CN203414733U - Ultraviolet LED (Light Emitting Diode) exposure machine - Google Patents
Ultraviolet LED (Light Emitting Diode) exposure machine Download PDFInfo
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- CN203414733U CN203414733U CN201320560814.1U CN201320560814U CN203414733U CN 203414733 U CN203414733 U CN 203414733U CN 201320560814 U CN201320560814 U CN 201320560814U CN 203414733 U CN203414733 U CN 203414733U
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- light source
- ultraviolet led
- exposure
- table top
- exposure machine
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Abstract
The utility model provides an ultraviolet LED (Light Emitting Diode) exposure machine which comprises a light source mounting platform and an exposure platform, wherein the light source mounting platform and the exposure platform are in translation match; an ultraviolet LED exposure machine optical exposure lighting system is arranged on the light source mounting platform; the ultraviolet LED exposure machine optical exposure lighting system comprises at least one light source mounting plate, a collimating lens and an exposure lighting matrix arranger; a plurality rows of ultraviolet LED light sources in equal distance arrangement are arranged in sequence on the light source mounting plate; the central distance B between the ultraviolet LED light sources of two adjacent rows in one line is equal to the distance A between the centers of every two adjacent ultraviolet LED light sources per line, divided by the number of rows; the adjacent two ultraviolet LED light sources are arranged in equal distance. On premise that the exposure uniformity is improved and the light source divergence angles of the light sources are reduced, the ultraviolet LED exposure machine prevents the phenomena that the lines are not uniform in thickness, the definition of the whole plate is not accordant, or lines are broken as the irradiance of the optical exposure lighting system is not uniform.
Description
Technical field
The utility model relates to a kind of PCB exposure machine, is specifically related to a kind of ultraviolet LED exposure machine that adopts the method design of proximity large area ultraviolet Uniform Irradiation exposure.
Background technology
Effectively Uniform Irradiation area is two important technology indexs of ultraviolet exposure machine with exposure uniformity coefficient.Existing ultraviolet exposure machine because of its purposes different, or high and its complex structure of exposure resolution ratio, luminous energy effect utilization factor is low, energy consumption is high and working service cost is high makes it in the today of advocating energy-conserving and environment-protective, day by day becomes the equipment that need substitute or improve.
Because optical exposure illuminator irradiance is inhomogeneous, cause line weight inhomogeneous, the resolving power in entire plate is inconsistent, or has the generation of the phenomenons such as broken string, and this is unallowed in the production run of PCB or liquid crystal display.The optical exposure lighting source of traditional exposure machine adopts metal halide (as mercuric bromide) as being excited to ionize luminescent material more, belong to high-intensity gas discharge lamp, high pressure, high temperature and noxious material are all contained in inside, high-pressure sodium lamp has very strong radiation from long wave ultraviolet to visible ray, but only the spectrum of some UVA-UVB section can act on uv-exposure purposes, the radiation of other spectral bands all can be distributed in the mode of luminous energy and radiation energy on other objects of space, causes environment temperature to raise; The lighting angle of high-pressure sodium lamp is 360 degree, needs quite large-area reflex housing and larger distance to carry out beam shaping to meet application demand, but can make the loss of light intensity 50-70% of exposure system.In sum,, the optical exposure illuminator of traditional exposure machine exists light transmittance efficiency low, and energy consumption is high, and the material that uses is unfavorable for the shortcomings such as environmental protection.And the feature that optical exposure illuminator in the present invention possesses is: use LED as luminophor, being aided with collimation lens and matrix organiser, to realize luminescent spectrum single, utilization ratio of optical energy is high, can reach more than 85%, the use material forming is glass, GaN based semiconductor, the metals such as X alloy; There is the advantages such as environmentally friendly, minimizing power consumption, the saving energy.
Adopt LED to expose, the mode that exists luminous intensity to change with lighting angle due to LED, its arrangement mode has caused LED may occur that the place that the intensity of light source is strong is over-exposed in exposure, and the problem of the low place under-exposure of the intensity of light source, how to go to design LED arrangement mode, the homogenising that makes to expose is urgently to be resolved hurrily.
Utility model content
In order to solve the deficiency of above-mentioned technology, by effective area of irradiation, both are unified in one with exposure uniformity coefficient height greatly, find a kind of when increasing effective area of irradiation, improve method and the approach of exposure uniformity coefficient, the utility model also provides that a kind of effective area of irradiation is large, high, the simple and practical ultraviolet LED exposure machine of exposure uniformity coefficient.
