CN106873317A - A kind of planar exposure system and exposure component - Google Patents
A kind of planar exposure system and exposure component Download PDFInfo
- Publication number
- CN106873317A CN106873317A CN201710300864.9A CN201710300864A CN106873317A CN 106873317 A CN106873317 A CN 106873317A CN 201710300864 A CN201710300864 A CN 201710300864A CN 106873317 A CN106873317 A CN 106873317A
- Authority
- CN
- China
- Prior art keywords
- exposure
- light source
- planar
- hot spot
- exposure system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to ultra violet applications technical field, specifically related to a kind of planar exposure system and exposure component, the planar exposure system, including light source assembly, the light source assembly is formed with planar hot spot in plane of exposure, the light source assembly there are at least one motion track, and there are at least one exposure stroke, at least one effective exposure area is there are in the corresponding irradiation area of the planar hot spot, when the light source assembly moves an exposure stroke along the motion track, the light energy integration differential at any point or any one region in the effective exposure area is less than 10%.The planar exposure system of the application, it is ensured that when being exposed work, the uniformity that each position is exposed in region to be exposed, it is ensured that good exposure effect；And, also further eliminate causes the uneven problem of exposure because hot spot unit internal irradiation intensity is uneven.
Description
Technical field
The present invention relates to ultra violet applications technical field, and in particular to a kind of planar exposure system and exposure component.
Background technology
In ultra violet applications technical field, photoetching microfabrication is applied more and more extensively, in order to improve in every profession and trade
Production efficiency, has effective irradiation intensity and good uniformity high, and have big effective light spot it is desirable to exposure light source
Area.But, for exposure light source, it is conflicting to increase effective light spot area with increase effective irradiation intensity.
Improved while in order to realize effective irradiation intensity and effective light spot area, current mode is to use multiple light sources
Light source strip is spliced into, a banded irradiation hot spot is formed on plane of exposure, in exposure process, by mobile light source strip, make band
The inswept face to be exposed of irradiation hot spot of shape, and then realize the exposure of larger area.
In further design work, inventor has found, above-mentioned this also to be deposited by the way of light source strip is scanned
There is deficiency, be characterized in particular in：Because light source is in arranged in strips, in order to have irradiation hot spot wider, so, beam angle is generally all
Larger, the effective irradiation intensity of plane of exposure is not high, and whole exposure process shift motion is larger, and part moving parts structure is answered
It is miscellaneous, it is also inconvenient for the precise control of light source movement.
The content of the invention
It is an object of the invention to：In for current uv-exposure technical field, there is above-mentioned deficiency, there is provided Yi Zhongzhao
Penetrate hot spot have good uniformity, effective light spot area it is larger, the shorter light-source structure of exposure process shift motion.
To achieve these goals, the technical solution adopted by the present invention is：
A kind of planar exposure system, including light source assembly, the light source assembly are formed with planar hot spot, the light in plane of exposure
Source component there are at least one motion track, and there are at least one exposure stroke, the corresponding photograph of the planar hot spot
Penetrate in region and there are at least one effective exposure area, when the light source assembly moves an exposure along the motion track
During light stroke, the light energy integration at any point or any one region in the effective exposure area, effective after integration
The light energy integration differential in any point or any one region is less than 10% in exposure area.
The planar exposure system of the application, in actual use, region to be exposed is placed in effective exposure area, is led to
Cross and move light source assembly, light source assembly along the motion track move one it is described exposure stroke when, in effective exposure area
Any point or the light energy integration differential in any one region be less than 10%, i.e. ensure that when being exposed work, wait to expose
Each position is exposed with more consistent uniformity in light region, it is ensured that good exposure effect；Be additionally, since is to use
Above-mentioned mode realizes the uniformity of exposure, so, on the other hand also it is relative reduce it is equal to light source assembly static state hot spot
The requirement of even property, and then also reduce production difficulty and manufacturing cost；Another further aspect, in practice, forms the light of planar hot spot
Source component, typically has some single light source cell spellings to form, the hot spot unit that planar hot spot is also formed by light source cell
Spelling is formed, so, for the hot spot unit that single source is formed, the irradiation intensity of its hot spot unit inside regional
Difference is there is also, using the above-mentioned exposure system of the application, is also further eliminated this because hot spot unit internal irradiation is strong
Spend uneven and cause the uneven problem of exposure；Further, because planar hot spot is spelled successively by some hot spot units
Connect or partly overlap or gap cooperatively forms, so, between hot spot unit or overlapping, its irradiation intensity and other portions
The irradiation intensity of position is simultaneously differed, so, using the planar exposure system of the application, also eliminate because light source cell splicing is drawn
Play the uneven problem of exposure.
