M335785 八、新型說明： 【新型所屬之技術領域】 本創作係有關於一種曝光機’特別是有關於一種應用於半導 體領域之曝光機。 【先前技術】 按，曝光機可應用在半導體製程，例如：製造半導體晶片時， 晶片上的各觀路佈局需要經過上百道_膜製程、曝光顯影製 程（Photolithography processes)、離子摻雜製程、蝕刻製程來 形成。其中’在進行曝細影製程時，縣在半導體晶片的表面 上塗上層光阻’之後再藉由光源照射將光罩之電路佈線圖案映 射至光阻層上，以使修相化學性fg)光源的照射而產生變 化’然後再_去光關來將被統照射過的光喊未經曝光的 光阻從晶片上去除，以形成對應於光罩的線路佈局，進而完成圖 案轉移。 、、請參閱第1圖，其顯示係傳統曝光機的機構示意圖，其曝光 =源所對應之機構包括有：—外殼1G ;—承載機架12，用以支撐 =殼10 ’包括有-基座14 (可為可移動式或固定式），用以支 牙=曝光物16 (例如：半導體晶圓）；一光罩18，包含有一移 ^係設置在該待曝光物16之相對應位置上方方向，可透過 7糸絲·位置；藉此，透過—單燈平行光源組所發出之 2光源2G’彻料燈平行歧_生所毅長及能量的平行 及該承嶋12上之絲14編杨16,儀該對位 5 • M335785 系統將該祕錄16與光罩18做神對位，對位絲後利用該 單燈平行光源組之曝光光源2〇做曝光動作。 請參閱第2目，其顯示係傳統曝光機之單燈平行光源組配置 示意圖，係設置在前述之外殼1〇内侧，包括有：一燈泡22 ; 一橢 圓鏡24，用嫌繼燈泡22之光賴射方向及細，為第一光源 26 ; -第-反射鏡28，用以接受該第—光源26，並改變該第一光 源26之照射角度為第二光源3〇 ; 一複眼（fry—，）裝置32，用 以接文料二統30，透過複眼（fry—eye)裝置32，可讓絲 均勻化，而形成第三光源34 ; 一第二反射鏡36，用以接受該第三 光源34 ’並改變該第三光源34之照射角度為第四光源38，以再 次改變光線之前進方向；及一凸透鏡4〇，用以接受該第四光源38, 以將光線修正為所需之平行光及面積大小，而投射出所須之曝光 光源20。簡言之’其動作為由光源燈泡22透過橢圓鏡24將光線 利用5亥第一反射鏡28投向複眼裝置32，使其讓光線均勻化，再利 用第一反射鏡36將光線改變前進方向，最後利用該凸透鏡4〇將 光線修正為所需之平行光及面積大小 ，而投射出所須之曝光光源 20 〇 月’J述傳統之曝光機雖有其產業上之利用價值，但仍具有下列 之缺點： —、如需曝光能量變大時，需使用大瓦數（通常為高達數KW) 的^/包作為光源，而大瓦數的燈泡產生的熱能相當高，所以需另 外用水冷系統散熱，致設備成本偏高。 6 M335785 二、 使用大瓦數的燈泡，其燈泡壽命相當短，容易造成生產 成本增加。 三、 使用單-大瓦數的燈泡在其能量下降時，僅能以更換燈 泡的方式因應，故替換頻率高。 如前所述’傳統的曝光機在使用上仍須添購水冷系統散熱， -且燈泡壽命相當短，故仍需要一種解決方案之技術，藉以改善前 • 述之缺失。 > 【新型内容】 本創作之目的係提供一種曝光機，以應用於半導體領域，用 以改善傳統燈泡壽命偏低及須仰賴使用水冷散熱系統之缺失，以 減少生產成本。 為達致上述目的，本創作之曝光機包括有複數個光源燈泡， 及用以支撐该些光源燈泡架設之固定燈座，該燈座包含有複數個 對應該些光源燈泡之燈罩，致該些光源燈泡之光線可集中照射出 第一光源；一第一反射鏡，用以接受該第一光源，並改變該第一 光源之照射角度為第二光源；一複眼裝置，用以接受該第二光源， 透過該複眼裝置，可讓棘均勻化，而形成第三光源；一第二反 射鏡，用以接受該第三光源，並改變該第三光源之照射角度為第 四光源，及一凸透鏡，用以接受該第四光源，以將光線修正為所 需之平行光及面積大小，而投射出所須之曝光光源。 為了讓本創作之上述目的、特徵、優點能更明顯，下文特舉 本創作較佳實酬，並配合所_示，作詳細說明如下。 7 M335785 【實施方式】 咅^參閱弟/3圖’其係本創作實關曝光機之光難統配置示 二該光源系統41係配置在如麵述第丨圖之外殼ι〇内側， 包括有： 一光源組42 ’包含有複數個光源燈泡私，及用以支撐該些光 源燈泡44架設之固定燈座46，其中，該燈座46之外部輪廊形狀 可為如本實關所示之方形，亦可為其他各種之形狀，並不偈限 實施之態樣。座46純含有複數個對應·絲燈泡44之 燈罩’致該些統燈泡44之光線可#巾騎㈣—光源48。 一第一反射鏡50，用以接受該第一光源48，並改變該第一光 源48之照射角度為第二光源52。 一複眼（fry-eye)裝置54，用以接受該第二光源52，透過 該複眼裝置54，可讓光線均勻化，而形成第三光源56。 一第二反射鏡58 ’用以接受該第三光源56，並改變該第三光 源56之照射角度為第四光源60，以再次改變光線之前進方向。 一凸透鏡62，用以接受該第四光源60，以將光線修正為所需 之平行光及面積大小，而投射出所須之曝光光源64。 前述光源組42所包含之複數個光源燈泡44，每一光源燈泡 44可為低功率燈泡。該些光源燈泡44在實施上亦可採用紫外線 LED 燈（UV LED)。 前述光源組42所包含之複數個光源燈泡44，該些光源燈泡 44之饰設方式可採用為矩陣式燈泡排列。 M335785 本創作利用前述之配置，可接供暖 二 』奴供曝先機所需之光源，其具有 比前述傳統更佳之下述優點： 一. 本創作所用的光源組42所包含之複數個光源燈泡44， 每:光源燈泡44採用為低功率燈泡，而低功率燈泡因功率低，致 其哥命較傳統採用高功率燈泡更長。 二. 本創作所採_低功率燈朗功率低，故無需如傳統須 使用水冷散齡絲降溫’ _需_風冷系統即可，減少設備 複雜化且本創作之設備體積無須太大。 三. 因本創作使用矩陣式燈泡排列，故可在一開始打開（〇n) 所需曝光·的燈泡數即可，待能量下降時再開啟其他燈泡補其 所需能量，減少生產成本。 四·本創作可使用UV LED,使其壽命長，以減少生產成本。 五·本創作如將光罩移動載台及移動機構不使用的情況下， 整台曝光機可以變化成固化機達到一機兩用的功能。 故本創作之提出，確實已可改善前述習知之缺失，應符合專 利產業上利用性、新穎性、以及進步性之規定。 雖然前述的描述及圖式已揭示本創作之較佳實施例，惟此乃 僅係實施例之呈現，舉凡各種增添、修改和取代可能使用於本創 作較佳實施例，仍應屬落入本創作之申請專利範圍所界定之範圍 内。因此’本創作之範圍應由後附之申請專利範圍所界定，並涵 蓋其合法均等物，並不限於先前之描述。 M335785 【圖式簡單說明】 第1圖係傳統曝光機的機構示意圖。 第2圖係傳統曝光機之單燈平行光源組配置示意圖。 第3圖係本創作實施例曝光機之光源系統配置示意圖。 