TWI572732B - A zinc oxide-based sintered body, a zinc oxide sputtering target made of the sintered body, and a zinc oxide thin film obtained by sputtering the target - Google Patents

A zinc oxide-based sintered body, a zinc oxide sputtering target made of the sintered body, and a zinc oxide thin film obtained by sputtering the target Download PDF

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Publication number
TWI572732B
TWI572732B TW102131969A TW102131969A TWI572732B TW I572732 B TWI572732 B TW I572732B TW 102131969 A TW102131969 A TW 102131969A TW 102131969 A TW102131969 A TW 102131969A TW I572732 B TWI572732 B TW I572732B
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Taiwan
Prior art keywords
zinc oxide
sintered body
metal
sputtering
target
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TW102131969A
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English (en)
Chinese (zh)
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TW201428117A (zh
Inventor
Hideo Takami
Atsushi Nara
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Jx Nippon Mining & Metals Corp
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Publication of TW201428117A publication Critical patent/TW201428117A/zh
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Publication of TWI572732B publication Critical patent/TWI572732B/zh

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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/05—Mixtures of metal powder with non-metallic powder
    • C22C1/051—Making hard metals based on borides, carbides, nitrides, oxides or silicides; Preparation of the powder mixture used as the starting material therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C22C29/12—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
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    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3217—Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3256—Molybdenum oxides, molybdates or oxide forming salts thereof, e.g. cadmium molybdate
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    • C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3258—Tungsten oxides, tungstates, or oxide-forming salts thereof
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/327—Iron group oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3272—Iron oxides or oxide forming salts thereof, e.g. hematite, magnetite
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/327—Iron group oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3275—Cobalt oxides, cobaltates or cobaltites or oxide forming salts thereof, e.g. bismuth cobaltate, zinc cobaltite
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    • C04B2235/3279—Nickel oxides, nickalates, or oxide-forming salts thereof
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3281—Copper oxides, cuprates or oxide-forming salts thereof, e.g. CuO or Cu2O
    • C—CHEMISTRY; METALLURGY
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    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
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    • C04B2235/3409—Boron oxide, borates, boric acids, or oxide forming salts thereof, e.g. borax
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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
TW102131969A 2012-10-02 2013-09-05 A zinc oxide-based sintered body, a zinc oxide sputtering target made of the sintered body, and a zinc oxide thin film obtained by sputtering the target TWI572732B (zh)

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Application Number Priority Date Filing Date Title
JP2012220320 2012-10-02

Publications (2)

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TW201428117A TW201428117A (zh) 2014-07-16
TWI572732B true TWI572732B (zh) 2017-03-01

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TW102131969A TWI572732B (zh) 2012-10-02 2013-09-05 A zinc oxide-based sintered body, a zinc oxide sputtering target made of the sintered body, and a zinc oxide thin film obtained by sputtering the target

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JP (1) JP5847308B2 (ko)
KR (1) KR101625773B1 (ko)
CN (1) CN105612136B (ko)
TW (1) TWI572732B (ko)
WO (1) WO2014054361A1 (ko)

Citations (2)

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WO2008023482A1 (fr) * 2006-08-24 2008-02-28 Nippon Mining & Metals Co., Ltd. conducteur électrique transparent à base d'oxyde de zinc, cible de pulvérisation cathodique pour former le conducteur et processus de fabrication de la cible
JP2009173962A (ja) * 2008-01-22 2009-08-06 Sony Corp スパッタリング複合ターゲット及びこれを用いた透明導電膜の製造方法

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KR101002537B1 (ko) * 2002-08-02 2010-12-17 이데미쓰 고산 가부시키가이샤 스퍼터링 타겟, 소결체, 이들을 사용하여 제조한 도전막,유기 ｅｌ 소자, 및 이것에 사용하는 기판
JP4817137B2 (ja) * 2002-09-09 2011-11-16 Ｊｘ日鉱日石金属株式会社 スパッタリングターゲット及び光記録媒体
RU2376263C2 (ru) * 2005-06-28 2009-12-20 Ниппон Майнинг Энд Металз Ко., Лтд. Распыляемая мишень на основе оксида галлия-оксида цинка, способ формирования тонкой прозрачной проводящей пленки и тонкая прозрачная проводящая пленка
JP2009167515A (ja) * 2008-01-15 2009-07-30 Kanazawa Inst Of Technology 透明導電膜製造用スパッタリングターゲット及び透明導電膜形成方法
JP4982423B2 (ja) * 2008-04-24 2012-07-25 株式会社日立製作所 酸化亜鉛薄膜形成用スパッタターゲットと、それを用いて得られる酸化亜鉛薄膜を有する表示素子及び太陽電池
JP2009295545A (ja) * 2008-06-09 2009-12-17 Kaneka Corp 透明導電膜およびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008023482A1 (fr) * 2006-08-24 2008-02-28 Nippon Mining & Metals Co., Ltd. conducteur électrique transparent à base d'oxyde de zinc, cible de pulvérisation cathodique pour former le conducteur et processus de fabrication de la cible
JP2009173962A (ja) * 2008-01-22 2009-08-06 Sony Corp スパッタリング複合ターゲット及びこれを用いた透明導電膜の製造方法

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WO2014054361A1 (ja) 2014-04-10
JP5847308B2 (ja) 2016-01-20
TW201428117A (zh) 2014-07-16
CN105612136B (zh) 2017-06-20
CN105612136A (zh) 2016-05-25
JPWO2014054361A1 (ja) 2016-08-25
KR20140100507A (ko) 2014-08-14
KR101625773B1 (ko) 2016-05-31

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