Preferably, light source assembly along the motion track move one it is described exposure stroke when, in effective exposure area
Any point or any one region light energy integration it is equal.It is to make in effective exposure area as optimal scheme
Any point or any one region light energy integration it is equal, in this way, i.e. ensure that each point or region be exposed it is equal
Even property.
Preferably, when the light source assembly moves an exposure stroke along the motion track, effective exposure
Region is in illuminated state all the time.Using this kind of mode, i.e. using a face shaped laser spot irradiation area more than region to be exposed
Light source assembly, is arranged such, and can significantly shorten exposure stroke, is on the one hand to improve exposure effect, on the other hand, it is also possible to more
The mobile accuracy of the application planar exposure system is accurately controlled, exposure accuracy, another further aspect is further improved, it is also possible to letter
Change the driving structure of mobile the application planar exposure system, and then be also convenient for processing and manufacturing.
Preferably, the light source assembly includes several light source cells, and each described light source cell is in the exposure
All it is formed with a hot spot unit on face, the adjacent hot spot unit splices or partly overlaps or formation that gap coordinates successively
The planar hot spot.
Preferably, the light source assembly also includes several for adjusting the optical lens that light source cell emits beam,
Each described light source cell and an optical lens coordinate.
Each light source cell is engaged with an optical lens so that the light that light source cell sends is first by optical lens
Formation hot spot unit on plane of exposure is radiated at after adjustment again, so, the hot spot unit of each light source cell is with partly overlapping side
Formula, the mode for mutually splicing or existing between adjacent spots unit minim gap, form the hot spot of strip, so make
, the beam angle for forming hot spot unit light is smaller, and hot spot has effective irradiation intensity higher, further improves exposure
Efficiency and the precision of exposure.
Preferably, the distance between adjacent described light source cell optical axis is L, when the hot spot unit that each light source cell is formed
Between for gap coordinate when, the distance between adjacent spots unit be less than 0.1L.In actual design work, inventor has found,
Light source cell is set using aforesaid way, it is ensured that the application planar exposure system can be realized easily effectively in movement
Any point or any one region in exposure area light energy integration, after integration in effective exposure area any point
Or any one region light energy integrate equal or difference be less than 10% this purpose, it is to avoid between hot spot unit gap compared with
Bring difficulty to greatly formulation motion track or/and exposure stroke.
Preferably, the specification of the light source cell is identical with model, and the size of the optical lens is identical with material.Using
The light source cell of same size and model, and using same size and material, in same plane of exposure, ensure that each
Hot spot unit has preferable uniformity, further facilitates the arrangement of relative position between light source cell.
As one kind preferably, all light source cells are to be uniformly arranged.
As it is a kind of preferably, the hot spot unit is shaped as rectangle, square or regular hexagon.
Can facilitate hot spot unit that overall planar hot spot is cooperatively formed on plane of exposure by above-mentioned structure.
As one kind preferably, the matching part between the hot spot unit is staggeredly arranged.
Preferably, the light source cell is ultraviolet LED light source of the wavelength from 200 nanometers to 420 nanometers.Using the wavelength
Ultraviolet light, it is ensured that the irradiation intensity of light, and then when ensureing mobile, exposure area can be treated and reliably exposed.
Disclosed herein as well is a kind of exposure component,
A kind of exposure component, including driver part and above-mentioned planar exposure system, the driver part are used to drive the face
Shape exposure system is moved along the motion track.
The exposure component of the application, as a result of above-mentioned planar exposure system, when work is exposed, Neng Gouti
It is larger for area, and irradiation intensity is uniform, it is mobile to form shorter effective exposure area.
