CN205103540U - A exposure device for making public light source module unit and including this light source module unit - Google Patents
A exposure device for making public light source module unit and including this light source module unit Download PDFInfo
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- CN205103540U CN205103540U CN201520858315.XU CN201520858315U CN205103540U CN 205103540 U CN205103540 U CN 205103540U CN 201520858315 U CN201520858315 U CN 201520858315U CN 205103540 U CN205103540 U CN 205103540U
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Abstract
The utility model provides a light source module for the exposure. Utilize the utility model discloses an exposure includes with the light source module unit: the light source board, its component does, and the ultraviolet ray light emitting component of a plurality of units constructs to paste with the array of matrix form and adorns on the circuit substrate to load in the backup pad, the optical sheet, it has a following structure, a plurality of collector lens of unit with from with the relative primary optic axis in position that light emitting component corresponds respectively is to passing the array structure of the matrix form of the decentered state of the arbitrary benchmark the central axis at the center of the ultraviolet light emitting component array on light source board side set up with form that the light source board was faced each other dispose in ultraviolet ray light emitting component's light jets out the lens plate of side. According to constitute, make from each ultraviolet ray light emitting component of unit (UV LED) shine the diffusion light that comes effectively spotlight to with the receipts light zone territory of form settlement in hole (aperture) at the optical system of exposure device, thereby can seek the bright maximize through the low power consumption, especially, through realizing the high efficiency, the single wavelength of high output, short wavelength's ultraviolet linear light, when can guarantee to improve the exposure performance of fineization and the resolution ratio of exposure pattern breakthroughly, can have practically and the substituting effect that has the light source of exposure device now in economically feasible ground.
Description
Technical field
The utility model relates to a kind of exposure light source, it is for photoetching process (Photolithography), to form fine circuit pattern at semiconductor transistor elements or display panel etc., the exposure device relating to a kind of light source module unit for exposing in more detail and comprise this light source module unit, it is through improvement, so that by the combination of multiple ultraviolet ray emitting element (UVLED) array (array) module and collector lens array (array) module, while can effectively promoting exposure performance and efficiency, can easily and the light source of existing exposure machine is replaced on economically feasible ground.
Background technology
Such as, as the critical piece of electric/electronic device and built-in semiconductor element or circuit substrate (PCB) and be similar to liquid crystal display (LCD; Or Organic Light Emitting Diode (OLED LiquidCrystalDisplay); And plasma display panel (PDP OrganicLightEmittingDiode); PlasmaDisplayPanel) image display plate, in the exposure technology in its manufacturing process, by being collectively referred to as the light Micrometer-Nanometer Processing Technology of photoetching (Photolithography), thus being fabricated to and being formed with minute circuit pattern.
Usually, what use in existing exposure technology mainly uses extra-high-pressure mercury vapour lamp or halogen (Halogen) lamp for the light source exposed, but notoriously, the efficiency of the exposure technology that the described existing light source for exposing not only has the poor efficiency of low and electric power high consumption of adjoint life-span and high cost to cause, and also problems are exposed in environmental protection.
Especially, the thin film transistor (TFT) (TFT in the display such as recent liquid crystal display cells (LCD) or Organic Light Emitting Diode (OLED) field; ThinFilmTransitor) manufacture or colored filter (CF; When ColorFilter) manufacturing, although realize market, aspect to the ultrahigh resolution of the miniaturization technology utilizing exposing patterns have practical requirement, but owing to utilizing the technology of the micro-gasification process of the exposing patterns of existing exposure light source (HgLamp) to limit to, very regrettably the miniaturization of exposing patterns and the core technology ultrahigh resolution of display industry realize aspect is impossible.
In addition, due to the trend of the recent miniaturization to semiconductor element and high capacity and Highgrade integration and densification, the miniaturization of exposing patterns and the requirement of densification are increased, problem is thus, realizes there is restriction to the requirement aspect of existing miniaturization pattern by the existing light source for exposing.
Thus, recently, such as, during the exploitation being similar to the new exposure technique of liquid submersion exposure or extreme ultraviolet line exposing etc. is actively carried out, especially ultraviolet ray emitting element (UVLED) selectivity that is long as a kind of power consumption low and life-span, single wavelength uses and short wavelength uses the light source for exposing of possibility and environmental protection, just as the existing light source for exposing substitute and get most of the attention.
But, with regard to by ultraviolet ray emitting element (UVLED) as light source exposure device with regard to, in the urgent need to exploitation be used for by the realization of the ultrahigh resolution of the formation of light path or the raising of power of illuminance degree of distribution and light output and the miniaturization of exposing patterns that can cut down light loss and, miniaturization, high capacity and densification etc. new light source of high transform efficiency (UVLED), meanwhile, to the exploitation of optics, module, unit etc. need also be in the urgent stage.
The utility model is derived under described technical background, the problem of described background technology is that the applicant holds to derive the utility model, or the content of new acquistion or confirmation in derivation process of the present utility model, content known by general public before the utility model application can not be considered as.
