200916970 九、發明說明： 【發明所屬之技術領域】 本發明係有關於-祕光鋪，特礙錢於—種應用於 半導體領域之曝光設備。 【先前技術】 按，曝光設備可應用在半導體製程，例如：製造半導體晶 片時，晶片上的各種電路佈局需要經過上百道的薄膜製程、曝 光顯影製程（Photolithography processes)、離子摻雜製程、 敍刻製程來形成。其中’在進行曝光顯影製程時，係先在半導 體晶片的表面上塗上-層光阻，之後再藉由光源照射將光罩之 電路佈線圖案映射至光阻層上’以使光阻層的化學性質因光源 的…、射而產生變化，然後再利用去光阻劑來將被光源照射過的 光阻或未經曝光的光阻從晶片上去除，以形成對應於光罩的線 路佈局，進而完成圖案轉移。 睛參閱第1圖，其顯示係傳統曝光設備的機構示意圖，其 曝光光源所對應之機構包括有：一外殼1〇 ; 一承载機架12，、 用以支撐該外殼10，包括有一基座14 (可為移動式或固定 式）’用以支撐-待曝光物16 (例如：半導體晶圓）卜光罩 8匕3有-移動載台’係、設置在該待曝光物之相對應位 置^方方向’可透過一對位系統來調整位置；藉此，透過一單 燈平行光源組所發出之曝光光源20 ’利用該單燈平行光源組 產生所需波長及能量辭行光源，及該承載她12上之基座 200916970 14有待曝光物16 ’利用該對位系統將該待曝光物16與光罩 18做精準對位’對位完成後糊該單燈平行光源組之曝光光 源20做曝光動作。 晴參閱第2 ® ’其顯示係前轉統單燈平行光雜之配置 示意圖，係設置在前述之外殼1〇内側，包括有：一燈泡22 ; 一橢圓鏡24，肋限繼燈泡22之光·射方向及範圍，為 第一光源26 ; 一第一反射鏡28，用以接受該第-光源26，並 改變該第-光源26之照射角度為第二光源3〇 ; 一複眼 (fry-eye)裝置32，用以接受該第二光源3〇，透過複眼 (的-eye)震置32，可讓光線均勻化，而形成第三光源如； 一第二反射鏡36 ’用以接受該第三光源34，並改變該第三光 源34之照射缝為第四光源38 ;及—凸透鏡4Q，狀接受該 第四光源38，以將光線修正為所需之平行光及面積大小，而 投射出所須之曝光光源2G。簡言之，其動作為由絲燈泡烈 透過橢圓鏡24將光線利用該第一反射鏡28投向複眼裝置必 使其讓光線均勻化，再第二反射鏡36將親改變前進方 向’最後該凸魏40將雄修正柄需之饰光及面積 大小，而投射出所須之曝光光源2〇。 前述傳統之曝光設備雖有其絲上之_触，但仍 T列之缺點： 一、如需曝光能量變大時’需使用大瓦數（通常為高達數 200916970 kw)的燈泡作為光源，而大瓦數的燈泡產生的熱能相當高，所 以需另外用水冷系統散熱，致設備成本偏高。 二、 使用大瓦數的燈泡，其燈泡壽命相當短，容易造成 生產成本增加。 三、 使用單一大瓦數的燈泡在其能量下降時，僅能以更 換燈泡的方式因應，故替換頻率高。 如前所述’傳統的曝光設備在使用上仍須添購水冷系統散 熱，且燈泡壽命相當短，故仍需要一種解決方案之技術，藉以 改善前述之缺失。 【發明内容】 本發明之目的係提供一種曝光設備，以應用於半導體製 作領域，用以改善傳統燈泡壽命偏低及須仰賴使用水冷散熱 系統之缺失，以減少生產成本。 為達致上述目的，本發明之曝光設備包括有複數個光源燈 /包，及用以支樓該些光源燈泡架設之燈座，該些燈座包含有複 數個對應該些光源燈泡之燈罩，該燈罩與該些光源燈泡之間為 可調整位置的機構設置’致該些光源燈泡之光線可集中照射出 一可調整光源之第一光源；一第一反射鏡，用以接受該第—光 源，並改變該第一光源之照射角度為第二光源；一複眼裝置， 用以接受S亥第二光源，透過該複眼裝置，可讓光線均勻化，而 形成第三光源；一第二反射鏡，用以接受該第三光源，並改變 200916970 該第三光源之照射角度為第四光源；及一凸透鏡，用以接受該 第四光源，以將光線修正為所需之平行光及面積大小，而投射 出所須之曝光光源。 為了讓本發明之上述目的、特徵、優點能更明顯，下文特 舉本發明較佳實施例，並配合所關示，作詳細說明如下。 【實施方式】 請參閱第3圖’其係根據本發明第一實施例所緣製之光源 系統配置示意圖，該光源系統41係配置在如前所述第i圖之 外殼ίο内侧，包括有： 一光源組42，請配合參閱帛4A圖，包含有複數個光源燈 泡44，及用以支撐該些光源燈泡私架設之燈座仙，其中，該 座46之外部輪廓形狀可為如本實施例所示之方形，亦可為 其他各種之形狀，並補限實施之祕。該燈座46亦包含有 複數個對應該些光源燈泡44之燈罩47，致該些光源燈泡44 之光線可集中照射出第一光源48。 一第-反射鏡50 ’為-平面鏡’用以接受該第一光源48， 並改變5亥第一光源48之照射角度為第二光源52。 …-複眼（fry-eye)裝置54,用以接受該第二光源52，透 I亥複眼裝置54 ’可讓級均勻化，轉成第三光源％。 、-第二反射鏡58，為—平面鏡’用以接受該第三光源56， 並改變該第二光源56之照射角度為第四光源。 —凸透鏡62 ’用以接受該第四光源6〇，以將光線修正為 200916970 所需光及面積大小，而投射出所須之曝光光源64。 卜1組42所包含之複數個統燈泡&，每一光源燈 繼妓獅44偷上亦可採用紫 冷44、,1飞、且42所包含之複數個光源燈泡44，該些光源燈 T設方式可採料轉式燈泡排列。200916970 IX. INSTRUCTIONS: [Technical Field to Be Invented by the Invention] The present invention relates to an exposure apparatus which is used in the field of semiconductors. [Prior Art] According to the exposure apparatus, the exposure apparatus can be applied to a semiconductor process. For example, when manufacturing a semiconductor wafer, various circuit layouts on the wafer require hundreds of film processes, photolithography processes, ion doping processes, and lithography. The process is formed. Wherein 'in the exposure and development process, the surface of the semiconductor wafer is first coated with a layer of photoresist, and then the light is irradiated by the light source to map the circuit pattern of the mask onto the photoresist layer' to make the photoresist layer chemistry The nature changes due to the ..., the radiation of the light source, and then the photoresist is used to remove the photoresist or the unexposed photoresist that is irradiated by the light source from the wafer to form a line layout corresponding to the mask, and further Complete the pattern transfer. Referring to FIG. 1 , which is a schematic diagram of a mechanism of a conventional exposure apparatus, the mechanism corresponding to the exposure light source includes: a housing 1 〇; a carrier frame 12 for supporting the housing 10, including