Preferably, it is shaped as square or during rectangle when the hot spot unit, the motion track and the light
The diagonal of spot unit is parallel, and the exposure stroke is equal to or more than a catercorner length for hot spot unit.It is logical
Above-mentioned structure is crossed, hot spot unit pair is equal to or more than when planar exposure system moves one along hot spot unit diagonal
During the exposure stroke of diagonal length, the light energy integration differential at any point or any one region in effective exposure area
Less than 10%, it is ensured that when being exposed work, the uniformity that each position is exposed in region to be exposed.
In sum, by adopting the above-described technical solution, the beneficial effect of the application is：
1st, the planar exposure system of the application, in actual use, region to be exposed is placed in effective exposure area, is passed through
Mobile light source assembly, light source assembly when an exposure stroke is moved along the motion track, in effective exposure area
The light energy integration differential in any point or any one region is less than 10%, i.e. ensure that when being exposed work, to be exposed
Each position is exposed with more consistent uniformity in region, it is ensured that good exposure effect；Be additionally, since is using upper
The mode stated realizes the uniformity of exposure, so, on the other hand also it is relative reduce it is uniform to light source assembly static state hot spot
The requirement of property, and then also reduce production difficulty and manufacturing cost；Another further aspect, in practice, forms the light source of planar hot spot
Component, typically has some single light source cell spellings to form, the hot spot unit group that planar hot spot is also formed by light source cell
Spelling is formed, so, for the hot spot unit that single source is formed, the irradiation intensity of its hot spot unit inside regional
Have differences, using the above-mentioned exposure system of the application, also further eliminate this because of hot spot unit internal irradiation intensity
It is uneven and cause the uneven problem of exposure；Further, because planar hot spot is spliced successively by some hot spot units
Or partly overlap or gap cooperatively forms, so, between hot spot unit or overlapping, its irradiation intensity and other positions
Irradiation intensity and differ, so, using the planar exposure system of the application, also eliminate because light source cell splice caused by
The uneven problem of exposure；
2nd, the exposure component of the application, as a result of above-mentioned planar exposure system, when work is exposed, using the teaching of the invention it is possible to provide
Area is larger, and irradiation intensity is uniform, mobile to form shorter effective exposure area.
Brief description of the drawings
Fig. 1 is the structural representation that the application planar exposure system coordinates with driver part；
Fig. 2 is the partial structural diagram after the application planar exposure system is removed；
Fig. 3 forms the schematic diagram of correspondence hot spot unit for light source cell；
Fig. 4 be hot spot unit between be schematic diagram when gap coordinates；
Fig. 5 is the schematic diagram staggered between hot spot unit matching portion；
Fig. 6 is schematic diagram when hot spot unit is rectangle；
Fig. 7 is the schematic diagram that driver part drives area source movement,
Marked in figure：1- light source cells, 2- hot spot units, 3- optical lenses, 4- driver parts, 5- planar hot spots, A- is effective
Exposure area.
Specific embodiment
Below in conjunction with the accompanying drawings, the present invention is described in detail.
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only used to explain the present invention, not
For limiting the present invention.
Embodiment 1, as shown in figs. 1-7,
A kind of planar exposure system, including light source assembly, the light source assembly are formed with planar hot spot 5 in plane of exposure, described
Light source assembly there are at least one motion track, and there are at least one exposure stroke, and the planar hot spot 5 is corresponding
At least one effective exposure area A is there are in irradiation area, when the light source assembly moves an institute along the motion track
State exposure stroke when, any point or any one region in the effective exposure area A light energy integration, after integration
The light energy integration differential in any point or any one region is less than 10% in effective exposure area.