[look-ahead technique document]
[patent documentation]
No. 10-1440874th, (patent documentation 1) Korean registered patent gazette
No. 10-1401238th, (patent documentation 2) Korean registered patent gazette
No. 10-2012-0095520th, (patent documentation 3) Korean Patent Laid
No. 10-2015-0049563rd, (patent documentation 4) Korean Patent Laid
Utility model content
The utility model is under background technology as above, consider the light source Problems existing for exposing of existing exposure device, propose to improve described problem, the purpose of this utility model is to provide the light source module unit of a kind of low power consumption type for exposing, it, by the optimum combination of multiple ultraviolet ray emitting element (UVLED) and collector lens array module, can maximize light gathering efficiency.
The light source module unit that another object of the present utility model is to provide a kind of low power consumption type for exposing and comprise the exposure device of this unit as light source, it can be effective and improve exposure performance and exposure efficiency, can realize miniaturization and the high resolving power of exposing patterns breakthroughly.
Of the present utility model have another object be to provide a kind of improvement for can be easy to be replaced by the light source of existing exposure device, interchangeable alternative modular unit thus economically feasible and the low power consumption type of practicality are for the light source module unit that exposes and comprise the exposure device of this unit as light source.
In order to reach described object, with regard to regard to the light source module unit for exposing of the present utility model, it comprises: light source board, consists of, multiple units ultraviolet ray emitting element is mounted on circuit substrate with the array of matrix (matrix) form structure, and is loaded into back up pad; Optical sheet, it has following structure, and multiple units collector lens is to be arranged on described light source board opposed facing form being configured at the lens board (LENSPANEL) of the light emitting side of described ultraviolet ray emitting element relative to key light axially across the array structure of the matrix shape of the state of any reference center axis lateral deviation heart at the center of the ultraviolet ray emitting element array on described light source board from the corresponding respectively position of described light-emitting component.
Further, in order to reach described object, comprise according to exposure device of the present utility model: exposure worktable (table), it is for being coated with supporting for the substrate exposed of emulsion; Drive unit, its to described exposure worktable can the state of movement on X-Y plane coordinate drive; For the light source module unit exposed, it is set to the illumination light of described substrate injection for exposing; Optical system, it is arranged at described substrate and between the light source module unit that exposes; And control device, it controls to described drive unit with for the driving of the light source cell exposed, the described light source module unit for exposing comprises: light source board, consist of, multiple units ultraviolet ray emitting element (UVLED) are mounted on circuit substrate with the array of matrix (matrix) form structure, and are loaded into back up pad; Optical sheet, it has following structure, and multiple units collector lens is to be arranged on described light source board opposed facing form being configured at the lens board (LENSPANEL) of the light emitting side of described ultraviolet ray emitting element relative to key light axially across the array structure of the matrix shape of the state of any reference center axis lateral deviation heart at the center of the ultraviolet ray emitting element array on described light source board from the corresponding respectively position of described light-emitting component.
According to the utility model, described unit collector lens is configured at submarginal position away from arbitrary reference center's axis side at the center through the ultraviolet ray emitting element array on described light source board gradually, the offset of the primary optical axis of relatively corresponding unit ultraviolet ray emitting element increases, and form the array structure of rectangle form, thus being constructed so that the light of the diffusion of irradiating from each unit ultraviolet ray emitting element is able to optically focused in receipts light region, described receipts light region is set in the optical system of exposure device.
According to a side of the present utility model, more than described ultraviolet ray emitting element can arrange with the LED light source attachment one encapsulating form on unit circuit substrate.Thus, the back up pad forming described light source board has the formation of the LED light source mounting multiple encapsulation form on multiple unit circuit substrate respectively.
According to another side of the present utility model, described ultraviolet ray emitting element can be mounted on single circuit substrate with the LED light source encapsulating form.
According to another side of the present utility model, described ultraviolet ray emitting element with one chip or multiple chip form, can be mounted on single or multiple circuit substrate with LED light source.
In the utility model, the unit collector lens on described optical sheet is formed with biconvex lens, and the configurable biconvex lens according to array position with the curvature surface of mutual different optical structure.
According to the utility model, relatively from described ultraviolet ray emitting element to the optical range " a " being set in optical system receiving light region, from the separating distance " b " of the ultraviolet ray emitting element that reference center's axis side at the center through the ultraviolet ray emitting element array described light source board is separated, and the face-to-face separating distance " c " of described ultraviolet ray emitting element and collector lens, and the eccentric distance " x " between the central shaft of each ultraviolet ray emitting element described and the central shaft of collector lens, and the relation of the diameter " t " receiving light region A is preferably, the benchmark of the eccentric distance " x " of collector lens is set as meeting " x=b*c/a ", and the scope of described " x " is configured to meet " bc (2b-t)/2ab<x<bc (2b+t)/2ab ".
In addition, preferably, the face-to-face separating distance c of described ultraviolet ray emitting element and collector lens and the diameter d of described collector lens are configured to the condition meeting 1.0c<d<2.5c.
Preferably, described light source board and described optical sheet are configured to, by housing (housing) support and with the location mode can unloaded at the enterprising luggage of exposure device.
In addition, preferably, around described light source board and described optical sheet, also heat abstractor is comprised.
According to utilizing the light source module unit for exposing of the present utility model, optical sheet as collector lens array module is combined to the light source board as multiple ultraviolet ray emitting element (UVLED) array module, light gathering efficiency can maximize by described collector lens array module, thus realize low power consumption, high output and high-level efficiency can be realized particularly by ultraviolet single wavelength and short wavelength, thus by effective lifting of exposure performance and exposure efficiency, the miniaturization of exposing patterns and breakthrough high resolving power is made to become possibility.