a pedestal 14 (may be mobile or fixed) 'to support - the object to be exposed 16 (for example: semiconductor wafer), the reticle 8 匕 3 - the mobile stage ', set at the corresponding position of the object to be exposed ^ The square direction ' can be adjusted through a one-bit system; thereby, the exposure light source 20' emitted by a single-lamp parallel light source group generates the desired wavelength and energy resignation light source by using the single-light parallel light source group, and the bearing 12 on the base 200916970 14 to be exposed 16 'Using the alignment system to accurately align the object to be exposed 16 with the reticle 18' after the alignment is completed, the exposure light source 20 of the single-light parallel light source group is exposed . Clearly refer to the 2 ® 'the display diagram of the front-light single-light parallel light miscellaneous, which is set inside the outer casing 1〇, including: a bulb 22; an elliptical mirror 24, the ribs are limited to the light of the bulb 22 The direction and range of the shot are the first light source 26; a first mirror 28 for receiving the first light source 26, and changing the illumination angle of the first light source 26 to the second light source 3; a compound eye (fry- The device 32 is configured to receive the second light source 3 〇 through the complex eye-eyes 32 to homogenize the light to form a third light source such as a second mirror 36 ′ The third light source 34, and changing the illumination slit of the third light source 34 to be the fourth light source 38; and the convex lens 4Q receives the fourth light source 38 to correct the light to the required parallel light and area, and project The required exposure light source 2G. In short, the action is that the light bulb is transmitted through the elliptical mirror 24 and the light is directed to the compound eye device by the first mirror 28 to make the light uniform, and the second mirror 36 will change the forward direction of the front. Wei 40 will correct the required light and area size of the handle, and project the required exposure light source 2〇. Although the aforementioned conventional exposure apparatus has its own touch on the wire, it still has the disadvantages of the T column: 1. If the exposure energy becomes large, 'a large wattage (usually up to the number of 200916970 kw) bulb is used as the light source, and The heat energy generated by the large wattage bulb is quite high, so it needs to be cooled by another water cooling system, resulting in high equipment cost. Second, the use of large wattage bulbs, the life of the bulb is quite short, easily lead to increased production costs. Third, the use of a single large wattage bulb, when its energy is reduced, can only be replaced by the way of replacing the bulb, so the replacement frequency is high. As mentioned above, the traditional exposure equipment still needs to purchase water cooling system for heat dissipation, and the lamp life is quite short. Therefore, a solution technology is still needed to improve the aforementioned deficiency. SUMMARY OF THE INVENTION An object of the present invention is to provide an exposure apparatus for use in the field of semiconductor fabrication to improve the low life of conventional lamps and to rely on the use of water-cooling heat dissipation systems to reduce production costs. In order to achieve the above object, the exposure apparatus of the present invention comprises a plurality of light source lamps/packages, and a lamp holder for erecting the light source bulbs, and the lamp