A kind of ultraviolet LED exposure machine, it comprises that light source is installed table top and the table top that exposes, described light source is installed table top and is coordinated with the translation of exposure table top formation, described light source is installed table top and is provided with ultraviolet LED exposure machine optical exposure illuminator, described ultraviolet LED exposure machine optical exposure illuminator comprises at least one light source installing plate, collimation lens and for the illumination for exposure matrix organiser of light source distance on fixedly collimation lens and light source installing plate, on described light source installing plate, be arranged in order the equidistant ultraviolet LED light source of arranging of multirow, the centre distance of the ultraviolet LED light source of the same row of described adjacent two row is that B equals the distance A/line number between the center of adjacent two ultraviolet LED light sources of every row, between adjacent two ultraviolet LED light sources, equidistantly arrange.
Described ultraviolet LED exposure machine optical exposure illuminator comprises light source installing plate described in a plurality of longitudinal arrangements successively, and on adjacent two light source installing plates, the centre distance of first ultraviolet LED light source is that C is the go forward center of the distance A between the center of two ultraviolet LED light sources of odd number light source installing plate.
Described collimation lens adopts high order aspheric surface or compound high order aspheric surface collimating mirror.
Described ultraviolet LED light source is cosine luminophor.
Described ultraviolet LED exposure machine comprises two light sources installation table tops that lay respectively at exposure table top upper-lower position.
Described light source is installed table top one side and is provided with driving light source installation table top relatively and the pulley transmission mechanism of exposure table top translation.
Described exposure table top one side is provided with for driving exposure table top that the drive unit of table top translation is installed with respect to light source.
The utility model take that to improve exposure uniformity coefficient and reduce light source dispersion angle be prerequisite, avoids, because optical lighting system irradiance is inhomogeneous, causing line weight inhomogeneous, and the resolving power in entire plate is inconsistent, or has the generation of the phenomenons such as broken string.
Accompanying drawing explanation
Fig. 1 is the structural representation that light source of the present utility model is installed table top.
Fig. 2 is the utility model ultraviolet LED light source arranged distribution figure.
Fig. 3 is the radiation angle of divergence distribution plan of ultraviolet LED light source.
Fig. 4 is the spectral wavelength distribution plan of ultraviolet LED light source.
Fig. 5 is compound high order aspheric surface collimating mirror light path simulation drawing.
Fig. 6 is the light beam of the ultraviolet LED light source planar strength distribution plan after collimated.
Fig. 7 is the light distribution of the irradiance intensity figure of single ultraviolet LED light source after collimation.
Fig. 8 is rectangular channel Pareto diagram on illumination for exposure matrix organiser.
Embodiment
Below in conjunction with accompanying drawing, the utility model is further illustrated:
Referring to Fig. 1 and Fig. 2, a kind of ultraviolet LED exposure machine, it comprises that light source is installed table top and the table top that exposes, described light source is installed table top and is coordinated with the translation of exposure table top formation, described light source is installed table top and is provided with ultraviolet LED exposure machine optical exposure illuminator, described ultraviolet LED exposure machine optical exposure illuminator comprises at least one light source installing plate, collimation lens 2 and for the illumination for exposure matrix organiser 3 of light source distance on fixing collimation lens 2 and light source installing plate, on described light source installing plate, be arranged in order the equidistant ultraviolet LED light source 1 of arranging of multirow, the centre distance of the ultraviolet LED light source 1 of the same row of described adjacent two row is that B equals the distance A/line number between the center of adjacent two ultraviolet LED light sources 1 of every row, between adjacent two ultraviolet LED light sources 1, equidistantly arrange.
Distance between the center of adjacent two ultraviolet LED light sources 1 of described every row is A, and the centre distance of the ultraviolet LED light source 1 of the same row of adjacent two row is B, and B=A/ line number is equidistantly arranged between adjacent two ultraviolet LED light sources 1.When being designed to 5 row, the centre distance of the center of first ultraviolet LED light source 1 of the first row and first ultraviolet LED light source 1 of the second row is A/5, the center of first ultraviolet LED light source 1 of the third line is A/5 to the centre distance of first ultraviolet LED light source 1 of the second row, remaining several row are arranged in order, formation has the parallelogram that arrange at angle of inclination, and every corresponding ultraviolet LED light source 1 of adjacent two row differs A/5 distance.
Described ultraviolet LED exposure machine optical exposure illuminator comprises light source installing plate described in a plurality of longitudinal arrangements successively, on adjacent two light source installing plates, the centre distance of first ultraviolet LED light source 1 is C, C=A/2, first light source of even number light source installing plate is positioned at the A/2 place of odd number light source installing plate, on the center line of two light sources, light source erecting frame is regularly arranged according to this successively.