And, according to utilizing the light source module unit for exposing of the present utility model, make the modular unit of the alternative exchange of the light source being easily replaced by existing exposure device change into into may, thus make practical and providing of economically viable exposure sources becomes possibility.
In addition, according to utilizing the light source module unit for exposing of the present utility model, replaced the solution etc. of the saving of expense, the raising of exposure sources duration of runs and environmental problem by the use of low power consumption, light source, thus following effect can be expected: have and save maintenance cost breakthroughly.
Moreover, utilize the light source module unit for exposing of the present utility model, the single wavelength of special high-level efficiency height output and the ultraviolet of short wavelength as required, unrestricted choice is used and becomes possibility, therefore pass through the fine patterns of the core technology realized as the exposure performance of high-quality, make high resolving power become possibility.
Accompanying drawing explanation
Fig. 1 is to the simple separation stereographic map according to the light source module unit for exposing of the present utility model.
Fig. 2 carries out the simple stereographic map shown in medelling to illustrate according to the flat light source of the light source module unit for exposing of the present utility model and collector lens (lens) array (array) structure.
Fig. 3 is the simple planimetric map array structure of the ultraviolet ray emitting element of the flat light source be configured to according to the light source module unit for exposing of the present utility model being carried out to medelling displaying.
Fig. 4 and Fig. 5 is respectively in order to the mode chart shown according to the flat light source of the light source module unit for exposing of the present utility model and the eccentric array structure of collector lens is described.
Fig. 6 represents the chart to the measurement result according to the relevant light harvesting amount of the concentration structure of the light source module unit for exposing of the present utility model.
Fig. 7 takes and the figure shown according to the light irradiating state of the light source module unit for exposing of the present utility model.
Fig. 8 and Fig. 9 is respectively to the stereoscopic figure making simply to illustrate in the state that mutually different housing (housing) is able to blocking according to the light source module unit for exposing of the present utility model.
Figure 10 and Figure 11 be respectively to according to another embodiment of the present utility model for the simple stereographic map shown in the light source module unit that exposes and collector lens array structure and planimetric map.
Figure 12 is to by taking according to light source module unit for exposing of the present utility model with as the keypoint part that the mercury vapor lamp (HgLamp) of the existing light source for exposing is formed at the circuit pattern of wafer respectively, and to carrying out according to the CD pH-value determination pH result of mask (mask) live width mutually relatively and the figure illustrated.
Figure 13 compares the CD pH-value determination pH result according to circuit pattern mask live width, and with the figure of chart display, described circuit pattern is by according to light source module unit for exposing of the present utility model and the circuit pattern being formed at wafer as the mercury vapor lamp (HgLamp) of the existing light source for exposing respectively.
Figure 14 carries out selecting and the simple pie graph shown in medelling according to the significant points of the exposure device of the light source module unit for exposing of the present utility model to using.
Embodiment
Below, be described in detail to according to the light source module unit for exposing of the present utility model with reference to accompanying drawing.The explanation that the following description content and accompanying drawing just carry out based on preferred embodiment of the present utility model, and the light source module unit for exposing of the present utility model described in non-limiting claim.
With reference to Fig. 1 and Fig. 2, comprise according to the light source module unit 100 for exposing of the present utility model: light source board 110, consist of, multiple units ultraviolet ray emitting element (UVLED) 111 construct with the array of matrix (matrix) form and are installed on circuit substrate 112 and are loaded into back up pad 113; Optical sheet 120, it has following structure, multiple units collector lens 121 with from and the respectively corresponding interval p of the interval p of described ultraviolet ray emitting element 111 array position relative to key light axially across the state e1 of any reference center axis lateral deviation heart of center O (with reference to Fig. 2) of ultraviolet ray emitting element 111 array on described light source board 110, the array structure of the matrix shape of e2 be arranged in order to described light source board 110 mutually faced by and be configured at the lens board (LENSPANEL) 122 of the light emitting side of described ultraviolet ray emitting element 111.
According to a side of the present utility model, as shown in Figure 1, preferably, described ultraviolet ray emitting element 111, arranges and is arranged on penetrate 100nm wavelength to the LED light source of the mixed style of the chip (chip) of the ultraviolet of 410nm wavelength coverage, encapsulation (package) or chip and encapsulation the unit circuit substrate 112 being with form above.
Thus, with regard to described light source board 110, the unit circuit substrate 112 of multiple band form with and the state of ordered array be loaded into respectively in back up pad 113, and the ultraviolet ray emitting element 111 being installed on each unit circuit substrate 112 forms the array of the matrix shape on x-y coordinate.
In addition, described ultraviolet ray emitting element 111, to penetrate the single circuit substrate 112 that 100nm wavelength to the LED light source of the chip of the ultraviolet of 410nm wavelength coverage, encapsulation or chip and package hybrid form is arranged on larger area, to form the array structure of matrix shape.
Fig. 3 is the simple planimetric map array structure of the ultraviolet ray emitting element 111 of the flat light source be configured to according to the light source module unit 100 for exposing of the present utility model being carried out to medelling displaying.