holders comprise a plurality of lampshades corresponding to the light source bulbs. The light shield and the light source bulbs are arranged to adjust the position of the light source, so that the light of the light source bulbs can illuminate the first light source of the adjustable light source; a first mirror for receiving the first light source And changing the illumination angle of the first light source to be a second light source; a compound eye device for receiving a second light source, through which the light is homogenized to form a third light source; and a second mirror Receiving the third light source, and changing the illumination angle of the third light source to a fourth light source in 200916970; and a convex lens for receiving the fourth light source to correct the light to a desired parallel light and area size, And project the required exposure light source. The above described objects, features, and advantages of the present invention will become more apparent from the aspects of the invention. [Embodiment] Please refer to FIG. 3, which is a schematic diagram of a light source system configuration according to a first embodiment of the present invention. The light source system 41 is disposed on the inner side of the outer casing ί of the first embodiment, and includes: A light source group 42, together with reference to FIG. 4A, includes a plurality of light source bulbs 44, and a lamp holder for supporting the light source bulbs. The outer contour shape of the seat 46 can be as in this embodiment. The squares shown can also be in various other shapes and complement the secrets of implementation. The lamp holder 46 also includes a plurality of lampshades 47 corresponding to the light source bulbs 44, such that the light from the source bulbs 44 can illuminate the first source 48 in a concentrated manner. A first-mirror 50' is a --plane mirror for receiving the first light source 48, and changing the illumination angle of the first light source 48 to the second light source 52. ...-fry-eye device 54 for accepting the second light source 52, the through-eye device 54' can be leveled and converted to a third source %. The second mirror 58 is a plane mirror for receiving the third light source 56 and changing the illumination angle of the second light source 56 to be a fourth light source. The convex lens 62' is adapted to receive the fourth light source 6'' to correct the light to the required light and area size of 200916970, and to project the desired exposure light source 64. Each of the light bulbs and the light bulbs included in the group 1 42 may be sneaked by the lion 44, and the plurality of light source bulbs 44 included in the purple cold 44, 1 fly, and 42 may be used. The T setting mode can be used to pick up the transfer bulbs.
明參閱第4β圖’其係根據本發明第-實施例所繪製之光 源燈泡44配置可調整位置之示意圖。除了可使該些光源燈泡 44之光線集巾照射出第-光源48外，其燈罩47與該些光源 燈/包44之間為可調整位置的機構設置。（如圖所示之箭頭Η水 平方向或刖頭v所示之垂直方向，肋調整燈罩47與光源燈 泡44之間之彼此位置），而可集中照射出—可調整光源之第一 光源48。 »月參閱第5圖，其係根據本發明第二實施例所繪製之光源 系統配置示意圖，該光齡統43係配置在如前所述第工圖之 外设10 包括有前述第—實施例所配置之光源組42、第 一反射鏡50、複眼（fry-eye)裝置54及透過該複眼裴置54 所形成之第三光源56。 本發明第一實施例包括有一第三反射鏡66，為一有弧度 角度之反射鏡’用以接受該第三光源56，而可改變該第三光 源56之照射角度，並可直接將光線修正為所需之平行光及面 200916970 積大小，而投射出所須之曝光光源68。 如前所述’本發明之光源系統可應用在接觸式曝光設備 (如第一圖所示）、投影式（projection)曝光設備、投影式 步進式(Stepper)曝光機或其他各類型之曝光設備上使用。 請參閱第6圖，其係根據本發明一較佳實施例所繪製之應 用範圍示意圖’本發明以-投影式步進式(stepper)#光機來 舉例說明。本發明之光源系統所投射之曝光光源64或兕，其 光線經過一光罩70、一投影鏡頭（lens) 72，而對一待曝光 物74 (半導體晶圓）進行曝光。而該半導體晶圓通常包含有 複數個小晶圓’因此可透過一晶圓步進機76，用以移動該待 曝光物74 (料體晶圓）對準曝光光源，使每一小晶圓位置 可達到所而之曝光光源’以完成光罩的線路佈局，進而完 成圖案轉移。 根據本發明實施例之觀點，本發明亦可應用在一投影式曝 光機，而無須配合前述之步進機76設備使用。 