary array such as the first array, the second array, the 3rd array.
Described lens adopt high borosilicate, quartz glass or other uvioresistant optical glass to make, adopt the light-source system of the technical program arrangement, its choice for lens is strengthened, and the lens not needing picture in the past certain material must be adopted to make, improve its range of application.
The top of described lens is 10mm-800mm to the distance A of exposure table top.
The shooting angle B of described ultraviolet LED light source scioptics is 0-60 degree.
By setting the shooting angle of lens, diameter and lensed tip to the distance exposing table top, resolution can be made to reach 0.5mil.
Described LED ultraviolet exposure machine light-source system can transverse shifting.By this light-source system of transverse shifting, uniformity coefficient can be made to bring up to 95% from 85%, meet the technological requirement in the fields such as PCB printed circuit board, FPCB flexible PCB touch-screen, glass substrate, semiconductor carrier plate and printing screen plate making greatly.
When the shooting angle of ultraviolet LED light source scioptics is 0 degree, this light-source system then must be made to carry out walking crosswise movement, improve it and irradiate uniformity coefficient, and transverse shifting distance is single lens diameter Φ, its transverse shifting speed is determined according to the characteristic of exposing material and the technological requirement of wiring board, its transverse shifting speed, from 1mm/s to 1000mm/s, can repeatedly move around, mobile number of times >=1.
Special arrangement mode is adopted to add to make effective exposure area to be in design in exposure status all the time, to improve exposure uniformity coefficient and to reduce premised on light source dispersion angle, avoid because optical exposure illumination system irradiance is uneven, cause line weight uneven, resolution in entire plate is inconsistent, or have the generation of the phenomenons such as broken string, by the ultraviolet exposure machine that this light-source system is applied to, in the angle of light source, exposition uniformity, and exposing material has great raising in the requirement of light source characteristic.
Below described by reference to the accompanying drawings embodiment is only the preferred embodiment of the present invention, and the restriction not to protection scope of the present invention, and any improvement done based on the present invention's spirit all ought within scope.
Claims (7)
1. a novel LED ultraviolet exposure machine light-source system, it comprises light source erecting frame, it is characterized in that: the ultraviolet LED light source described light source erecting frame arranging at least one group of multirow equidistant arrangement, described ultraviolet LED light source comprises lens and UVLED, the diameter of described lens is φ, K is the difference of the centre distance of the ultraviolet LED light source of the same row of adjacent rows, described lens arrangement forms lens matrix, the line number of described lens matrix is L, K=φ/L, described LED ultraviolet exposure machine light-source system forms relative vertically moving with to be exposed, the diameter of described lens is 20mm-80mm, often the centre distance of capable adjacent two lens is M, M is more than or equal to φ, the centre distance of the lens of the same row of adjacent rows is N, N is more than or equal to φ, the line number L of lens matrix be 3-10 capable between.
2. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, it is characterized in that, described ultraviolet LED light source is irradiated on exposure table top and forms light source irradiation region, the effective exposure area of to be exposed is provided with in light source irradiation region, described effective exposure area is relative to the length travel of light source irradiation region, light source irradiation region is greater than effective exposure area, and time mobile, effective exposure area is in light source irradiation region all the time.
3. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, it is characterized in that, the horizontal and vertical of described arbitrary group of ultraviolet LED light source all aligns.
4. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, the top of described lens is 10mm-800mm to the distance A of exposure table top.
5. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, it is characterized in that, the shooting angle B of described ultraviolet LED light source scioptics is 0-60 degree.
6. a kind of novel LED ultraviolet exposure machine light-source system according to claim 1, it is characterized in that, described LED ultraviolet exposure machine light-source system can transverse shifting.
7. a kind of New LED ultraviolet exposure machine light-source system according to claim 1, is characterized in that, the optical wavelength range of described UVLED is 250nm-450nm.
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| CN201310481112.9A CN103592821B (en) | 2013-10-16 | 2013-10-16 | Novel LED (light-emitting diode) light source system for ultraviolet exposure machine |
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| CN201310481112.9A CN103592821B (en) | 2013-10-16 | 2013-10-16 | Novel LED (light-emitting diode) light source system for ultraviolet exposure machine |
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| CN103592821B true CN103592821B (en) | 2015-06-03 |
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Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103913956B (en) * | 2014-03-10 | 2016-02-24 | 东莞科视自动化科技有限公司 | Energy saving and environment friendly UVLED exposure machine uniformity coefficient automatic testing method and equipment |
| RU2719062C2 (en) * | 2015-06-03 | 2020-04-17 | Конинклейке Филипс Н.В. | System and method of improving safety when operating with uv radiation under conditions of aqueous use |
| KR101593963B1 (en) * | 2015-07-30 | 2016-02-15 | 조남직 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| CN105629680A (en) * | 2016-03-30 | 2016-06-01 | 昆山尊宸电子有限公司 | UV-LED mixed wavelength light source system for exposure machine |
| CN105759571A (en) * | 2016-05-13 | 2016-07-13 | 京东方科技集团股份有限公司 | Ultraviolet light mask device and use method thereof |
| CN106773549B (en) * | 2017-01-21 | 2024-02-27 | 南京新趋势光电有限公司 | High-uniformity LED parallel light ultraviolet exposure machine light source system |
| CN106873317A (en) * | 2017-05-02 | 2017-06-20 | 成都恒坤光电科技有限公司 | A kind of planar exposure system and exposure component |
| CN106907586B (en) * | 2017-05-02 | 2023-07-18 | 成都恒坤光电科技有限公司 | Strip light source, planar light source and exposure component adopting planar light source |
| CN107450283A (en) * | 2017-09-25 | 2017-12-08 | 北京京圳永达科技有限公司 | LED light polyplant and parallel exposing machine |
| CN108286682A (en) * | 2018-02-12 | 2018-07-17 | 丁强 | Enhance the integrated module and strip-shaped light source of UVLED radiation peak intensity |
| CN113126456A (en) * | 2021-05-06 | 2021-07-16 | 艾斯尔光电(南通)有限公司 | Photomask exposure developing process |
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Address after: 325000 Main Building, 700 Wenzhou Avenue, Wenzhou Economic and Technological Development Zone, Wenzhou City, Zhejiang Province Patentee after: Zhejiang Eurovision Television Technology Co., Ltd. Address before: Room G-502, Standard Workshop Phase III, No. 10 District, Wenzhou High-tech Industrial Park, Zhejiang Province Patentee before: Zhejiang Ousut Technology Co., Ltd. |
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