【主要元件符號說明】 41 光源系統 42 光源組 44 光源燈泡 46 燈座 48 第一光源 50 第一反射鏡 52 第二光源 54 複眼裝置 56 第三光源 58 第二反射鏡 60 第四光源 62 凸透鏡 64 曝光光源M335785 VIII. New description: [New technical field] This creation is about an exposure machine, especially for an exposure machine used in the field of semiconductors. [Prior Art] According to the exposure machine, the exposure machine can be applied to a semiconductor process. For example, when manufacturing a semiconductor wafer, each view layout on the wafer needs to pass through hundreds of film processes, photolithography processes, ion doping processes, etching. The process is formed. Wherein 'in the exposure process, the county applies a layer of photoresist on the surface of the semiconductor wafer' and then maps the circuit pattern of the reticle to the photoresist layer by illumination of the light source to make the phase-corrected chemical fg) light source The illumination changes and then 'de-lights off' to remove the unexposed photoresist from the wafer to form a line layout corresponding to the reticle, thereby completing the pattern transfer. Referring to FIG. 1 , which is a schematic diagram of a mechanism of a conventional exposure machine, the mechanism corresponding to the exposure=source includes: a housing 1G; a carrier frame 12 for supporting = housing 10 'including a base a seat 14 (which may be movable or fixed) for supporting teeth = exposure 16 (for example, a semiconductor wafer); a mask 18 including a shifting system disposed at a corresponding position of the object to be exposed 16 In the upper direction, it can pass through the 7-wire position; thereby, the 2 light source 2G' of the parallel light source group emitted by the single-light parallel light source is parallel to the parallel and the parallel of the energy and the wire on the bearing 12 14 edit Yang 16, the instrument is aligned 5 • M335785 system makes the secret record 16 and the mask 18 to be in the opposite position, and after the alignment wire, the exposure light source 2 of the parallel light source group of the single lamp is used for the exposure operation. Please refer to item 2, which shows a schematic diagram of a single-lamp parallel light source group configuration of a conventional exposure machine, which is disposed inside the outer casing 1〇, and includes: a bulb 22; an elliptical mirror 24, which uses the light of the bulb 22 The light source direction and the thinness are the first light source 26; the first mirror 28 is for receiving the first light source 26, and changing the illumination angle of the first light source 26 to the second light source 3〇; a compound eye (fry- , the device 32 is configured to receive the material system 30, through the fry-eye device 32, the wire can be homogenized to form a third light source 34; a second mirror 36 for accepting the third The light source 34' changes the illumination angle of the third light source 34 to the fourth light source 38 to change the forward direction of the light again; and a convex lens 4〇 receives the fourth light source 38 to correct the light to a desired state. Parallel light and area size are projected to project the desired exposure light source 20. Briefly, 'the action is that the light source bulb 22 transmits the light through the elliptical mirror 24 to the compound eye device 32 through the 5 ray first mirror 28 to make the light uniform, and then the first mirror 36 is used to change the light direction. Finally, the convex lens 4 修正 is used to correct the light to the required parallel light and the size of the area, and the required exposure light source 20 is projected. The conventional exposure machine has the industrial value, but still has the following Disadvantages: — If the exposure energy becomes larger, a large wattage (usually up to several KW) ^/package is required as the light source, and the large wattage bulb generates a relatively high heat energy, so it needs to be cooled by another water cooling system. , resulting in high equipment costs. 