足見本發_用前述之配置，可提供曝光設備所需之光 源，其具有比前述傳統更佳之下述優點： 一·本發明所用的光源組42所包含之複數個光源燈泡 44 ’每-光源燈泡44採用為低功率燈泡，而低功率燈泡因功 率低，致其壽命較傳統採用高功率燈泡更長。 -.本發明所採用的低功率燈泡因功率低，故無需如傳 200916970 統須使用水冷散齡絲降溫，祕需採觀冷祕即可，減 少設備複雜化且本發明之設備體積無須太大。 三.因本發明使用矩陣式燈泡排列，故可在一開始打開 ⑽）所需曝絲量的燈絲即可，概訂料再開啟其他 燈泡補其所需能量’減少生產成本。 四·本發明可使用抓LED，使其壽命長，以減少生產成 本。 五.本發明如將光罩移動載台及移動機構不使用的情況 下，整台曝光設備可以變化成固化機達到—機_的功能。 故本發明之提出確實已可改善前述習知之缺失，應符合 專利產業上利用性、新穎性、以及進步性之規定。 雖然刖述的描述及圖式已揭示本發明之較佳實施例，惟 此乃僅係實施例之呈現，舉凡各種增添、修改和取代可能使 用於本發明錄實補，仍麟落人本發明之申請專利範圍 所界定之範_。目此，本錄此所麻的實施例所有觀點， 應被視為職說明本發明，㈣肋關本發明。本發明之 範圍應由後附之申請專利範圍所界定，並涵蓋其合法均等 物，並不限於先前之描述。 200916970 【圖式簡單說明】 第1圖係傳統曝光設備的機構示意圖。 第2圖係傳統單燈平行光·之配置示意圖。 第3圖係根據本發明第—實施例崎製之曝光設備的光源系 統配置示意圖。 第4A圖係根據本發明第一實施例所綠製之曝光設備的光源燈 泡配置示意圖。 第4B圖係根據本發明第一實施例所繪製之曝光設備的光源燈 泡配置可調整位置之示意圖。 第5圖係根據本發明第二實施例所緣製之曝光設備的光源系 統配置示意圖。 第6圖係根據本發明一較佳實施例所繪製之曝光設備的應用 範圍示意圖。 42 光源組 44 光源燈泡 48 第一光源 52 第二光源 56 第三光源 60 第四光源 64 曝光光源 68 曝光光源 72 投影鏡頭 76 步進機 【主要元件符號說明】 41 光源系統 43 光源系統 46 燈座 50 第一反射鏡 54 複眼裝置 58 第二反射鏡 62 凸透鏡 66 第三反射鏡 70 光罩 74 待曝光物Referring to Figure 4, there is shown a schematic diagram of an arrangement of adjustable position of light source bulb 44 in accordance with a first embodiment of the present invention. In addition to illuminating the light source of the light source bulbs 44 out of the first light source 48, the shade 47 and the light source/package 44 are arranged in an adjustable position. (The arrow Η as shown in the horizontal direction or the vertical direction indicated by the hoe v, the rib adjusts the position between the lamp cover 47 and the light source bulb 44), and can illuminate the first light source 48 of the light source. Referring to FIG. 5, which is a schematic diagram of a configuration of a light source system according to a second embodiment of the present invention, the light age system 43 is disposed outside the above-described drawing, and includes the foregoing first embodiment. The light source group 42, the first mirror 50, the fry-eye device 54, and the third light source 56 formed by the complex eye device 54 are disposed. The first embodiment of the present invention includes a third mirror 66 for a curved angle mirror 'for receiving the third light source 56, and changing the illumination angle of the third light source 56, and directly correcting the light The desired exposure source 68 is projected for the desired parallel light and surface 200916970 product size. As described above, the light source system of the present invention can be applied to a contact exposure apparatus (as shown in the first figure), a projection exposure apparatus, a stepper exposure machine, or other types of exposure. Used on the device. Please refer to Fig. 6, which is a schematic diagram of the application range drawn according to a preferred embodiment of the present invention. The present invention is illustrated by a projection stepper #光机. The exposure light source 64 or germanium projected by the light source system of the present invention passes through a mask 70 and a projection lens 72 to expose an exposure to be exposed 74 (semiconductor wafer). The semiconductor wafer usually includes a plurality of small wafers, so that a wafer stepper 76 can be transmitted to move the object to be exposed 74 (material wafer) to the exposure light source, so that each small wafer The position can reach the exposure light source 'to complete the circuit layout of the reticle, thereby completing the pattern transfer. From the perspective of embodiments of the present invention, the present invention can also be applied to a projection type exposure machine without the use of the aforementioned stepper 76 device. It