TWI576573B - Optical analysis device - Google Patents
Optical analysis device Download PDFInfo
- Publication number
- TWI576573B TWI576573B TW100148283A TW100148283A TWI576573B TW I576573 B TWI576573 B TW I576573B TW 100148283 A TW100148283 A TW 100148283A TW 100148283 A TW100148283 A TW 100148283A TW I576573 B TWI576573 B TW I576573B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- corrosion
- optical
- optical system
- measurement
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 86
- 238000004458 analytical method Methods 0.000 title claims description 15
- 238000005259 measurement Methods 0.000 claims description 52
- 238000005260 corrosion Methods 0.000 claims description 43
- 230000007797 corrosion Effects 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 26
- 239000005304 optical glass Substances 0.000 claims description 26
- 239000007789 gas Substances 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 8
- 238000010030 laminating Methods 0.000 claims 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 24
- 229910052594 sapphire Inorganic materials 0.000 description 19
- 239000010980 sapphire Substances 0.000 description 19
- 238000001228 spectrum Methods 0.000 description 13
- 239000000126 substance Substances 0.000 description 11
- 238000010183 spectrum analysis Methods 0.000 description 9
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 8
- 238000000862 absorption spectrum Methods 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000011481 absorbance measurement Methods 0.000 description 2
- 238000004847 absorption spectroscopy Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0297—Constructional arrangements for removing other types of optical noise or for performing calibration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/12—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using wholly visual means
- G01J1/122—Visual exposure meters for determining the exposure time in photographical recording or reproducing
- G01J1/124—Visual exposure meters for determining the exposure time in photographical recording or reproducing based on the comparison of the intensity of measured light with a comparison source or comparison illuminated surface
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
- G01J2001/161—Ratio method, i.e. Im/Ir
- G01J2001/1615—Computing a difference/sum ratio, i.e. (Im - Ir) / (Im + Ir)
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Optical Measuring Cells (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010287860A JP5584109B2 (ja) | 2010-12-24 | 2010-12-24 | 光学分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201233991A TW201233991A (en) | 2012-08-16 |
| TWI576573B true TWI576573B (zh) | 2017-04-01 |
Family
ID=46525586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100148283A TWI576573B (zh) | 2010-12-24 | 2011-12-23 | Optical analysis device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5584109B2 (ko) |
| KR (1) | KR101814823B1 (ko) |
| CN (1) | CN102608029B (ko) |
| TW (1) | TWI576573B (ko) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5937956B2 (ja) * | 2012-11-28 | 2016-06-22 | 株式会社堀場製作所 | 光学分析装置 |
| JP5947709B2 (ja) | 2012-12-27 | 2016-07-06 | 株式会社堀場製作所 | 分光分析方法及び分光分析装置 |
| JP6249886B2 (ja) * | 2014-06-11 | 2017-12-20 | 株式会社堀場製作所 | 光学測定セル及び光学分析計 |