6 M335785 Second, the use of large wattage bulbs, the lamp life is quite short, easily lead to increased production costs. Third, the use of single-large wattage bulbs can only respond to the replacement of the bulb when its energy is reduced, so the replacement frequency is high. As mentioned above, 'the traditional exposure machine still needs to purchase water cooling system for heat dissipation, and the lamp life is quite short, so there is still a need for a solution technology to improve the lack of the previous description. > [New content] The purpose of this creation is to provide an exposure machine for use in the semiconductor field to improve the low life of conventional lamps and to rely on the use of water-cooled heat dissipation systems to reduce production costs. In order to achieve the above object, the exposure machine of the present invention comprises a plurality of light source bulbs, and a fixed lamp holder for supporting the light source bulbs, the lamp holder comprising a plurality of lampshades corresponding to the light source bulbs, The light source of the light source bulb can illuminate the first light source collectively; a first mirror for receiving the first light source and changing an illumination angle of the first light source to be a second light source; and a compound eye device for accepting the second light source a light source through which the spine is homogenized to form a third light source; a second mirror for receiving the third light source, and changing an illumination angle of the third light source to a fourth light source, and a convex lens And receiving the fourth light source to correct the light to the required parallel light and area size, and projecting the required exposure light source. In order to make the above-mentioned purposes, features and advantages of the present creation more obvious, the following is a better example of the present invention, and is described in detail below. 7 M335785 [Embodiment] 咅^Refer to the younger brother/3's picture. The light source system of the original exposure machine is shown in Fig. 2. The light source system 41 is arranged on the inner side of the casing 如, as described in the figure, including The light source group 42' includes a plurality of light source bulbs, and a fixed lamp holder 46 for supporting the light source bulbs 44. The outer shape of the lamp holder 46 can be as shown in the present embodiment. The square shape can also be in various other shapes, and is not limited to the implementation. The seat 46 is purely containing a plurality of lampshades corresponding to the wire bulbs 44. The light rays from the light bulbs 44 can be used as a light source 48. A first mirror 50 is configured to receive the first light source 48 and change the illumination angle of the first light source 48 to the second light source 52. A fry-eye device 54 is provided for receiving the second light source 52, and through the compound eye device 54, the light is homogenized to form a third light source 56. A second mirror 58' is adapted to receive the third source 56 and change the illumination