With reference to Fig. 3, formed according to the light source module unit 100 for exposing of the present utility model, on the x-y orthogonal coordinate being initial point with the center O of ultraviolet ray emitting element 111 array multiple ultraviolet ray emitting element 111 at certain intervals the matrix shape of p configured separate array structure, described ultraviolet ray emitting element 111 is on described light source board 110.
In addition, although described back up pad 113 is with the plate example of quadrilateral, the shape design of described back up pad 113 is shown as an embodiment, and non-limiting according to the light source module unit 100 for exposing of the present utility model.
Thus, according to the light source module unit 100 for exposing of the present utility model, the applicable embodiment being deformed into the various shapes such as such as similar disc-shaped plate.
In other words, with regard to regard to the light source module unit 100 for exposing of the present utility model, its basis is installed as specification or the formation of the exposure device of light source, or exposure object or exposing patterns etc. can be deformed into various form, so that the shape design of back up pad 113 is used with optimized form, in described back up pad 113, array has ultraviolet ray emitting element 111.
According to a side of the present utility model, as shown in Figure 3, with regard to described ultraviolet ray emitting element 111 in back up pad 113 with regard to the structure of the line of odd number (9) and file array, the center O of the ultraviolet ray emitting element array of described light source board 110 may be configured with unit ultraviolet ray emitting element 111.
In addition, with regard to described ultraviolet ray emitting element 111 in back up pad 113 with regard to the structure of the line of even number and file array, have following array structure, get rid of the configuration of unit ultraviolet ray emitting element 111 at the center O of the ultraviolet ray emitting element array of described light source board 110.
In other words, the center configuration of the center O of the ultraviolet ray emitting element array on described light source board 110 and light area (drawing reference numeral " A " with reference to Fig. 4 and Fig. 5) is on coaxial, become the benchmark of the offset (e1, e2, en with reference to Fig. 2 and Fig. 4) determining constituent parts collector lens 121, described light area is irradiate the diffusion light the come region by collector lens 121 optically focused from each unit ultraviolet ray emitting element.
Described light area (drawing reference numeral " A " with reference to Fig. 4 and Fig. 5) is formed as hole (aperture) form, to form the optically focused target (target) passed through through catoptron concentrated light, described catoptron is included in the optical system of unshowned exposure device.
Thus, with regard to regard to the light source module unit 100 for exposing of the present utility model, there is concentrating refractive by collector lens 121 in the light of the diffusion of irradiating from each unit ultraviolet ray emitting element 111, thus obtains optically focused so that the hole (aperture) by being formed as the optically focused target (target) receiving light region.
In other words, with regard to regard to the light source module unit 100 for exposing of the present utility model, the center O of ultraviolet ray emitting element 111 array on described light source board 110 and the center configuration of lens board 212 are in same axis, and away from the arbitrary reference center's axis side through described center O, the collector lens 121 be configured on submarginal position is configured to gradually, increase gradually to the distance of the described reference center axis lateral deviation heart relative to the primary optical axis of ultraviolet ray emitting element 111 corresponding thereto.
Generally speaking, be configured to according to the light source module unit 100 for exposing of the present utility model, collector lens 121 is configured in the mode of the primary optical axis bias relative to ultraviolet ray emitting element 111, for example, perform effect and the function of stravismus (strabismus) lens, thus the light gathering efficiency of the diffusion light of irradiating from each unit ultraviolet ray emitting element 111 is maximized.
In addition, with regard to the light source module unit 100 for exposing of the present utility model that basis has formation as mentioned above, in order to maximize the light gathering efficiency of the diffusion light of irradiating from ultraviolet ray emitting element 111, preferably, collector lens 121 is made up of biconvex lens, and preferably, there are the biconvex lens of the curvature surface according to array position with mutual different optical structure.
Fig. 4 and Fig. 5 is respectively in order to the mode chart shown relative to the array structure of the primary optical axis bias of ultraviolet ray emitting element 111 according to the collector lens 121 of the light source module unit 100 for exposing of the present utility model is described.
In Fig. 4 and Fig. 5, " a " represents the optical range from ultraviolet ray emitting element 111 to hole (aperture), and described hole is set in the receipts light region A as optically focused target (target).
Further, " b " represents the separating distance of the ultraviolet ray emitting element 111 of reference center's axis side configured separate of the center O from the ultraviolet ray emitting element array through described light source board 110.
In addition, " c " represents the face-to-face separating distance of ultraviolet ray emitting element 111 and collector lens 121, and " x " shows the eccentric distance between the central shaft of ultraviolet ray emitting element 111 and the central shaft of collector lens 121, and " t " represents the diameter receiving light region A.
With reference to Fig. 4 and Fig. 5, with regard to regard to the light source module unit 100 for exposing of the present utility model, for the optical range " a " from ultraviolet ray emitting element 111 to hole (aperture), preferably, the relation of described " b " and " c ", " x " and " t " is defined by following formula, and described hole is set as the receipts light region A as optically focused target (target).
In other words, the benchmark of the eccentric distance " x " of collector lens 121 is set as meeting " x=b*c/a ", and the range set of described " x " is for meeting " bc (2b-t)/2ab<x<bc (2b+t)/2ab ".
Fig. 6 is the chart of the measurement result representing the light harvesting amount constructed according to the optically focused of the light source module unit 100 for exposing of the present utility model, " a " represents the optical range from ultraviolet ray emitting element 111 to hole (aperture), described hole is set as the receipts light region A as optically focused target (target), " c " represents the face-to-face separating distance of ultraviolet ray emitting element 111 and collector lens 121, and " d " represents the diameter of collector lens 121.