Described collimation lens 2 adopts high order aspheric surface or compound high order aspheric surface collimating mirror, and described ultraviolet LED light source is cosine luminophor.
The radiation flux that ultraviolet LED light source 1 sends, collimation lens 2 forms an irradiation profile after assembling.This irradiation profile is cut apart through each optical channel arranged side by side in illumination for exposure matrix organiser 3, and stacking image forms an equally distributed effective irradiation face of irradiance.This effective irradiation face process film Film 4 projection imagings are on the exposure substrate of exposure table top.Collimation lens 2 projections go out to have the collimated light beam of specific angle of collimation.
As shown in Figure 3 and Figure 4, ultraviolet LED light source 1 its intensity of light source that the utility model adopts changes along with the variation of the angle of divergence, strong in the middle of presenting, weaken gradually at two ends, there is the variation at the luminous angle of partly declining of 100 degree, therefore adopt this ultraviolet LED light source 1, that in the middle of its intensity of light source, compared with surrounding, is eager to excel is many, therefore, when arranging this light source, will be for the variation of its intensity of light source, arrange targetedly, the location overlap that its intensity of light source is lower is compensated, improve the intensity of light source of this position, by arrangement mode as shown in Figure 2, can greatly every light source effectively be compensated, and by translation and swing to ultraviolet LED exposure machine optical exposure illuminator, reaching better distribution of light sources arranges, effectively raise effective radiation flux and the utilization factor to radiation flux in system.And by the arrangement mode of multiple sets of light sources installing plate, increase light source range of exposures, adopt the design of larger collimation lens simultaneously, increase the spread length between ultraviolet LED light source, first reduced the degree of heat of light source, be conducive to heat radiation, secondly, by the collimation of larger collimation lens, the hot spot that light source is produced is larger, has reduced its intensity of light source, in conjunction with large-area light source range of exposures, realization is carried out time exposure in 5 seconds to pcb board, meets the theoretical exposure time of pcb board, improves exposure quality.
Its light source arrangement mode draws by the curvature of collimation lens 2 angle that it is dispersed, and according to light source own radiation angle of divergence distribution plan and spectral wavelength distribution plan, by calculating the spread length between light source, and according to the decay angle of its Benshen's radiation angle of divergence distribution plan, to site of attenuation, carry out overlapping, the light intensity that improves its decay part, realizes light source irradiation intensity and is uniformly distributed.
With reference to figure 6, Fig. 7 and Fig. 8, the utility model adopts illumination for exposure matrix organiser 3 its queueing disciplines and ultraviolet LED light source 1 distribution of the irradiance intensity to match, in order to improve the irradiation evenness compensation in effective coverage.In the situation that light source is area source, clear aperture adopts foursquare form, reach the effect of irradiance homogenize, queueing discipline and ultraviolet LED light source 1 distribution of the irradiance intensity match, improve irradiation evenness compensation, their assembled arrangement mode is all identical with the shape of ultraviolet LED light source irradiation profile, with the whole radiating surface of homogenize to greatest extent, there is good illumination for exposure homogeneity.
Described collimation lens 2 adopts high order aspheric surface or the compound high order aspheric surface collimating mirror relevant to cosine luminophor, and the emittance that fully convergent light source sends, light radiation angle is tending towards vertically, and capacity usage ratio is high.As shown in Figure 5, when the light beam of ultraviolet LED light source is after collimation lens 2 collimations, be the outgoing of quasi-parallel light, angle of divergence <=3 degree (0.052rad).And the acting in conjunction through illumination for exposure matrix organiser 3 and collimation lens 2, can effectively compensate the lower position of ultraviolet LED light source 1 intensity, has greatly improved the uniformity coefficient of its exposure.
Described ultraviolet LED exposure machine comprises two light sources installation table tops that lay respectively at exposure table top upper-lower position, adopts the mode of double-sided exposure, and pcb board is carried out to two-sided exposure simultaneously, increases work efficiency.
The utility model light source is installed table top and is coordinated and can adopt light source that the mode of table top translation is installed with the translation of exposure table top, described light source is installed table top one side and is provided with driving light source installation table top relatively and the pulley transmission mechanism of exposure table top translation, by belt pulley, drive light source table top to be installed along the translation of exposure table top direction, exposure table top is exposed.
The utility model light source is installed table top and is coordinated the mode that can adopt the translation of exposure table top with the translation of exposure table top, described exposure table top one side is provided with for driving exposure table top that the drive unit of table top translation is installed with respect to light source, described drive unit can adopt pulley transmission mechanism or motor transmission mechanism, by the drive table top that exposes, move, realize uniform exposure.
