TWI560514B - Method of manufacturing a mask - Google Patents

Method of manufacturing a mask

Info

Publication number
TWI560514B
TWI560514B TW101133681A TW101133681A TWI560514B TW I560514 B TWI560514 B TW I560514B TW 101133681 A TW101133681 A TW 101133681A TW 101133681 A TW101133681 A TW 101133681A TW I560514 B TWI560514 B TW I560514B
Authority
TW
Taiwan
Prior art keywords
mask
manufacturing
Prior art date
Application number
TW101133681A
Other languages
English (en)
Other versions
TW201312261A (zh
Inventor
Valeriy Prushinskiy
Won-Sik Hyun
Heung-Yeol Na
Min-Soo Kim
Young-Shin Pyo
Jae-Min Hong
Original Assignee
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of TW201312261A publication Critical patent/TW201312261A/zh
Application granted granted Critical
Publication of TWI560514B publication Critical patent/TWI560514B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
TW101133681A 2011-09-15 2012-09-14 Method of manufacturing a mask TWI560514B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110093072A KR101854796B1 (ko) 2011-09-15 2011-09-15 마스크 제조 방법

Publications (2)

Publication Number Publication Date
TW201312261A TW201312261A (zh) 2013-03-16
TWI560514B true TWI560514B (en) 2016-12-01

Family

ID=47880966

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101133681A TWI560514B (en) 2011-09-15 2012-09-14 Method of manufacturing a mask

Country Status (5)

Country Link
US (1) US8927180B2 (zh)
JP (1) JP5524272B2 (zh)
KR (1) KR101854796B1 (zh)
CN (1) CN102998897B (zh)
TW (1) TWI560514B (zh)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102090198B1 (ko) * 2013-03-29 2020-03-18 삼성디스플레이 주식회사 파인 메탈 마스크 및 그 제조 방법
KR102126699B1 (ko) * 2013-05-30 2020-06-26 삼성디스플레이 주식회사 마스크 제조 방법
CN103938154B (zh) 2013-06-21 2017-04-19 厦门天马微电子有限公司 一种掩膜板及其制造方法
KR20150017191A (ko) * 2013-08-06 2015-02-16 삼성디스플레이 주식회사 메탈 마스크 제작 방법
TWI490637B (zh) * 2013-12-06 2015-07-01 金屬遮罩製造方法以及金屬遮罩
CN104062842B (zh) * 2014-06-30 2019-02-15 上海天马有机发光显示技术有限公司 一种掩模板及其制造方法、工艺装置
CN105579610A (zh) * 2014-07-21 2016-05-11 安徽省大富光电科技有限公司 复合掩膜板及其制造方法、复合掩膜板组件
CN104201289B (zh) * 2014-08-07 2017-02-08 京东方科技集团股份有限公司 一种像素单元及其制作方法、显示面板、显示装置
KR102140304B1 (ko) 2014-08-26 2020-08-03 삼성디스플레이 주식회사 증착 장치, 이를 이용한 박막 형성 방법 및 유기 발광 표시 장치 제조 방법
KR20160061568A (ko) * 2014-11-21 2016-06-01 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
KR102278606B1 (ko) * 2014-12-19 2021-07-19 삼성디스플레이 주식회사 마스크 프레임 조립체, 이를 포함하는 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
CN105220124B (zh) * 2015-10-10 2018-07-13 京东方科技集团股份有限公司 固定基台和蒸镀设备
KR102549358B1 (ko) 2015-11-02 2023-06-29 삼성디스플레이 주식회사 증착 마스크 조립체 및 이를 이용한 표시 장치의 제조 방법
KR102608420B1 (ko) 2016-03-09 2023-12-01 삼성디스플레이 주식회사 증착용 마스크, 표시 장치의 제조 장치 및 표시 장치의 제조 방법
KR102388719B1 (ko) * 2017-07-20 2022-04-21 삼성디스플레이 주식회사 박막 증착용 마스크, 이의 제조 방법 및 이를 이용한 표시 장치 제조 방법
US11655536B2 (en) * 2018-03-20 2023-05-23 Sharp Kabushiki Kaisha Film forming mask and method of manufacturing display device using same
CN109023235B (zh) * 2018-08-13 2021-01-26 京东方科技集团股份有限公司 掩模基板、掩膜组件、显示面板和显示装置
CN109680245A (zh) * 2019-02-20 2019-04-26 湖畔光电科技（江苏）有限公司 一种新型蒸镀用金属掩模板及蒸镀装置
CN109913804B (zh) * 2019-03-27 2021-01-26 京东方科技集团股份有限公司 掩膜版及其制造方法
WO2022092848A1 (ko) * 2020-10-30 2022-05-05 에이피에스홀딩스 주식회사 증착 마스크

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08106152A (ja) * 1994-10-06 1996-04-23 Fujitsu Ltd フォトマスク及びその作製方法
TW201109834A (en) * 2009-06-18 2011-03-16 Hoya Corp Mask blank, transfer mask, and method for manufacturing transfer masks

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5348825A (en) 1991-07-02 1994-09-20 Dai Nippon Printing Co., Ltd. Method for manufacturing shadow mask and shadow mask manufactured by said method
JP3193863B2 (ja) * 1996-01-31 2001-07-30 ホーヤ株式会社 転写マスクの製造方法
JP3271616B2 (ja) * 1999-07-28 2002-04-02 日本電気株式会社 電子線露光用マスク及びその製造方法
KR20000006852A (ko) 1999-11-08 2000-02-07 김창태 쉐도우 마스크를 이용한 웨이퍼상에 금속 패턴을 형성하는방법
JP4173722B2 (ja) * 2002-11-29 2008-10-29 三星エスディアイ株式会社 蒸着マスク、これを利用した有機ｅｌ素子の製造方法及び有機ｅｌ素子
JP4233882B2 (ja) * 2003-01-30 2009-03-04 株式会社アルバック 蒸着用マスクの製造方法
JP2005183153A (ja) * 2003-12-18 2005-07-07 Dainippon Screen Mfg Co Ltd 蒸着用マスクの製造方法
JP5262226B2 (ja) * 2007-08-24 2013-08-14 大日本印刷株式会社 蒸着マスクおよび蒸着マスクの製造方法
KR101117645B1 (ko) 2009-02-05 2012-03-05 삼성모바일디스플레이주식회사 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치
JP2011034681A (ja) 2009-07-29 2011-02-17 Hitachi Displays Ltd 金属加工方法、金属マスク製造方法及び有機ｅｌ表示装置製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08106152A (ja) * 1994-10-06 1996-04-23 Fujitsu Ltd フォトマスク及びその作製方法
TW201109834A (en) * 2009-06-18 2011-03-16 Hoya Corp Mask blank, transfer mask, and method for manufacturing transfer masks

Also Published As

Publication number Publication date
US8927180B2 (en) 2015-01-06
TW201312261A (zh) 2013-03-16
JP2013064190A (ja) 2013-04-11
JP5524272B2 (ja) 2014-06-18
KR20130044388A (ko) 2013-05-03
CN102998897B (zh) 2017-07-28
CN102998897A (zh) 2013-03-27
US20130071775A1 (en) 2013-03-21
KR101854796B1 (ko) 2018-05-09

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