With reference to Fig. 6, with regard to regard to the light source module unit 100 for exposing of the present utility model, when rate value d/c for the diameter " d " of the collector lens 121 of the face-to-face separating distance " c " of ultraviolet ray emitting element 111 and collector lens 121 is more than 1, light quantity sharply increases, in contrast, when the value of d/c is more than 2, light quantity is maintained certain.
Thus, preferably, be configured to according to the light source module unit 100 for exposing of the present utility model, ultraviolet ray emitting element 111 meets the condition of 1.0c<d<2.5c with the face-to-face separating distance c of collector lens 121 and the diameter d of described collector lens.
Fig. 7 takes and the figure shown according to the light irradiating state of the light source module unit for exposing of the present utility model, (a) of Fig. 7 is the shooting carried out the light irradiating state of the light source board 110 of the state getting rid of optical sheet 120, and (b) of Fig. 7 is the shooting carried out the light irradiating state by optical sheet 120.
With reference to Fig. 7, the light irradiating state comparing the state getting rid of optical sheet 120 can be confirmed, brighter by the brightness of the light irradiating state of optical sheet 120.
In addition, respectively as can be seen from figures 8 and 9, with regard to regard to the light source module unit 100 for exposing of the present utility model, described light source board 110 and optical sheet 120 being installed as and being supported by housing (housing) 130,140, thus the formation of blocking can be had.Thus, with be installed on the mode blocking of housing 130,140 for the light source module unit 100 that exposes because the removably light source of exposure device (not shown) can be utilized as, so can be very economical feasible and be easy to substitute the light source being similar to the existing exposure device of mercury or Halogen lamp LED etc.
In addition, with regard to regard to the light source module unit 100 for exposing of the present utility model, under the state making described light source board 110 and optical sheet 120 combine in the mode being formed as a group, also can be placed through the light source that the structure such as support (bracket) or flange (flange) included by exposure device is supported.
Further, with regard to regard to the light source module unit 100 for exposing of the present utility model, preferably, the heat abstractor being arranged at described housing 130,140 is comprised further, to be arranged at light source board 110 and optical sheet 120 around.
With regard to described heat abstractor, such as, can arrange and be built in described housing 130, the heating radiator (heatsink) of 140, to load described light source board 110 and optical sheet 120, and also air-cooled type heat abstractor can be set, described air-cooled type heat abstractor uses the fan (fan) or fan blower (blower) that are used for air circulation, and as shown in Figure 10, also can water-cooled power converter be set, described water-cooled power converter is connected with cooling device (chiller), to make cooling water circulation by cooling water flow entrance 141 and flow export 142, and the state that can merge with described air-cooled type and water-cooled power converter is arranged.
According to another side of the present utility model, embodiment as different in Figure 10 and Figure 11 respectively show, can be configured to have by the light source module unit for exposing of the present utility model and make ultraviolet ray emitting element 111 and collector lens 121 be able to the structure of array with circle.The situation tool of described circular array structure has the following advantages: can discharge in quadrilateral array structure, from the light loss that the ultraviolet ray emitting element 111 of array on the corner angle position of distance farthest away from center O produces.
In addition, Figure 12 be to according to there is the light source module unit for exposing of the present utility model that forms as mentioned above and test as the exposure performance of the mercury vapor lamp (HgLamp) of the existing light source for exposing and relatively after, result is shot for photograph and the figure shown.
The test result that Figure 12 shows obtains through following process, to the photoresist (photoresist) (ProductName: DTFR-JC800) of 3.5 inches of (inch) wafer coating 1.5um thickness, and mask (mask) live width is set with the interval of 0.2 (or 0.3um) respectively in 1.0 to 3.5um scope, thus after exposing, video picture is carried out by tetramethylphosphonihydroxide hydroxide base ammonium hydroxide (TMAH) 2.38wt% imaging liquid, thus the critical live width fine sizes (CD to the fine circuit pattern that the photoetching process (photolithography) by using in conventional LCD manufacturing process is formed, CriticalDimension) measure with photograph taking.
With reference to Figure 12, the following fact can be confirmed: the limit of the critical live width fine sizes CD of the fine circuit pattern utilizing the existing mercury vapor lamp as the light source for exposing to realize is about 2.0um, in contrast, utilizing according to the critical live width fine sizes CD of the fine circuit pattern that can realize for the light source module unit exposed of the present utility model can be about 1.4um.
Further, Figure 13 carries out arranging and the figure represented with chart to be compared by the critical live width fine sizes CD measured by photograph taking in Figure 12 and desirable critical live width fine sizes CD.
With reference to Figure 13, just utilize according to regard to the critical live width fine sizes CD of the attainable fine circuit pattern of light source module unit for exposing of the present utility model, the following fact can be confirmed: comparing with utilizing the critical live width fine sizes CD of the attainable fine circuit pattern of the existing mercury vapor lamp as the light source for exposing, being formed as the pattern closer to desirable critical live width fine sizes CD.
Thus, just utilize according to for the live width of the fine circuit pattern formed for the light source module unit exposed of the present utility model, the following fact can be confirmed: with utilize the existing mercury vapor lamp as the light source for exposing and compared with the live width of the circuit pattern formed, can be formed finer and accurate.Thus, breakthrough high resolving power can be realized according to the light source module unit for exposing of the present utility model in exposure technology.