The planar exposure system of the present embodiment, in actual use, region to be exposed is placed in effective exposure area A
It is interior, by mobile light source assembly, light source assembly when an exposure stroke is moved along the motion track, effective exposure region
The light energy integration differential at any point or any one region in the A of domain is less than 10%, i.e. ensure that when being exposed work,
Each position is exposed with more consistent uniformity in region to be exposed, it is ensured that good exposure effect；Being additionally, since is
The uniformity for realizing exposure in manner just described is adopted, so, it is also relative on the other hand to reduce to light source assembly static light
The requirement of spot uniformity, and then also reduce production difficulty and manufacturing cost；Another further aspect, in practice, forms planar hot spot 5
Light source assembly, typically there are some single spellings of light source cell 1 to form, the light that planar hot spot 5 is also formed by light source cell 1
The spelling of spot unit 2 is formed, so, for the hot spot unit 2 that single source is formed, its inside regional of hot spot unit 2
Irradiation intensity there is also difference, using the above-mentioned exposure system of the present embodiment, also further eliminate this because of hot spot list
First 2 internal irradiation intensity are uneven and cause the uneven problem of exposure；Further, because planar hot spot 5 is by some
Hot spot unit 2 splices or partly overlaps or gap cooperatively forms successively, so, between the hot spot unit 2 or overlapping, its
The irradiation intensity at irradiation intensity and other positions is simultaneously differed, so, using the planar exposure system of the present embodiment, also eliminate
Uneven problem is exposed caused by light source cell 1 splices.
As a preferred mode, the light source assembly is moving an exposure stroke along the motion track
When, the light energy integration at any point or any one region in effective exposure area is equal.As optimal scheme, it is
Make the light energy integration in any point in effective exposure area or any one region equal, in this way, ensure that each point
Or the uniformity that region is exposed.
As a kind of implementation method, when the light source assembly moves an exposure stroke along the motion track, institute
State effective exposure area A and be in illuminated state all the time.Using this kind of mode, i.e. be more than using the irradiation area of a face shaped laser spot 5
The light source assembly in region to be exposed, is arranged such, and can significantly shorten exposure stroke, is on the one hand to improve exposure effect, another
Aspect, it is also possible to the mobile accuracy of more precise control the present embodiment planar exposure system, further improves exposure accuracy, then
On the one hand, it is also possible to which the driving structure of the present embodiment planar exposure system is moved in simplification, and then has been also convenient for processing and manufacturing.
Used as a kind of implementation method, the light source assembly includes several light source cells 1, each described light source cell
1 is all formed with a hot spot unit 2 on the plane of exposure, the adjacent hot spot unit 2 splice successively or partly overlap or
The formation planar hot spot 5 that gap coordinates.
Used as a kind of implementation method, the light source assembly also includes several and is emitted beam for adjusting light source cell 1
Optical lens 3, each described light source cell 1 coordinates with an optical lens 3.
Each light source cell 1 is engaged with an optical lens so that the light that light source cell 1 sends is first by optical lens
It is radiated at again after mirror adjustment and hot spot unit 2 is formed on plane of exposure, so, the hot spot unit 2 of each light source cell 1 is partly overlapping
Mode, mutually splicing or there is the mode of minim gap between adjacent spots unit 2, form the hot spot of strip, such as
This causes that the beam angle for forming the light of hot spot unit 2 is smaller, and hot spot has effective irradiation intensity higher, further to improve
Exposure efficiency and the precision of exposure.
Used as a kind of implementation method, the distance between adjacent optical axis of the light source cell 1 is L, when each shape of light source cell 1
Into hot spot unit 2 between for gap coordinate when, the distance between adjacent spots unit 2 be less than 0.1L.In actual design work
In, inventor find, using aforesaid way set light source cell 1, it is ensured that the present embodiment planar exposure system in movement, energy
The light energy integration in enough any point easily realized in effective exposure area A or any one region, effective after integration
The light energy integration differential in any point or any one region is less than 10% this purpose in exposure area, it is to avoid hot spot unit 2
Between gap it is larger and give formulation motion track or/and exposure stroke bring difficulty.
Used as a kind of implementation method, the specification of the light source cell 1 is identical with model, the size of the optical lens 3 and
Material is identical.Using the light source cell 1 of same size and model, and using same size and material, in same plane of exposure
It is interior, ensure that each hot spot unit 2 has preferable uniformity, further facilitate relative position between light source cell 1
Arrangement.
As one kind preferably, all light source cells 1 are to be uniformly arranged.
As it is a kind of preferably, the hot spot unit 2 is shaped as rectangle, square or regular hexagon.
Can facilitate hot spot unit 2 that overall planar hot spot 5 is cooperatively formed on plane of exposure by above-mentioned structure.
As one kind preferably, the matching part between the hot spot unit 2 is staggeredly arranged.
