TWI545184B - 混合的研磨性鎢之化學機械拋光（ｃｍｐ）組合物 - Google Patents

混合的研磨性鎢之化學機械拋光（ｃｍｐ）組合物 Download PDF

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Publication number
TWI545184B
TWI545184B TW104109483A TW104109483A TWI545184B TW I545184 B TWI545184 B TW I545184B TW 104109483 A TW104109483 A TW 104109483A TW 104109483 A TW104109483 A TW 104109483A TW I545184 B TWI545184 B TW I545184B
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Taiwan
Prior art keywords
acid
cerium oxide
colloidal
abrasive
polishing
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TW104109483A
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English (en)
Chinese (zh)
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TW201602324A (zh
Inventor
威廉 沃德
葛倫 懷騰納
史帝芬 葛倫拜
傑佛瑞 戴薩
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卡博特微電子公司
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Publication of TW201602324A publication Critical patent/TW201602324A/zh
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74—Iron group metals
    • B01J23/745—Iron
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • H10P52/00—
    • H10P52/402—
    • H10P52/403—

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW104109483A 2014-03-24 2015-03-24 混合的研磨性鎢之化學機械拋光（ｃｍｐ）組合物 TWI545184B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/222,736 US9303190B2 (en) 2014-03-24 2014-03-24 Mixed abrasive tungsten CMP composition

Publications (2)

Publication Number Publication Date
TW201602324A TW201602324A (zh) 2016-01-16
TWI545184B true TWI545184B (zh) 2016-08-11

Family

ID=54141490

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104109483A TWI545184B (zh) 2014-03-24 2015-03-24 混合的研磨性鎢之化學機械拋光（ｃｍｐ）組合物

Country Status (7)

Country Link
US (1) US9303190B2 (enExample)
EP (1) EP3123498B1 (enExample)
JP (1) JP6633540B2 (enExample)
KR (1) KR102390111B1 (enExample)
CN (1) CN106415796B (enExample)
TW (1) TWI545184B (enExample)
WO (1) WO2015148295A1 (enExample)

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Also Published As

Publication number Publication date
CN106415796A (zh) 2017-02-15
KR102390111B1 (ko) 2022-04-25
US9303190B2 (en) 2016-04-05
CN106415796B (zh) 2019-06-25
WO2015148295A1 (en) 2015-10-01
JP2017516296A (ja) 2017-06-15
EP3123498A1 (en) 2017-02-01
TW201602324A (zh) 2016-01-16
KR20160135774A (ko) 2016-11-28
EP3123498B1 (en) 2019-10-02
US20150267083A1 (en) 2015-09-24
EP3123498A4 (en) 2017-12-27
JP6633540B2 (ja) 2020-01-22

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