Figure 14 carries out selecting and the simple pie graph shown in medelling according to the significant points of the exposure device of the light source module unit for exposing of the present utility model to using.At this, represent identical inscape with the reference label identical with reference to label of aforementioned shown accompanying drawing.
With reference to Figure 14, comprise: exposure worktable (table) 250 according to exposure device 200 of the present utility model, it is for being coated with supporting for the glass substrate 10 exposed of emulsion; Drive unit (without drawing reference numeral), its to described exposure worktable 250 can the state of movement on X-Y plane coordinate drive; For the light source module unit 100 exposed, it is set to penetrate illumination light for exposing to described glass substrate 10; Optical system 210 ~ 230, it is arranged at described glass substrate 10 and between the light source module unit 100 that exposes; And control device (without drawing reference numeral), it contacts to described drive unit with for the driving of the light source cell 100 exposed and controls.At this, unaccounted drawing reference numeral 240 represents the mask for exposing being formed with exposing patterns.
Described glass substrate 10 is set to, the face incident from described illumination light of irradiating for the light source module unit 100 exposed is coated with emulsion, and air layer is clipped in the middle and is supported in exposure worktable 250 by mask 240, described mask 240 is formed and the photosensitive pattern identical patterns be formed on described light-sensitive surface.Thus, while being able to optically focused for the illumination light emitted by the light source module unit 100 that exposes by optical system 210 ~ 230, irradiated by the light-sensitive surface of mask 240 to glass substrate 10, perform thus and make the exposing patterns being formed at mask 240 be transferred to the exposure technology of the light-sensitive surface of glass substrate 3.
With regard to described exposure worktable 250, according to the relative size of glass substrate 10 and mask 240, while carrying out movement by drive unit on X-Y plane coordinate, under the state that the position of glass substrate 10 and mask 240 is arranged, perform exposure technology.
In addition, by exposure device 200 of the present utility model, described glass substrate 10 and mask 240, although carried out example to the formation arranged in the mode be separated from each other, described structure non-limiting the utility model.
In addition, can have the formation making mask 240 be close to the light-sensitive surface of glass substrate 10, when described formation, the light-sensitive surface of glass substrate 10 is close to exposure, thus the pattern of mask 240 is needed on light-sensitive surface.
In addition, by expanding the gap (gap) between glass substrate 10 and mask 240, thus between glass substrate 10 and mask 240, get involved the formation of reduced projection lens, the pattern being formed at mask 240 can be carried out reduced projection exposure to the light-sensitive surface of glass substrate 10.
And, the setting of described optical system 210 ~ 230 is in order to illumination light is converged to mask 240 effectively, it comprises the catoptron 210 for reflecting and the fly's-eye lens (flyeyelens) 221 for the illumination light by described hole (aperture) A being carried out to the catoptron 230 for optically focused reflecting, collector lens (condenselens) 222 and plano lens (platelens) 223, 224, the described catoptron 210 for reflecting carries out reflecting thus makes the illumination light of irradiating from the light source module unit 100 for exposing by being set as receiving hole (aperture) A in light region, the described catoptron 230 for optically focused will by the illumination light of described hole (aperture) A to mask optically focused.The formation of described optical system 210 ~ 230 is also non-limiting according to exposure device 200 of the present utility model, and according to the deformation construction of specification of exposure object and mask etc. also applicable variform.
The described light source module unit 100 for exposing is as making according to the characteristic inscape of exposure device 200 tool of the present utility model, it comprises: light source board 110, consist of, multiple units ultraviolet ray emitting element (UVLED) 111 construct with the array of matrix (matrix) form and are mounted on circuit substrate 112 and are loaded into back up pad 113; Optical sheet 120, it has following structure, multiple units collector lens 121 with from and the respectively corresponding interval p of the interval p of described ultraviolet ray emitting element 111 array position relative to key light axially across the state e1 of any reference center axis lateral deviation heart of center O (with reference to Fig. 2) of ultraviolet ray emitting element 111 array on described light source board 110, the array structure of the matrix shape of e2 be arranged in order to described light source board 110 mutually faced by and be configured at the lens board (LENSPANEL) 122 of the light emitting side of described ultraviolet ray emitting element 111.
According to exposure device 200 of the present utility model, with regard to described ultraviolet ray emitting element 111, as shown in Figure 1, preferably, row are above is arranged on penetrate 100nm wavelength to the LED light source of the mixed style of the chip (chip) of the ultraviolet of 410nm wavelength coverage, encapsulation (package) or chip and encapsulation the unit circuit substrate 112 being with form.
The described light source module unit 100 for exposing to the light source board combination as multiple ultraviolet ray emitting element (UVLED) array module as the optical sheet of collector lens array module, light gathering efficiency can maximize by described collector lens array module, have by Fig. 1 to Figure 12 describe in detail and the claim 1 to 10 of right described in formation, description is omitted.