Preferably, the light source cell 1 is ultraviolet LED light source of the wavelength from 200 nanometers to 420 nanometers.Using the ripple
Ultraviolet light long, it is ensured that the irradiation intensity of light, and then when ensureing mobile, exposure area can be treated and reliably exposed.
Embodiment 2, as shown in figs. 1-7,
A kind of exposure component, including driver part 4 and above-mentioned planar exposure system, the driver part 4 are described for driving
Planar exposure system is moved along the motion track.
The exposure component of the present embodiment, as a result of above-mentioned planar exposure system, when work is exposed, can
There is provided area larger, and irradiation intensity is uniform, it is mobile to form shorter effective exposure area A.
As a kind of implementation method, when the hot spot unit 2 is when being shaped as square or rectangle, the moving rail
Mark is parallel with the diagonal of the hot spot unit 2, and the exposure stroke is equal to or more than the right of hot spot unit 2
Diagonal length.By above-mentioned structure, it is equal to or big when planar exposure system moves one along the diagonal of hot spot unit 2
When the exposure stroke of the catercorner length of hot spot unit 2, the light at any point or any one region in effective exposure area A
According to energy integral difference be less than 10%, it is ensured that when being exposed work, in region to be exposed each position be exposed it is uniform
Property.
All any modification, equivalent and improvement made within the spirit and principles in the present invention etc., should be included in
Within protection scope of the present invention.
Claims (12)
1. a kind of planar exposure system, it is characterised in that：Including light source assembly, the light source assembly is formed with face in plane of exposure
Shaped laser spot, the light source assembly there are at least one motion track, and there are at least one exposure stroke, the planar
At least one effective exposure area is there are in the corresponding irradiation area of hot spot, when the light source assembly is moved along the motion track
During a dynamic exposure stroke, the light energy integration at any point or any one region in the effective exposure area,
The light energy integration differential in any point or any one region is less than 10% in effective exposure area after integration.
2. planar exposure system according to claim 1, it is characterised in that：The light source assembly is moved along the motion track
During a dynamic exposure stroke, the effective exposure area is in illuminated state all the time.
3. planar exposure system according to claim 2, it is characterised in that：The light source assembly includes several light sources
Unit, each described light source cell is formed with a hot spot unit, the adjacent hot spot unit on the plane of exposure
Splice successively or partly overlap or gap coordinate the formation planar hot spot.
4. planar exposure system according to claim 3, it is characterised in that：The light source assembly also includes several use
In the optical lens that adjustment light source cell emits beam, each described light source cell and an optical lens coordinate.
5. planar exposure system according to claim 4, it is characterised in that：Between the adjacent light source cell optical axis away from
From being L, when coordinating for gap between the hot spot unit that each light source cell is formed, the distance between adjacent spots unit is less than
0.1L。
6. the planar exposure system according to claim 3-5 any one, it is characterised in that：The specification of the light source cell
Identical with model, the size of the optical lens is identical with material.
7. the planar exposure system according to claim 3-5 any one, it is characterised in that：All light source cells are uniform
Set.
8. the planar exposure system according to claim 3-5 any one, it is characterised in that：The shape of the hot spot unit
It is rectangle, square or regular hexagon.
9. the planar exposure system according to claim 3-5 any one, it is characterised in that：Between the hot spot unit
Matching part is staggeredly arranged.
10. the planar exposure system according to claim 3-5 any one, it is characterised in that：The light source cell is ripple
Ultraviolet LED light source from 200 nanometers to 420 nanometers long.
A kind of 11. exposure components, it is characterised in that：Exposed including the planar described in driver part and claim 1-10 any one
Photosystem, the driver part is used to drive the planar exposure system to be moved along the motion track.