angle of the third source 56 to a fourth source 60 to again change the forward direction of the light. A convex lens 62 is provided for receiving the fourth light source 60 to correct the light to a desired parallel light and area to project the desired exposure light source 64. The plurality of light source bulbs 44 included in the light source group 42 may each be a low power bulb. The light source bulbs 44 can also be implemented with ultraviolet LED lamps (UV LEDs). The plurality of light source bulbs 44 are included in the light source group 42. The light source bulbs 44 can be arranged in a matrix bulb arrangement. M335785 This creation utilizes the aforementioned configuration to provide the light source required for the heating of the first machine, which has the following advantages over the aforementioned conventional ones: 1. The plurality of light source bulbs included in the light source group 42 used in the present creation. 44, each: The light source bulb 44 is a low-power light bulb, while the low-power light bulb has a lower power, so that its life is longer than the conventional high-power light bulb. 2. The low power lamp is low in power. Therefore, it is not necessary to use water-cooled silk cooling to reduce the temperature. _Requires air cooling system, which reduces the complexity of the equipment and does not require too much equipment. 3. Because the creation uses matrix light bulbs, it is possible to open (〇n) the number of bulbs required for exposure at the beginning. When the energy is reduced, turn on other bulbs to supplement the required energy and reduce the production cost. 4. This creation can use UV LEDs to make it long-lived to reduce production costs. 5. In the case of the creation of the photomask moving stage and the moving mechanism, the whole exposure machine can be changed into a function of the curing machine to achieve dual use. Therefore, the creation of this creation has indeed improved the lack of the aforementioned practices and should be in accordance with the provisions on the use, novelty and advancement of the patent industry. While the foregoing description and drawings have been shown in the preferred embodiments of the embodiments of the embodiments of the present invention, it is intended that the present invention may be used in the preferred embodiments of the present invention. Within the scope defined by the scope of the patent application for creation. Therefore, the scope of this creation should be defined by the scope of the patent application attached to it, and its legal equivalents are not limited to the previous description. M335785 [Simple description of the diagram] Figure 1 is a schematic diagram of the mechanism of a conventional exposure machine. Figure 2 is a schematic diagram of the configuration of a single lamp parallel light source group of a conventional exposure machine. Fig. 3 is a schematic view showing the configuration of a light source system of the exposure machine of the present embodiment. [Main component symbol description] 41 Light source system 42 Light source group 44 Light source bulb 46 Lamp holder 48 First light source 50 First mirror 52 Second light source 54 Compound eye device 56 Third light source 58 Second mirror 60 Fourth light source 62 Convex lens 64 Exposure light source