In sum, with regard to regard to exposure device 200 of the present utility model, it is set to have replaces the described light source module unit 100 for exposing to the exposure device of existing routine, pass through low power consumption thus, save light source and replace expense, promote the duration of runs of exposure device and solve the effect that environmental problem etc. can expect breakthrough saving maintenance cost, moreover, especially tool has the following advantages: can realize high output and high-level efficiency by ultraviolet single wavelength and short wavelength, thus by effective lifting of exposure performance and exposure efficiency, the miniaturization of exposing patterns and breakthrough high resolving power is made to become possibility.
The utility model described above not limit by above-mentioned specific preferred embodiment, and when not departing from main points of the present utility model required in right, the personnel that technical field belonging to this utility model has general knowledge all can carry out various variant embodiment, and in the belonging described right of described distortion.
Label declaration
100: for the light source module unit exposed
110: light source board
111: ultraviolet ray emitting element
112: circuit substrate
113: back up pad
120: optical sheet
121: collector lens
122: lens board
200: exposure device
210: catoptron
240: mask
A: receive light region/hole (aperture)
Claims (13)
1. the light source module unit for exposing, is characterized in that, comprising:
Light source board, consists of, and multiple units ultraviolet ray emitting element is installed on circuit substrate with the array of matrix shape structure, and is loaded into back up pad;
Optical sheet, it has following structure, and multiple units collector lens is to be arranged on the lens board of the light emitting side to be configured at described ultraviolet ray emitting element with the opposed facing form of described light source board from the corresponding respectively position of described light-emitting component axially across the array structure of the matrix shape of the state of any reference center axis lateral deviation heart at the center of the ultraviolet ray emitting element array on described light source board relative to key light.
2. the light source module unit for exposing according to claim 1, is characterized in that,
Described unit collector lens is configured at submarginal position away from arbitrary reference center's axis side at the center through the ultraviolet ray emitting element array on described light source board gradually, the offset of the primary optical axis of relatively corresponding unit ultraviolet ray emitting element increases, and form the array structure of rectangle form, thus making the diffusion light optically focused irradiated from each unit ultraviolet ray emitting element in receipts light region, described receipts light region is set in the optical system of exposure device.
3. the light source module unit for exposing according to claim 1, is characterized in that,
Described ultraviolet ray emitting element is installed on single or multiple unit circuit substrate with the some forms selected in chip or encapsulation or both LED light sources of form of mixing.
4. the light source module unit for exposing according to claim 1, is characterized in that,
Described ultraviolet ray emitting element is installed on single circuit substrate with the some forms selected in chip or encapsulation or both LED light sources of form of mixing.
5. the light source module unit for exposing as claimed in any of claims 1 to 4, is characterized in that,
Described unit collector lens is with biconvex lens forming.
6. the light source module unit for exposing as claimed in any of claims 1 to 4, is characterized in that,
Described unit collector lens is with biconvex lens forming, and described biconvex lens have the curvature surface according to the mutual different optical structure of the arrangement position carrying out array.
7. the light source module unit for exposing as claimed in any of claims 1 to 4, is characterized in that,
Relatively from described ultraviolet ray emitting element to the optical range " a " receiving light region A, from the separating distance " b " of the ultraviolet ray emitting element that reference center's axis side of the center O through the ultraviolet ray emitting element array described light source board is separated, and the face-to-face separating distance " c " of described ultraviolet ray emitting element and collector lens, and the eccentric distance " x " between the central shaft of each ultraviolet ray emitting element described and the central shaft of collector lens, and the relation of the diameter " t " receiving light region A is set as, the benchmark of the eccentric distance " x " of collector lens meets " x=b*c/a ", and the scope of described " x " meets " bc (2b-t)/2ab<x<bc (2b+t)/2ab ".
8. the light source module unit for exposing as claimed in any of claims 1 to 4, is characterized in that,
The diameter d of the described unit ultraviolet ray emitting element of mutual correspondence and the face-to-face separating distance c of unit collector lens and described collector lens meets the condition of 1.0c<d<2.5c.
9. the light source module unit for exposing as claimed in any of claims 1 to 4, is characterized in that,
Described light source board and described optical sheet are set to, and are obtained blocking by housings support with the state being removable at exposure device.
10. the light source module unit for exposing as claimed in any of claims 1 to 4, is characterized in that,
Also heat abstractor is comprised around described light source board and described optical sheet.
11. 1 kinds of exposure devices, it comprises: exposure worktable, and it is for being coated with supporting for the substrate exposed of emulsion; Drive unit, its to described exposure worktable can the state of movement on X-Y plane coordinate drive; For the light source module unit exposed, it is set to mask injection illumination light, and described mask is for the formation of the exposing patterns of described substrate; Optical system, it is arranged at described substrate and between the light source module unit that exposes; And control device, it controls described drive unit and connecting for the driving of the light source cell exposed,
The feature of described exposure device is, the described light source module unit for exposing comprises:
Light source board, consists of, and multiple units ultraviolet ray emitting element is installed on circuit substrate with the array of matrix shape structure, and is loaded into back up pad;
Optical sheet, it has following structure, and multiple units collector lens is to be arranged on the lens board of the light emitting side to be configured at described light-emitting component with the opposed facing form of described light source board from the corresponding respectively position of described light-emitting component axially across the array structure of the matrix shape of the state of any reference center axis lateral deviation heart at the center of the ultraviolet ray emitting element array on described light source board relative to key light.