12. exposure components according to claim 11, it is characterised in that：When the hot spot unit be shaped as square or
During person's rectangle, the motion track is parallel with the diagonal of the hot spot unit, it is described exposure stroke be equal to or
More than a catercorner length for hot spot unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710300864.9A CN106873317A (en) | 2017-05-02 | 2017-05-02 | A kind of planar exposure system and exposure component |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710300864.9A CN106873317A (en) | 2017-05-02 | 2017-05-02 | A kind of planar exposure system and exposure component |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106873317A true CN106873317A (en) | 2017-06-20 |
Family
ID=59161853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710300864.9A Pending CN106873317A (en) | 2017-05-02 | 2017-05-02 | A kind of planar exposure system and exposure component |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106873317A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1503063A (en) * | 2002-11-26 | 2004-06-09 | 中国科学院光电技术研究所 | Method and apparatus for large area photoetching by constant light source step scanning |
| US20060103829A1 (en) * | 2004-11-18 | 2006-05-18 | Takahiro Inoue | Exposure apparatus and exposure method |
| CN101226343A (en) * | 2008-01-29 | 2008-07-23 | 芯硕半导体（中国）有限公司 | Method for improving photolithography exposure energy homogeneity using grey level compensation |
| JP2009150919A (en) * | 2007-12-18 | 2009-07-09 | Nsk Ltd | Exposure apparatus and method for manufacturing substrate |
| CN103513518A (en) * | 2013-09-11 | 2014-01-15 | 浙江欧视达科技有限公司 | Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
| CN103592821A (en) * | 2013-10-16 | 2014-02-19 | 浙江欧视达科技有限公司 | Novel LED (light-emitting diode) light source system for ultraviolet exposure machine |
-
2017
- 2017-05-02 CN CN201710300864.9A patent/CN106873317A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1503063A (en) * | 2002-11-26 | 2004-06-09 | 中国科学院光电技术研究所 | Method and apparatus for large area photoetching by constant light source step scanning |
| US20060103829A1 (en) * | 2004-11-18 | 2006-05-18 | Takahiro Inoue | Exposure apparatus and exposure method |
| JP2009150919A (en) * | 2007-12-18 | 2009-07-09 | Nsk Ltd | Exposure apparatus and method for manufacturing substrate |
| CN101226343A (en) * | 2008-01-29 | 2008-07-23 | 芯硕半导体（中国）有限公司 | Method for improving photolithography exposure energy homogeneity using grey level compensation |
| CN103513518A (en) * | 2013-09-11 | 2014-01-15 | 浙江欧视达科技有限公司 | Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
| CN103592821A (en) * | 2013-10-16 | 2014-02-19 | 浙江欧视达科技有限公司 | Novel LED (light-emitting diode) light source system for ultraviolet exposure machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6600315B2 (en) | Photo-curable 3D printing apparatus and imaging system therefor | |
| KR102442533B1 (en) | Method and apparatus for using a light engine for light-curing of liquid polymers to shape three-dimensional objects | |
| US11971569B2 (en) | Optical body and light emitting device | |
| CN105216320A (en) | A kind of double light path projection exposure 3D printing equipment and method | |
| KR20190021204A (en) | Apparatus and method for increasing adhesion of a constituent layer to a carrier object | |
| TWI543228B (en) | Light irradiation device | |
| CN109375475A (en) | Substrate processing method using same and element fabricating device | |
| TW583467B (en) | Display device and light guide plate | |
| CN109031866B (en) | Laser animation display method | |
| CN206725963U (en) | A kind of planar exposure system and exposure component | |
| CN106873317A (en) | A kind of planar exposure system and exposure component | |
| JP3961963B2 (en) | Exposure equipment | |
| CN106907586A (en) | A kind of strip-shaped light source, flat light source and the exposure component using the flat light source | |
| KR101244292B1 (en) | Engraving method and manufacturing method of light guide plate using laser | |
| JP4045892B2 (en) | Display panel bonding method and apparatus | |
| WO2017068962A1 (en) | Light irradiation device | |
| CN106019582A (en) | Method and apparatus for changing laser beam into rectangular scanning light screen | |
| CN207034661U (en) | A kind of strip-shaped light source, flat light source and the exposure component using the flat light source | |
| KR102174249B1 (en) | Material for controlling luminous flux, light emitting device and display device | |
| KR20120090589A (en) | Optical sheet, backlight assembly using the same and manufacturing method thereof | |
| CN105242495B (en) | Photoetching exposure device | |
| CN101154054A (en) | Substrate exposure apparatus and illumination apparatus | |
| KR20130118160A (en) | Serration light guide plate for liquid crystal display device and back light unit using the same | |
| CN214872715U (en) | Large-size photocuring 3D printer light source | |
| US20100033831A1 (en) | Liquid crystal sealing apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170620 |