Embodiment should not be considered as restriction of the present utility model, but any improvement of doing based on spirit of the present utility model, all should be within protection domain of the present utility model.
Claims (7)
1. a ultraviolet LED exposure machine, it comprises that light source is installed table top and the table top that exposes, it is characterized in that: described light source is installed table top and coordinated with the translation of exposure table top formation, described light source is installed table top and is provided with ultraviolet LED exposure machine optical lighting system, described ultraviolet LED exposure machine optical lighting system comprises at least one light source installing plate, collimation lens and for the lighting matrix organiser of light source distance on fixedly collimation lens and light source installing plate, on described light source installing plate, be arranged in order the equidistant ultraviolet LED light source of arranging of multirow, the centre distance of the ultraviolet LED light source of the same row of described adjacent two row is that B equals the distance A/line number between the center of adjacent two ultraviolet LED light sources of every row, between adjacent two ultraviolet LED light sources, equidistantly arrange.
2. ultraviolet LED exposure machine according to claim 1, it is characterized in that, described ultraviolet LED exposure machine optical lighting system comprises light source installing plate described in a plurality of longitudinal arrangements successively, and on adjacent two light source installing plates, the centre distance of first ultraviolet LED light source is that C is the go forward center of the distance A between the center of two ultraviolet LED light sources of odd number light source installing plate.
3. ultraviolet LED exposure machine according to claim 1, is characterized in that, described collimation lens adopts high order aspheric surface or compound high order aspheric surface collimating mirror.
4. ultraviolet LED exposure machine according to claim 1 and 2, is characterized in that, described ultraviolet LED light source is cosine luminophor.
5. ultraviolet LED exposure machine according to claim 1, is characterized in that, described ultraviolet LED exposure machine comprises two light sources installation table tops that lay respectively at exposure table top upper-lower position.
6. ultraviolet LED exposure machine according to claim 1, is characterized in that, described light source is installed table top one side and is provided with driving light source installation table top relatively and the pulley transmission mechanism of exposure table top translation.
7. ultraviolet LED exposure machine according to claim 1, is characterized in that, described exposure table top one side is provided with for driving exposure table top that the drive unit of table top translation is installed with respect to light source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320560814.1U CN203414733U (en) | 2013-09-11 | 2013-09-11 | Ultraviolet LED (Light Emitting Diode) exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320560814.1U CN203414733U (en) | 2013-09-11 | 2013-09-11 | Ultraviolet LED (Light Emitting Diode) exposure machine |
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| Publication Number | Publication Date |
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| CN203414733U true CN203414733U (en) | 2014-01-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320560814.1U Withdrawn - After Issue CN203414733U (en) | 2013-09-11 | 2013-09-11 | Ultraviolet LED (Light Emitting Diode) exposure machine |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103513518A (en) * | 2013-09-11 | 2014-01-15 | 浙江欧视达科技有限公司 | Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
| CN106678609A (en) * | 2015-11-11 | 2017-05-17 | 上海嘉捷通电路科技股份有限公司 | LED cold light source used for PCB exposure |
| CN109100921A (en) * | 2018-10-17 | 2018-12-28 | 浙江欧珑电气有限公司 | A kind of mixing wave band scanning light source system for exposure machine |
| CN114779596A (en) * | 2022-06-07 | 2022-07-22 | 杭州爱新凯科技有限公司 | High-precision double-sided exposure machine |
-
2013
- 2013-09-11 CN CN201320560814.1U patent/CN203414733U/en not_active Withdrawn - After Issue
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103513518A (en) * | 2013-09-11 | 2014-01-15 | 浙江欧视达科技有限公司 | Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
| CN103513518B (en) * | 2013-09-11 | 2015-12-16 | 浙江欧视达科技有限公司 | ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
| CN106678609A (en) * | 2015-11-11 | 2017-05-17 | 上海嘉捷通电路科技股份有限公司 | LED cold light source used for PCB exposure |
| CN109100921A (en) * | 2018-10-17 | 2018-12-28 | 浙江欧珑电气有限公司 | A kind of mixing wave band scanning light source system for exposure machine |
| CN109100921B (en) * | 2018-10-17 | 2023-10-20 | 浙江欧珑电气有限公司 | Mixed wave band scanning light source system for exposure machine |
| CN114779596A (en) * | 2022-06-07 | 2022-07-22 | 杭州爱新凯科技有限公司 | High-precision double-sided exposure machine |
| CN114779596B (en) * | 2022-06-07 | 2023-12-22 | 杭州爱新凯科技有限公司 | High-precision double-sided exposure machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20140129 Effective date of abandoning: 20151216 |
|
| C25 | Abandonment of patent right or utility model to avoid double patenting |