12. exposure devices according to claim 11, is characterized in that,
Described unit collector lens is configured at submarginal position away from arbitrary reference center's axis side at the center through the ultraviolet ray emitting element array on described light source board gradually, the offset of the primary optical axis of relatively corresponding unit ultraviolet ray emitting element increases, and form the array structure of rectangle form, thus being constructed so that the diffusion light optically focused irradiated from each unit ultraviolet ray emitting element is in receipts light region, described receipts light region is set in the optical system of exposure device.
13. exposure devices according to claim 11 or 12, is characterized in that,
Relatively from described ultraviolet ray emitting element to the optical range " a " receiving light region A, from the separating distance " b " of the ultraviolet ray emitting element that reference center's axis side of the center O through the ultraviolet ray emitting element array described light source board is separated, and the face-to-face separating distance " c " of described ultraviolet ray emitting element and collector lens, and the eccentric distance " x " between the central shaft of each ultraviolet ray emitting element described and the central shaft of collector lens, and the pass of the diameter " t " receiving light region A is, the benchmark of the eccentric distance " x " of collector lens meets " x=b*c/a ", and the scope of described " x " meets " bc (2b-t)/2ab<x<bc (2b+t)/2ab ".
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150107835A KR101593963B1 (en) | 2015-07-30 | 2015-07-30 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| KR10-2015-0107835 | 2015-07-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205103540U true CN205103540U (en) | 2016-03-23 |
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ID=55357502
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520858315.XU Withdrawn - After Issue CN205103540U (en) | 2015-07-30 | 2015-10-30 | A exposure device for making public light source module unit and including this light source module unit |
| CN201510726723.4A Expired - Fee Related CN106406033B (en) | 2015-07-30 | 2015-10-30 | For the light source module unit of exposure and the exposure device including the light source module unit |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510726723.4A Expired - Fee Related CN106406033B (en) | 2015-07-30 | 2015-10-30 | For the light source module unit of exposure and the exposure device including the light source module unit |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101593963B1 (en) |
| CN (2) | CN205103540U (en) |
| TW (1) | TWI579658B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106406033A (en) * | 2015-07-30 | 2017-02-15 | 赵南稙 | Uv led light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101848072B1 (en) * | 2016-09-27 | 2018-04-11 | (주)블루코어 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3987350B2 (en) * | 2001-11-16 | 2007-10-10 | 株式会社リコー | Laser illumination optical system and exposure apparatus, laser processing apparatus, and projection apparatus using the same |
| JP3937138B2 (en) | 2002-01-18 | 2007-06-27 | 株式会社オーク製作所 | Exposure equipment |
| US7988305B2 (en) * | 2006-03-23 | 2011-08-02 | Panasonic Corporation | Projection type display device and light source device |
| JP2009099925A (en) * | 2007-09-27 | 2009-05-07 | Tokyo Electron Ltd | Annealing apparatus |
| KR100983582B1 (en) * | 2007-12-31 | 2010-10-11 | 엘지디스플레이 주식회사 | Apparatus and method for exposure and method for pattrning thin layer using the same |
| EP2329322B1 (en) * | 2008-09-22 | 2016-09-07 | ASML Netherlands BV | Lithographic apparatus and lithographic method |
| JP2010164658A (en) * | 2009-01-13 | 2010-07-29 | Oki Data Corp | Lens array, lens unit, led head, exposing unit, image forming apparatus, and reading apparatus |
| EP2226683A1 (en) * | 2009-03-06 | 2010-09-08 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Illumination system for use in a stereolithography apparatus |
| JP5515120B2 (en) * | 2010-10-29 | 2014-06-11 | 株式会社ブイ・テクノロジー | Scan exposure equipment using microlens array |
| JP2012145869A (en) * | 2011-01-14 | 2012-08-02 | Hitachi High-Technologies Corp | Exposure method and device thereof |
| JP2013171088A (en) * | 2012-02-17 | 2013-09-02 | Hitachi High-Technologies Corp | Proximity exposure apparatus, method for forming exposure light of proximity exposure apparatus, and method for manufacturing display panel substrate |
| CN103592821B (en) * | 2013-10-16 | 2015-06-03 | 浙江欧视达科技有限公司 | Novel LED (light-emitting diode) light source system for ultraviolet exposure machine |
| KR101593963B1 (en) * | 2015-07-30 | 2016-02-15 | 조남직 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
-
2015
- 2015-07-30 KR KR1020150107835A patent/KR101593963B1/en active IP Right Grant
- 2015-10-28 TW TW104135369A patent/TWI579658B/en active
- 2015-10-30 CN CN201520858315.XU patent/CN205103540U/en not_active Withdrawn - After Issue
- 2015-10-30 CN CN201510726723.4A patent/CN106406033B/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106406033A (en) * | 2015-07-30 | 2017-02-15 | 赵南稙 | Uv led light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| CN106406033B (en) * | 2015-07-30 | 2019-05-03 | 赵南稙 | For the light source module unit of exposure and the exposure device including the light source module unit |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106406033A (en) | 2017-02-15 |
| TWI579658B (en) | 2017-04-21 |
| TW201704884A (en) | 2017-02-01 |
| KR101593963B1 (en) | 2016-02-15 |
| CN106406033B (en) | 2019-05-03 |
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| AV01 | Patent right actively abandoned |
Granted publication date: 20160323 Effective date of abandoning: 20190503 |
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| AV01 | Patent right actively abandoned |