can be seen that with the foregoing configuration, a light source required for an exposure apparatus can be provided, which has the following advantages better than the aforementioned conventional ones: 1. A plurality of light source bulbs 44 per light source included in the light source group 42 used in the present invention. The bulb 44 is a low-power bulb, and the low-power bulb has a lower power life than the conventional high-power bulb. - The low-power light bulb used in the present invention has low power, so it is not necessary to use the water-cooled loose silk to cool down in 200916970, and it is necessary to use cold and secret to reduce the complexity of the equipment and the apparatus of the present invention does not need to be too large. . 3. Since the present invention uses a matrix bulb arrangement, it is possible to open (10) the filament of the desired amount of silk at the beginning, and then open the other bulbs to replenish the required energy to reduce the production cost. 4. The present invention can use LEDs to make them have a long life to reduce production costs. 5. In the present invention, if the photomask moving stage and the moving mechanism are not used, the entire exposure apparatus can be changed to the function of the curing machine. Therefore, the present invention has indeed improved the aforementioned deficiencies and should be in accordance with the provisions of the patent industry for usability, novelty, and advancement. The description and drawings of the present invention are intended to be illustrative of the preferred embodiments of the present invention, which are merely representative of the embodiments of the present invention, and various additions, modifications, and substitutions may be used in the present invention. The scope defined by the scope of application for patents. Accordingly, all aspects of the embodiments of the present invention should be construed as a description of the invention, and (4) the invention. The scope of the invention is defined by the scope of the appended claims and the legal equivalents thereof are not limited to the description. 200916970 [Simple description of the diagram] Figure 1 is a schematic diagram of the mechanism of a conventional exposure apparatus. Figure 2 is a schematic diagram of the configuration of a conventional single lamp parallel light. Fig. 3 is a schematic view showing the configuration of a light source system of an exposure apparatus according to a first embodiment of the present invention. Fig. 4A is a view showing a configuration of a light source bulb of an exposure apparatus made of green according to a first embodiment of the present invention. Fig. 4B is a view showing the adjustable position of the light source bulb configuration of the exposure apparatus according to the first embodiment of the present invention. Fig. 5 is a view showing the configuration of a light source system of an exposure apparatus according to a second embodiment of the present invention. Figure 6 is a schematic illustration of the application range of an exposure apparatus according to a preferred embodiment of the present invention. 42 Light source group 44 Light source bulb 48 First light source 52 Second light source 56 Third light source 60 Fourth light source 64 Exposure light source 68 Exposure light source 72 Projection lens 76 Stepper [Main component symbol description] 41 Light source system 43 Light source system 46 Lamp holder 50 first mirror 54 compound eye device 58 second mirror 62 convex lens 66 third mirror 70 photomask 74 to be exposed