TWI546574B - 著色組成物、彩色濾光片及顯示元件 - Google Patents
著色組成物、彩色濾光片及顯示元件 Download PDFInfo
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- TWI546574B TWI546574B TW101119298A TW101119298A TWI546574B TW I546574 B TWI546574 B TW I546574B TW 101119298 A TW101119298 A TW 101119298A TW 101119298 A TW101119298 A TW 101119298A TW I546574 B TWI546574 B TW I546574B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/12—Amino derivatives of triarylmethanes without any OH group bound to an aryl nucleus
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B55/00—Azomethine dyes
- C09B55/005—Disazomethine dyes
- C09B55/006—Disazomethine dyes containing at least one heteroring
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/006—Preparation of organic pigments
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0084—Dispersions of dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
- C09B69/06—Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/103—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a diaryl- or triarylmethane dye
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Dispersion Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Indole Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011123603 | 2011-06-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201305616A TW201305616A (zh) | 2013-02-01 |
TWI546574B true TWI546574B (zh) | 2016-08-21 |
Family
ID=47259389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101119298A TWI546574B (zh) | 2011-06-01 | 2012-05-30 | 著色組成物、彩色濾光片及顯示元件 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5994775B2 (ja) |
KR (1) | KR101892777B1 (ja) |
TW (1) | TWI546574B (ja) |
WO (1) | WO2012165537A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3354641B1 (en) | 2012-05-09 | 2019-07-17 | Basf Se | Oxime ester photoinitiators |
JP6015150B2 (ja) * | 2012-06-11 | 2016-10-26 | 住友化学株式会社 | 着色感光性樹脂組成物 |
JP6015151B2 (ja) * | 2012-06-11 | 2016-10-26 | 住友化学株式会社 | 着色感光性樹脂組成物 |
KR102066287B1 (ko) * | 2012-06-11 | 2020-01-14 | 스미또모 가가꾸 가부시키가이샤 | 착색 감광성 수지 조성물 |
JP6062732B2 (ja) * | 2012-12-19 | 2017-01-18 | 株式会社Adeka | 新規化合物及び着色感光性組成物 |
KR102229653B1 (ko) * | 2012-12-19 | 2021-03-18 | 가부시키가이샤 아데카 | 착색 감광성 조성물 |
JP2014170098A (ja) * | 2013-03-04 | 2014-09-18 | Toyo Ink Sc Holdings Co Ltd | 感光性着色組成物およびカラーフィルタ |
KR101563131B1 (ko) | 2013-06-03 | 2015-10-26 | (주)경인양행 | 청색 염료 화합물, 이를 포함하는 컬러필터용 청색 수지 조성물 및 이를 이용한 컬러필터 |
KR20150005139A (ko) * | 2013-07-04 | 2015-01-14 | (주)경인양행 | 청색 염료 화합물, 이를 포함하는 컬러필터용 청색 수지 조성물 및 이를 이용한 컬러필터 |
TWI624499B (zh) * | 2013-07-16 | 2018-05-21 | 東友精細化工有限公司 | 著色硬化性樹脂組成物 |
KR101661733B1 (ko) * | 2014-07-10 | 2016-10-04 | (주)경인양행 | 염료 화합물 및 이를 포함하는 컬러필터용 수지 조성물 |
JP6464764B2 (ja) * | 2015-01-16 | 2019-02-06 | Jsr株式会社 | 感放射線性着色組成物、スペーサー、その形成方法及び液晶表示素子 |
JP6592257B2 (ja) * | 2015-03-12 | 2019-10-16 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 着色硬化性樹脂組成物 |
KR102402598B1 (ko) * | 2015-04-30 | 2022-05-26 | 삼성디스플레이 주식회사 | 표시 장치용 포지티브형 감광성 수지 조성물 및 이를 포함하는 표시 장치 |
JP2016157127A (ja) * | 2016-03-25 | 2016-09-01 | 住友化学株式会社 | 着色感光性樹脂組成物 |
KR102335614B1 (ko) * | 2018-03-21 | 2021-12-03 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 |
JP6951994B2 (ja) * | 2018-03-22 | 2021-10-20 | 株式会社日本触媒 | 新規重合体 |
CN111100059A (zh) * | 2018-10-28 | 2020-05-05 | 北京艾德旺科技发展有限公司 | 一种新型咔唑肟酯类光引发剂的结构设计与合成 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2891418B2 (ja) | 1988-11-26 | 1999-05-17 | 凸版印刷株式会社 | カラーフィルターおよびその製造方法 |
JPH0812292B2 (ja) | 1989-07-20 | 1996-02-07 | 凸版印刷株式会社 | 耐熱性カラーフィルターおよびその製造方法 |
JPH0635188A (ja) | 1992-07-15 | 1994-02-10 | Nippon Kayaku Co Ltd | カラーフィルター用光重合組成物及びカラーフィルター |
JP2005031583A (ja) * | 2003-07-11 | 2005-02-03 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びプリント配線板の製造方法 |
WO2005116775A1 (ja) * | 2004-05-31 | 2005-12-08 | Fuji Photo Film Co., Ltd. | パターン形成方法及びカラーフィルタの製造方法、並びにカラーフィルタ及び液晶表示装置 |
TW200622491A (en) * | 2004-09-28 | 2006-07-01 | Fuji Photo Film Co Ltd | Pattern-forming material, pattern-forming device and pattern-forming method |
JP4500657B2 (ja) * | 2004-11-30 | 2010-07-14 | 旭化成イーマテリアルズ株式会社 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
JP5262258B2 (ja) * | 2008-04-11 | 2013-08-14 | 大日本印刷株式会社 | 染料カラーフィルタ |
JP5572332B2 (ja) * | 2009-04-24 | 2014-08-13 | 凸版印刷株式会社 | 染料を含有する青色着色組成物、カラーフィルタ、それを具備する液晶表示装置並びに有機elディスプレイ |
JP5442004B2 (ja) | 2009-04-24 | 2014-03-12 | 日本化薬株式会社 | 新規なトリアリールメタン化合物 |
JP2010217903A (ja) * | 2010-04-19 | 2010-09-30 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びプリント配線板の製造方法 |
JPWO2011152379A1 (ja) * | 2010-06-03 | 2013-08-01 | 日本化薬株式会社 | 着色樹脂組成物、着色硬化膜、カラーフィルター、液晶表示装置、有機elディスプレイ及び固体撮像素子 |
JPWO2012053211A1 (ja) * | 2010-10-21 | 2014-02-24 | 日本化薬株式会社 | カラーフィルター用着色樹脂組成物、カラーフィルター、表示装置及び固体撮像素子 |
-
2012
- 2012-05-30 TW TW101119298A patent/TWI546574B/zh active
- 2012-05-31 KR KR1020137031450A patent/KR101892777B1/ko active IP Right Grant
- 2012-05-31 JP JP2013518153A patent/JP5994775B2/ja active Active
- 2012-05-31 WO PCT/JP2012/064056 patent/WO2012165537A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP5994775B2 (ja) | 2016-09-21 |
KR20140027346A (ko) | 2014-03-06 |
TW201305616A (zh) | 2013-02-01 |
WO2012165537A1 (ja) | 2012-12-06 |
JPWO2012165537A1 (ja) | 2015-02-23 |
KR101892777B1 (ko) | 2018-08-28 |
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