TWI542060B - 有機膜形成裝置及有機膜形成方法 - Google Patents

有機膜形成裝置及有機膜形成方法 Download PDF

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Publication number
TWI542060B
TWI542060B TW100138097A TW100138097A TWI542060B TW I542060 B TWI542060 B TW I542060B TW 100138097 A TW100138097 A TW 100138097A TW 100138097 A TW100138097 A TW 100138097A TW I542060 B TWI542060 B TW I542060B
Authority
TW
Taiwan
Prior art keywords
film
film formation
light
organic
vacuum chamber
Prior art date
Application number
TW100138097A
Other languages
English (en)
Chinese (zh)
Other versions
TW201232863A (en
Inventor
內田一也
大森大輔
宮內淳
Original Assignee
愛發科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 愛發科股份有限公司 filed Critical 愛發科股份有限公司
Publication of TW201232863A publication Critical patent/TW201232863A/zh
Application granted granted Critical
Publication of TWI542060B publication Critical patent/TWI542060B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/421—Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW100138097A 2010-10-20 2011-10-20 有機膜形成裝置及有機膜形成方法 TWI542060B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010235646 2010-10-20

Publications (2)

Publication Number Publication Date
TW201232863A TW201232863A (en) 2012-08-01
TWI542060B true TWI542060B (zh) 2016-07-11

Family

ID=45975243

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100138097A TWI542060B (zh) 2010-10-20 2011-10-20 有機膜形成裝置及有機膜形成方法

Country Status (5)

Country Link
JP (1) JP5619175B2 (fr)
KR (1) KR101504443B1 (fr)
CN (1) CN103154303B (fr)
TW (1) TWI542060B (fr)
WO (1) WO2012053532A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107636192B (zh) * 2015-06-16 2020-12-18 株式会社爱发科 成膜方法和成膜装置
JPWO2017158946A1 (ja) * 2016-03-18 2019-01-17 コニカミノルタ株式会社 有機エレクトロルミネッセンス素子のパターニング方法及びパターニング装置
KR102235066B1 (ko) * 2017-02-21 2021-04-01 가부시키가이샤 아루박 수지막의 형성 방법 및 마스크
CN110023529B (zh) * 2017-02-21 2022-03-04 株式会社爱发科 树脂膜的形成方法及树脂膜的成膜装置
CN111403630A (zh) 2017-03-08 2020-07-10 堺显示器制品株式会社 有机el设备的制造方法
CN110447307B (zh) 2017-03-30 2022-01-04 堺显示器制品株式会社 有机el器件及其制造方法
DE102017120529A1 (de) * 2017-09-06 2019-03-07 Aixtron Se Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat unter Verwendung einer Maske
JP6662840B2 (ja) * 2017-12-11 2020-03-11 株式会社アルバック 蒸着装置
JP6662841B2 (ja) * 2017-12-21 2020-03-11 株式会社アルバック 蒸着装置
JP6563055B2 (ja) * 2018-02-27 2019-08-21 堺ディスプレイプロダクト株式会社 有機ｅｌデバイス
CN108977764B (zh) * 2018-09-18 2020-06-05 合肥鑫晟光电科技有限公司 蒸镀膜层记录装置及其方法、掩模板组件和蒸镀设备
CN110018619B (zh) * 2019-04-30 2021-11-09 台州锐祥机械设备有限公司 胶印印刷用晒版装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3330656B2 (ja) * 1992-12-14 2002-09-30 松下電器産業株式会社 合成樹脂薄膜のパターン形成方法およびその形成装置
JP4112702B2 (ja) * 1998-09-11 2008-07-02 株式会社アルバック 成膜装置
US20020011205A1 (en) * 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
JP4785269B2 (ja) * 2000-05-02 2011-10-05 株式会社半導体エネルギー研究所 発光装置の作製方法及び成膜装置のクリーニング方法
KR100360308B1 (ko) * 2000-07-03 2002-11-18 한국화학연구원 아세틸렌기를 포함하는 유기화합물, 그 화합물을 이용한증착중합법, 그 방법에 의하여 제조된 증착중합 박막 및그 박막을 사용한 전기 발광소자
JP4083564B2 (ja) * 2001-12-26 2008-04-30 住友ベークライト株式会社 有機層の形成方法及びガスバリア性プラスチックフィルム
JP4013859B2 (ja) * 2003-07-17 2007-11-28 富士電機ホールディングス株式会社 有機薄膜の製造装置
CN1939095B (zh) * 2004-12-14 2010-12-08 株式会社爱发科 涂敷装置、有机材料薄膜的形成方法、有机el面板制造装置
KR100882178B1 (ko) * 2005-06-15 2009-02-06 가부시키가이샤 알박 밀봉 장치 및 밀봉 방법
KR20090041316A (ko) * 2007-10-23 2009-04-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 성막 방법 및 발광 장치의 제작 방법

Also Published As

Publication number Publication date
KR20130063547A (ko) 2013-06-14
CN103154303A (zh) 2013-06-12
JPWO2012053532A1 (ja) 2014-02-24
TW201232863A (en) 2012-08-01
JP5619175B2 (ja) 2014-11-05
WO2012053532A1 (fr) 2012-04-26
CN103154303B (zh) 2016-01-06
KR101504443B1 (ko) 2015-03-19

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