TWI518452B - A color filter, a black matrix, or a hardened resin composition for forming a circuit - Google Patents

A color filter, a black matrix, or a hardened resin composition for forming a circuit Download PDF

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Publication number
TWI518452B
TWI518452B TW102147786A TW102147786A TWI518452B TW I518452 B TWI518452 B TW I518452B TW 102147786 A TW102147786 A TW 102147786A TW 102147786 A TW102147786 A TW 102147786A TW I518452 B TWI518452 B TW I518452B
Authority
TW
Taiwan
Prior art keywords
acrylate
dipentaerythritol
resin composition
acid
meth
Prior art date
Application number
TW102147786A
Other languages
English (en)
Chinese (zh)
Other versions
TW201432378A (zh
Inventor
Naohiro Takamura
Original Assignee
Dai Ichi Kogyo Seiyaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Ichi Kogyo Seiyaku Co Ltd filed Critical Dai Ichi Kogyo Seiyaku Co Ltd
Publication of TW201432378A publication Critical patent/TW201432378A/zh
Application granted granted Critical
Publication of TWI518452B publication Critical patent/TWI518452B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW102147786A 2012-12-26 2013-12-23 A color filter, a black matrix, or a hardened resin composition for forming a circuit TWI518452B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012282420A JP6120560B2 (ja) 2012-12-26 2012-12-26 カラーフィルター、ブラックマトリックス、又は回路形成用の硬化性樹脂組成物

Publications (2)

Publication Number Publication Date
TW201432378A TW201432378A (zh) 2014-08-16
TWI518452B true TWI518452B (zh) 2016-01-21

Family

ID=51020849

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102147786A TWI518452B (zh) 2012-12-26 2013-12-23 A color filter, a black matrix, or a hardened resin composition for forming a circuit

Country Status (5)

Country Link
JP (1) JP6120560B2 (ja)
KR (1) KR102101239B1 (ja)
CN (1) CN104871044B (ja)
TW (1) TWI518452B (ja)
WO (1) WO2014103761A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101990230B1 (ko) * 2015-04-08 2019-06-17 아사히 가세이 가부시키가이샤 감광성 수지 조성물

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1062986A (ja) * 1996-08-21 1998-03-06 Fuji Photo Film Co Ltd 感放射線性着色組成物
JP4130102B2 (ja) * 2001-09-18 2008-08-06 富士フイルム株式会社 感放射線性着色組成物
JP5535430B2 (ja) 2007-06-01 2014-07-02 富士フイルム株式会社 カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
JP5355069B2 (ja) * 2007-12-28 2013-11-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5137662B2 (ja) * 2008-03-31 2013-02-06 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5224936B2 (ja) 2008-06-26 2013-07-03 富士フイルム株式会社 分散液、黒色硬化性組成物、製造方法、固体撮像素子用の遮光膜または反射防止膜の製造方法、および固体撮像素子
JP5396833B2 (ja) 2008-11-28 2014-01-22 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示素子のスペーサーおよび保護膜ならびにそれらの形成方法
JP5362696B2 (ja) 2009-12-22 2013-12-11 エルジー・ケム・リミテッド 多官能アクリル化合物及びそれを含む感光性組成物
JP6022749B2 (ja) * 2010-07-30 2016-11-09 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、リードフレームの製造方法及びプリント配線板の製造方法
JP5671377B2 (ja) 2011-03-07 2015-02-18 富士フイルム株式会社 インプリント用硬化性組成物、パターン形成方法およびパターン
JP5899798B2 (ja) * 2011-10-26 2016-04-06 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法

Also Published As

Publication number Publication date
JP2014126653A (ja) 2014-07-07
WO2014103761A1 (ja) 2014-07-03
CN104871044A (zh) 2015-08-26
JP6120560B2 (ja) 2017-04-26
KR20150102015A (ko) 2015-09-04
CN104871044B (zh) 2018-08-28
KR102101239B1 (ko) 2020-04-17
TW201432378A (zh) 2014-08-16

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