| JP6641171B2 (ja) * | 2015-12-14 | 2020-02-05 | 株式会社堀場製作所 | 吸光度計 |
| JP7229084B2 (ja) * | 2019-04-19 | 2023-02-27 | 株式会社 堀場アドバンスドテクノ | 光学分析装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002082050A (ja) * | 2000-09-08 | 2002-03-22 | Horiba Ltd | 分光分析装置 |
| TW201040319A (en) * | 2009-01-16 | 2010-11-16 | Fujimori Kogyo Co | Method of corrosion prevention and corrosion preventive structure |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN85202765U (zh) * | 1985-06-29 | 1986-04-30 | 上海自立仪器合作工厂 | 可直读浓度的双波长光度计 |
| JPH03104857A (ja) * | 1989-09-18 | 1991-05-01 | Central Glass Co Ltd | 含フッ素樹脂被覆ＫＢｒ板状体およびその製造法 |
| JPH0798252A (ja) * | 1993-09-28 | 1995-04-11 | Jasco Corp | フーリエ変換赤外分光光度計 |
| JPH0868746A (ja) * | 1994-08-29 | 1996-03-12 | Dainippon Screen Mfg Co Ltd | 透過光測定用フローセル |
| JP2000046728A (ja) * | 1998-07-24 | 2000-02-18 | Apurikusu:Kk | 光学分析用耐蝕セル |
| DE10204963A1 (de) * | 2002-02-06 | 2003-08-14 | Isco Inc | Fotometrische Sonde für Untersuchungen an Flüssigkeiten sowie Verfahren hierfür |
| WO2006085646A1 (ja) * | 2005-02-14 | 2006-08-17 | Japan Science And Technology Agency | ガス相関法によるガス濃度測定装置 |
| CN101324524B (zh) * | 2007-06-11 | 2010-10-27 | 财团法人工业技术研究院 | 测量装置 |
| CN201335808Y (zh) * | 2009-01-05 | 2009-10-28 | 宇星科技发展(深圳)有限公司 | 双波长光学检测装置 |
-
2010
- 2010-12-24 JP JP2010287860A patent/JP5584109B2/ja active Active
-
2011
- 2011-12-20 KR KR1020110137968A patent/KR101814823B1/ko active IP Right Grant
- 2011-12-21 CN CN201110432455.7A patent/CN102608029B/zh active Active
- 2011-12-23 TW TW100148283A patent/TWI576573B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002082050A (ja) * | 2000-09-08 | 2002-03-22 | Horiba Ltd | 分光分析装置 |
| TW201040319A (en) * | 2009-01-16 | 2010-11-16 | Fujimori Kogyo Co | Method of corrosion prevention and corrosion preventive structure |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20120073108A (ko) | 2012-07-04 |
| CN102608029A (zh) | 2012-07-25 |
| JP5584109B2 (ja) | 2014-09-03 |
| TW201233991A (en) | 2012-08-16 |
| CN102608029B (zh) | 2016-08-24 |
| JP2012137303A (ja) | 2012-07-19 |
| KR101814823B1 (ko) | 2018-01-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI576573B (zh) | Optical analysis device | |
| KR101907393B1 (ko) | 소수성 박막을 증착한 비분산적외선 이산화탄소 가스센서 | |
| US8077315B2 (en) | Multiple path length transmittance measuring device | |
| JP4254654B2 (ja) | レーザ式多重反射セル式ガス分析計 | |
| WO2014181527A1 (ja) | 原料流体濃度検出器 | |
| JP5885699B2 (ja) | 脆性破壊性光透過窓板の固定構造及びこれを用いた脆性破壊性光透過窓板の固定方法 | |
| KR102122843B1 (ko) | 광학 분석 장치 | |
| KR20110127122A (ko) | 시료분석장치 | |
| JP2014219294A5 (ko) | ||
| US20200158625A1 (en) | Flow cell and optical system for analyzing fluid | |
| CN103403529B (zh) | 包括频谱校准装置的光学气体分析装置 | |
| TWI792164B (zh) | 濃度測定裝置 | |
| JP4762128B2 (ja) | 吸光分析計 | |
| JP2008216094A (ja) | 透過光測定用フローセル | |
| JPH06265471A (ja) | 混酸の濃度測定方法および濃度測定装置 | |
| JP7229084B2 (ja) | 光学分析装置 | |
| JP6082329B2 (ja) | 濃度測定装置及び濃度測定方法 | |
| JP3215570B2 (ja) | 有機剥離液の成分濃度測定方法およびその測定装置 | |
| JP4538364B2 (ja) | 屈折率測定用具、屈折率測定装置及び屈折率測定方法 | |
| JP5397296B2 (ja) | ガス分析装置 | |
| CN111458302A (zh) | 一种复用ccd的双光路分光光度测量系统及方法 | |
| CN212432972U (zh) | 一种复用ccd的双光路分光光度测量装置 | |
| CN107036981B (zh) | 吸收光谱仪 | |
| JP2022017606A (ja) | 濃度センサ | |
| CN110785650B (zh) | 用于分析流体的流通池以及光学系统 |